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1. 发明授权

US07179334B2 System and method for performing semiconductor processing on substrate being processed 有权
标题翻译：在正在处理的衬底上进行半导体处理的系统和方法
公开(公告)号：US07179334B2
公开(公告)日：2007-02-20
申请号：US10484709
申请日：2002-03-19
申请人： Koichi Sakamoto , Yamato Tonegawa , Takehiko Fujita
发明人： Koichi Sakamoto , Yamato Tonegawa , Takehiko Fujita
IPC分类号： C23C16/52 , C23C16/44 , B65H1/00 , H01L21/306 , C23F1/00
CPC分类号： H01L21/67259 , H01L21/67253 , H01L21/68 , H01L22/20 , Y10S414/135 , Y10S414/136
摘要： A semiconductor process system (10) includes a measuring section (40), an information processing section (51), and a control section (52). The measuring section (40) measures a characteristic of a test target film formed on a target substrate (W) by a semiconductor process. The information processing section (51) calculates a positional correction amount of the target substrate (W) necessary for improving planar uniformity of the characteristic, based on values of the characteristic measured by the measuring section (40) at a plurality of positions on the test target film. The control section (52) controls a drive section (30A, 32A) of a transfer device (30), based on the positional correction amount, when the transfer device (30) transfers a next target substrate (W) to the support member (17) to perform the semiconductor process.
摘要翻译：半导体处理系统（10）包括测量部分（40），信息处理部分（51）和控制部分（52）。测量部分（40）通过半导体工艺测量在目标衬底（W）上形成的测试目标膜的特性。信息处理部（51）基于测试部（40）在测试时的多个位置测定的特性的值，计算提高特性的平面均匀性所需的目标基板（W）的位置修正量目标电影。当传送装置（30）将下一个目标基板（W）传送到支撑件（30）时，控制部分（52）基于位置校正量来控制传送装置（30）的驱动部分（30A，32A）（17）执行半导体处理。

2. 发明授权

US08153451B2 System and method for performing semiconductor processing on target substrate 有权
标题翻译：在目标衬底上进行半导体处理的系统和方法
公开(公告)号：US08153451B2
公开(公告)日：2012-04-10
申请号：US11626752
申请日：2007-01-24
申请人： Koichi Sakamoto , Yamato Tonegawa , Takehiko Fujita
发明人： Koichi Sakamoto , Yamato Tonegawa , Takehiko Fujita
IPC分类号： H01L21/66
CPC分类号： H01L21/67259 , H01L21/67253 , H01L21/68 , H01L22/20 , Y10S414/135 , Y10S414/136
摘要： A semiconductor process system (10) includes a measuring section (40), an information processing section (51), and a control section (52). The measuring section (40) measures a characteristic of a test target film formed on a target substrate (W) by a semiconductor process. The information processing section (51) calculates a positional correction amount of the target substrate (W) necessary for improving planar uniformity of the characteristic, based on values of the characteristic measured by the measuring section (40) at a plurality of positions on the test target film. The control section (52) controls a drive section (30A, 32A) of a transfer device (30), based on the positional correction amount, when the transfer device (30) transfers a next target substrate (W) to the support member (17) to perform the semiconductor process.
摘要翻译：半导体处理系统（10）包括测量部分（40），信息处理部分（51）和控制部分（52）。测量部分（40）通过半导体工艺测量在目标衬底（W）上形成的测试目标膜的特性。信息处理部（51）基于在测试时的多个位置上由测量部（40）测量的特性的值来计算提高特性的平面均匀性所需的目标基板（W）的位置修正量目标电影。当传送装置（30）将下一个目标基板（W）传送到支撑部件（30）时，控制部分（52）基于位置校正量来控制传送装置（30）的驱动部分（30A，32A） 17）进行半导体处理。

