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    • 7. 发明授权
    • Projection exposure apparatus
    • 投影曝光装置
    • US5264898A
    • 1993-11-23
    • US936646
    • 1992-08-28
    • Kazuya KamonTeruo MiyamotoYasuhito Myoi
    • Kazuya KamonTeruo MiyamotoYasuhito Myoi
    • G03F7/20G03B27/42G03B27/54
    • G03F7/70091G03F7/701
    • A projection exposure apparatus for use in LSI production comprises a light source, a light condensing optical system through which light from the light source is condensed and applied to a mask carrying a circuit pattern, a projection lens system which projects the light transmitted through the mask onto the surface of a wafer, and an aperture member which is interposed between the light source and the light condensing optical system. The aperture member has a light transmission region for transmitting the light from the light source and a light-interrupting member disposed to extend across the light transmission region. The shape or configuration of the light-interrupting member is determined in accordance with the geometry of the circuit pattern formed on the mask.
    • 用于LSI生产的投影曝光装置包括一个光源,一个聚光系统,通过该聚光光学系统来自光源的光会聚并施加到一个承载电路图形的掩模上;一个投影透镜系统, 在晶片的表面上,以及插入在光源和聚光光学系统之间的开口部件。 光圈构件具有用于透射来自光源的光的透光区域和设置成延伸穿过光透射区域的遮光构件。 遮光构件的形状或构造根据形成在掩模上的电路图案的几何形状来确定。