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1. 发明授权

US08498056B2 Synthesized silica glass for optical component 有权
标题翻译：用于光学部件的合成石英玻璃
公开(公告)号：US08498056B2
公开(公告)日：2013-07-30
申请号：US13367780
申请日：2012-02-07
申请人： Masaaki Takata , Long Shao , Kei Iwata , Tomonori Ogawa
发明人： Masaaki Takata , Long Shao , Kei Iwata , Tomonori Ogawa
IPC分类号： G02B27/12 , C03B11/08 , C03B23/22
CPC分类号： C03B19/1453 , C03B2201/04 , G03F7/70966 , Y02P40/57
摘要： The present invention provides a synthetic silica glass for an optical member in which not only a fast axis direction in an optical axis direction is controlled, and a birefringence in an off-axis direction is reduced, but a magnitude of a birefringence in the optical axis direction is controlled to an arbitrary value, such that an average value of a value BR cos2θxy defined from a birefringence BR and a fast axis direction θxy as measured from a parallel direction to the principal optical axis direction is defined as an average birefringence AveBR cos2θxy, and when a maximum value of a birefringence measured from a vertical direction to the principal optical axis direction of the optical member is defined as a maximum birefringence BRmax in an off-axis direction, the following expression (1-1) and expression (2-1) are established: −1.0≦AveBR cos2θxy
摘要翻译：本发明提供一种用于光学构件的合成石英玻璃，其不仅控制光轴方向上的快轴方向，并且减少偏轴双折射，而且在光轴上具有双折射的大小方向被控制为任意值，使得从平行方向到主光轴方向测量的从双折射BR和快轴方向三角形定义的值BR cos2thetaxy的平均值被定义为平均双折射AveBR cos2thetaxy，并且当将从光学构件的垂直方向到主光轴方向测量的双折射的最大值定义为离轴方向上的最大双折射BRmax时，下列表达式（1-1）和表达式（2- 1）建立：-1.0@AveBR cos2thetaxy <0.0（1-1）0.0 @ BRmax @ 1.0（2-1）。

2. 发明申请

US20120182622A1 SYNTHESIZED SILICA GLASS FOR OPTICAL COMPONENT 有权
标题翻译：用于光学组件的合成二氧化硅玻璃
公开(公告)号：US20120182622A1
公开(公告)日：2012-07-19
申请号：US13367780
申请日：2012-02-07
申请人： Masaaki TAKATA , Long Shao , Kei Iwata , Tomonori Ogawa
发明人： Masaaki TAKATA , Long Shao , Kei Iwata , Tomonori Ogawa
IPC分类号： G02B27/12 , C03B25/00 , B82Y20/00
CPC分类号： C03B19/1453 , C03B2201/04 , G03F7/70966 , Y02P40/57
摘要： The present invention provides a synthetic silica glass for an optical member in which not only a fast axis direction in an optical axis direction is controlled, and a birefringence in an off-axis direction is reduced, but a magnitude of a birefringence in the optical axis direction is controlled to an arbitrary value, such that an average value of a value BR cos 2θxy defined from a birefringence BR and a fast axis direction θxy as measured from a parallel direction to the principal optical axis direction is defined as an average birefringence AveBR cos 2θxy, and when a maximum value of a birefringence measured from a vertical direction to the principal optical axis direction of the optical member is defined as a maximum birefringence BRmax in an off-axis direction, the following expression (1-1) and expression (2-1) are established: −1.0≦AveBR cos 2θxy
摘要翻译：本发明提供一种用于光学构件的合成石英玻璃，其不仅控制光轴方向上的快轴方向，并且减少偏轴双折射，而且在光轴上具有双折射的大小方向被控制为任意值，使得从平行方向到主光轴方向测量的从双折射BR和快轴方向＆yt; xy定义的值BR cos 2＆amp; t s; xy的平均值被定义为平均双折射度AveBR cos 2＆amp; t s; xy，并且当从垂直方向测量到光学构件的主光轴方向的双折射的最大值被定义为在偏轴方向上的最大双折射率BRmax时，以下表达式（1 -1）和表达式（2-1）：-1.0＆nlE; AveBR cos 2＆thetas; xy <0.0（1-1）0.0＆nlE; BRmax＆nlE; 1.0（2-1）。

