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1. 发明申请

US20090093373A1 DNA MICRO-ARRAY HAVING STANDARD PROBE AND KIT INCLUDING THE ARRAY 审中-公开
标题翻译：具有标准探针和包装阵列的DNA微阵列
公开(公告)号：US20090093373A1
公开(公告)日：2009-04-09
申请号：US12264241
申请日：2008-11-03
申请人： Masahiro Kawaguchi , Tadashi Okamoto , Hiromitsu Takase , Hiroyuki Hashimoto
发明人： Masahiro Kawaguchi , Tadashi Okamoto , Hiromitsu Takase , Hiroyuki Hashimoto
IPC分类号： C40B30/04 , C40B30/10
CPC分类号： C12Q1/6837
摘要： To provide a DNA micro-array having a nucleic acid probe immobilized on a substrate, which is used to detect a molecule of a target nucleic acid contained in a sample and has a substantially complementary base sequence to the target base sequence of the nucleic acid molecule, including at least one probe selected from the group consisting of: at least one internal standard probe for assay of PCR of the target nucleic acid; at least one external standard probe for a detection operation and assay of an amount of the probe; and a probe for measurement of the amount or density of the nucleic acid probe, formed by the same method as the nucleic acid probe.
摘要翻译：提供具有固定在底物上的核酸探针的DNA微阵列，其用于检测样品中所含的靶核酸的分子，并且与核酸分子的靶碱基序列具有基本上互补的碱基序列包括至少一种选自以下的探针：用于测定靶核酸的PCR的至少一个内标物探针; 用于检测操作的至少一个外部标准探针和探针的量的测定; 以及通过与核酸探针相同的方法形成的用于测量核酸探针的量或密度的探针。

2. 发明申请

US20070042496A1 METHOD FOR ACQUIRING INFORMATION OF A BIOCHIP USING TIME OF FLIGHT SECONDARY ION MASS SPECTROMETRY AND AN APPARATUS FOR ACQUIRING INFORMATION FOR THE APPLICATION THEREOF 有权
标题翻译：使用飞行次级离子质谱的时间获取生物信息的方法和获取其应用信息的装置
公开(公告)号：US20070042496A1
公开(公告)日：2007-02-22
申请号：US10601777
申请日：2003-06-24
申请人： Tadashi Okamoto , Hiromitsu Takase , Hiroyuki Hashimoto
发明人： Tadashi Okamoto , Hiromitsu Takase , Hiroyuki Hashimoto
IPC分类号： G06F19/00 , G01N33/50
CPC分类号： G01N23/2258 , H01J49/16 , H01J49/40
摘要： A measurement method is provided, which enables to obtain a two-dimensional image with better quantitative-ability by suppressing the influence of the charge-up, when the two-dimensional secondary ion image is obtained for a biological material fixed on a substrate having a high resistivity by utilizing a TOF-SIMS method in a certain wide area. A two-dimensional image having considerably high positioning resolution-ability can be obtained by the procedure in which the pulsed primary ion beam is irradiated at a spot, and the pulse-wise spot-applications of the primary ion beam and the simultaneous detection of the secondary ion generated from the irradiated primary ion beam proceed along with a discontinuous scanning pattern, and eventually the results of these secondary ion measurements are reconstructed into a two-dimensional image in line with the aforementioned discontinuous scanning pattern.
摘要翻译：提供了一种测量方法，其能够通过抑制电荷的影响来获得具有更好的定量能力的二维图像，当获得固定在具有在某一广泛领域利用TOF-SIMS方法具有高电阻率。具有相当高的定位分辨能力的二维图像可以通过脉冲一次离子束在一个点照射的过程和一次离子束的脉冲点应用和同时检测从照射的一次离子束产生的二次离子与不连续扫描图案一起进行，最终将这些二次离子测量的结果重建为与上述不连续扫描图案一致的二维图像。