3. 发明申请

US20060099805A1 Heat treating system and heat treating method 审中-公开
标题翻译：热处理系统和热处理方法
公开(公告)号：US20060099805A1
公开(公告)日：2006-05-11
申请号：US10532878
申请日：2003-10-29
申请人： Takehiko Fujita , Mitsuhiro Okada , Kota Umezawa , Kazuhide Hasebe , Koichi Sakamoto
发明人： Takehiko Fujita , Mitsuhiro Okada , Kota Umezawa , Kazuhide Hasebe , Koichi Sakamoto
IPC分类号： H01L21/44 , C23C16/00 , H05B3/02
CPC分类号： H01L21/67253 , F27B17/0025 , H01L21/67109
摘要： A thermal processing unit of the present invention includes: a holder that holds a plurality of substrates; a reaction container into which the holder is conveyed; a process-gas supplying mechanism that supplies a process gas into the reaction container; and a heating mechanism that heats the reaction container to conduct a film-forming process to the substrates when the process gas is supplied. Flow-rate-parameter table-data associating number-data of the substrates to be processed by one batch-process with target-data of flow-rate parameter of the process gas is stored in a flow-rate-parameter table-data storing part. A controlling unit obtains target-data of flow-rate parameter of the process gas, depending on an actual number of the substrates to be processed by one batch-process, based on the flow-rate-parameter table-data stored in the flow-rate-parameter table-data storing part, and controls the process-gas supplying mechanism according to the obtained target-data. The target-data of flow-rate parameter are determined in such a manner that a speed of the film-forming process is uniform among a plurality of batch-processes in which the numbers of substrates to be processed are different from each other.
摘要翻译：本发明的热处理单元包括：保持多个基板的保持器; 保持器被输送到其中的反应容器; 将处理气体供给到反应容器内的处理气体供给机构; 以及加热机构，当供给处理气体时，加热反应容器进行成膜处理。将通过一批处理的基板的数量数据与处理气体的流量参数的目标数据相关联的流量参数表数据存储在流量参数表数据存储部。控制单元根据存储在流量参数表中的流量参数表数据，取决于通过一个批处理的待处理的基板的实际数量来获得处理气体的流量参数的目标数据。速率参数表数据存储部，并根据获得的目标数据来控制处理气体供给机构。流量参数的目标数据以这样一种方式确定，即在待处理的基板数目彼此不同的多个间歇处理中，成膜处理的速度是一致的。

4. 发明授权

US08900381B2 Spring steel and spring superior in fatigue properties 有权
标题翻译：弹簧钢和弹簧性能优越
公开(公告)号：US08900381B2
公开(公告)日：2014-12-02
申请号：US12241593
申请日：2008-09-30
申请人： Tomoko Sugimura , Koichi Sakamoto , Atsuhiko Yoshida , Kei Masumoto
发明人： Tomoko Sugimura , Koichi Sakamoto , Atsuhiko Yoshida , Kei Masumoto
IPC分类号： C22C38/00 , C22C5/02 , C22C38/04 , C21D9/02 , C22C38/02 , C22C38/06 , C21D9/00
CPC分类号： C22C38/04 , C21D9/0075 , C21D9/02 , C21D2211/004 , C22C38/002 , C22C38/02 , C22C38/06
摘要： Disclosed is a spring steel which contains, by mass, 1.2% or less C; 0.1% to 2% Mn; 0.2% to 3% Si; 0.0003% to 0.005% Al; to 8 ppm Li; 30 ppm or less (excluding 0 ppm) Ca; and 10 ppm or less (excluding 0 ppm) Mg. The steel contains oxide inclusions satisfying the following conditions (1) to (3) in a number of 1×10−4 or more per square millimeter: (1) containing a total of 80 percent by mass or more of Al2O3 and SiO2 based on the inclusion composition excluding Li2O; (2) having a ratio by mass of Al2O3 to SiO2 of from 1:4 to 2:3; and (3) containing lithium (Li). The spring steel gives a spring that exhibits superior fatigue properties without strict control of the average composition of inclusions.
摘要翻译：公开了以质量计含有1.2％以下C的弹簧钢; 0.1％至2％Mn; 0.2％至3％的Si; 0.0003％至0.005％的Al; 至8ppm Li; 30ppm以下（不含0ppm）Ca; 和10ppm以下（不含0ppm）Mg。钢含有满足以下条件（1）至（3）的氧化物夹杂物，其数量为每平方毫米1×10 -4以上：（1）基于以下的总和为80质量％以上的Al 2 O 3和SiO 2：不含Li2O的夹杂物组成; （2）Al 2 O 3与SiO 2的质量比为1:4至2:3; 和（3）含有锂（Li）。弹簧钢弹簧具有优异的疲劳性能，而不需要严格控制夹杂物的平均组成。

