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1. 发明授权

US10876978B2 X-ray inspecting device, X-ray thin film inspecting method, and method for measuring rocking curve 有权
公开(公告)号：US10876978B2
公开(公告)日：2020-12-29
申请号：US16205801
申请日：2017-07-12
申请人： Rigaku Corporation
发明人： Kiyoshi Ogata , Kazuhiko Omote , Sei Yoshihara , Yoshiyasu Ito , Hiroshi Motono , Hideaki Takahashi , Takao Kinefuchi , Akifusa Higuchi , Shiro Umegaki , Shigematsu Asano , Ryotaro Yamaguchi , Katsutaka Horada , Makoto Kambe , Licai Jiang , Boris Verman
IPC分类号： G01N23/20016 , G01B15/02 , G21K1/06 , G01N23/207 , G01N23/20025 , G21K5/02
CPC分类号： G01N23/20016 , G01B15/02 , G01N23/207 , G01N23/20025 , G21K1/06 , G21K5/02 , G01N2223/1016 , G01N2223/61
摘要： In an X-ray inspection device according to the present invention, an X-ray irradiation unit 40 includes a first X-ray optical element 42 for focusing characteristic X-rays in a vertical direction, and a second X-ray optical element 43 for focusing the characteristic X-rays in a horizontal direction. The first X-ray optical element 42 is constituted by a crystal material having high crystallinity. The second X-ray optical element includes a multilayer mirror.

2. 发明申请

US20190272929A1 X-RAY GENERATOR AND X-RAY ANALYSIS DEVICE 审中-公开
公开(公告)号：US20190272929A1
公开(公告)日：2019-09-05
申请号：US16284777
申请日：2019-02-25
申请人： Rigaku Corporation
发明人： Kazuhiko Omote , Takeshi Osakabe , Tetsuya Ozawa , Licai Jiang , Boris Verman
IPC分类号： G21K1/06 , G21K1/02 , G01N23/201
摘要： An X-ray generator includes: a line X-ray source; a multilayer film mirror; and a side-by-side reflecting mirror including two concave mirrors joined together so as to share a join line. A cross section of a reflecting surface of the multilayer film mirror has a parabolic shape, and a focus of the parabolic shape is located at the line X-ray source. Cross sections of reflecting surfaces of the two concave mirrors of the side-by-side reflecting mirror each have a parabolic shape, and each of focuses of the parabolic shapes is located on a side opposite to the multilayer film mirror. An extended line of the join line of the side-by-side reflecting mirror passes through the multilayer film mirror and the line X-ray source as viewed in a plan view.

3. 发明授权

US09159524B2 X-ray generating apparatus 有权
标题翻译： X射线发生装置
公开(公告)号：US09159524B2
公开(公告)日：2015-10-13
申请号：US14055453
申请日：2013-10-16
申请人： RIGAKU CORPORATION
发明人： Martin Horvarth , Jiri Marsik , Ladislav Pina , Vaclav Jelinek , Naohisa Osaka , Kazuhiko Omote , Makoto Kambe , Licai Jiang , Bonglea Kim
IPC分类号： H01J35/14
CPC分类号： H01J35/14 , H01J2235/081 , H01J2235/083
摘要： The X-ray generating apparatus 100 applies an electron beam e1 onto a target 150 to generate X-rays x1, and includes a permanent magnet lens 120 configured to focus the electron beam e1, a correction coil 130 provided on a side of the electron beam e1 with respect to the permanent magnet lens 120 and configured to correct a focus position formed by the permanent magnet lens 120 in a traveling direction of the electron beam e1, and a target 150 onto which the focused electron beam is applied. Accordingly, the apparatus configuration can be extremely compact and lightweight in comparison with general apparatuses. Furthermore, by the correction coil 130, the intensity of the magnetic field can be finely adjusted and the focus position in the traveling direction of the electron beam e1 can be finely adjusted.
摘要翻译： X射线产生装置100将电子束e1施加到靶150上以产生X射线x1，并且包括被配置为聚焦电子束e1的永磁体透镜120，设置在电子束侧的校正线圈130 e1相对于永磁体透镜120，并且被配置为在电子束e1的行进方向上校正由永久磁铁透镜120形成的聚焦位置，以及被施加聚焦电子束的目标150。因此，与一般装置相比，装置结构可以非常紧凑和重量轻。此外，通过校正线圈130，可以精细地调节磁场的强度，并且可以精细地调整电子束e1的行进方向上的聚焦位置。