3. 发明授权

US07188031B1 Method for acquiring information of a biochip using time of flight secondary ion mass spectrometry and an apparatus for acquiring information for the application thereof 有权
标题翻译：使用飞行时间二次离子质谱法获取生物芯片的信息的方法和用于获取其应用信息的装置
公开(公告)号：US07188031B1
公开(公告)日：2007-03-06
申请号：US10601777
申请日：2003-06-24
申请人： Tadashi Okamoto , Hiromitsu Takase , Hiroyuki Hashimoto
发明人： Tadashi Okamoto , Hiromitsu Takase , Hiroyuki Hashimoto
IPC分类号： G01N33/48 , G01R23/02 , C12Q1/00 , C12M1/34
CPC分类号： G01N23/2258 , H01J49/16 , H01J49/40
摘要： A measurement method is provided, which enables to obtain a two-dimensional image with better quantitative-ability by suppressing the influence of the charge-up, when the two-dimensional secondary ion image is obtained for a biological material fixed on a substrate having a high resistivity by utilizing a TOF-SIMS method in a certain wide area. A two-dimensional image having considerably high positioning resolution-ability can be obtained by the procedure in which the pulsed primary ion beam is irradiated at a spot, and the pulse-wise spot-applications of the primary ion beam and the simultaneous detection of the secondary ion generated from the irradiated primary ion beam proceed along with a discontinuous scanning pattern, and eventually the results of these secondary ion measurements are reconstructed into a two-dimensional image in line with the aforementioned discontinuous scanning pattern.
摘要翻译：提供了一种测量方法，其能够通过抑制电荷的影响来获得具有更好的定量能力的二维图像，当获得固定在具有在某一广泛领域利用TOF-SIMS方法具有高电阻率。具有相当高的定位分辨能力的二维图像可以通过脉冲一次离子束在一个点照射的过程和一次离子束的脉冲点应用和同时检测从照射的一次离子束产生的二次离子与不连续扫描图案一起进行，最终将这些二次离子测量的结果重建为与上述不连续扫描图案一致的二维图像。

4. 发明授权

US07208276B2 Probe carrier and method for analyzing the probe carrier 失效
标题翻译：探头载体和分析探针载体的方法
公开(公告)号：US07208276B2
公开(公告)日：2007-04-24
申请号：US10728707
申请日：2003-12-04
申请人： Hiromitsu Takase , Tadashi Okamoto , Toshiaki Aiba , Hiroyuki Hashimoto
发明人： Hiromitsu Takase , Tadashi Okamoto , Toshiaki Aiba , Hiroyuki Hashimoto
IPC分类号： C12Q1/68
CPC分类号： H01J49/0409 , B01J2219/00581 , B01J2219/00702 , B01J2219/00722 , B01L3/5085 , B01L2300/0819 , B01L2300/161 , C40B40/06 , C40B70/00 , G01N23/2258
摘要： Nucleic acid probes arranged on a nucleic acid chip substrate in a matrix form can be analyzed quantitatively by TOF-SIMS with accuracy by forming a phosphorus-containing area which can be used as a standard on the substrate.
摘要翻译：以基质形式配置在核酸芯片基板上的核酸探针可以通过TOF-SIMS以准确的方式定量分析，形成可用作基板上标准的含磷区域。

5. 发明申请

US20120288799A1 CHARGED-PARTICLE BEAM LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING DEVICE 有权
标题翻译：充电粒子束光刻设备及其制造方法
公开(公告)号：US20120288799A1
公开(公告)日：2012-11-15
申请号：US13462013
申请日：2012-05-02
申请人： Hiromitsu Takase , Ichiro Tanaka , Akira Miyake
发明人： Hiromitsu Takase , Ichiro Tanaka , Akira Miyake
IPC分类号： G03F7/20 , G21K5/08
CPC分类号： H01J37/3177 , B08B5/00 , B82Y10/00 , B82Y40/00 , G03F7/70925 , H01J2237/022 , H01J2237/03 , H01J2237/0435 , H01J2237/0453 , H01J2237/1205
摘要： A lithographic apparatus which performs drawing on a substrate with a charged-particle beam, includes an optical system having an aperture plate in which a first number of apertures are formed to pass a first number of charged-particle beams to perform the drawing, a substrate holder, a cleaning unit configured to clean the aperture plate, and a chamber containing the optical system and the substrate holder. The cleaning unit includes a case having an emitting hole plate in which a second number of emitting holes are formed, the second number being smaller than the first number, an active species source configured to generate active species in the case, and a driving mechanism configured to move the case.
摘要翻译：在带有带电粒子束的基板上进行拉伸的光刻设备包括具有孔板的光学系统，其中形成有第一数量的孔以通过第一数量的带电粒子束以进行绘图;基板配置为清洁孔板的清洁单元和容纳光学系统和基板保持器的室。清洁单元包括具有发射孔板的壳体，其中形成有第二数量的发射孔，第二数量小于第一数量，被配置为在壳体中产生活性物种的活性物质源和被配置为移动案件。

