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1. 发明申请

US20060134345A1 Systems and methods for depositing material onto microfeature workpieces 审中-公开
标题翻译：将材料沉积在微型工件上的系统和方法
公开(公告)号：US20060134345A1
公开(公告)日：2006-06-22
申请号：US11018142
申请日：2004-12-20
申请人： Neal Rueger , Joel Drewes
发明人： Neal Rueger , Joel Drewes
IPC分类号： H05H1/24 , C23C16/00
CPC分类号： C23C16/45536 , C23C16/45551
摘要： Systems and methods for depositing materials onto a microfeature workpiece are disclosed herein. In one embodiment, a system includes a first deposition chamber, a gas distributor carried by the first deposition chamber, a second deposition chamber operably coupled to the first deposition chamber, an energy source, and a workpiece support movable between the first and second deposition chambers. The energy source is configured to generate a plasma energy and direct the plasma energy toward a plasma zone in the second deposition chamber. The system may also include a barrier positioned in the second deposition chamber to divide the plasma zone into a first zone and a second zone. The barrier is configured to selectively control the movement of ions from the first zone to the second zone.
摘要翻译：本文公开了将材料沉积到微特征工件上的系统和方法。在一个实施例中，系统包括第一沉积室，由第一沉积室承载的气体分配器，可操作地耦合到第一沉积室的第二沉积室，能量源和可在第一和第二沉积室之间移动的工件支撑件。能量源被配置为产生等离子体能量并将等离子体能量引导到第二沉积室中的等离子体区域。该系统还可以包括位于第二沉积室中的隔板，以将等离子体区分成第一区和第二区。阻挡层构造成选择性地控制离子从第一区到第二区的移动。

2. 发明授权

US07649316B2 Assemblies for plasma-enhanced treatment of substrates 失效
标题翻译：用于等离子体增强处理基材的组件
公开(公告)号：US07649316B2
公开(公告)日：2010-01-19
申请号：US11777762
申请日：2007-07-13
申请人： Neal Rueger , Stephen J. Kramer
发明人： Neal Rueger , Stephen J. Kramer
IPC分类号： H01J17/49
CPC分类号： H01J9/02 , H01J11/10 , H01J37/32596 , H05H1/2406 , H05H1/46 , H05H2001/466
摘要： Some embodiments include methods of forming plasma-generating microstructures. Aluminum may be anodized to form an aluminum oxide body having a plurality of openings extending therethrough. Conductive liners may be formed within the openings, and circuitry may be formed to control current flow through the conductive liners. The conductive liners form a plurality of hollow cathodes, and the current flow is configured to generate and maintain plasmas within the hollow cathodes. The plasmas within various hollow cathodes, or sets of hollow cathodes, may be independently controlled. Such independently controlled plasmas may be utilized to create a pattern in a display, or on a substrate. In some embodiments, the plasmas may be utilized for plasma-assisted etching and/or plasma-assisted deposition. Some embodiments include constructions and assemblies containing multiple plasma-generating structures.
摘要翻译：一些实施例包括形成等离子体产生微结构的方法。铝可以被阳极化以形成具有延伸穿过其中的多个开口的氧化铝体。可以在开口内形成导电衬里，并且可以形成电路以控制通过导电衬套的电流。导电衬里形成多个中空阴极，并且电流流动被配置为在中空阴极内产生和维持等离子体。各种空心阴极内的等离子体或一组空心阴极可以独立控制。这种独立控制的等离子体可用于在显示器或基板上产生图案。在一些实施例中，等离子体可用于等离子体辅助蚀刻和/或等离子体辅助沉积。一些实施例包括包含多个等离子体产生结构的构造和组件。

3. 发明申请

US20060273456A1 Multiple spacer steps for pitch multiplication 有权
公开(公告)号：US20060273456A1
公开(公告)日：2006-12-07
申请号：US11144543
申请日：2005-06-02
申请人： Sanket Sant , Gurtej Sandhu , Neal Rueger
发明人： Sanket Sant , Gurtej Sandhu , Neal Rueger
IPC分类号： H01L21/8242 , H01L23/48
CPC分类号： H01L21/3088 , H01L21/0337 , H01L21/3085 , H01L21/3086 , H01L21/76802 , H01L27/1052
摘要： Multiple pitch-multiplied spacers are used to form mask patterns having features with exceptionally small critical dimensions. One of each pair of spacers formed around a plurality of mandrels is removed and alternating layers, formed of two mutually selectively etchable materials, are deposited around the remaining spacers. Layers formed of one of the materials are then etched, leaving behind vertically-extending layers formed of the other of the materials, which form a mask pattern. Alternatively, instead of depositing alternating layers, amorphous carbon is deposited around the remaining spacers followed by a plurality of cycles of forming pairs of spacers on the amorphous carbon, removing one of the pairs of spacers and depositing an amorphous carbon layer. The cycles can be repeated to form the desired pattern. Because the critical dimensions of some features in the pattern can be set by controlling the width of the spaces between spacers, exceptionally small mask features can be formed.

