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1. 发明申请

US20100082144A1 METHOD OF CALCULATING PATTERN-FAILURE-OCCURRENCE-REGION, COMPUTER PROGRAM PRODUCT, PATTERN-LAYOUT EVALUATING METHOD, AND SEMICONDUCTOR-DEVICE MANUFACTURING METHOD 有权
标题翻译：计算图形失效区域的方法，计算机程序产品，图案布局评估方法和半导体器件制造方法
公开(公告)号：US20100082144A1
公开(公告)日：2010-04-01
申请号：US12554495
申请日：2009-09-04
申请人： Masanori TAKAHASHI , Toshiya Kotani , Satoshi Tanaka
发明人： Masanori TAKAHASHI , Toshiya Kotani , Satoshi Tanaka
IPC分类号： G06F19/00 , G06F17/50
CPC分类号： G06F17/5081
摘要： Method of calculating pattern-failure-occurrence-region comprising calculating a pattern failure occurrence region using relation information and a layout used for forming a convex section, the relation information being a relation between a distance from a formed pattern in a film to cover the convex section on a substrate to the convex section and a region in the film in which a shape of the formed pattern cannot satisfy a predetermined condition because of influence of the convex section.
摘要翻译：计算图案故障发生区域的方法包括使用关系信息和用于形成凸部的布局来计算图案故障发生区域，所述关系信息是从胶片中形成的图案到覆盖凸起的距离之间的关系由于凸部的影响，形成图案的形状不能满足规定条件的膜中的与凸部的基板上的区域。

2. 发明申请

US20100261121A1 PATTERN FORMING METHOD 审中-公开
标题翻译：图案形成方法
公开(公告)号：US20100261121A1
公开(公告)日：2010-10-14
申请号：US12717423
申请日：2010-03-04
申请人： Masanori TAKAHASHI , Satoshi Tanaka , Soichi Inoue , Akiko Mimotogi , Katsuyoshi Kodera , Takamasa Takaki
发明人： Masanori TAKAHASHI , Satoshi Tanaka , Soichi Inoue , Akiko Mimotogi , Katsuyoshi Kodera , Takamasa Takaki
IPC分类号： G03F7/20
CPC分类号： G03F1/36
摘要： To provide a pattern forming method comprising: laminating a resist layer on a substrate; forming a diffraction pattern having an opening opened at a predetermined pitch p for diffracting exposure light on an upper layer side of the resist layer; performing whole image exposure with respect to the diffraction pattern in which a refractive index with respect to the exposure light is n, with diffracted light acquired by irradiation of exposure light having a wavelength λ from above the diffraction pattern, which is then diffracted by the diffraction pattern; and forming a desired pattern on a lower layer side of the resist pattern by using a resist pattern formed by developing the resist layer, wherein the predetermined pitch p, the wavelength λ, and the refractive index n satisfy a condition of p>λ/n.
摘要翻译：提供一种图案形成方法，包括：将抗蚀剂层层压在基底上; 形成具有以预定间距p开口的开口的衍射图案，用于将抗蚀剂层的上层侧上的曝光光衍射; 对于相对于曝光光的折射率为n的衍射图案进行全部图像曝光，通过从衍射图案的上方照射具有波长λ的曝光光获得的衍射光，然后通过衍射衍射模式; 并且通过使用通过使抗蚀剂层显影而形成的抗蚀剂图案在抗蚀剂图案的下层侧上形成期望的图案，其中预定间距p，波长λ和折射率n满足p>λ/ n的条件。

