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1. 发明授权

US09221785B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US09221785B2
公开(公告)日：2015-12-29
申请号：US12797459
申请日：2010-06-09
申请人： Koji Ichikawa , Masako Sugihara , Masahiko Shimada
发明人： Koji Ichikawa , Masako Sugihara , Masahiko Shimada
IPC分类号： G03F7/004 , G03F7/38 , C07D317/12 , C07D317/16 , C07D317/24 , C07D319/02 , C07D319/12 , C07D321/02 , C07D327/04 , C07D327/06 , C07D339/02 , C07D339/06 , C07D339/08 , C07C381/12 , C07C309/17 , G03F7/039
CPC分类号： C07D327/06 , C07C309/17 , C07C381/12 , C07C2603/74 , C07D317/12 , C07D317/16 , C07D317/24 , C07D319/12 , C07D321/02 , C07D327/04 , C07D339/02 , C07D339/06 , C07D339/08 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/38
摘要： A salt having a group represented by the formula (I): -T (I) wherein T represents a C3-C36 alicyclic hydrocarbon group in which at least two methylene groups are replaced by —O— or —S— and which can have one or more substituents.
摘要翻译：具有由式（I）表示的基团的盐：-T（I）其中T表示其中至少两个亚甲基被-O-或-S-代替的C 3 -C 36脂环族烃基，并且可以具有一个或更多取代基。

2. 发明申请

US20100316951A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME 有权
标题翻译：含有它的盐和光催化剂组合物
公开(公告)号：US20100316951A1
公开(公告)日：2010-12-16
申请号：US12797459
申请日：2010-06-09
申请人： Koji ICHIKAWA , Masako Sugihara , Masahiko Shimada
发明人： Koji ICHIKAWA , Masako Sugihara , Masahiko Shimada
IPC分类号： G03F7/004 , C07D327/06 , G03F7/20
CPC分类号： C07D327/06 , C07C309/17 , C07C381/12 , C07C2603/74 , C07D317/12 , C07D317/16 , C07D317/24 , C07D319/12 , C07D321/02 , C07D327/04 , C07D339/02 , C07D339/06 , C07D339/08 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/38
摘要： A salt having a group represented by the formula (I): -T (I) wherein T represents a C3-C36 alicyclic hydrocarbon group in which at least two methylene groups are replaced by —O— or —S— and which can have one or more substituents.
摘要翻译：具有由式（I）表示的基团的盐：-T（I）其中T表示其中至少两个亚甲基被-O-或-S-代替的C 3 -C 36脂环族烃基，并且可以具有一个或更多取代基。

3. 发明授权

US09507258B2 Resin and photoresist composition comprising the same 有权
标题翻译：树脂和包含其的光致抗蚀剂组合物
公开(公告)号：US09507258B2
公开(公告)日：2016-11-29
申请号：US13290558
申请日：2011-11-07
申请人： Koji Ichikawa , Masahiko Shimada , Takashi Nishimura
发明人： Koji Ichikawa , Masahiko Shimada , Takashi Nishimura
IPC分类号： G03F7/004 , C08F220/38 , G03F7/039 , G03F7/20 , C08F220/28
CPC分类号： G03F7/004 , C08F220/28 , C08F220/38 , G03F7/0045 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein T1 represents a C4-C34 sultone ring group optionally having one or more substituents, X1 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, Z1 represents *-X2—, *-X2—X4—CO—X3—, or *-X2—CO—X4—X3—, X2 and X3 independently each represent a C1-C6 alkanediyl group, X4 represents —O— or —N(Rc)—, * represents a binding position to X1, and R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.

4. 发明授权

US08614048B2 Resin, resist composition and method for producing resist pattern 有权
标题翻译：树脂，抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08614048B2
公开(公告)日：2013-12-24
申请号：US13237250
申请日：2011-09-20
申请人： Koji Ichikawa , Masahiko Shimada , Takashi Nishimura
发明人： Koji Ichikawa , Masahiko Shimada , Takashi Nishimura
IPC分类号： G03F7/004 , G03F7/40 , C08F26/06 , C08F126/06 , C08F226/06
CPC分类号： C08F20/10 , C08F20/06 , C08F26/06 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resin having a structural unit derived from a compound represented by the following formula (I), wherein R1, A1 and ring X1 are as defined in the instant specification:
摘要翻译：具有衍生自由下式（I）表示的化合物的结构单元的树脂，其中R 1，A 1和环X1如本说明书中所定义：