4. 发明授权

US10436723B2 X-ray diffractometer with multilayer reflection-type monochromator 有权
$X-ray diffractometer with multilayer reflection-type monochromator$
公开(公告)号：US10436723B2
公开(公告)日：2019-10-08
申请号：US15312881
申请日：2015-01-14
申请人： RIGAKU CORPORATION
发明人： Takeshi Osakabe , Tetsuya Ozawa , Kazuhiko Omote , Licai Jiang , Boris Verman , Yuriy Platonov
IPC分类号： G01N23/20008 , G21K1/04 , G21K1/06 , G02B7/00 , G02B27/42 , G02B27/09 , G01N23/207
摘要： Only X-rays having a specific wavelength, selected from a group of focusing X-rays diffracted from a sample, are reflected from a monochromator based on a Bragg's condition, passed through a receiving slit and detected by an X-ray detector. The monochromator is configured to be freely removable, and arranged between the sample and a focal point at which the wavelength-selected focusing X-rays diffracted from the sample are directly focused. At this time, the monochromator is moved so as to position the monochromator as close to the focal point as possible. The monochromator comprises a multilayer mirror having an internal interplanar spacing, wherein said internal interplanar spacing varies continuously from one end of the monochromator to the other end.

5. 发明授权

US10429325B2 X-ray small angle optical system 有权
公开(公告)号：US10429325B2
公开(公告)日：2019-10-01
申请号：US15259581
申请日：2016-09-08
申请人： Rigaku Corporation
发明人： Kazuki Ito , Kazuhiko Omote , Licai Jiang
IPC分类号： G01N23/201
摘要： Provided is an X-ray small angle optical system, which easily achieves a desired angular resolution, including: an X-ray source having a microfocus; a multilayer mirror having an elliptical reflection surface, and being configured to collect X-rays emitted from the X-ray source and to irradiate a sample; and an X-ray detector configured to detect scattered X-rays generated from the sample, in which the elliptical reflection surface of the multilayer mirror has a focal point A and a focal point B, in which the X-ray source is arranged such that the microfocus includes the focal point A, and in which the X-ray detector is arranged on the multilayer mirror side of the focal point B.

6. 发明申请

US20170074809A1 X-RAY SMALL ANGLE OPTICAL SYSTEM 审中-公开
标题翻译： X射线小角度光学系统
公开(公告)号：US20170074809A1
公开(公告)日：2017-03-16
申请号：US15259581
申请日：2016-09-08
申请人： Rigaku Corporation
发明人： Kazuki ITO , Kazuhiko OMOTE , Licai Jiang
IPC分类号： G01N23/201
摘要： Provided is an X-ray small angle optical system, which easily achieves a desired angular resolution, including: an X-ray source having a microfocus; a multilayer mirror having an elliptical reflection surface, and being configured to collect X-rays emitted from the X-ray source and to irradiate a sample; and an X-ray detector configured to detect scattered X-rays generated from the sample, in which the elliptical reflection surface of the multilayer mirror has a focal point A and a focal point B, in which the X-ray source is arranged such that the microfocus includes the focal point A, and in which the X-ray detector is arranged on the multilayer mirror side of the focal point B.
摘要翻译：本发明提供一种X射线小角度光学系统，其容易实现期望的角度分辨率，包括：具有微焦点的X射线源; 多层反射镜，具有椭圆反射面，并且被配置为收集从X射线源发射的X射线并照射样品; 以及X射线检测器，被配置为检测从样品产生的散射的X射线，其中多层反射镜的椭圆反射表面具有焦点A和焦点B，其中X射线源被布置成使得微焦点包括焦点A，其中X射线检测器布置在焦点B的多层反射镜侧。