3. 发明申请

US20100008562A1 LATENT IMAGE INTENSITY DISTRIBUTION EVALUATION METHOD, METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE AND LATENT IMAGE INTENSITY DISTRIBUTION EVALUATION PROGRAM 审中-公开
标题翻译：最小图像强度分布评估方法，制造半导体器件的方法和专利图像强度分布评估程序
公开(公告)号：US20100008562A1
公开(公告)日：2010-01-14
申请号：US12500039
申请日：2009-07-09
申请人： Masanori TAKAHASHI , Satoshi TANAKA
发明人： Masanori TAKAHASHI , Satoshi TANAKA
IPC分类号： G06K9/00 , G06F17/50
CPC分类号： G03F7/70675 , G03F7/705 , G06T7/0006 , G06T7/136 , G06T2207/30148
摘要： A latent image intensity distribution calculating unit calculates a latent image intensity distribution in the thickness direction of a resist film based on an exposure condition and a mask pattern. An evaluated position calculating unit calculates an evaluated position in the thickness direction of the resist film based on the latent image intensity distribution calculated by the latent image intensity distribution calculating unit. A pattern evaluating unit evaluates a characteristic of a pattern formed on the resist film based on latent image intensity at the evaluated position calculated by the evaluated position calculating unit.
摘要翻译：潜像强度分布计算单元基于曝光条件和掩模图案计算抗蚀剂膜的厚度方向上的潜像强度分布。评估位置计算单元基于由潜像强度分布计算单元计算的潜像强度分布，计算抗蚀剂膜的厚度方向的评估位置。图案评估单元基于由评估位置计算单元计算的评估位置处的潜像强度来评估形成在抗蚀剂膜上的图案的特性。

4. 发明申请

US20110122390A1 EXPOSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND EXPOSURE APPARATUS 失效
标题翻译：曝光方法，制造半导体器件的方法和曝光装置
公开(公告)号：US20110122390A1
公开(公告)日：2011-05-26
申请号：US12952835
申请日：2010-11-23
申请人： Masanori TAKAHASHI , Takashi Sato , Satoshi Tanaka , Soichi Inoue , Takamasa Takaki
发明人： Masanori TAKAHASHI , Takashi Sato , Satoshi Tanaka , Soichi Inoue , Takamasa Takaki
IPC分类号： G03B27/72 , G03F7/20
CPC分类号： G03F7/2016 , G03F7/70408 , H01L21/0274
摘要： According to one embodiment, on a substrate, a resist layer is laminated on an upper side of a pattern formation layer on which a desired pattern is formed. A diffraction pattern that diffracts exposure light irradiated on the substrate is formed further on the upper side than the resist layer. Overall exposure is performed from above the diffraction pattern using a deformed light having illumination light source shape determined according to the desired pattern. Diffracted light diffracted on the resist layer.
摘要翻译：根据一个实施例，在基板上，在其上形成有所需图案的图案形成层的上侧层压抗蚀剂层。衍射照射在基板上的曝光光的衍射图案进一步形成在抗蚀剂层的上侧。使用具有根据期望图案确定的照明光源形状的变形光从衍射图案上方进行总体曝光。衍射光在抗蚀剂层上衍射。

5. 发明申请

US20100081295A1 PROCESS MODEL EVALUATION METHOD, PROCESS MODEL GENERATION METHOD AND PROCESS MODEL EVALUATION PROGRAM 审中-公开
标题翻译：过程模型评估方法，过程模型生成方法和过程模型评估程序
公开(公告)号：US20100081295A1
公开(公告)日：2010-04-01
申请号：US12548955
申请日：2009-08-27
申请人： Masanori TAKAHASHI , Masaki Satake , Satoshi Tanaka
发明人： Masanori TAKAHASHI , Masaki Satake , Satoshi Tanaka
IPC分类号： H01L21/027 , G03F7/20 , G06F17/50
CPC分类号： G03F1/36
摘要： According to an aspect of the present invention, there is provided a method for evaluating a process model, the method including: acquiring, for each of given patterns, a dimensional difference amount between: a first pattern that is formed by actually applying a process onto a corresponding one of the given patterns; and a second pattern that is calculated by applying a process model modeling the process to the corresponding one of the given patterns; and evaluating the process model based on an evaluation index, the evaluation index being based on the number of the patterns at which the dimensional difference amount is equal to or less than a threshold value.
摘要翻译：根据本发明的一个方面，提供了一种用于评估过程模型的方法，所述方法包括：针对每个给定模式，获取以下之间的尺寸差异量：通过实际应用过程形成的第一图案到给定模式中的相应一个; 以及通过将过程模型建模到给定模式中的相应一个模型来计算的第二模式; 以及基于评价指标来评价所述过程模型，所述评价指标基于所述维度差量等于或小于阈值的模式的数量。

