专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US10100572B2 Insulating glazing 有权
公开(公告)号：US10100572B2
公开(公告)日：2018-10-16
申请号：US13805470
申请日：2011-06-23
申请人： Lorenzo Pesce , Eric Tixhon
发明人： Lorenzo Pesce , Eric Tixhon
IPC分类号： E06B3/67 , C03C17/245 , C03C17/34 , C03C17/36 , E04B1/78 , E06B3/66
摘要： The invention relates to triple glazing comprising at least one glass sheet that has a system of layers on one side which are produced using sputtering and include at least one metal layer that reflects infrared radiation. The at least one glass sheet has a set of low-emission layers on the other side, said set of layers comprising one or more oxide layers that are deposited using gas phase pyrolysis. The disclosed glazing has a minimum light transmittance of 60 percent (standard EN 410, illuminant D65 at 2°) with 4 mm thick glass sheets.

2. 发明申请

US20130101760A1 INSULATING GLAZING 有权
标题翻译：绝缘玻璃
公开(公告)号：US20130101760A1
公开(公告)日：2013-04-25
申请号：US13805542
申请日：2011-06-23
申请人： Lorenzo Pesce , Eric Tixhon
发明人： Lorenzo Pesce , Eric Tixhon
IPC分类号： E06B3/66
CPC分类号： C03C17/366 , C03C17/245 , C03C17/2453 , C03C17/3417 , C03C17/36 , C03C17/3644 , C03C17/3681 , C03C2217/24 , C03C2217/241 , C03C2217/244 , C03C2217/94 , C03C2218/365 , E06B3/66 , E06B3/6612 , E06B3/6715 , E06B9/24 , E06B2009/2417 , Y10T428/24355 , Y10T428/24942 , Y10T428/24967
摘要： The invention relates to double glazing comprising at least one glass sheet that has a set of low-emission layers on each side, one side being coated with layers which are produced using sputtering and which include at least one metal layer that reflects infrared radiation. The other side of said at least one glass sheet comprises one or more metal oxide layers that are deposited using gas phase pyrolysis. The disclosed glazing has a minimum light transmittance of 60 percent (with 4 mm thick clear glass sheets).
摘要翻译：本发明涉及双层玻璃，其包括至少一个玻璃板，每个玻璃板在每一侧具有一组低发射层，一侧涂覆有使用溅射制造的层，并且其包括至少一个反射红外辐射的金属层。所述至少一个玻璃板的另一侧包括使用气相热分解沉积的一个或多个金属氧化物层。所公开的玻璃具有60％的最小透光率（具有4mm厚的透明玻璃板）。

3. 发明申请

US20130089684A1 INSULATING GLAZING 审中-公开
标题翻译：绝缘玻璃
公开(公告)号：US20130089684A1
公开(公告)日：2013-04-11
申请号：US13805470
申请日：2011-06-23
申请人： Lorenzo Pesce , Eric Tixhon
发明人： Lorenzo Pesce , Eric Tixhon
IPC分类号： E06B3/67 , E06B3/66 , E04B1/78
CPC分类号： E06B3/6715 , C03C17/245 , C03C17/3417 , C03C17/36 , C03C17/3644 , C03C17/366 , C03C2217/241 , C03C2217/244 , C03C2218/365 , E04B1/78 , E06B3/66 , E06B3/6608 , Y10T428/265
摘要： The invention relates to triple glazing comprising at least one glass sheet that has a system of layers on one side which are produced using sputtering and include at least one metal layer that reflects infrared radiation. The at least one glass sheet has a set of low-emission layers on the other side, said set of layers comprising one or more oxide layers that are deposited using gas phase pyrolysis. The disclosed glazing has a minimum light transmittance of 60 percent (standard EN 410, illuminant D65 at 2°) with 4 mm thick glass sheets.
摘要翻译：本发明涉及三层玻璃，其包括至少一个玻璃板，该玻璃板在一侧具有使用溅射制造的层的系统，并且包括反射红外辐射的至少一个金属层。所述至少一个玻璃板在另一侧具有一组低发射层，所述一组层包括使用气相热解沉积的一个或多个氧化物层。所公开的玻璃具有60％的最小光透射率（标准EN 410，在2°的光源D65），具有4mm厚的玻璃板。