3. 发明授权

US08178450B2 TiO2-containing silica glass and optical member for EUV lithography using high energy densities as well as special temperature controlled process for its manufacture 失效
标题翻译：含TiO 2的石英玻璃和用于EUV光刻的光学构件，使用高能量密度以及用于其制造的特殊温度控制方法
公开(公告)号：US08178450B2
公开(公告)日：2012-05-15
申请号：US12868900
申请日：2010-08-26
申请人： Akio Koike , Kenta Saito , Long Shao , Yasutomi Iwahashi , Shinya Kikugawa
发明人： Akio Koike , Kenta Saito , Long Shao , Yasutomi Iwahashi , Shinya Kikugawa
IPC分类号： C03C3/06 , C03C3/04 , C03B37/018
CPC分类号： C03B19/1453 , C03B19/1415 , C03B2201/075 , C03B2201/23 , C03B2201/42 , C03B2207/70 , C03B2207/81 , C03C3/06 , C03C3/076 , C03C2201/23 , C03C2201/42 , C03C2203/44 , C03C2203/52 , C03C2203/54 , Y02P40/57
摘要： The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion in the range of the time of irradiation with EUV light is substantially zero when used as an optical member of an exposure tool for EUVL and which has extremely high surface smoothness. The present invention relates to a TiO2-containing silica glass having a TiO2 content of from 7.5 to 12% by mass, a temperature at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 40 to 110° C., and a standard deviation (σ) of a stress level of striae of 0.03 MPa or lower within an area of 30 mm×30 mm in at least one plane.
摘要翻译：本发明提供一种TiO 2 -SiO 2玻璃，当用作EUVL的曝光工具的光学部件并且具有非常高的表面光滑度时，在EUV光的照射时间范围内的线性热膨胀系数基本上为零。本发明涉及TiO 2含量为7.5〜12质量％，线膨胀系数为0ppb /℃的温度，在40〜 110℃，在至少一个平面内在30mm×30mm的区域内的条纹应力水平为0.03MPa以下的标准偏差（＆sgr）。

4. 发明申请

US20100323871A1 TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY USING HIGH ENERGY DENSITIES AS WELL AS SPECIAL TEMPERATURE CONTROLLED PROCESS FOR ITS MANUFACTURE 失效
标题翻译：含氧二氧化硅玻璃和光学成员，用于使用高能量密度的EUV光刻作为其特殊温度控制过程的制造
公开(公告)号：US20100323871A1
公开(公告)日：2010-12-23
申请号：US12868900
申请日：2010-08-26
申请人： Akio Koike , Kenta Saito , Long Shao , Yasutomi Iwahashi , Shinya Kikugawa
发明人： Akio Koike , Kenta Saito , Long Shao , Yasutomi Iwahashi , Shinya Kikugawa
IPC分类号： C03C3/04
CPC分类号： C03B19/1453 , C03B19/1415 , C03B2201/075 , C03B2201/23 , C03B2201/42 , C03B2207/70 , C03B2207/81 , C03C3/06 , C03C3/076 , C03C2201/23 , C03C2201/42 , C03C2203/44 , C03C2203/52 , C03C2203/54 , Y02P40/57
摘要： The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion in the range of the time of irradiation with EUV light is substantially zero when used as an optical member of an exposure tool for EUVL and which has extremely high surface smoothness. The present invention relates to a TiO2-containing silica glass having a TiO2 content of from 7.5 to 12% by mass, a temperature at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 40 to 110° C., and a standard deviation (σ) of a stress level of striae of 0.03 MPa or lower within an area of 30 mm×30 mm in at least one plane.
摘要翻译：本发明提供一种TiO 2 -SiO 2玻璃，当用作EUVL的曝光工具的光学部件并且具有非常高的表面光滑度时，在EUV光的照射时间范围内的线性热膨胀系数基本上为零。本发明涉及TiO 2含量为7.5〜12质量％，线膨胀系数为0ppb /℃的温度，在40〜 110℃，在至少一个平面内在30mm×30mm的区域内的条纹应力水平为0.03MPa以下的标准偏差（＆sgr）。

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