6. 发明申请

US20110151361A1 OPTICAL-IMAGE-INTENSITY CALCULATING METHOD, PATTERN GENERATING METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE 有权
标题翻译：光学图像强度计算方法，图案生成方法和半导体器件的制造方法
公开(公告)号：US20110151361A1
公开(公告)日：2011-06-23
申请号：US12960074
申请日：2010-12-03
申请人： Masanori TAKAHASHI , Satoshi Tanaka
发明人： Masanori TAKAHASHI , Satoshi Tanaka
IPC分类号： G03F7/20 , G03B27/32
CPC分类号： G03F7/70441 , G03F1/36 , G03F7/70466
摘要： According to the embodiment, an optical image intensity distribution to be formed in a resist arranged on a lower layer side of a diffraction pattern is calculated by performing a whole image exposure from an upper surface side of the diffraction pattern formed on a substrate. The optical image intensity distribution is calculated by using a multimode waveguide analysis model or a fractional Fourier transform with respect to the diffraction pattern.
摘要翻译：根据本实施例，通过从形成在基板上的衍射图案的上表面侧进行整体图像曝光来计算要形成在衍射图案的下层侧的抗蚀剂中的光学图像强度分布。通过使用关于衍射图案的多模波导分析模型或分数阶傅里叶变换来计算光学图像强度分布。

7. 发明申请

US20110091176A1 HOLEY FIBERS 审中-公开
公开(公告)号：US20110091176A1
公开(公告)日：2011-04-21
申请号：US12938104
申请日：2010-11-02
申请人： Masanori TAKAHASHI , Katsunori Imamura , Kazunori Mukasa , Takeshi Yagi
发明人： Masanori TAKAHASHI , Katsunori Imamura , Kazunori Mukasa , Takeshi Yagi
IPC分类号： G02B6/032
CPC分类号： G02B6/02347 , G02B6/02019 , G02B6/02361 , G02B6/02366
摘要： A holey fiber with significantly large effective core area is provided. The holey fiber comprises a core portion and a cladding portion at the circumference of the core portion. The cladding portion has plurality of holes distributed to shape triangular lattices around the core portion; wherein d/Λ is less than or equal to 0.42, the diameter of the holey fiber is larger than or equal to 580 μm, an effective core area is larger than or equal to 15000 μm2 at 1064 nm and a confinement loss is less than or equal to 0.1 dB/m at 1064 nm; where d is the hole diameter in μm and Λ is a lattice constant of the triangular lattice in μm.

8. 发明申请

US20090237868A1 CAPACITOR DEVICE 审中-公开
标题翻译：电容器件
公开(公告)号：US20090237868A1
公开(公告)日：2009-09-24
申请号：US12405395
申请日：2009-03-17
申请人： Masanori TAKAHASHI , Koji Sakata , Katsuhiro Yoshida
发明人： Masanori TAKAHASHI , Koji Sakata , Katsuhiro Yoshida
IPC分类号： H01G9/012
CPC分类号： H01G9/10 , H01G9/012 , H01G9/14
摘要： A capacitor device comprises first and second substrates and a capacitor element that comprises an anode portion and a cathode portion. The first substrate has a first inner surface and a first outer surface and is provided with a first inner anode terminal, a first inner cathode terminal, a first outer anode terminal and a first outer cathode terminal. The capacitor element is mounted on the first inner surface of the first substrate. The first inner anode terminal and the first inner cathode terminal are formed on the first inner surface and are electrically connected to the anode portion and the cathode portion, respectively. The first outer anode terminal and the first outer cathode terminal are formed on the first outer surface and are electrically connected to the first inner anode terminal and the first inner cathode terminal, respectively. The second substrate has a second inner surface and a second outer surface and is provided with a second inner anode terminal, a second inner cathode terminal, a second outer anode terminal and a second outer cathode terminal. The second inner surface is mounted on the capacitor element so that the capacitor element is positioned between the first and the second substrates. The second inner anode terminal and the second inner cathode terminal are formed on the second inner surface and are electrically connected to the anode portion and the cathode portion, respectively. The second outer anode terminal and the second outer cathode terminal are formed on the second outer surface and are electrically connected to the second inner anode terminal and the second inner cathode terminal, respectively.
摘要翻译：电容器装置包括第一和第二基板以及包括阳极部分和阴极部分的电容器元件。第一基板具有第一内表面和第一外表面，并且设置有第一内阳极端子，第一内阴极端子，第一外阳极端子和第一外阴极端子。电容器元件安装在第一基板的第一内表面上。第一内阳极端子和第一内阴极端子形成在第一内表面上并且分别电连接到阳极部分和阴极部分。第一外阳极端子和第一外阴极端子分别形成在第一外表面上并分别与第一内阳极端子和第一内阴极端子电连接。第二基板具有第二内表面和第二外表面，并且设置有第二内阳极端子，第二内阴极端子，第二外阳极端子和第二外阴极端子。第二内表面安装在电容器元件上，使得电容器元件位于第一和第二基板之间。第二内阳极端子和第二内阴极端子分别形成在第二内表面上并分别与阳极部分和阴极部分电连接。第二外阳极端子和第二外阴极端子分别形成在第二外表面上并分别电连接到第二内阳极端子和第二内阴极端子。

