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1. 发明授权

US09536714B2 Sputtering target having increased power compatibility 有权
标题翻译：溅射目标具有增加的功率兼容性
公开(公告)号：US09536714B2
公开(公告)日：2017-01-03
申请号：US14783168
申请日：2014-04-07
申请人： Oerlikon Surface Solutions AG, Trübbach
发明人： Siegfried Krassnitzer , Juerg Hagmann , Joerg Kerschbaumer
IPC分类号： C23C14/34 , H01J37/34
CPC分类号： H01J37/3435 , C23C14/3407 , H01J37/3438 , H01J37/3467 , H01J37/3497
摘要： A plate-centering system that has a plate with a holder, in which the plate is centered in the holder both at room temperature and at higher temperatures, independently of the thermal expansion of the plate and the holder, and the plate can freely expand in the holder at higher temperatures. The invention relates in particular to a target having a frame-shaped target mount, which is very well suited for use in a coating source for high power pulsed magnetron sputtering of the target.
摘要翻译：板对中系统，其具有带有保持器的板，其中板在室温和较高温度下在保持器中居中，独立于板和保持器的热膨胀，并且板可自由地膨胀持有人在较高的温度。本发明具体涉及一种具有框架状目标安装座的靶，其非常适合用于靶材的大功率脉冲磁控溅射用涂层源。

2. 发明申请

US20150318151A1 PLASMA SOURCE 审中-公开
标题翻译：等离子体源
公开(公告)号：US20150318151A1
公开(公告)日：2015-11-05
申请号：US14651278
申请日：2013-12-09
申请人： OERLIKON SURFACE SOLUTIONS AG, TRÜBBACH
发明人： Siegfried Krassnitzer , Juerg Hagmann
IPC分类号： H01J37/32 , C23C16/50
CPC分类号： H01J37/3233 , C23C16/50 , H01J37/3244 , H01J37/32596 , H01J2237/3321 , H05H1/50
摘要： A plasma generating device includes a plasma source having a plasma source hollow body (1) and an electron emission unit (5) for emitting free electrons into the plasma source hollow body. The plasma source hollow body (1) has a first gas inlet (7a) and a plasma source opening (10) which forms an opening to a vacuum chamber. An anode has an anode hollow body (2). The anode hollow body (2) has a second gas inlet (7b) and an anode opening (11) which forms an opening to the vacuum chamber, and a voltage source (8) the negative pole of which is connected to the electron emission unit (5) and the positive pole of which is connected to the anode hollow body (2). The positive pole of the voltage source (8) is electrically connected by a first shunt (6a) to the plasma source hollow body.
摘要翻译：一种等离子体产生装置包括具有等离子体源空心体（1）的等离子体源和用于将自由电子发射到等离子体源空心体中的电子发射单元（5）。等离子体源空心体（1）具有形成到真空室的开口的第一气体入口（7a）和等离子体源开口（10）。阳极具有阳极中空体（2）。阳极中空体（2）具有形成到真空室的开口的第二气体入口（7b）和阳极开口（11），其负极连接到电子发射单元的电压源（8）（5），其正极连接到阳极中空体（2）。电压源（8）的正极通过第一分流器（6a）与等离子体源中空体电连接。

3. 发明申请

US20160141157A1 TARGET FOR THE REACTIVE SPUTTER DEPOSITION OF ELECTRICALLY INSULATING LAYERS 审中-公开
标题翻译：电绝缘层反应溅射沉积的目标
公开(公告)号：US20160141157A1
公开(公告)日：2016-05-19
申请号：US14904343
申请日：2014-07-09
申请人： OERLIKON SURFACE SOLUTIONS AG, TRÜBBACH
发明人： Juerg Hagmann , Siegfried Krassnitzer
IPC分类号： H01J37/34 , C23C14/34 , C23C14/00 , C23C14/35
摘要： A target whose target surface is embodied so that the use of the target for reactive sputter deposition of electrically insulating layers in a coating chamber avoids a production of a spark discharge from the target surface to an anode that is situated in the coating chamber.
摘要翻译：其目标表面被实施为使得在涂覆室中使用电绝缘层的反应溅射沉积的靶避免产生从目标表面到位于涂覆室中的阳极的火花放电。

4. 发明申请

US20160064201A1 SPUTTERING TARGET HAVING INCREASED POWER COMPATIBILITY 有权
标题翻译：具有电力兼容性的飞溅目标
公开(公告)号：US20160064201A1
公开(公告)日：2016-03-03
申请号：US14783168
申请日：2014-04-07
申请人： OERLIKON SURFACE SOLUTIONS AG, TRÜBBACH
发明人： Siegfried Krassnitzer , Juerg Hagmann , Joerg Kerschbaumer
IPC分类号： H01J37/34 , C23C14/34
CPC分类号： H01J37/3435 , C23C14/3407 , H01J37/3438 , H01J37/3467 , H01J37/3497
摘要： A plate-centering system that has a plate with a holder, in which the plate is centered in the holder both at room temperature and at higher temperatures, independently of the thermal expansion of the plate and the holder, and the plate can freely expand in the holder at higher temperatures. The invention relates in particular to a target having a frame-shaped target mount, which is very well suited for use in a coating source for high power pulsed magnetron sputtering of the target.
摘要翻译：板对中系统，其具有带有保持器的板，其中板在室温和较高温度下在保持器中居中，独立于板和保持器的热膨胀，并且板可自由地膨胀持有人在较高的温度。本发明具体涉及一种具有框架状目标安装座的靶，其非常适合用于靶材的大功率脉冲磁控溅射用涂层源。

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