4. 发明授权

US09416582B2 Insulating glazing 有权
标题翻译：绝缘玻璃
公开(公告)号：US09416582B2
公开(公告)日：2016-08-16
申请号：US13805542
申请日：2011-06-23
申请人： Lorenzo Pesce , Eric Tixhon
发明人： Lorenzo Pesce , Eric Tixhon
IPC分类号： C03C17/36 , E06B3/66 , C03C17/245 , C03C17/34 , E06B3/67
CPC分类号： C03C17/366 , C03C17/245 , C03C17/2453 , C03C17/3417 , C03C17/36 , C03C17/3644 , C03C17/3681 , C03C2217/24 , C03C2217/241 , C03C2217/244 , C03C2217/94 , C03C2218/365 , E06B3/66 , E06B3/6612 , E06B3/6715 , E06B9/24 , E06B2009/2417 , Y10T428/24355 , Y10T428/24942 , Y10T428/24967
摘要： The invention relates to double glazing comprising at least one glass sheet that has a set of low-emission layers on each side, one side being coated with layers which are produced using sputtering and which include at least one metal layer that reflects infrared radiation. The other side of said at least one glass sheet comprises one or more metal oxide layers that are deposited using gas phase pyrolysis. The disclosed glazing has a minimum light transmittance of 60 percent (with 4 mm thick clear glass sheets).
摘要翻译：本发明涉及双层玻璃，其包括至少一个玻璃板，每个玻璃板在每一侧具有一组低发射层，一侧涂覆有使用溅射制造的层，并且其包括至少一个反射红外辐射的金属层。所述至少一个玻璃板的另一侧包括使用气相热分解沉积的一个或多个金属氧化物层。所公开的玻璃具有60％的最小透光率（具有4mm厚的透明玻璃板）。

5. 发明申请

US20140087101A1 TRANSPARENT GLASS SUBSTRATE HAVING A COATING OF CONSECUTIVE LAYERS 有权
标题翻译：透明玻璃衬底，具有相互作用层的涂层
公开(公告)号：US20140087101A1
公开(公告)日：2014-03-27
申请号：US14119332
申请日：2012-05-23
申请人： Eric Tixhon , Delphine Didier
发明人： Eric Tixhon , Delphine Didier
IPC分类号： C03C17/34 , E06B3/66
CPC分类号： C03C17/3417 , B32B17/10211 , B32B17/1022 , C03C17/3435 , C03C17/366 , C03C2217/94 , E06B3/66 , E06B3/6715 , Y10T428/24975
摘要： The invention relates to a transparent glass substrate having a coating including, in order: a first reflected color neutralization layer; a low-emissivity second layer essentially made up of SnO2:F and having a thickness between 455 and 800 nm; and a third layer that is essentially made up of SiOx, x being less than or equal to 2, and has a thickness between 40 and 65 nm or between 140 and 180 nm. The invention also relates to a double glass sheet and a triple glass sheet, manufactured from such a glass substrate, and to a window comprising said glass sheets.
摘要翻译：本发明涉及具有涂层的透明玻璃基板，其顺序为：第一反射色中和层; 基本上由SnO 2：F组成并具有455和800nm之间的厚度的低辐射率第二层; 以及基本上由SiOx，x小于或等于2构成的第三层，并且具有40至65nm或140至180nm之间的厚度。本发明还涉及由这种玻璃基板制造的双层玻璃板和三重玻璃板，以及包括所述玻璃板的窗。

6. 发明申请

US20120258260A1 METHOD AND DEVICE FOR POLARIZING A DBD ELECTRODE 有权
标题翻译：用于极化DBD电极的方法和装置
公开(公告)号：US20120258260A1
公开(公告)日：2012-10-11
申请号：US13511163
申请日：2010-11-23
申请人： Eric Michel , Eric Tixhon , Joseph Leclercq
发明人： Eric Michel , Eric Tixhon , Joseph Leclercq
IPC分类号： C23C16/503
CPC分类号： H01J37/32348 , C23C16/50 , C23C16/507 , C23C16/545 , H05H1/2406 , H05H2001/2412 , H05H2242/1005
摘要： The invention relates to a device for treating the surface of a substrate by means of dielectric barrier discharge for generating a filamentary plasma, including a reaction chamber comprising a mixture having a composition such that, when in contact with the plasma, the mixture decomposes and generates species capable of deposition in the form of a layer mostly or totally on the substrate, wherein at least two electrodes area provided in said chamber, with one electrode being subjected to a high AC voltage, and are arranged on either side of the substrate, at least one dielectric barrier (DBD) arranged between said at least two electrodes, and a THT/HF transformer comprising a secondary circuit, in which a direct current (DC) power source is provided in series in the secondary circuit such that the chemical species generated in the plasma in the form of electrically positive or negative ions are selectively attracted by the target substrate inserted in the reaction chamber and arranged between said at least two electrodes, and repelled by electrodes having a corresponding charge.
摘要翻译：本发明涉及一种用于通过用于产生丝状等离子体的电介质阻挡放电来处理衬底表面的装置，包括反应室，该反应室包括具有如下组成的混合物：当与等离子体接触时，混合物分解并产生能够以基本上或完全在基底上的层的形式沉积的物质，其中设置在所述腔室中的至少两个电极区域，其中一个电极经受高AC电压，并且布置在衬底的任一侧上，布置在所述至少两个电极之间的至少一个介电阻挡层（DBD）和包括次级电路的THT / HF变压器，其中在次级电路中串联地提供直流（DC）电源，使得产生的化学物质电离正离子等离子体被插入反应室内的目标基板选择性地吸引并排列在所述至少两个电极之间，并被具有相应电荷的电极排斥。