5. 发明申请

US20110033804A1 PHOTORESIST COMPOSITION 审中-公开
标题翻译：光电组合物
公开(公告)号：US20110033804A1
公开(公告)日：2011-02-10
申请号：US12852072
申请日：2010-08-06
申请人： Masahiko Shimada , Koji Ichikawa
发明人： Masahiko Shimada , Koji Ichikawa
IPC分类号： G03F7/004 , C08G63/00 , G03F7/20
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/2041
摘要： The present invention provides a photoresist composition comprising a resin which comprises a structural unit derived from a compound having an acid-labile group and a structural unit derived from a compound represented by the formula (a): wherein R1 represents a hydrogen atom, a halogen atom, a C1-C6 alkyl group or a C1-C6 halogenated alkyl group, k represents an integer of 1 to 6, W1 represents a C6-C18 divalent aromatic hydrocarbon group which can have one or more substituents selected from the group consisting of a halogen atom, a hydroxyl group, a C1-C12 alkyl group, a C1-C12 alkoxy group, a C6-C14 aryl group, a C7-C15 aralkyl group, a glycidyloxy group and a C2-C4 acyl group, and R2 represents a hydrogen atom, a group represented by the formula (R2-1) or a group represented by the formula (R2-2), wherein R3, R4 and R5 independently each represent a C1-C12 hydrocarbon group, and R3 and R4 can be bonded each other to form a ring, R6 and R7 independently each represent a hydrogen atom or a C1-C12 hydrocarbon group, and R8 represents a C1-C12 hydrocarbon group, and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.
摘要翻译：本发明提供了包含树脂的光致抗蚀剂组合物，其包含衍生自具有酸不稳定基团的化合物的结构单元和由式（a）表示的化合物衍生的结构单元：其中R1表示氢原子，卤素原子，C1-C6烷基或C1-C6卤代烷基，k表示1〜6的整数，W1表示可具有一个以上取代基的C6-C18二价芳香族烃基，该取代基选自卤素原子，羟基，C1-C12烷基，C1-C12烷氧基，C6-C14芳基，C7-C15芳烷基，缩水甘油氧基和C2-C4酰基，R2表示氢原子，式（R2-1）表示的基团或式（R2-2）表示的基团，其中R3，R4和R5各自独立地表示C1-C12烃基，R3和R4可以键合彼此形成环，R6和R7各自独立地表示氢 om或C1-C12烃基，R8表示C1-C12烃基，其在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱性水溶液。

6. 发明授权

US09360754B2 Resin and photoresist composition comprising the same 有权
标题翻译：树脂和包含其的光致抗蚀剂组合物
公开(公告)号：US09360754B2
公开(公告)日：2016-06-07
申请号：US13290618
申请日：2011-11-07
申请人： Koji Ichikawa , Masahiko Shimada , Takashi Nishimura , Akira Kamabuchi , Hyungjoo Kim , Mitsuyoshi Ochiai
发明人： Koji Ichikawa , Masahiko Shimada , Takashi Nishimura , Akira Kamabuchi , Hyungjoo Kim , Mitsuyoshi Ochiai
IPC分类号： G03F7/004 , C08F28/06 , C08F20/58 , C07D327/04 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0397 , C07D327/04 , C08F20/58 , C08F28/06 , G03F7/2041
摘要： The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein T1 represents a C4-C34 sultone ring group optionally having one or more substituents, X2 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, when X2 is —O—, Z1 represents *—X1—, *—X3—CO—O—X1—, *—X3—CO—N(Rc)—X1—, *—X3—O—CO—X1— or *—X3—N(Rc)—CO—X1—, when X2 is —N(Rc)—, Z1 represents *—X1—, *—X1—O—X3—, *—X1—CO—, *—X1—X4—CO—X3—, *—X1—CO—X4—X3—, *—X1—X4—CO—X3—CO— or *—X1—CO—X4—X3—CO—, X1 and X3 independently each represent a C1-C6 divalent aliphatic hydrocarbon group, X4 represents —O— or —N(Rc)—, * represents a binding position to X2, and R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.
摘要翻译：本发明提供一种树脂，其包含由式（aa）表示的结构单元：其中T1表示任选具有一个或多个取代基的C 4 -C 34磺内酯环基团，X 2表示-O-或-N（R c） - ，R c表示氢原子或C1-C6烷基，当X2为-O-时，Z1为* -X1-，* -X3-CO-O-X1-，* -X3-CO-N（Rc）-X1-， * -X3-O-CO-X1-或* -X3-N（Rc）-CO-X1-，当X2为-N（Rc）时，Z1表示* -X1-，* -X1-O-X3- ，* -X1-CO-，* -X1-X4-CO-X3-，* -X1-CO-X4-X3-，* -X1-X4-CO-X3-CO-或* -X1-CO-X4 -X3-CO-，X1和X3各自独立地表示C1-C6二价脂族烃基，X4表示-O-或-N（Rc） - ，*表示与X2的结合位置，R1表示C1-C6烷基具有一个或多个卤素原子的基团，氢原子或卤素原子。

