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1. 发明授权

US07345739B2 Lithographic alignment system and device manufacturing method 失效
标题翻译：光刻对准系统和器件制造方法
公开(公告)号：US07345739B2
公开(公告)日：2008-03-18
申请号：US10792909
申请日：2004-03-05
申请人： Robert Frans Maria Hendriks , Egbert Lenderink , Rene Monshouwer , Alexander Marc Van Der Lee , Gert Wim 'T Hooft
发明人： Robert Frans Maria Hendriks , Egbert Lenderink , Rene Monshouwer , Alexander Marc Van Der Lee , Gert Wim 'T Hooft
IPC分类号： G03B27/52 , G03B27/54
CPC分类号： G03F7/70483 , G03F7/70216 , G03F9/7065
摘要： A lithographic apparatus equipped with an improved alignment system, is presented herein. In one embodiment, the apparatus includes a radiation system for providing a projection beam of radiation, a support structure for supporting a patterning device that configures the projection beam according to a desired pattern, a substrate holder for holding a substrate, projection system for projecting the patterned beam onto a target portion of the substrate, and an alignment system. The alignment system includes a radiation source for illuminating at least one mark which is usable for alignment on a substrate and an imaging system for imaging light which has interacted with the at least one mark to generate alignment information.
摘要翻译：本文介绍了一种配有改进对准系统的光刻设备。在一个实施例中，该装置包括用于提供投影辐射束的辐射系统，用于支撑根据期望图案配置投影光束的图案形成装置的支撑结构，用于保持基板的基板保持器，图案化的光束到基板的目标部分上，以及对准系统。对准系统包括用于照亮可用于在基板上对准的至少一个标记的辐射源和用于对与至少一个标记相互作用的光进行成像的成像系统以产生对准信息。

2. 发明申请

US20050110965A1 Lithographic alignment system and device manufacturing method 失效
标题翻译：光刻对准系统和器件制造方法
公开(公告)号：US20050110965A1
公开(公告)日：2005-05-26
申请号：US10792909
申请日：2004-03-05
申请人： Robert Hendriks , Egbert Lenderink , Rene Monshouwer , Alexander Van Der Lee , Gert 'T Hooft
发明人： Robert Hendriks , Egbert Lenderink , Rene Monshouwer , Alexander Van Der Lee , Gert 'T Hooft
IPC分类号： G03F9/00 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70483 , G03F7/70216 , G03F9/7065
摘要： A lithographic apparatus equipped with an improved alignment system, is presented herein. In one embodiment, the apparatus comprises a radiation system for providing a projection beam of radiation, a support structure for supporting a patterning device that configures the projection beam according to a desired pattern, a substrate holder for holding a substrate, projection system for projecting the patterned beam onto a target portion of the substrate, and an alignment system. The alignment system comprises a radiation source for illuminating at least one mark which is usable for alignment on a substrate and an imaging system for imaging light which has interacted with the at least one mark to generate alignment information.
摘要翻译：本文介绍了一种配有改进对准系统的光刻设备。在一个实施例中，该装置包括用于提供投影辐射束的辐射系统，用于支撑根据期望图案配置投影光束的图案形成装置的支撑结构，用于保持基板的基板保持器，图案化的光束到基板的目标部分上，以及对准系统。对准系统包括用于照亮可用于在基板上对准的至少一个标记的辐射源和用于对与至少一个标记相互作用的光进行成像的成像系统以产生对准信息。

3. 发明申请

US20090066921A1 METHOD FOR PRODUCING A MARKER ON A SUBSTRATE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 失效
标题翻译：在基板上生产标记的方法，平版印刷设备和器件制造方法
公开(公告)号：US20090066921A1
公开(公告)日：2009-03-12
申请号：US12269390
申请日：2008-11-12
申请人： Maurits Van Der Schaar , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Everhardus Cornelis Mos , Rene Monshouwer
发明人： Maurits Van Der Schaar , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Everhardus Cornelis Mos , Rene Monshouwer
IPC分类号： G03B27/52
CPC分类号： G03F7/105 , G03F7/168 , G03F9/708 , G03F9/7084
摘要： A method of producing a marker on a substrate includes projecting a patterned beam on a layer of resist disposed on a substrate in a lithographic apparatus to create a latent marker; and locally heating the substrate at the marker location in the lithographic apparatus to transform the latent marker into a detectable marker.
摘要翻译：在衬底上产生标记的方法包括将图案化的光束投影到设置在光刻设备中的衬底的抗蚀剂层上以产生潜在标记; 并且在光刻设备中的标记位置处局部加热衬底，以将潜在标记转变成可检测标记。

