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1. 发明申请

US20120264060A1 SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN 有权
标题翻译：盐，光电组合物和生产光电子图案的方法
公开(公告)号：US20120264060A1
公开(公告)日：2012-10-18
申请号：US13443166
申请日：2012-04-10
申请人： Koji ICHIKAWA , Isao YOSHIDA , Yuko YAMASHITA
发明人： Koji ICHIKAWA , Isao YOSHIDA , Yuko YAMASHITA
IPC分类号： C07C69/753 , G03F7/20 , C07D333/22 , G03F7/027
CPC分类号： C07C309/17 , C07C25/18 , C07C303/32 , C07C309/06 , C07C309/07 , C07C309/12 , C07C309/19 , C07C381/12 , C07C2601/14 , C07C2603/74 , C07D333/46 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, L2 and L3 respectively represent a single bond or a C1-C6 divalent saturated alkyl group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, ring W1 and ring W2 respectively represent a C3-C36 hydrocarbon ring, R1 and R2 respectively represent a hydrogen atom or C1-C6 alkyl group, R3 represents C1-C6 alkyl group, t represents an integer of 0 to 2 and Z+ represents an organic counter ion
摘要翻译：由式（I）表示的盐：其中Q1和Q2独立地表示氟原子或C1-C6全氟烷基，L1表示其中亚甲基可以被氧原子代替的C1-C17二价饱和烃基或羰基，L2和L3分别表示单键或C1-C6二价饱和烷基，其中亚甲基可被氧原子或羰基取代，环W1和环W2分别表示C3-C36烃环，R1和R2分别表示氢原子或C1-C6烷基，R3表示C1-C6烷基，t表示0〜2的整数，Z +表示有机抗衡离子

2. 发明申请

US20120052440A1 SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME 有权
标题翻译：含有它的盐和光催化剂组合物
公开(公告)号：US20120052440A1
公开(公告)日：2012-03-01
申请号：US13216776
申请日：2011-08-24
申请人： Isao YOSHIDA , Koji ICHIKAWA
发明人： Isao YOSHIDA , Koji ICHIKAWA
IPC分类号： G03F7/039 , C07C309/24 , C07D327/08 , G03F7/38
CPC分类号： C07C309/17 , C07C381/12 , C07C2603/74 , C07D233/60 , C07D327/08 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 and L2 independently each represent a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W1 and ring W2 independently each represent a C3-C36 aliphatic ring, R2 is independently in each occurrence a C1-C6 alkyl group, R4 is independently in each occurrence a C1-C6 alkyl group, R3 represents a C1-C12 hydrocarbon group, t represents an integer of 0 to 2, u represents an integer of 0 to 2, and Z+ represents an organic counter ion.
摘要翻译：本发明提供由式（I）表示的盐：其中Q1和Q2独立地表示氟原子或C1-C6全氟烷基，L1和L2各自表示C1-C17二价饱和烃基，其中一个或更多的-CH 2 - 可被-O-或-CO-取代，环W1和环W2各自独立地表示C 3 -C 36脂族环，R 2在每次出现时独立地为C1-C6烷基，R4各自独立地为 C1-C6烷基，R3表示C1-C12烃基，t表示0〜2的整数，u表示0〜2的整数，Z +表示有机抗衡离子。

3. 发明申请

US20100304293A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME 有权
标题翻译：含有它的盐和光催化剂组合物
公开(公告)号：US20100304293A1
公开(公告)日：2010-12-02
申请号：US12786738
申请日：2010-05-25
申请人： Koji ICHIKAWA , Isao Yoshida
发明人： Koji ICHIKAWA , Isao Yoshida
IPC分类号： G03F7/004 , C07C309/02 , G03F7/20
CPC分类号： G03F7/039 , C07C303/32 , C07C309/17 , C07C381/12 , C07C2601/14 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： A salt represented by the formula (a): wherein Q1 and Q2 each independently represent a fluorine atom etc., X1 represents a single bond etc., X2 represents a single bond etc., Y1 represents a C3-C6 alicyclic hydrocarbon group etc., with the proviso that —X2—Y1 group has one or more fluorine atoms, and Z+ represents an organic counter cation, and a photoresist composition comprising the salt represented by the formula (a) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.
摘要翻译：由式（a）表示的盐：其中Q1和Q2各自独立地表示氟原子等，X1表示单键等，X2表示单键等，Y1表示C3-C6脂肪族烃基等。条件是-X2-Y1基团具有一个或多个氟原子，Z +表示有机抗衡阳离子，以及包含由式（a）表示的盐的光致抗蚀剂组合物和包含具有酸性基团的结构单元的树脂，不稳定的基团，并且在碱性水溶液中不溶或难溶，但是通过酸的作用变得可溶于碱性水溶液。