7. 发明授权

US09401265B2 Method and device for polarizing a DBD electrode 有权
标题翻译：用于极化DBD电极的方法和装置
公开(公告)号：US09401265B2
公开(公告)日：2016-07-26
申请号：US13511163
申请日：2010-11-23
申请人： Eric Michel , Eric Tixhon , Joseph Leclercq
发明人： Eric Michel , Eric Tixhon , Joseph Leclercq
IPC分类号： C23C16/00 , H01J37/32 , C23C16/54 , C23C16/507 , H05H1/24 , C23C16/50
CPC分类号： H01J37/32348 , C23C16/50 , C23C16/507 , C23C16/545 , H05H1/2406 , H05H2001/2412 , H05H2242/1005
摘要： The invention relates to a device for treating the surface of a substrate by means of dielectric barrier discharge for generating a filamentary plasma, including a reaction chamber comprising a mixture having a composition such that, when in contact with the plasma, the mixture decomposes and generates species capable of deposition in the form of a layer mostly or totally on the substrate, wherein at least two electrodes area provided in said chamber, with one electrode being subjected to a high AC voltage, and are arranged on either side of the substrate, at least one dielectric barrier (DBD) arranged between said at least two electrodes, and a THT/HF transformer comprising a secondary circuit, in which a direct current (DC) power source is provided in series in the secondary circuit such that the chemical species generated in the plasma in the form of electrically positive or negative ions are selectively attracted by the target substrate inserted in the reaction chamber and arranged between said at least two electrodes, and repelled by electrodes having a corresponding charge.
摘要翻译：本发明涉及一种用于通过用于产生丝状等离子体的电介质阻挡放电来处理衬底表面的装置，包括反应室，该反应室包括具有如下组成的混合物：当与等离子体接触时，混合物分解并产生能够以基本上或完全在基底上的层的形式沉积的物质，其中设置在所述腔室中的至少两个电极区域，其中一个电极经受高AC电压，并且布置在衬底的任一侧上，布置在所述至少两个电极之间的至少一个介电阻挡层（DBD）和包括次级电路的THT / HF变压器，其中在次级电路中串联地提供直流（DC）电源，使得产生的化学物质电离正离子等离子体被插入反应室内的目标基板选择性地吸引并排列在所述至少两个电极之间，并被具有相应电荷的电极排斥。

8. 发明授权

US09005718B2 Process for depositing films simultaneously onto both sides of a substrate 有权
标题翻译：同时将薄膜沉积在基材的两面上的工艺
公开(公告)号：US09005718B2
公开(公告)日：2015-04-14
申请号：US13054090
申请日：2009-07-16
申请人： Eric Tixhon , Joseph Leclercq , Eric Michel
发明人： Eric Tixhon , Joseph Leclercq , Eric Michel
IPC分类号： C23C16/455 , C23C16/458 , C23C16/50 , C23C16/52 , C23C16/509 , C03C17/00 , C23C16/54
CPC分类号： C23C16/509 , C03C17/002 , C03C2218/365 , C23C16/54
摘要： A process for the simultaneous deposition of films onto both sides of a substrate (2), which comprises in particular introducing a substrate (2) into a reaction chamber (106, 206) or making said substrate run therethrough, in which chamber at least two electrodes (110, 210) are placed. At least one dielectric barrier (14, 114) is placed between these at least two electrodes (110, 210). An adjustable inductor (L) is placed in the secondary circuit of the transformer in parallel with the circuit comprising the at least two electrodes. A high-frequency electrical voltage is generated, said voltage being such that it generates a filamentary plasma (112, 212) on each side of the substrate between the at least two electrodes (110, 210).
摘要翻译：一种用于将薄膜同时沉积到基底（2）的两侧上的方法，其特别地包括将基底（2）引入反应室（106,206）或使所述基底穿过其中，其中至少两个放置电极（110,210）。至少一个电介质阻挡层（14,114）被放置在这些至少两个电极（110,210）之间。可变电感器（L）与包括至少两个电极的电路并联放置在变压器的次级电路中。产生高频电压，所述电压使得其在至少两个电极（110,210）之间的衬底的每一侧上产生丝状等离子体（112,212）。