4. 发明授权

US07476490B2 Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method 失效
标题翻译：在基板上制造标记的方法，光刻设备和器件制造方法
公开(公告)号：US07476490B2
公开(公告)日：2009-01-13
申请号：US10875605
申请日：2004-06-25
申请人： Maurits Van Der Schaar , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Everhardus Cornelis Mos , Rene Monshouwer
发明人： Maurits Van Der Schaar , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Everhardus Cornelis Mos , Rene Monshouwer
IPC分类号： G03C9/00
CPC分类号： G03F7/105 , G03F7/168 , G03F9/708 , G03F9/7084
摘要： A method of producing a marker on a substrate includes projecting a patterned beam on a layer of resist disposed on a substrate in a lithographic apparatus to create a latent marker; and locally heating the substrate at the marker location in the lithographic apparatus to transform the latent marker into a detectable marker.
摘要翻译：在衬底上产生标记的方法包括将图案化的光束投影到设置在光刻设备中的衬底的抗蚀剂层上以产生潜在标记; 并且在光刻设备中的标记位置处局部加热衬底，以将潜在标记转变成可检测标记。

5. 发明授权

US07095499B2 Method of measuring alignment of a substrate with respect to a reference alignment mark 有权
标题翻译：测量衬底相对于参考对准标记的对准的方法
公开(公告)号：US07095499B2
公开(公告)日：2006-08-22
申请号：US11152083
申请日：2005-06-15
申请人： Rene Monshouwer , Jacobus Hermanus Maria Neijzen , Jan Evert Van Der Werf
发明人： Rene Monshouwer , Jacobus Hermanus Maria Neijzen , Jan Evert Van Der Werf
IPC分类号： G01B11/00 , G01B11/02
CPC分类号： G03F9/7015 , G03F9/7049 , G03F9/7076
摘要： For determining the alignment of a substrate with respect to a mask, a substrate alignment mark, having a periodic structure, and an additional alignment mark, having a periodic structure and provided in a resist layer on top of the substrate, are used. Upon illumination of these two marks, having a period which is considerably smaller than that of a reference mark, an interference pattern is generated, which has a period corresponding to that of the reference mark. By measuring the movement of the interference pattern with respect to the refernce mark, the much smaller mutual movement of the fine alignment marks can be measured. In this way, the resolution and accuracy of a conventional alignment device can be increased considerably.
摘要翻译：为了确定衬底相对于掩模的对准，使用具有周期性结构的衬底对准标记和具有周期性结构并且设置在衬底顶部的抗蚀剂层中的附加对准标记。在照射这两个标记时，具有明显小于参考标记的周期的周期，产生具有对应于参考标记的周期的干涉图案。通过测量干涉图案相对于参考标记的移动，可以测量精细对准标记的相对较小的相互移动。以这种方式，可以显着提高常规对准装置的分辨率和精度。

6. 发明申请

US20050012915A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050012915A1
公开(公告)日：2005-01-20
申请号：US10920328
申请日：2004-08-18
申请人： Jacobus Neijzen , Rene Monshouwer
发明人： Jacobus Neijzen , Rene Monshouwer
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G03B27/42
CPC分类号： G03F9/7088 , G03F9/7049 , G03F9/7076
摘要： An off-axis alignment system in a lithographic projection apparatus uses broadband radiation to illuminate a phase grating on the wafer. The broadband radiation source may include fluorescent materials, e.g. Yag:Ce or ND:Yag crystals illuminated by excitation light.
摘要翻译：光刻投影装置中的离轴对准系统使用宽带辐射来照射晶片上的相位光栅。宽带辐射源可以包括荧光材料，例如 Yag：Ce或ND：由激发光照亮的Yag晶体。

7. 发明授权

US06803993B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US06803993B2
公开(公告)日：2004-10-12
申请号：US10273352
申请日：2002-10-18
申请人： Jacobus Hermanus Maria Neijzen , Rene Monshouwer
发明人： Jacobus Hermanus Maria Neijzen , Rene Monshouwer
IPC分类号： G03B2742
CPC分类号： G03F9/7088 , G03F9/7049 , G03F9/7076
摘要： An off-axis alignment system in a lithographic projection apparatus uses broadband radiation to illuminate a phase grating on the wafer. The broadband radiation source may include fluorescent materials, e.g. Yag:Ce or ND:Yag crystals illuminated by excitation light.
摘要翻译：光刻投影装置中的离轴对准系统使用宽带辐射来照射晶片上的相位光栅。宽带辐射源可以包括荧光材料，例如 Yag：Ce或ND：由激发光照亮的Yag晶体。