7. 发明授权

US09221391B2 Vehicle turn signal switch device 有权
标题翻译：车辆转向信号开关装置
公开(公告)号：US09221391B2
公开(公告)日：2015-12-29
申请号：US14344090
申请日：2012-07-09
申请人： Masahiko Shimada , Masatsugu Urakawa
发明人： Masahiko Shimada , Masatsugu Urakawa
IPC分类号： B60Q1/40 , B60Q1/42 , B60Q1/00 , H01H3/42
CPC分类号： B60Q1/42 , B60Q1/0076 , B60Q1/425 , H01H3/42
摘要： A vehicle turn signal switch device whereby the production of knocking sounds by a cancellation pin when a steering wheel is turned in the direction of a turn signal is suppressed. A turn signal switch includes a fixed member and a movable plate. The cancellation pin, which is supported by the fixed member and the movable plate such that the cancellation pin can swing and move forward and backward relative to a cancellation cam, includes a sliding-contact surface that is in sliding contact with the fixed member. The cancellation pin is biased by a return spring in the direction of the cancellation cam and in the direction of the sliding contact of the sliding-contact surface with the fixed member.
摘要翻译：一种车辆转向信号开关装置，其中当方向盘沿转向信号的方向转动时，由消除销产生爆震声音被抑制。转向信号开关包括固定部件和可动板。由固定构件和可动板支撑的抵销销相对于取消凸轮可以摆动并向前和向后移动，包括与固定构件滑动接触的滑动接触表面。消除销通过复位弹簧沿着取消凸轮的方向和滑动接触表面与固定构件的滑动接触的方向偏置。

8. 发明申请

US20140044970A1 PRODUCTION OF A GaN BULK CRYSTAL SUBSTRATE AND A SEMICONDUCTOR DEVICE FORMED ON A GaN BULK CRYSTAL SUBSTRATE 审中-公开
标题翻译：生产GaN体积晶体衬底和形成GaN大块晶体衬底的半导体器件
公开(公告)号：US20140044970A1
公开(公告)日：2014-02-13
申请号：US14057690
申请日：2013-10-18
申请人： Seiji Sarayama , Masahiko Shimada , Hisanori Yamane , Hirokazu Iwata
发明人： Seiji Sarayama , Masahiko Shimada , Hisanori Yamane , Hirokazu Iwata
IPC分类号： C09K11/62 , C30B29/40
CPC分类号： C30B7/105 , C09K11/62 , C30B7/00 , C30B9/00 , C30B11/00 , C30B15/00 , C30B29/403 , C30B29/406 , H01L29/2003 , H01L29/7783 , Y10T117/1092 , Y10T117/1096 , Y10T428/2982
摘要： A crystal has a diameter of 1 cm or more and shows a strongest peak in cathode luminescent spectrum at a wavelength of 360 nm in correspondence to a band edge.
摘要翻译：晶体具有1cm或更大的直径，并且对应于带边缘，在360nm波长处的阴极发光光谱中显示出最强峰。

9. 发明授权

US08562737B2 Crystal growth method, crystal growth apparatus, group-III nitride crystal and group III nitride semiconductor device 有权
标题翻译：晶体生长方法，晶体生长装置，III族氮化物晶体和III族氮化物半导体器件
公开(公告)号：US08562737B2
公开(公告)日：2013-10-22
申请号：US12139230
申请日：2008-06-13
申请人： Seiji Sarayama , Masahiko Shimada , Hisanori Yamane , Masato Aoki
发明人： Seiji Sarayama , Masahiko Shimada , Hisanori Yamane , Masato Aoki
IPC分类号： C30B13/02
CPC分类号： C01B21/06 , C30B11/002 , C30B29/403 , C30B29/406
摘要： A crystal growth method, comprising the steps of: a) bringing a nitrogen material into a reaction vessel in which a mixed molten liquid comprising an alkaline metal and a group-III metal; and b) growing a crystal of a group-III nitride using the mixed molten liquid and the nitrogen material brought in by the step a) in the reaction vessel, wherein a provision is made such as to prevent a vapor of the alkaline metal from dispersing out of the reaction vessel.
摘要翻译：一种晶体生长方法，包括以下步骤：a）将氮材料送入其中包含碱金属和III族金属的混合熔融液体的反应容器中; 以及b）使用混合的熔融液体和由步骤a）引入的氮材料在III族氮化物中生长晶体，其中设置如防止碱金属的蒸气分散离开反应容器。

10. 发明申请

US20100035180A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 有权
标题翻译：化学放大正电阻组合物
公开(公告)号：US20100035180A1
公开(公告)日：2010-02-11
申请号：US12536239
申请日：2009-08-05
申请人： Masahiko Shimada , Kazuhiko Hashimoto , Satoshi Yamaguchi , Soon Shin Kim , Yoshiyuki Takata , Takashi Hiraoka
发明人： Masahiko Shimada , Kazuhiko Hashimoto , Satoshi Yamaguchi , Soon Shin Kim , Yoshiyuki Takata , Takashi Hiraoka
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , Y10S430/108 , Y10S430/111
摘要： The present invention provides a chemically amplified positive composition comprising: a resin comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or —(CH2)k—CO—X4—, k represents an integer of 1 to 4, X1, X2, X3 and X4 each independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and an acid generator.
摘要翻译：本发明提供一种化学放大阳性组合物，其包含：包含由式（I）表示的结构单元的树脂：其中R1表示氢原子，卤素原子，C1-C4烷基或C1-C4全氟烷基， Z表示单键或 - （CH 2）k -CO-X 4 - ，k表示1〜4的整数，X 1，X 2，X 3，X 4各自独立地表示氧原子或硫原子，m表示1的整数 3，n表示0〜3的整数，酸产生剂。

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