9. 发明授权

US08753723B2 Process and installation for depositing films onto a substrate 有权
标题翻译：用于将薄膜沉积到基底上的工艺和安装
公开(公告)号：US08753723B2
公开(公告)日：2014-06-17
申请号：US13054284
申请日：2009-07-16
申请人： Eric Tixhon , Joseph Leclercq , Eric Michel
发明人： Eric Tixhon , Joseph Leclercq , Eric Michel
IPC分类号： H05H1/24 , B05D3/14 , H05H1/20 , C03C17/00
CPC分类号： C23C16/52 , C03C17/001 , C03C17/002 , C23C16/509 , C23C16/54 , H01J37/32174 , H01J37/32348 , H01J37/32403 , H01J37/32889
摘要： A process for depositing a film onto a substrate (2), which comprises in particular introducing a substrate (2) into a reaction chamber (6, 106, 206), in which at least two electrodes (10, 110, 210) are placed. A high-frequency electrical voltage is generated, said voltage being such that it generates filamentary plasma (12, 112, 212) between the two electrodes (10, 110, 210). An adjustable inductor (L) placed in parallel with the inductor of the installation generating the electrical voltage is employed so as to reduce the phase shift between the voltage and the current generated and to increase the time during which the current flows in the plasma (12, 112, 212).
摘要翻译：一种用于将膜沉积到基底（2）上的方法，其特征在于，特别地将基底（2）引入反应室（6,106,206）中，其中放置了至少两个电极（10,110,210）。产生高频电压，所述电压使得它在两个电极（10,110,210）之间产生丝状等离子体（12,112,212）。采用与产生电压的装置的电感并联放置的可调节电感器（L），以减小所产生的电压和电流之间的相移并增加电流在等离子体中流动的时间（12 ，112,212）。

10. 发明申请

US20110174333A1 PROCESS AND INSTALLATION FOR SURFACE PREPARATION BY DIELECTRIC BARRIER DISCHARGE 有权
标题翻译：电介质放电的表面处理工艺及其安装
公开(公告)号：US20110174333A1
公开(公告)日：2011-07-21
申请号：US13054311
申请日：2009-07-16
申请人： Eric Tixhon , Joseph Leclercq , Eric Michel
发明人： Eric Tixhon , Joseph Leclercq , Eric Michel
IPC分类号： C25F1/00
CPC分类号： B08B7/0035 , H01J37/32009 , H01J37/32348 , H01J37/32376 , H05H1/2406 , H05H2001/2412
摘要： A process for surface preparation of a substrate (2), which comprises introducing or running a substrate (2) into a reaction chamber (6, 106). A dielectric barrier (14, 114) is placed between electrodes (1, 10, 110). A high-frequency electrical voltage is generated, to generate filamentary plasma (12, 112). Molecules (8, 108) are introduced into the reaction chamber (6, 106). Upon contact with the plasma, they generate active species typical of reacting with the surface of the substrate. An adjustable inductor (L) placed in parallel with the inductor of the installation is employed to reduce the phase shift between the voltage and the current generated and to increase the time during which the current flows in the plasma (12, 112).
摘要翻译：一种用于表面制备基底（2）的方法，其包括将基底（2）引入或运行到反应室（6,106）中。介电阻挡层（14,114）被放置在电极（1,10,110）之间。产生高频电压，以产生丝状等离子体（12,112）。将分子（8,108）引入反应室（6,106）中。与等离子体接触时，它们产生典型的与基底表面反应的活性物质。采用与设备的电感并联放置的可调电感器（L）来减小所产生的电压和电流之间的相移并增加电流在等离子体（12,112）中流动的时间。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式