8. 发明授权

US07633618B2 Method and apparatus for measuring the relative position of a first and a second alignment mark 失效
标题翻译：用于测量第一和第二对准标记的相对位置的方法和装置
公开(公告)号：US07633618B2
公开(公告)日：2009-12-15
申请号：US10979817
申请日：2004-11-03
申请人： Rene Monshouwer
发明人： Rene Monshouwer
IPC分类号： G01B11/00
CPC分类号： G03F7/70633 , G01B11/27 , G03F9/7049 , G03F9/7076 , H01L23/544 , H01L2924/0002 , H01L2924/00
摘要： The invention relates to a method for measuring the relative position of a first and a second alignment mark on a substrate. The first alignment mark comprises a periodic structure having a first portion with a first periodicity (PE1) and an adjacent second portion with a second periodicity (PE2). The second alignment mark (11) comprises a periodic structure having a first portion with the second periodicity (PE2) and an adjacent second portion with the first periodicity (PE1). The first and second alignment marks are arranged such that the first portions are substantially located one over the other and the second portions are substantially located one over the other. The method further comprises generating a Moiré pattern from the alignment marks and determining the relative positions of the first and second alignment marks based on the periodicity of the Moiré pattern.
摘要翻译：本发明涉及一种用于测量衬底上的第一和第二对准标记的相对位置的方法。第一对准标记包括具有第一周期性（PE1）的第一部分和具有第二周期性（PE2）的相邻第二部分的周期性结构。第二对准标记（11）包括具有第二周期性（PE2）的第一部分和具有第一周期性（PE1）的相邻第二部分的周期性结构。第一和第二对准标记布置成使得第一部分基本上彼此位于一个并且第二部分基本上位于另一个之上。该方法还包括从对准标记产生莫尔图案，并且基于莫尔图案的周期性确定第一和第二对准标记的相对位置。

9. 发明授权

US07312846B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07312846B2
公开(公告)日：2007-12-25
申请号：US10920328
申请日：2004-08-18
申请人： Jacobus Hermanus Maria Neijzen , Rene Monshouwer
发明人： Jacobus Hermanus Maria Neijzen , Rene Monshouwer
IPC分类号： G03B27/42 , G03B11/00
CPC分类号： G03F9/7088 , G03F9/7049 , G03F9/7076
摘要： An off-axis alignment system in a lithographic projection apparatus uses broadband radiation to illuminate a phase grating on the wafer. The broadband radiation source may include fluorescent materials, e.g. Yag:Ce or ND:Yag crystals illuminated by excitation light.
摘要翻译：光刻投影装置中的离轴对准系统使用宽带辐射来照射晶片上的相位光栅。宽带辐射源可以包括荧光材料，例如 Yag：Ce或ND：由激发光照亮的Yag晶体。

10. 发明授权

US07277185B2 Method of measuring overlay 有权
标题翻译：测量覆盖层的方法
公开(公告)号：US07277185B2
公开(公告)日：2007-10-02
申请号：US11153316
申请日：2005-06-16
申请人： Rene Monshouwer , Jacobus Hermanus Maria Neijzen , Jan Evert Van Der Werf
发明人： Rene Monshouwer , Jacobus Hermanus Maria Neijzen , Jan Evert Van Der Werf
IPC分类号： G01B11/02 , G01B11/00
CPC分类号： G03F7/70633 , G03F7/70675 , G03F9/7049 , G03F9/7084
摘要： In a method of measuring, in a lithographic manufacturing process using a lithographic projection apparatus, overlay between a resist layer, in which a mask pattern is to be imaged, and a substrate, use is made of an alignment-measuring device forming part of the apparatus and of specific overlay marks in the substrate and resist layer. These marks have periodic structures with periods which cannot be resolved by the alignment device, but generate an interference pattern having a period corresponding to the period of a reference mark of the alignment device.
摘要翻译：在使用光刻投影装置的光刻制造工艺中，在要成像掩模图案的抗蚀剂层与基板之间进行覆盖的测量方法中，使用对准测量装置形成部分设备和基板和抗蚀剂层中的特定覆盖标记。这些标记具有周期性结构，其周期不能由对准装置解决，而是产生具有对应于对准装置的参考标记的周期的周期的干涉图案。

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