7. 发明授权

US10854348B2 X-ray generator and x-ray analysis device 有权
公开(公告)号：US10854348B2
公开(公告)日：2020-12-01
申请号：US16284777
申请日：2019-02-25
申请人： Rigaku Corporation
发明人： Kazuhiko Omote , Takeshi Osakabe , Tetsuya Ozawa , Licai Jiang , Boris Verman
IPC分类号： G21K1/00 , G21K1/06 , G01N23/201 , G21K1/02 , H05G1/02
摘要： An X-ray generator includes: a line X-ray source; a multilayer film mirror; and a side-by-side reflecting mirror including two concave mirrors joined together so as to share a join line. A cross section of a reflecting surface of the multilayer film mirror has a parabolic shape, and a focus of the parabolic shape is located at the line X-ray source. Cross sections of reflecting surfaces of the two concave mirrors of the side-by-side reflecting mirror each have a parabolic shape, and each of focuses of the parabolic shapes is located on a side opposite to the multilayer film mirror. An extended line of the join line of the side-by-side reflecting mirror passes through the multilayer film mirror and the line X-ray source as viewed in a plan view.

8. 发明授权

US11867646B2 Total reflection x-ray fluorescence spectrometer 有权
公开(公告)号：US11867646B2
公开(公告)日：2024-01-09
申请号：US18034886
申请日：2021-11-01
申请人： Rigaku Corporation
发明人： Makoto Kambe , Kazuhiko Omote , Toshifumi Higuchi , Tsutomu Tada , Hajime Fujimura , Masahiro Nonoguchi , Licai Jiang , Boris Verman , Yuriy Platonov
IPC分类号： G01N23/223
CPC分类号： G01N23/223
摘要： Provided is a total reflection X-ray fluorescence spectrometer which has high analysis sensitivity and analysis speed. The total reflection X-ray fluorescence spectrometer includes: an X-ray source that has an electron beam focal point having an effective width in a direction parallel to a surface of a sample, and orthogonal to an X-ray irradiation direction, that is larger than a dimension in the irradiation direction; a reflective optic that has an effective width in the orthogonal direction that is larger than that of the electron beam focal point, and has a curved surface in the irradiation direction; and a plurality of detectors that are arranged in a row in the orthogonal direction, and are configured to measure intensities of fluorescent X-rays emitted from the sample irradiated with primary X-rays focused by the reflective optic.

9. 发明申请

US20190227005A1 X-RAY INSPECTING DEVICE, X-RAY THIN FILM INSPECTING METHOD, AND METHOD FOR MEASURING ROCKING CURVE 审中-公开
公开(公告)号：US20190227005A1
公开(公告)日：2019-07-25
申请号：US16205801
申请日：2017-07-12
申请人： Rigaku Corporation
发明人： Kiyoshi Ogata , Kazuhiko Omote , Sei Yoshihara , Yoshiyasu Ito , Hiroshi Motono , Hideaki Takahashi , Takao Kinefuchi , Akifusa Higuchi , Shiro Umegaki , Shigematsu Asano , Ryotaro Yamaguchi , Katsutaka Horada , Makoto Kambe , Licai Jiang , Boris Verman
IPC分类号： G01N23/20016 , G01B15/02 , G21K1/06 , G01N23/207 , G01N23/20025
摘要： In an X-ray inspection device according to the present invention, an X-ray irradiation unit 40 includes a first X-ray optical element 42 for focusing characteristic X-rays in a vertical direction, and a second X-ray optical element 43 for focusing the characteristic X-rays in a horizontal direction. The first X-ray optical element 42 is constituted by a crystal material having high crystallinity. The second X-ray optical element includes a multilayer mirror.

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