6. 发明授权

US08921807B2 In situ cleaning device for lithographic apparatus 有权
标题翻译：光刻设备原位清洁装置
公开(公告)号：US08921807B2
公开(公告)日：2014-12-30
申请号：US13462013
申请日：2012-05-02
申请人： Hiromitsu Takase , Ichiro Tanaka , Akira Miyake
发明人： Hiromitsu Takase , Ichiro Tanaka , Akira Miyake
IPC分类号： H01J37/30 , B08B5/00 , H01J37/317
CPC分类号： H01J37/3177 , B08B5/00 , B82Y10/00 , B82Y40/00 , G03F7/70925 , H01J2237/022 , H01J2237/03 , H01J2237/0435 , H01J2237/0453 , H01J2237/1205
摘要： A lithographic apparatus which performs drawing on a substrate with a charged-particle beam, includes an optical system having an aperture plate in which a first number of apertures are formed to pass a first number of charged-particle beams to perform the drawing, a substrate holder, a cleaning unit configured to clean the aperture plate, and a chamber containing the optical system and the substrate holder. The cleaning unit includes a case having an emitting hole plate in which a second number of emitting holes are formed, the second number being smaller than the first number, an active species source configured to generate active species in the case, and a driving mechanism configured to move the case.
摘要翻译：在带有带电粒子束的基板上进行拉伸的光刻设备包括具有孔板的光学系统，其中形成有第一数量的孔以通过第一数量的带电粒子束以进行绘图;基板配置为清洁孔板的清洁单元和容纳光学系统和基板保持器的室。清洁单元包括具有发射孔板的壳体，其中形成有第二数量的发射孔，第二数量小于第一数量，被配置为在壳体中产生活性物种的活性物质源和被配置为移动案件。

7. 发明申请

US20050159068A1 Image display apparatus, disassembly processing method therefor, and component recovery method 失效
标题翻译：图像显示装置，拆卸处理方法和组件恢复方法
公开(公告)号：US20050159068A1
公开(公告)日：2005-07-21
申请号：US11025991
申请日：2005-01-03
申请人： Takashi Noma , Toyoko Kobayashi , Taiko Motoi , Hiromitsu Takase , Naoko Miura , Shin Kobayashi
发明人： Takashi Noma , Toyoko Kobayashi , Taiko Motoi , Hiromitsu Takase , Naoko Miura , Shin Kobayashi
IPC分类号： B09B3/00 , B03B9/06 , B09B5/00 , C22B3/04 , C22B7/00 , G02F1/13 , G09F9/00 , H01J9/50 , H01J9/52
CPC分类号： H01J9/52 , B03B9/062 , B09B5/00 , H01J2201/3165 , H01J2329/00 , Y02W30/60 , Y02W30/828
摘要： To reuse glass used in a flat panel display, processing suitable for global environment such as processing of separating a lead component must be realized. A disassembly processing method for a flat panel display having a structure in which a face plate and rear plate mainly containing glass are airtightly joined via a frame with frit glass is characterized by including the step of separating the face plate and rear plate joined with the frit glass. The separation step is characterized by separating the face plate and rear plate by cutting, dissolution, or melting.
摘要翻译：为了重复使用在平板显示器中的玻璃，必须实现适合于全球环境的处理，例如分离铅组分的处理。一种平板显示器的拆卸处理方法，其特征在于包括：将面板和主要包含玻璃的后板通过框架与熔结玻璃气密接合的结构的方法，其特征在于，包括以下步骤：将面板和后板与玻璃料玻璃。分离步骤的特征在于通过切割，溶解或熔化分离面板和后板。

8. 发明授权

US08149378B2 Cleaning apparatus for exposure apparatus and exposure apparatus 失效
标题翻译：曝光装置和曝光装置的清洁装置
公开(公告)号：US08149378B2
公开(公告)日：2012-04-03
申请号：US12108049
申请日：2008-04-23
申请人： Hideki Morishima , Takahiro Sasaki , Hiromitsu Takase
发明人： Hideki Morishima , Takahiro Sasaki , Hiromitsu Takase
IPC分类号： G03B27/52 , G03B27/54 , G03B27/42 , G03B27/32
CPC分类号： G03F1/82 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F7/70925 , G21K1/06
摘要： A cleaning apparatus for an exposure apparatus that projects a pattern of an exposing mask onto a substrate with first light through an optical element is provided. The cleaning apparatus cleans the optical element with second light having a wavelength different from that of the first light, and includes a recording part configured to record information on exposure history of the exposure apparatus, and an information producing part configured to produce information on a cumulative irradiation light amount of the second light at each of regions in a predetermined cleaning area on the optical element, based on the information on the exposure history.
摘要翻译：提供一种用于通过光学元件将具有第一光的曝光掩模的图案投影到基板上的曝光装置的清洁装置。清洁装置用具有与第一光的波长不同的波长的第二光清洁光学元件，并且包括被配置为记录关于曝光装置的曝光历史的信息的记录部分，以及被配置为产生累积的信息的信息产生部分基于关于曝光历史的信息，在光学元件上的预定清洁区域中的每个区域处的第二光的照射光量。