4. 发明申请

US20060218762A1 SYSTEM AND METHOD FOR DETECTING FLOW IN A MASS FLOW CONTROLLER 审中-公开
公开(公告)号：US20060218762A1
公开(公告)日：2006-10-05
申请号：US11421701
申请日：2006-06-01
申请人： Gurtej Sandhu , Sujit Sharan , Neal Rueger , Allen Mardian
发明人： Gurtej Sandhu , Sujit Sharan , Neal Rueger , Allen Mardian
IPC分类号： H01L21/00 , H01L21/306 , C23C16/00
CPC分类号： G01F1/40 , G01F1/42 , G01P13/0006 , G01P13/0013 , G01P13/0033 , G05D7/0635 , Y10T137/0396 , Y10T137/7722 , Y10T137/775 , Y10T137/8242
摘要： Systems and methods are provided for detecting flow in a mass flow controller (MFC). The position of a gate in the MFC is sensed or otherwise determined to monitor flow through the MFC and to immediately or nearly immediately detect a flow failure. In one embodiment of the present invention, a novel MFC is provided. The MFC includes an orifice, a mass flow control gate, an actuator and a gate position sensor. The actuator moves the control gate to control flow through the orifice. The gate position sensor determines the gate position and/or gate movement to monitor flow and immediately or nearly immediately detect a flow failure. According to one embodiment of the present invention, the gate position sensor includes a transmitter for transmitting a signal and a receiver for receiving the signal such that the receiver provides an indication of the position of the gate based on the signal received. Other embodiments of the gate position sensor are described herein, as well as systems and methods that incorporate the novel MFC within a semiconductor manufacturing process.

5. 发明申请

US20060208649A1 Method and system for discretely controllable plasma processing 有权
标题翻译：离子控制等离子体处理方法和系统
公开(公告)号：US20060208649A1
公开(公告)日：2006-09-21
申请号：US11083433
申请日：2005-03-17
申请人： Neal Rueger , Gurtej Sandhu
发明人： Neal Rueger , Gurtej Sandhu
IPC分类号： H01J7/24
CPC分类号： H01J37/3233 , H01J37/32366
摘要： A method and system for plasma generation and processing includes a plurality of beam generators each locally controllable and configured for operation upon a single substrate. A control circuit couples to each of the plurality of beam generators with the control circuit configured to independently regulate at least a portion of the plurality of beam generators. A process gas is introduced into an area above a surface of a substrate. A plurality of beam generators is locally controlled and is directed at the process gas. The beam generators independently emit electrons as controlled and at least a portion of the process gas is converted into plasma according to the electrons emitted from the plurality of the independently controllable beam generators. The substrate is processed using the plasma according to local control of each of the plurality of beam generators.
摘要翻译：用于等离子体产生和处理的方法和系统包括多个光束发生器，每个光束发生器可局部地可控制并且被配置为在单个衬底上操作。控制电路耦合到多个光束发生器中的每一个，控制电路被配置为独立地调节多个光束发生器的至少一部分。将工艺气体引入衬底表面上方的区域。多个束发生器被局部控制并且被引导到处理气体。束发生器独立地发射受电子的电子，并且至少一部分处理气体根据从多个可独立控制的光束发生器发射的电子转换为等离子体。根据多个光束发生器中的每一个的局部控制，使用等离子体处理衬底。