5. 发明授权

US08273292B2 Steel for machine and structural use having excellent machinability 有权
标题翻译：机械和结构用钢具有优良的加工性能
公开(公告)号：US08273292B2
公开(公告)日：2012-09-25
申请号：US12809107
申请日：2009-01-20
申请人： Koichi Sakamoto , Motohiro Horiguchi , Shogo Murakami , Hiroshi Yaguchi , Shinsuke Masuda , Koichi Akazawa
发明人： Koichi Sakamoto , Motohiro Horiguchi , Shogo Murakami , Hiroshi Yaguchi , Shinsuke Masuda , Koichi Akazawa
IPC分类号： C22C38/18
CPC分类号： C21C7/064 , C21C7/06 , C22C1/002 , C22C38/001 , C22C38/002 , C22C38/02 , C22C38/04 , C22C38/06 , C22C38/28
摘要： The present invention provides a steel for machine and structural use which sustains mechanical properties such as strength by reducing S content, and exerts excellent machinability (in particular, tool life) in both of intermittent cutting with HSS tools and continuous cutting with carbide tools. The invention relates to a steel for machine and structural use which contains an oxide inclusion containing, wherein a total mass of an average composition of the oxide inclusions is 100%: CaO: 10 to 55 mass %; SiO2: 20 to 70 mass %; Al2O3: more than 0 and 35 mass % or less; MgO: more than 0 and 20 mass % or less; MnO: more than 0 and 5 mass % or less; and one or more members selected from the group consisting of Li2O, Na2O, K2O, BaO, SrO and TiO2: 0.5 to 20 mass % in total.
摘要翻译：本发明提供一种用于机械和结构用途的钢，其通过降低S含量而保持诸如强度的机械性能，并且在用HSS工具进行的间歇切削和用硬质合金工具的连续切削中都具有优异的机械加工性（特别是刀具寿命）。本发明涉及一种含有氧化物夹杂物的机械和结构用钢，其中氧化物夹杂物的平均组成的总质量为100％：CaO：10〜55质量％ SiO 2：20〜70质量％ Al2O3：大于0和35质量％以下; MgO：大于等于0和20质量％ MnO：大于0和5质量％以下; 和选自Li 2 O，Na 2 O，K 2 O，BaO，SrO和TiO 2中的一种以上的成分总计为0.5〜20质量％。

6. 发明授权

US07750950B2 Image pickup apparatus and image processing method 有权
标题翻译：图像拾取装置和图像处理方法
公开(公告)号：US07750950B2
公开(公告)日：2010-07-06
申请号：US11606087
申请日：2006-11-30
申请人： Masaya Tamaru , Koichi Sakamoto , Koji Ichikawa , Masahiko Sugimoto , Manabu Hyodo , Kazuhiko Takemura , Hirokazu Kobayashi
发明人： Masaya Tamaru , Koichi Sakamoto , Koji Ichikawa , Masahiko Sugimoto , Manabu Hyodo , Kazuhiko Takemura , Hirokazu Kobayashi
IPC分类号： H04N9/73
CPC分类号： H04N5/2355 , H04N5/202 , H04N5/235 , H04N9/69 , H04N9/735
摘要： An image combined high sensitivity image and low sensitivity image is provided with well-adjusted white balance and broad dynamic range. The image is obtained by multiplying the combined data by total gain that depends on scene. A white balance is adjusted with gain value calculated from of high output image data. Lv value representing luminance is calculated and compared with a threshold to decide whether or not the high sensitivity image and the low sensitivity image should be combined. First gamma correction unit performs gamma-correction for the image signal derived from the high sensitivity signal with first gamma character, second gamma correction unit performs gamma-correction for the image signal derived from the low sensitivity signal with second gamma character that is different from the first gamma character, and addition unit combines the image signal from the first gamma correction unit and the image signal from the second gamma correction unit.
摘要翻译：组合高灵敏度图像和低灵敏度图像的图像具有良好调整的白平衡和宽动态范围。通过将组合数据乘以取决于场景的总增益来获得图像。用高输出图像数据计算的增益值调整白平衡。计算表示亮度的Lv值并将其与阈值进行比较，以决定是否应该组合高灵敏度图像和低灵敏度图像。第一伽马校正单元对于具有第一伽玛字符的高灵敏度信号导出的图像信号执行伽马校正，第二伽马校正单元对于具有与第一伽玛校正不同的第二伽马字符从低灵敏度信号导出的图像信号进行伽马校正第一伽马字符和加法单元组合来自第一伽马校正单元的图像信号和来自第二伽马校正单元的图像信号。

