会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 7. 发明申请
    • BLUE ENHANCED IMAGE SENSOR
    • 蓝增强图像传感器
    • US20160211295A1
    • 2016-07-21
    • US14601010
    • 2015-01-20
    • OMNIVISION TECHNOLOGIES, INC.
    • Gang ChenDuli MaoYuanwei ZhengChih-Wei HsiungArvind KumarDyson H. Tai
    • H01L27/146
    • H01L27/14621H01L27/14612H01L27/1464H01L27/14641H01L27/14643H01L27/14645H01L27/14647
    • A back side illuminated image sensor includes a semiconductor material having a front side and a back side. The semiconductor material is disposed between image sensor circuitry and a light filter array. The image sensor circuitry is disposed on the front side, and the light filter array is disposed proximate to the back side. The image sensor includes a first pixel with a first doped region that extends from the image sensor circuitry into the semiconductor material a first depth. The first pixel also includes a second doped region that is disposed between the back side of the semiconductor material and the first doped region. The second doped region is electrically isolated from the first doped region. A second pixel with a third doped region is also included in the image sensor. The third doped region extends from the image sensor circuitry into the semiconductor material a second depth.
    • 背面照明图像传感器包括具有前侧和后侧的半导体材料。 半导体材料设置在图像传感器电路和滤光器阵列之间。 图像传感器电路设置在前侧,并且滤光器阵列靠近背面设置。 图像传感器包括具有第一掺杂区域的第一像素,其从图像传感器电路延伸到半导体材料第一深度。 第一像素还包括设置在半导体材料的背面和第一掺杂区之间的第二掺杂区域。 第二掺杂区域与第一掺杂区域电隔离。 具有第三掺杂区域的第二像素也包括在图像传感器中。 第三掺杂区域从图像传感器电路延伸到半导体材料第二深度。
    • 8. 发明授权
    • Stacked integrated circuit system with thinned intermediate semiconductor die
    • 具有薄型中间半导体芯片的堆叠集成电路系统
    • US09391111B1
    • 2016-07-12
    • US14820992
    • 2015-08-07
    • OMNIVISION TECHNOLOGIES, INC.
    • Keiji MabuchiChih-Wei Hsiung
    • H01L23/02H01L27/146
    • H01L27/14634H01L27/14601H01L27/14609H01L27/14636H01L27/1464H01L27/14645
    • An intermediate integrated circuit die of a stacked integrated circuit system includes an intermediate semiconductor substrate including first polarity dopants is thinned from a second side. A first well including first polarity dopants is disposed in the intermediate semiconductor proximate to a first side. A second well including second polarity dopants is disposed in the intermediate semiconductor substrate proximate to the first side. A deep well having second polarity dopants is disposed in the intermediate semiconductor substrate beneath the first and second wells. An additional implant of first polarity dopants is implanted into the intermediate semiconductor substrate between the deep well and the second side of the intermediate semiconductor substrate to narrow a depletion region overlapped by the additional implant of first polarity dopants. The depletion region is between the deep well and the second side of the intermediate semiconductor substrate.
    • 堆叠集成电路系统的中间集成电路管芯包括中间半导体衬底,其包括第一极性掺杂剂从第二侧变薄。 包括第一极性掺杂剂的第一阱设置在靠近第一侧的中间半导体中。 包括第二极性掺杂剂的第二阱设置在靠近第一侧的中间半导体衬底中。 具有第二极性掺杂剂的深井设置在第一和第二阱下面的中间半导体衬底中。 将第一极性掺杂剂的另外的注入植入到中间半导体衬底的深阱和第二侧之间的中间半导体衬底中,以缩小由第一极性掺杂剂的附加注入重叠的耗尽区。 耗尽区位于中间半导体衬底的深阱和第二侧之间。