6. 发明申请

US20120313517A1 Plasma-Generating Structures and Display Devices 失效
标题翻译：等离子体发生结构和显示设备
公开(公告)号：US20120313517A1
公开(公告)日：2012-12-13
申请号：US13593280
申请日：2012-08-23
申请人： Neal Rueger , Stephen J. Kramer
发明人： Neal Rueger , Stephen J. Kramer
IPC分类号： H01J61/09 , H01J17/49
CPC分类号： H01J9/02 , H01J11/10 , H01J37/32596 , H05H1/2406 , H05H1/46 , H05H2001/466
摘要： Some embodiments include methods of forming plasma-generating microstructures. Aluminum may be anodized to form an aluminum oxide body having a plurality of openings extending therethrough. Conductive liners may be formed within the openings, and circuitry may be formed to control current flow through the conductive liners. The conductive liners form a plurality of hollow cathodes, and the current flow is configured to generate and maintain plasmas within the hollow cathodes. The plasmas within various hollow cathodes, or sets of hollow cathodes, may be independently controlled. Such independently controlled plasmas may be utilized to create a pattern in a display, or on a substrate. In some embodiments, the plasmas may be utilized for plasma-assisted etching and/or plasma-assisted deposition. Some embodiments include constructions and assemblies containing multiple plasma-generating structures.
摘要翻译：一些实施例包括形成等离子体产生微结构的方法。铝可以被阳极化以形成具有延伸穿过其中的多个开口的氧化铝体。可以在开口内形成导电衬里，并且可以形成电路以控制通过导电衬套的电流。导电衬里形成多个中空阴极，并且电流流动被配置为在中空阴极内产生和维持等离子体。各种空心阴极内的等离子体或一组空心阴极可以独立控制。这种独立控制的等离子体可用于在显示器或基板上产生图案。在一些实施例中，等离子体可用于等离子体辅助蚀刻和/或等离子体辅助沉积。一些实施例包括包含多个等离子体产生结构的构造和组件。

7. 发明申请

US20090308312A1 Devices for positioning carbon nanoparticles, and systems for controlling placement of nanoparticles 有权
标题翻译：用于定位碳纳米颗粒的装置和用于控制纳米颗粒的放置的系统
公开(公告)号：US20090308312A1
公开(公告)日：2009-12-17
申请号：US12381088
申请日：2009-03-05
申请人： Krupakar Murali Subramanian , Neal Rueger , Gurtej Sandhu
发明人： Krupakar Murali Subramanian , Neal Rueger , Gurtej Sandhu
IPC分类号： B05C11/00
CPC分类号： B05B1/14 , B82Y30/00 , B82Y40/00 , C01B32/15 , H01J37/32366
摘要： The present invention is generally directed to a system for controlling placement of nanoparticles, and methods of using same. In one illustrative embodiment, the device includes a substrate and a plurality of funnels in the substrate, wherein each of the funnels comprises an inlet opening and an elongated, rectangular shaped outlet opening. In one illustrative embodiment, the method includes creating a dusty plasma comprising a plurality of carbon nanotubes, positioning a mask between the dusty plasma and a desired target for the carbon nanotubes, the mask having a plurality of openings extending therethrough, and extinguishing the dusty plasma to thereby allow at least some of the carbon nanotubes in the dusty plasma to pass through at least some of the plurality of openings in the mask and land on the target.
摘要翻译：本发明一般涉及一种用于控制纳米颗粒的放置的系统及其使用方法。在一个说明性实施例中，该装置包括衬底和衬底中的多个漏斗，其中每个漏斗包括入口开口和细长的矩形出口。在一个说明性实施例中，该方法包括产生包含多个碳纳米管的多尘等离子体，将掩模放置在尘埃等离子体和碳纳米管的期望目标之间，掩模具有延伸穿过其中的多个开口，并且熄灭灰尘等离子体从而允许灰尘等离子体中的至少一些碳纳米管穿过掩模中的多个开口中的至少一些并且落在目标上。

8. 发明申请

US20070046172A1 Integrated circuit inspection system 失效
标题翻译：集成电路检测系统
公开(公告)号：US20070046172A1
公开(公告)日：2007-03-01
申请号：US11216541
申请日：2005-08-31
申请人： Gurtej Sandhu , Neal Rueger
发明人： Gurtej Sandhu , Neal Rueger
IPC分类号： H01J63/04
CPC分类号： H01L22/12 , B82Y15/00 , H01J2237/2814 , H01J2237/2818
摘要： Methods and systems that include a nanotube used as an emitter in the testing and fabrication of integrated circuits. The nanotube emits a signal to a substrate. Based on the signal or the electrical properties, e.g., current induced in the substrate by the signal, the region of the substrate is characterized. The characterization includes topology of the region of the substrate such as determining whether a recess in the substrate has a proper depth or other dimensions or characteristics of the substrate.
摘要翻译：包括在集成电路的测试和制造中用作发射极的纳米管的方法和系统。纳米管向衬底发出信号。基于信号或电特性，例如由信号在衬底中感应的电流，衬底的区域被表征。表征包括衬底的区域的拓扑，例如确定衬底中的凹槽是否具有适当的深度或衬底的其他尺寸或特性。

