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    • 7. 发明授权
    • Device for the regulation of a plasma impedance
    • 用于调节等离子体阻抗的装置
    • US06860973B2
    • 2005-03-01
    • US10287452
    • 2002-11-04
    • Thomas WillmsJürgen Bruch
    • Thomas WillmsJürgen Bruch
    • H05H1/46B01J3/00B01J19/08C23C14/34H01J37/32H01J37/34C23C16/00
    • H01J37/32174H01J37/32082H01J37/32935H01J37/34
    • The invention relates to a device for the regulation of a plasma impedance in a vacuum chamber, wherein at least one electrode is connected to an AC generator. This AC generator is a free-running [oscillator], whose frequency adjusts to the resonance frequency of the load upon which it acts. This load comprises fixed circuit elements and a variable plasma impedance. If the plasma impedance is changed, with it the resonance frequency is also changed. The plasma impedance can thus be varied by acquisition of the resonance frequency and by presetting of a reference frequency value, for example thereby that the voltage, the current, the power or the gas inflow is varied as a function of the difference between resonance frequency and reference frequency value.
    • 本发明涉及一种用于调节真空室中的等离子体阻抗的装置,其中至少一个电极连接到AC发生器。 该交流发电机是一个自由运行的[振荡器],其频率根据其作用的负载的谐振频率进行调整。 该负载包括固定电路元件和可变等离子体阻抗。 如果等离子体阻抗发生变化,则谐振频率也会发生变化。 因此,等离子体阻抗可以通过获取谐振频率并通过预设参考频率值而变化,例如由此使电压,电流,功率或气体流入根据共振频率和 参考频率值。