9. 发明申请

US20120195560A1 OPTICAL FIBER MODULE 审中-公开
标题翻译：光纤模块
公开(公告)号：US20120195560A1
公开(公告)日：2012-08-02
申请号：US13445407
申请日：2012-04-12
申请人： Masanori TAKAHASHI , Tomohiro Gonda , Ryuichi Sugizaki
发明人： Masanori TAKAHASHI , Tomohiro Gonda , Ryuichi Sugizaki
IPC分类号： G02B6/024
CPC分类号： G02B6/024 , G02B6/02028 , G02B6/02242 , G02B6/02395 , G02B6/03627
摘要： An optical fiber module includes a polarization-maintaining highly-nonlinear optical fiber and a housing. The polarization-maintaining highly-nonlinear optical fiber includes a core, a cladding surrounding the core and having two stress applying portions formed to sandwich the core and extend along the core, and a coating covering the cladding. The housing houses the polarization-maintaining highly-nonlinear optical fiber which is wound in a ring coil shape. The polarization-maintaining highly-nonlinear optical fiber has a bending loss of 0.01 dB/turn or less at a wavelength of 1550 nm when bent to form a diameter of 20 mm, a nonlinear coefficient γ of 10 W1 km−1 or larger at the wavelength of 1550 nm, a cutoff wavelength λc of 1530 nm or shorter, and a zero-dispersion wavelength of not shorter than 1400 nm and not longer than 1650 nm.
摘要翻译：光纤模块包括偏振保持高非线性光纤和壳体。偏振保持高非线性光纤包括芯，围绕芯的包层，并具有形成为夹住芯并且沿着芯延伸的两个应力施加部分和覆盖包层的涂层。壳体容纳以环形线圈形状缠绕的偏振保持高非线性光纤。偏振保持高非线性光纤在弯曲形成直径为20mm时的波长为1550nm时的弯曲损耗为0.01dB /次以下，非线性系数γ为10W1·m-1以上波长1550nm，截止波长λc为1530nm以下，零色散波长不低于1400nm且不大于1650nm。

10. 发明申请

US20110026890A1 HOLEY FIBERS 审中-公开
公开(公告)号：US20110026890A1
公开(公告)日：2011-02-03
申请号：US12846113
申请日：2010-07-29
申请人： Masanori TAKAHASHI , Katsunori Imamura , Kazunori Mukasa , Takeshi Yagi
发明人： Masanori TAKAHASHI , Katsunori Imamura , Kazunori Mukasa , Takeshi Yagi
IPC分类号： G02B6/032
CPC分类号： G02B6/02347 , G02B6/02019 , G02B6/02361
摘要： A holey fiber with significantly large effective core area is provided.The holey fiber comprises a core portion and a cladding portion at the circumference of the core portion. The cladding portion has plurality of holes distributed to shape triangular lattices around the core portion; wherein d/Λ is less than or equal to 0.42, the diameter of the holey fiber is larger than or equal to 580 μm, an effective core area is larger than or equal to 15000 μm2 at 1064 nm and a confinement loss is less than or equal to 0.1 dB/m at 1064 nm; where d is the hole diameter in μm and Λ is a lattice constant of the triangular lattice in μm.
摘要翻译：提供了一种具有明显大的有效核心区域的多孔光纤。多孔纤维包括在芯部的圆周处的芯部分和包层部分。包层部分具有分布形成围绕芯部的三角形格子的多个孔; 其中d /Λ小于或等于0.42，多孔纤维的直径大于或等于580μm，有效核心面积在1064nm处大于或等于15000μm2，限制损耗小于或等于在1064nm处等于0.1dB / m; 其中d是以μm表示的孔直径，Λ是三角形晶格的晶格常数，单位为μm。

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