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    • 1. 发明授权
    • Substrate support mechanism and substrate rotation device
    • 基板支撑机构和基板旋转装置
    • US06660089B2
    • 2003-12-09
    • US09772853
    • 2001-01-31
    • Naoyuki NozawaTerushige TakeyamaMiho Sakai
    • Naoyuki NozawaTerushige TakeyamaMiho Sakai
    • B05C1300
    • G11B5/8404C23C14/505C23C14/568G11B7/266G11B11/10582
    • A substrate support mechanism of the present invention, which holds the inner rim of a disc substrate having an opening at its center, comprises: a hollow cylindrical member; a central shaft having a tapered portion disposed in the cylindrical member so as to be axially pushed by a first spring; and a plurality of radially movable members, each of which is pushed inwardly by a second spring and has a click to grip the inner rim; whereby the axial motion of the central shaft is converted by the tapered portion to the radial motion of said radially movable members to grip and release said substrate. A substrate rotation device includes a mechanism for axially moving the cylindrical member; a mechanism for axially moving the central shaft; and a mechanism for rotating the cylindrical member in addition to the substrate support mechanism.
    • 本发明的基板支撑机构,其保持在其中心具有开口的盘基片的内缘,包括:中空圆柱形构件; 中心轴,其具有设置在所述圆筒形构件中以由第一弹簧轴向推动的锥形部分; 以及多个可径向移动的构件,每个都由第二弹簧向内推动并且具有夹紧内轮缘的咔嗒声; 由此中心轴的轴向运动通过锥形部分转换成所述可径向移动的部件的径向运动,以夹紧和释放所述基板。1。一种基板旋转装置,包括用于轴向移动所述圆柱形部件的机构; 用于轴向移动中心轴的机构; 以及除了基板支撑机构之外还使圆筒状构件旋转的机构。
    • 7. 发明授权
    • System for depositing a film
    • 沉积薄膜的系统
    • US06872285B2
    • 2005-03-29
    • US10233272
    • 2002-08-30
    • Shinji FurukawaMiho Sakai
    • Shinji FurukawaMiho Sakai
    • C23C14/34C23C14/04C23C14/22C23C14/35G11B5/851H01J37/34
    • C23C14/225C23C14/044C23C14/352G11B5/851H01J37/3408H01J37/3426H01J37/3447
    • This application discloses a system for depositing a magnetic film for a magnetic recording layer or depositing an underlying film prior to depositing a magnetic film as a recording layer. The system comprises; a chamber in which the film is deposited onto a substrate by sputtering, a target that is provided in the chamber and made of material of the film to be deposited, a sputter power source for applying voltage to the target for the sputtering, and a direction control member for controlling sputter-particles released from the target during the sputtering. The direction control member is provided between the substrate and the target. The direction control member provides a passage for the sputter-particles. The direction control member lets the sputter-particles selectively pass through, thereby allowing magnetic anisotropy to the magnetic film. The passage is not close but open in its cross section.
    • 本申请公开了一种用于在沉积磁性膜作为记录层之前沉积用于磁记录层的磁性膜或沉积下面的膜的系统。 该系统包括 通过溅射将膜沉积在基板上的室,设置在室中并由要沉积的膜的材料制成的靶,用于向溅射靶施加电压的溅射电源,以及用于溅射的方向 用于控制在溅射期间从靶释放的溅射颗粒的控制构件。 方向控制构件设置在基板和靶之间。 方向控制构件为溅射颗粒提供通道。 方向控制部件使溅射粒子选择性地通过,从而允许对磁性膜的磁各向异性。 通道不近,但在其横截面上开放。