7. 发明申请

US20100111748A1 HIGH CLEANLINESS SPRING STEEL AND HIGH CLEANLINESS SPRING EXCELLENT IN FATIGUE PROPERTIES 审中-公开
标题翻译：高清洁弹簧钢和高清洁弹性优异的疲劳性能
公开(公告)号：US20100111748A1
公开(公告)日：2010-05-06
申请号：US12683672
申请日：2010-01-07
申请人： Tomoko SUGIMURA , Sei Kimura , Koichi Sakamoto , Atsuhiko Yoshida , Takeshi Inoue
发明人： Tomoko SUGIMURA , Sei Kimura , Koichi Sakamoto , Atsuhiko Yoshida , Takeshi Inoue
IPC分类号： C22C38/46 , C22C38/00 , C22C38/02 , C22C38/12
CPC分类号： F16F1/021 , C21D7/04 , C21D7/06 , C21D2211/004 , C22C38/002 , C22C38/005 , C22C38/02 , C22C38/04 , C22C38/06 , C22C38/08 , C22C38/12 , C22C38/18 , C22C38/24 , C22C38/28 , C22C38/34 , C22C38/40 , C22C38/44 , C22C38/46
摘要： High cleanliness spring steel useful in manufacturing a spring with SiO2-based inclusions being extremely controlled and excellent in fatigue properties is provided.High cleanliness spring steel which is steel containing;C: 1.2% (means mass %, hereafter the same with respect to the component) or below (not inclusive of 0%), Si: 1.2-4%, Mn: 0.1-2.0%, Al: 0.01% or below (not inclusive of 0%), and the balance comprising iron with inevitable impurities, wherein; the total of oxide-based inclusions of 4 or above of L (the large diameter of an inclusion)/D (the short diameter of an inclusion) and 25 μm or above of D and oxide-based inclusions of less than 4 L/D and 25 μm or above of L, in the oxide-based inclusions of 25 mass % or above of oxygen concentration and 70% (means mass %, hereafter the same with respect to inclusions) or above of SiO2 content when Al2O3+MgO+CaO+SiO2+MnO=100% is presumed, out of inclusions in the steel, is 20 nos./500 g or below.
摘要翻译：提供了用于制造具有非常可控且具有优异的疲劳特性的具有SiO 2类夹杂物的弹簧的高清洁度弹簧钢。高清洁弹簧钢是含钢; C：1.2％（表示质量％，以下相对于成分）以下（不包括0％），Si：1.2〜4％，Mn：0.1〜2.0％，Al：0.01％以下包括0％），余量包含铁与不可避免的杂质，其中; D的4以上的氧化物系夹杂物（夹杂物的大直径）/ D（夹杂物的短径）和25μm以上的D和氧化物系夹杂物的氧化物系夹杂物的总和小于4L / D 在25质量％以上的氧浓度的氧化物系夹杂物中，当Al 2 O 3 + MgO + CaO的氧化物系夹杂物为25质量％以上时，相对于夹杂物为70质量％（以下与夹杂物相同） + SiO2 + MnO = 100％，假定钢中的夹杂物为20 nos./500 g以下。

8. 发明申请

US20100024923A1 SI-KILLED STEEL WIRE ROD AND SPRING 有权
标题翻译： SI-KILLED钢丝绳和弹簧
公开(公告)号：US20100024923A1
公开(公告)日：2010-02-04
申请号：US12519179
申请日：2007-12-03
申请人： Tomoko Sugimura , Koichi Sakamoto
发明人： Tomoko Sugimura , Koichi Sakamoto
IPC分类号： C22C38/00
CPC分类号： C21C7/06 , C21C7/04 , C22C38/002 , C22C38/02 , C22C38/04 , C22C38/06 , C22C38/08 , C22C38/12 , C22C38/14 , C22C38/24 , C22C38/26 , C22C38/30 , C22C38/34 , C22C38/46
摘要： A Si-killed steel wire rod for obtaining a spring excellent in fatigue properties and a spring excellent in fatigue properties obtained from such steel wire rod are provided. In the Si-killed steel wire rod of the present invention, oxide-based inclusions present in the wire rod contain SiO2: 30-90%, Al2O3: 2-35%, MgO: 35% or below (not inclusive of 0%), CaO: 50% or below (not inclusive of 0%), MnO: 20% or below (not inclusive of 0%) and BaO: 0.2-20% respectively, and total content of (CaO+MgO) is 3% or above.
摘要翻译：提供一种用于获得疲劳特性优异的弹簧和由这种钢线棒获得的疲劳特性优异的弹簧的Si镇静钢线材。在本发明的Si镇静钢线材中，线材中存在的氧化物系夹杂物含有SiO 2：30〜90％，Al 2 O 3：2-35％，MgO：35％以下（不包括0％），CaO：50％以下（不包括0％），MnO：20％以下（不包括0％）和BaO：0.2〜20％，（CaO + MgO）的总含量为3％以上。

