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1. 发明申请

US20120264060A1 SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN 有权
标题翻译：盐，光电组合物和生产光电子图案的方法
公开(公告)号：US20120264060A1
公开(公告)日：2012-10-18
申请号：US13443166
申请日：2012-04-10
申请人： Koji ICHIKAWA , Isao YOSHIDA , Yuko YAMASHITA
发明人： Koji ICHIKAWA , Isao YOSHIDA , Yuko YAMASHITA
IPC分类号： C07C69/753 , G03F7/20 , C07D333/22 , G03F7/027
CPC分类号： C07C309/17 , C07C25/18 , C07C303/32 , C07C309/06 , C07C309/07 , C07C309/12 , C07C309/19 , C07C381/12 , C07C2601/14 , C07C2603/74 , C07D333/46 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, L2 and L3 respectively represent a single bond or a C1-C6 divalent saturated alkyl group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, ring W1 and ring W2 respectively represent a C3-C36 hydrocarbon ring, R1 and R2 respectively represent a hydrogen atom or C1-C6 alkyl group, R3 represents C1-C6 alkyl group, t represents an integer of 0 to 2 and Z+ represents an organic counter ion
摘要翻译：由式（I）表示的盐：其中Q1和Q2独立地表示氟原子或C1-C6全氟烷基，L1表示其中亚甲基可以被氧原子代替的C1-C17二价饱和烃基或羰基，L2和L3分别表示单键或C1-C6二价饱和烷基，其中亚甲基可被氧原子或羰基取代，环W1和环W2分别表示C3-C36烃环，R1和R2分别表示氢原子或C1-C6烷基，R3表示C1-C6烷基，t表示0〜2的整数，Z +表示有机抗衡离子

2. 发明申请

US20110059400A1 PHOTORESIST COMPOSITION 审中-公开
标题翻译：光电组合物
公开(公告)号：US20110059400A1
公开(公告)日：2011-03-10
申请号：US12875627
申请日：2010-09-03
申请人： Akira KAMABUCHI , Yuko YAMASHITA
发明人： Akira KAMABUCHI , Yuko YAMASHITA
IPC分类号： G03F7/004 , G03F7/20 , C07C61/135
CPC分类号： C07C61/135 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： The present invention provides a photoresist composition comprisinga resin which comprises a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, an acid generator and a compound represented by the formula (I′): wherein R51, R52, R53 and R54 independently each represent a C1-C8 alkyl group, and A11 represents a C3-C36 divalent saturated cyclic hydrocarbon group which can contain one or more heteroatoms and which have one or more substituents or a C6-C20 divalent aromatic hydrocarbon group which can contain one or more heteroatoms and which have one or more substituents.
摘要翻译：本发明提供一种光致抗蚀剂组合物，其包含树脂，其包含衍生自具有酸不稳定基团的化合物的结构单元，其在碱性水溶液中不溶或难溶于碱性水溶液，但通过酸，酸产生剂和由式（I'）表示的化合物：其中R51，R52，R53和R54各自独立地表示C1-C8烷基，A11表示可以含有（C 1 -C 8）烷基的C 3 -C 36二价饱和环状烃基一个或多个杂原子并且具有一个或多个取代基或可含有一个或多个杂原子且具有一个或多个取代基的C 6 -C 20二价芳族烃基。

3. 发明申请

US20110318690A1 COMPOUND, RESIN AND PHOTORESIST COMPOSITION 审中-公开
标题翻译：化合物，树脂和光电组合物
公开(公告)号：US20110318690A1
公开(公告)日：2011-12-29
申请号：US13168480
申请日：2011-06-24
申请人： Yuko YAMASHITA , Hyungjoo KIM
发明人： Yuko YAMASHITA , Hyungjoo KIM
IPC分类号： G03F7/38 , C08F20/38 , C08F20/30 , C07D333/16 , C07C69/66 , C07D311/02 , C07D327/06 , C08F28/06 , G03F7/004
CPC分类号： C07D311/20 , C08F220/28 , C08F220/30 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： The present invention provides a compound represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, A1 represents a single bond or *—(CH2)m—CO—O— in which m represents an integer of 1 to 4 and * represents a binding position to —O—, B1 represents —O— or —S—, B2 represents —CH2—, —O— or —S— and W1 represents an optionally substituted aromatic ring, a resin comprising a structural unit derived from the compound and a photoresist composition comprising the resin.
摘要翻译：本发明提供由式（I）表示的化合物：其中R1表示氢原子或甲基，A1表示单键或* - （CH2）m-CO-O-，其中m表示1的整数至4和*表示与-O-的结合位置，B1表示-O-或-S-，B2表示-CH2-，-O-或-S-，W1表示任选取代的芳环，包含结构式衍生自该化合物的单元和包含该树脂的光致抗蚀剂组合物。

4. 发明申请

US20110165513A1 PHOTORESIST COMPOSITION 有权
标题翻译：光电组合物
公开(公告)号：US20110165513A1
公开(公告)日：2011-07-07
申请号：US12983729
申请日：2011-01-03
申请人： Yuko YAMASHITA , Nobuo ANDO
发明人： Yuko YAMASHITA , Nobuo ANDO
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： The present invention provides a photoresist composition comprisinga resin which comprises a structural unit represented by the formula (I): wherein Q1 and Q2 independently represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group etc., X1 represents —O—CO— etc., and A+ represents an organic counter ion, and a compound represented by the formula (D′): wherein R51, R52, R53 and R54 independently represent a C1-C20 alkyl group etc., and A11 represents a C1-C36 saturated cyclic hydrocarbon group which may have one or more substituents and which may contain one or more heteroatoms.
摘要翻译：本发明提供了包含树脂的光致抗蚀剂组合物，其包含式（I）表示的结构单元：其中Q1和Q2独立地表示氟原子等，U表示C1-C20二价烃基等，X 1表示 - O-CO-等，A +表示有机抗衡离子，由式（D'）表示的化合物：其中R51，R52，R53和R54独立地表示C1-C20烷基等，A11表示可以具有一个或多个取代基且可以含有一个或多个杂原子的C 1 -C 36饱和环烃基。

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