9. 发明申请

US20080267815A1 CLEANING APPARATUS FOR EXPOSURE APPARATUS AND EXPOSURE APPARATUS 失效
标题翻译：用于曝光装置和曝光装置的清洁装置
公开(公告)号：US20080267815A1
公开(公告)日：2008-10-30
申请号：US12108049
申请日：2008-04-23
申请人： Hideki Morishima , Takahiro Sasaki , Hiromitsu Takase
发明人： Hideki Morishima , Takahiro Sasaki , Hiromitsu Takase
IPC分类号： A61L2/00 , G03F1/00
CPC分类号： G03F1/82 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F7/70925 , G21K1/06
摘要： A cleaning apparatus for an exposure apparatus that projects a pattern of an exposing mask onto a substrate with first light through an optical element is provided. The cleaning apparatus cleans the optical element with second light having a wavelength different from that of the first light, and includes a recording part configured to record information on exposure history of the exposure apparatus, and an information producing part configured to produce information on a cumulative irradiation light amount of the second light at each of regions in a predetermined cleaning area on the optical element, based on the information on the exposure history.
摘要翻译：提供一种用于通过光学元件将具有第一光的曝光掩模的图案投影到基板上的曝光装置的清洁装置。清洁装置用具有与第一光的波长不同的波长的第二光清洁光学元件，并且包括被配置为记录关于曝光装置的曝光历史的信息的记录部分，以及被配置为产生累积的信息的信息产生部分基于关于曝光历史的信息，在光学元件上的预定清洁区域中的每个区域处的第二光的照射光量。

10. 发明申请

US20070097342A1 EXPOSURE APPARATUS AND METHOD, AND DEVICE MANUFACTURING METHOD 失效
标题翻译：曝光装置和方法以及装置制造方法
公开(公告)号：US20070097342A1
公开(公告)日：2007-05-03
申请号：US11614416
申请日：2006-12-21
申请人： Yoshio Gomei , Hiromitsu Takase , Shiqeru Terashima
发明人： Yoshio Gomei , Hiromitsu Takase , Shiqeru Terashima
IPC分类号： G03B27/42
CPC分类号： G03F7/70958 , G03F7/70916 , G03F7/70925 , G03F7/70933
摘要： This invention provides a novel technique for reducing at least the former of the oxidation of a ruthenium film and the deposition of carbon onto the ruthenium film. An exposure apparatus which exposes a substrate to exposure light via an original includes a reflecting means which includes a multilayer film and a ruthenium film and reflects the exposure light, the multilayer film reflecting the exposure light, and the ruthenium film being arranged on the multilayer film, a vacuum container which contains the reflecting means, an exhaust means which exhausts gas in the vacuum container, a detection means which detects the content of a gas component in the vacuum container, a supply means which supplies at least one of gas of water and carbonaceous gas into the vacuum container, and a control means which controls based on an amount of gas component detected by the detection means, an amount of the at least one supplied by the supply means, so that an amount of gas of water and carbonaceous gas satisfy a predetermined relationship.
摘要翻译：本发明提供了一种用于至少还原钌膜的氧化和将碳沉积到钌膜上的新技术。通过原稿将基板曝光于曝光光的曝光装置包括反射装置，其包括多层膜和钌膜并反射曝光光，反射曝光光的多层膜和布置在多层膜上的钌膜包含所述反射装置的真空容器，排出所述真空容器内的气体的排气装置，检测所述真空容器内的气体成分的检测装置;供给装置，其供给水的气体和碳质气体进入真空容器，以及控制装置，其基于由检测装置检测的气体成分的量控制供给装置供给的至少一个量，从而使水和碳质气体的气体量满足预定的关系。

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