4. 发明申请

US20110201823A1 SALT AND PROCESS FOR PRODUCING ACID GENERATOR 有权
标题翻译：生产酸生产器的盐和方法
公开(公告)号：US20110201823A1
公开(公告)日：2011-08-18
申请号：US13025637
申请日：2011-02-11
申请人： Isao YOSHIDA , Koji ICHIKAWA
发明人： Isao YOSHIDA , Koji ICHIKAWA
IPC分类号： C07C309/19 , C07D233/14
CPC分类号： C07D233/14 , C07C303/22 , C07C381/12 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0397 , C07C309/17
摘要： A salt represented by the formula (I0): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a divalent C1-C17 hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, m represents 1 or 2, and Zm+ represents m-valent organic or inorganic cation.
摘要翻译：由式（I0）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基，L1表示二价C1-C17烃基，其中一个或多个-CH2-可以被 - O-或-CO-，m表示1或2，Zm +表示m价有机或无机阳离子。

5. 发明申请

US20130052588A1 SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN 有权
标题翻译：盐，光电组合物和生产光电子图案的方法
公开(公告)号：US20130052588A1
公开(公告)日：2013-02-28
申请号：US13589852
申请日：2012-08-20
申请人： Isao YOSHIDA , Yuichi MUKAI , Koji ICHIKAWA
发明人： Isao YOSHIDA , Yuichi MUKAI , Koji ICHIKAWA
IPC分类号： C07C309/19 , G03F7/20 , G03F7/027
CPC分类号： C07C381/12 , C07C309/06 , C07C309/10 , C07C309/12 , C07C309/17 , C07C2601/14 , C07C2603/74 , C07D307/00 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A photoresist composition containing a resin that is hardly soluble or insoluble, but which is soluble in an aqueous alkali solution by action of an acid, and a salt represented by formula (I): wherein Q1, Q2, L1, W1, W2, R1, R2, t1 and t2 are defined in the specification, and Z+ represents an organic cation.
摘要翻译：含有难溶性或不溶性但通过酸作用而溶于碱性水溶液的树脂的光致抗蚀剂组合物和式（I）表示的盐：其中Q1，Q2，L1，W1，W2，R1 在说明书中定义了R2，t1和t2，Z +表示有机阳离子。

6. 发明申请

US20130040239A1 SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN 有权
标题翻译：盐，光电组合物和生产光电子图案的方法
公开(公告)号：US20130040239A1
公开(公告)日：2013-02-14
申请号：US13567892
申请日：2012-08-06
申请人： Koji ICHIKAWA , Yuichi MUKAI , Isao YOSHIDA
发明人： Koji ICHIKAWA , Yuichi MUKAI , Isao YOSHIDA
IPC分类号： C07C69/753 , G03F7/20 , G03F7/027
CPC分类号： C07C309/17 , C07C381/12 , C07C2603/74
摘要： A salt represented by formula (I): wherein Q1, Q2, L1, W, and Z+ are defined in the specification.
摘要翻译：由式（I）表示的盐：其中Q1，Q2，L1，W和Z +在说明书中定义。

7. 发明申请

US20120295201A1 COMPOUND, RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN 有权
标题翻译：化合物，树脂，光电组合物和制造光电子图案的方法
公开(公告)号：US20120295201A1
公开(公告)日：2012-11-22
申请号：US13475594
申请日：2012-05-18
申请人： Koji ICHIKAWA , Isao YOSHIDA
发明人： Koji ICHIKAWA , Isao YOSHIDA
IPC分类号： C07C69/753 , C08F222/20 , G03F7/20 , G03F7/004 , G03F7/027 , C08F122/20 , C08F218/14
CPC分类号： C08F122/20 , C07C69/757 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A compound represented by formula (I): wherein T1 represents a single bond or a C6-C14 aromatic hydrocarbon group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, L2 and L3 each independently represent a single bond or a C1-C6 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, ring W1 and ring W2 each independently represent a C3-C36 hydrocarbon ring, R1 and R2 each independently represent a hydrogen atom, a hydroxyl group, or C1-C6 alkyl group, R3 and R4 each independently represent a hydroxyl group, or C1-C6 alkyl group, R5 represents a hydroxyl group or a methyl group, m represents 0 or 1, and t and u each independently represent an integer of 0 to 2.
摘要翻译：由式（I）表示的化合物：其中，T1表示单键或C6-C14芳香族烃基，L1表示可以被氧原子或羰基取代亚甲基的C1-C17二价饱和烃基，L2和L3各自独立地表示单键或C1-C6二价饱和烃基，其中亚甲基可被氧原子或羰基取代，环W1和环W2各自独立地表示C3-C36烃环，R 1和R 2各自独立地表示氢原子，羟基或C 1 -C 6烷基，R 3和R 4各自独立地表示羟基或C 1 -C 6烷基，R 5表示羟基或甲基，m 表示0或1，t和u各自独立地表示0〜2的整数。