9. 发明申请

US20060275549A1 System for controlling placement of nanoparticles and methods of using same 有权
标题翻译：用于控制纳米颗粒放置的系统及其使用方法
公开(公告)号：US20060275549A1
公开(公告)日：2006-12-07
申请号：US11146248
申请日：2005-06-06
申请人： Krupakar Subramanian , Neal Rueger , Gurtej Sandhu
发明人： Krupakar Subramanian , Neal Rueger , Gurtej Sandhu
IPC分类号： B05D1/32 , H05H1/24 , C23C16/00
CPC分类号： B05B1/14 , B82Y30/00 , B82Y40/00 , C01B32/15 , H01J37/32366
摘要： The present invention is generally directed to a system for controlling placement of nanoparticles, and methods of using same. In one illustrative embodiment, the device includes a substrate and a plurality of funnels in the substrate, wherein each of the funnels comprises an inlet opening and an elongated, rectangular shaped outlet opening. In one illustrative embodiment, the method includes creating a dusty plasma comprising a plurality of carbon nanotubes, positioning a mask between the dusty plasma and a desired target for the carbon nanotubes, the mask having a plurality of openings extending therethrough, and extinguishing the dusty plasma to thereby allow at least some of the carbon nanotubes in the dusty plasma to pass through at least some of the plurality of openings in the mask and land on the target.
摘要翻译：本发明一般涉及一种用于控制纳米颗粒的放置的系统及其使用方法。在一个说明性实施例中，该装置包括衬底和衬底中的多个漏斗，其中每个漏斗包括入口开口和细长的矩形出口。在一个说明性实施例中，该方法包括产生包含多个碳纳米管的多尘等离子体，将掩模放置在尘埃等离子体和碳纳米管的期望目标之间，掩模具有延伸穿过其中的多个开口，并且熄灭灰尘等离子体从而允许灰尘等离子体中的至少一些碳纳米管穿过掩模中的多个开口中的至少一些并且落在目标上。

10. 发明申请

US20060236513A1 SYSTEM AND METHOD FOR DETECTING FLOW IN A MASS FLOW CONTROLLER 失效
标题翻译：用于检测流量控制器中的流量的系统和方法
公开(公告)号：US20060236513A1
公开(公告)日：2006-10-26
申请号：US11456055
申请日：2006-07-06
申请人： Gurtej Sandhu , Sujit Sharan , Neal Rueger , Allen Mardian
发明人： Gurtej Sandhu , Sujit Sharan , Neal Rueger , Allen Mardian
IPC分类号： H01L21/66 , F17D3/00 , F16K37/00 , G01B7/00
CPC分类号： G01F1/40 , G01F1/42 , G01P13/0006 , G01P13/0013 , G01P13/0033 , G05D7/0635 , Y10T29/41 , Y10T137/0396 , Y10T137/7722 , Y10T137/775 , Y10T137/8242
摘要： Systems and methods are provided for detecting flow in a mass flow controller (MFC). The position of a gate in the MFC is sensed or otherwise determined to monitor flow through the MFC and to immediately or nearly immediately detect a flow failure. In one embodiment of the present invention, a novel MFC is provided. The MFC includes an orifice, a mass flow control gate, an actuator and a gate position sensor. The actuator moves the control gate to control flow through the orifice. The gate position sensor determines the gate position and/or gate movement to monitor flow and immediately or nearly immediately detect a flow failure. According to one embodiment of the present invention, the gate position sensor includes a transmitter for transmitting a signal and a receiver for receiving the signal such that the receiver provides an indication of the position of the gate based on the signal received. Other embodiments of the gate position sensor are described herein, as well as systems and methods that incorporate the novel MFC within a semiconductor manufacturing process.
摘要翻译：提供了用于检测质量流量控制器（MFC）中的流量的系统和方法。 MFC中的门的位置被感测或以其他方式确定以监视通过MFC的流动并立即或几乎立即检测到流动故障。在本发明的一个实施例中，提供了一种新颖的MFC。 MFC包括孔口，质量流量控制门，致动器和门位置传感器。致动器移动控制门以控制通过孔口的流动。门位置传感器确定门位置和/或门移动以监视流量并立即或几乎立即检测到流动故障。根据本发明的一个实施例，门位置传感器包括用于发送信号的发射机和用于接收信号的接收机，使得接收机基于所接收的信号提供门的位置的指示。这里描述了门位置传感器的其他实施例，以及在半导体制造过程中并入新颖的MFC的系统和方法。

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