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1. 发明授权

US5651823A Clustered photolithography system 失效
标题翻译：集群光刻系统
公开(公告)号：US5651823A
公开(公告)日：1997-07-29
申请号：US412650
申请日：1995-03-29
申请人： Michael L. Parodi , Michael R. Biche , H. Alexander Anderson , Alexander Lurye
发明人： Michael L. Parodi , Michael R. Biche , H. Alexander Anderson , Alexander Lurye
IPC分类号： G03F7/16 , G03F7/20 , G03F7/26 , G03F7/30 , H01L21/00 , H01L21/027 , H01L21/677 , B65G25/00
CPC分类号： H01L21/67167 , G03F7/30 , G03F7/3021 , G03F7/70691 , H01L21/67178 , H01L21/67184 , H01L21/67225 , H01L21/67742 , H01L21/67772 , H01L21/67775 , Y10S414/14
摘要： A substrate photolithography system includes a substrate handling robot which pivots about a fixed point and transfers substrates between photoresist coater, a developer, and a heating/cooling unit, all of which are clustered about the robot. The end effector of the robot is capable of both vertical and lateral movement so that individual modules of the heating/cooling unit may be stacked. An apparatus and a method for baking and cooling silicon substrates are disclosed. Both baking and cooling of silicon substrates are done in a single integrated thermal process module. Each thermal process module includes two hot plate assemblies, a cool plate assembly, two local linear transfer arms and a micro-processor based module controller. Both transfer arms are capable of transferring substrates among the cool and hot plate assemblies. A cassette input/output unit handles cassettes which contain semiconductor wafers or other substrates that are to be delivered to or withdrawn from a semiconductor processing system. The input/output unit includes a drawer front which rotates 90.degree. about a horizontal axis as it is opened.
摘要翻译：基板光刻系统包括基板处理机器人，其基于固定点枢转并且在光致抗蚀剂涂布器，显影剂和加热/冷却单元之间传送基板，所有这些基板处理机器人围绕机器人聚集。机器人的末端执行器能够垂直和横向移动，从而可以堆叠加热/冷却单元的各个模块。公开了一种用于烘焙和冷却硅衬底的设备和方法。硅基板的烘烤和冷却都是在单个集成的热处理模块中完成的。每个热处理模块包括两个热板组件，冷板组件，两个局部线性传输臂和基于微处理器的模块控制器。两个传送臂都能够在冷和热板组件之间传送基板。盒式磁带输入/输出单元处理包含半导体晶片或将被输送到半导体处理系统或从半导体处理系统退出的其它基板的盒。输入/输出单元包括一个抽屉前端，它在打开时围绕水平轴线旋转90°。

2. 发明授权

US5766824A Method and apparatus for curing photoresist 失效
标题翻译：固化光刻胶的方法和设备
公开(公告)号：US5766824A
公开(公告)日：1998-06-16
申请号：US508028
申请日：1995-07-27
申请人： William T. Batchelder , Michael L. Parodi , Michael R. Biche
发明人： William T. Batchelder , Michael L. Parodi , Michael R. Biche
IPC分类号： G03F7/16 , G03F7/30 , H01L21/00 , H01L21/027 , H01L21/687 , G03F7/00
CPC分类号： G03F7/30 , G03F7/168 , G03F7/3021 , H01L21/67109 , H01L21/67167 , H01L21/67184 , H01L21/67225 , H01L21/68735 , H01L21/68742 , H01L21/6875
摘要： A substrate photolithography system includes a substrate handling robot that pivots about a fixed point and transfers substrates between photoresist coater, a developer, and a heating/cooling unit, all of which are clustered about the robot. The end effector of the robot is capable of both vertical and lateral movement so that individual modules of the heating/cooling unit may be stacked. For heating/cooling, the substrate is placed in the heating/cooling unit in close proximity to a hotplate/chillplate and a thermally conductive, non-reactive gas, such as helium, is introduced into the airspace between the substrate and the hotplate/chillplate. The thermally conductive, non-reactive gas, is preheated/precooled before introduction into the airspace between the substrate and the hotplate/chillplate when the gas passes through a bore in the hotplate/chillplate. Additionally, the substrate is automatically aligned in a milled recession in the hotplate surface for future handling.
摘要翻译：基板光刻系统包括基板处理机器人，该基板处理机器人围绕固定点枢转并且在光致抗蚀剂涂布机，显影剂和加热/冷却单元之间传送基板，所有这些都围绕机器人聚集。机器人的末端执行器能够垂直和横向移动，从而可以堆叠加热/冷却单元的各个模块。对于加热/冷却，将基板放置在靠近加热板/冷却板的加热/冷却单元中，并且将导热的非反应性气体（例如氦）引入到基板和加热板/冷却板之间的空间中。导热的非反应性气体在气体通过加热板/冷却板中的孔之前被引入基板和加热板/冷却板之间的空气空间之前被预热/预冷却。此外，基板在加热板表面的铣削凹陷中自动对准，以便将来处理。

3. 发明授权

US5798140A Oscillatory chuck method and apparatus for coating flat substrates 失效
标题翻译：振荡卡盘方法及平面基板涂装设备
公开(公告)号：US5798140A
公开(公告)日：1998-08-25
申请号：US640248
申请日：1996-04-30
申请人： Michael L. Parodi , Roy E. Hurtig
发明人： Michael L. Parodi , Roy E. Hurtig
IPC分类号： B05D1/00 , B05D1/40 , G03F7/16 , H01L21/00 , H01L21/027 , B05D3/12
CPC分类号： H01L21/6715 , B05D1/002 , G03F7/162
摘要： An apparatus and method are provided for efficiently and effectively coating a substantially flat surface, i.e., a substrate, with a high-viscosity liquid chemical, such as photoresist. The flat surface is oscillated by rotating the surface in one direction and then repeatedly reversing the direction of rotation of the surface. The chemical is spread by both the centrifugal force of the rotation of the surface and the tangential force of the angular acceleration of the surface. The tangential force helps spread the chemical without prematurely overcoming the surface tension of the chemical resulting in a particularly effective coating using substantially less chemical. Chemical is alternatively spread by vibrating the flat surface. Vibrating applies to the chemical, in addition to radial, centrifugal force, if any, non-radial forces which are not directly opposed by surface tension. The chemical is therefore spread more evenly and efficiently without overcoming the surface tension of the chemical. Vibrating is accomplished either (i) by oscillating the surface with a low amplitude and a high frequency or (ii) by quickly moving the surface in a small, circular motion.
摘要翻译：提供一种装置和方法，用于利用高粘度液体化学品（例如光致抗蚀剂）有效地和有效地涂覆基本平坦的表面，即基底。平面通过在一个方向上旋转表面并且然后反复地反转表面的旋转方向而振荡。化学物质通过表面旋转的离心力和表面的角加速度的切向力来传播。切向力有助于传播化学品，而不会过早地克服化学品的表面张力，从而产生使用更少化学物质的特别有效的涂层。通过振动平坦表面，化学物质也可以传播。除了径向，离心力（如果有的话）外，振动也适用于不直接与表面张力相反的非径向力。因此，化学品在不克服化学品的表面张力的情况下更均匀和有效地扩散。振动可以通过以下方式实现：（i）通过以低振幅和高频振荡表面，或（ii）通过以小的圆周运动快速移动表面。

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