8. 发明申请

US20120164579A1 SALT, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN 有权
标题翻译：盐，光电组合物和生产光电子图案的方法
公开(公告)号：US20120164579A1
公开(公告)日：2012-06-28
申请号：US13333521
申请日：2011-12-21
申请人： Koji ICHIKAWA , Isao YOSHIDA , Yuki SUZUKI
发明人： Koji ICHIKAWA , Isao YOSHIDA , Yuki SUZUKI
IPC分类号： G03F7/20 , C07C69/767 , C07D333/46 , G03F7/027
CPC分类号： C07C309/17 , C07C2603/74 , C07D307/33 , C07D307/93 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A salt represented by the formula (I): wherein Q1, Q2, L1, L2, ring W, s, t, R1, R2 and Z+ are defined in the specification.
摘要翻译：由式（I）表示的盐：其中Q1，Q2，L1，L2，环W，s，t，R1，R2和Z +在说明书中定义。

9. 发明申请

US20110117493A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME 有权
标题翻译：含有它的盐和光催化剂组合物
公开(公告)号：US20110117493A1
公开(公告)日：2011-05-19
申请号：US12946243
申请日：2010-11-15
申请人： Koji ICHIKAWA , Masako SUGIHARA , Isao YOSHIDA
发明人： Koji ICHIKAWA , Masako SUGIHARA , Isao YOSHIDA
IPC分类号： G03F7/004 , C07D307/93 , G03F7/20
CPC分类号： C07D307/93 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A salt represented by the formula (X): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W1 represents a C4-C36 lactone ring, R3 is a C1-C6 alkyl group etc., t represents an integer of 0 to 2, Z+ represents an organic counter ion, and W10 represents a group represented by the formula (X-1): wherein L2 represents a single bond etc., ring W2 represents a C3-C36 saturated hydrocarbon ring in which one —CH2— is replaced by —CO— and in which one or more —CH2— can be replaced by —O— or —CO—, R1 represents a C1-C12 hydrocarbon group, R2 is a C1-C6 alkyl group etc., and s represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein L3 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W3 represents a C3-C36 saturated hydrocarbon ring, R4 is a hydroxyl group etc., R5 is a C1-C6 alkyl group etc., v represents an integer of 1 to 3, and w represents an integer of 0 to 2.
摘要翻译：由式（X）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基，L1表示C1-C17二价饱和烃基，其中一个或多个-CH 2 - 可以被 -O-或-CO-，环W1表示C4-C36内酯环，R3表示C1-C6烷基等，t表示0〜2的整数，Z +表示有机抗衡离子，W10表示由式（X-1）表示：其中L2表示单键等，环W2表示其中一个-CH 2 - 被-CO-替代的C 3 -C 36饱和烃环，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，R1表示C1-C12烃基，R2表示C1-C6烷基等，s表示0〜2的整数，或式（ X-2）：其中L3表示C1-C17二价饱和烃基，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，环W3重复呈现C3-C36饱和烃环，R4为羟基等，R5为C1-C6烷基等，v为1〜3的整数，w为0〜2的整数。

10. 发明申请

US20130022928A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20130022928A1
公开(公告)日：2013-01-24
申请号：US13551874
申请日：2012-07-18
申请人： Koji ICHIKAWA , Satoshi YAMAGUCHI , Yuki SUZUKI
发明人： Koji ICHIKAWA , Satoshi YAMAGUCHI , Yuki SUZUKI
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator having an acid labile group, wherein R1, A1, A13, A14, X12 are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸产生剂和具有酸不稳定基团的酸产生剂，其中R1，A1，A13，A14，X12在说明书中定义。

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