9. 发明授权

US07570883B2 Image pickup method and apparatus with ISO sensitivity setting variable 有权
标题翻译：具有ISO感光度设定变量的图像拾取方法和装置
公开(公告)号：US07570883B2
公开(公告)日：2009-08-04
申请号：US11723695
申请日：2007-03-21
申请人： Koichi Sakamoto
发明人： Koichi Sakamoto
IPC分类号： G03B7/08 , H04N5/235
CPC分类号： G03B7/28 , H04N5/2351
摘要： An image pickup apparatus includes an automatic exposure controller automatically controls ISO sensitivity in response to the output signal of an exposure metering circuit, and controls the exposure so that exposure setting is determined based on the brightness values of both the central photometry area and the remaining photometry area of an imaging frame. The automatic exposure controller controls the exposure setting so that when the ISO sensitivity is set to its higher value, the weighting factor of the central photometry area is higher than that of the remaining photometry area. The automatic exposure controller further determines whether or not a light source is behind an object, and, if it is the case, reduces the adjusted exposure setting so as to increase the amount of light incident on the image pickup apparatus.
摘要翻译：图像拾取装置包括自动曝光控制器，以响应于曝光计量电路的输出信号自动控制ISO感光度，并且控制曝光，使得基于中央测光区域和剩余测光学的亮度值确定曝光设置成像框架的区域。自动曝光控制器控制曝光设置，使得当ISO感光度设置为更高的值时，中央测光区域的加权系数高于其余测光区域的加权系数。自动曝光控制器还确定光源是否在物体后面，并且如果是这种情况，则减小调整的曝光设置以增加入射在图像拾取装置上的光量。

10. 发明申请

US20080208385A1 Semiconductor Manufacturing Apparatus, Method of Detecting Abnormality, Identifying Cause of Abnormality, or Predicting Abnormality in the Semiconductor Manufacturing Apparatus, and Storage Medium Storing Computer Program for Performing the Method 有权
标题翻译：半导体制造装置，检测异常的方法，识别异常原因或预测半导体制造装置中的异常，以及存储介质存储执行方法的计算机程序
公开(公告)号：US20080208385A1
公开(公告)日：2008-08-28
申请号：US11794374
申请日：2005-12-22
申请人： Koichi Sakamoto , Minoru Obata , Noriaki Koyama
发明人： Koichi Sakamoto , Minoru Obata , Noriaki Koyama
IPC分类号： G06F19/00 , H01L21/3065 , H01L21/02
CPC分类号： C23C16/4412 , C23C16/52 , G05B23/0235 , H01L21/67288
摘要： In order to detect an abnormality of semiconductor manufacturing apparatus, a biaxial coordinate system having first and second axes respectively assigned two different monitoring parameters selected from plural apparatus status parameters representing statuses of semiconductor manufacturing apparatus is prepared. As monitoring parameters, for example, a cumulative film thickness for deposition processes that have previously been performed in deposition apparatus and an opening of the pressure control valve located in a vacuum exhaust path to control the internal pressure of a reaction vessel are selected. Values of monitoring parameters obtained when the semiconductor manufacturing apparatus was normally operating are plotted on the biaxial coordinate system. A boundary between a normal condition and an abnormality status is set around a plot group. Values of monitoring parameters obtained during present operation of the semiconductor manufacturing apparatus are plotted on the biaxial coordinate system to determine whether or not there exists an abnormality and identify a type of abnormality based on a positional relation between the plots and the boundary.
摘要翻译：为了检测半导体制造装置的异常，准备了具有第一和第二轴的双轴坐标系分别分配了从表示半导体制造装置的状态的多个装置状态参数中选择的两个不同的监视参数。作为监测参数，例如，选择先前在沉积设备中执行的沉积工艺的累积膜厚度和位于真空排气路径中的压力控制阀的打开以控制反应容器的内部压力。在半导体制造装置正常工作时获得的监视参数的值被绘制在双轴坐标系上。围绕绘图组设定正常状态与异常状态之间的边界。在双轴坐标系上绘制在半导体制造装置的当前操作期间获得的监视参数的值，以基于图和边界之间的位置关系确定是否存在异常并识别异常的类型。

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