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1. 发明申请

US20090130581A1 DEVELOPER COMPOSITION AND METHOD FOR PREPARING THE SAME, AND METHOD FOR FORMING RESIST PATTERN 审中-公开
标题翻译：开发者组合物及其制备方法，以及形成耐蚀图案的方法
公开(公告)号：US20090130581A1
公开(公告)日：2009-05-21
申请号：US11817127
申请日：2006-04-07
申请人： Kaoru Ishikawa , Koichi Misumi , Koji Saito
发明人： Kaoru Ishikawa , Koichi Misumi , Koji Saito
IPC分类号： G03G9/00 , G03F7/20
CPC分类号： G03F7/322
摘要： There is provided a developer composition which can from a good thick-film resist pattern and is less likely to cause frothing. This composition is a developer composition used to form a thick-film resist pattern on a substrate, and contains an organic quaternary ammonium base as a main component, an anionic surfactant represented by the following general formula (I), and a defoaming agent selected from the group consisting of a silicone-based defoaming agent, an alcohol-based defoaming agent and a nonionic surfactant-based defoaming agent: R1 in the formula (I) represents an alkyl or alkoxy group having 5 to 18 carbon atoms; “a” represents 1 or 2; R2 and R3 independently represent an ammonium sulfonate group, a substituted ammonium sulfonate group, or a group represented by the following general formula (II); “b” represents an integer of 0 or 1 to 3; and “c” represents an integer of 1 to 3; and —SO3M (II) wherein M in the formula (II) represents a metal atom.
摘要翻译：提供了可以从良好的厚膜抗蚀剂图案获得并且不太可能引起起泡的显影剂组合物。该组合物是用于在基材上形成厚膜抗蚀剂图案的显影剂组合物，含有有机季铵碱作为主要成分，由以下通式（I）表示的阴离子表面活性剂和选自由硅酮类消泡剂，醇系消泡剂和非离子型表面活性剂类消泡剂组成的组中，式（I）中的R 1表示碳原子数为5〜18的烷基或烷氧基， “a”表示1或2; R2和R3独立地表示磺酸铵基，取代磺酸铵基或由以下通式（II）表示的基团。 “b”表示0或1〜3的整数， “c”表示1〜3的整数，和<？in-line-formula description =“In-line Formulas”end =“lead”？> - SO3M（II）<？in-line-formula description =“In-line Formulas”end =“tail”？> 式（II）中的M表示金属原子。

2. 发明授权

US07871758B2 Process for producing resist pattern and conductor pattern 失效
标题翻译：制造抗蚀剂图案和导体图案的方法
公开(公告)号：US07871758B2
公开(公告)日：2011-01-18
申请号：US11720176
申请日：2005-11-29
申请人： Koichi Misumi , Koji Saito , Kaoru Ishikawa
发明人： Koichi Misumi , Koji Saito , Kaoru Ishikawa
IPC分类号： G03F7/26
CPC分类号： G03F7/0382 , G03F7/11 , H05K3/108 , H05K3/384 , H05K2201/0317
摘要： This process for producing a resist pattern is a process for producing a resist pattern including: the step of laminating (a) a support having an upper surface on which copper exists, (b) an inorganic substance layer consisting of an inorganic substance supplied from an inorganic substance source, and (c) a photoresist layer consisting of a chemically amplified type negative photoresist composition, to obtain a photoresist laminate, the step of selectively irradiating active light or radioactive rays to the photoresist laminate, and the step of developing the (c) photoresist layer together with the (b) inorganic substance layer to form a resist pattern.
摘要翻译：制造抗蚀剂图案的方法是一种抗蚀剂图案的制造方法，包括以下步骤：层叠（a）具有铜的上表面的载体，（b）由无机物质层构成的无机物质层，无机物质源，和（c）由化学放大型负性光致抗蚀剂组合物构成的光致抗蚀剂层，以获得光致抗蚀剂层压体，选择性地将光或放射线照射到光致抗蚀剂层压体上的步骤，以及（c ）光致抗蚀剂层与（b）无机物质层一起形成抗蚀剂图案。

3. 发明申请

US20090226850A1 PROCESS FOR PRODUCING RESIST PATTERN AND CONDUCTOR PATTERN 有权
标题翻译：生产电阻图案和导体图案的方法
公开(公告)号：US20090226850A1
公开(公告)日：2009-09-10
申请号：US11720180
申请日：2005-11-28
申请人： Koichi Misumi , Koji Saito , Kaoru Ishikawa
发明人： Koichi Misumi , Koji Saito , Kaoru Ishikawa
IPC分类号： G03F7/20
CPC分类号： H05K3/108 , G03F7/0397 , G03F7/11 , H05K3/384 , H05K2201/0317
摘要： This process for producing a resist pattern includes: the step of laminating (a) a support having an upper surface on which copper exists, (b) an inorganic substance layer consisting of an inorganic substance supplied from an inorganic substance source, and (c) a photoresist layer consisting of a chemically amplified type positive photoresist composition, to obtain a photoresist laminate, the step of selectively irradiating active light or radioactive rays to said photoresist laminate, and the step of developing said (c) photoresist layer together with said (b) inorganic substance layer to form a resist pattern.
摘要翻译：制造抗蚀剂图案的方法包括：（a）具有铜的上表面的载体的层叠步骤，（b）由无机物质源供给的无机物质构成的无机物质层，（c）由化学放大型正性光致抗蚀剂组合物构成的光致抗蚀剂层，以获得光致抗蚀剂层压体，选择性地向所述光致抗蚀剂层压体照射活性光或放射线的步骤，以及将所述（c）光致抗蚀剂层与所述（b ）无机物质层以形成抗蚀剂图案。

4. 发明授权

US07754416B2 Process for producing resist pattern and conductor pattern 有权
标题翻译：制造抗蚀剂图案和导体图案的方法
公开(公告)号：US07754416B2
公开(公告)日：2010-07-13
申请号：US11720180
申请日：2005-11-28
申请人： Koichi Misumi , Koji Saito , Kaoru Ishikawa
发明人： Koichi Misumi , Koji Saito , Kaoru Ishikawa
IPC分类号： G03F7/26 , G03F7/40
CPC分类号： H05K3/108 , G03F7/0397 , G03F7/11 , H05K3/384 , H05K2201/0317
摘要： This process for producing a resist pattern includes: the step of laminating (a) a support having an upper surface on which copper exists, (b) an inorganic substance layer consisting of an inorganic substance supplied from an inorganic substance source, and (c) a photoresist layer consisting of a chemically amplified type positive photoresist composition, to obtain a photoresist laminate, the step of selectively irradiating active light or radioactive rays to said photoresist laminate, and the step of developing said (c) photoresist layer together with said (b) inorganic substance layer to form a resist pattern.
摘要翻译：制造抗蚀剂图案的方法包括：（a）具有铜的上表面的载体的层叠步骤，（b）由无机物质源供给的无机物质构成的无机物质层，（c）由化学放大型正性光致抗蚀剂组合物构成的光致抗蚀剂层，以获得光致抗蚀剂层压体，选择性地向所述光致抗蚀剂层压体照射活性光或放射线的步骤，以及将所述（c）光致抗蚀剂层与所述（b ）无机物质层以形成抗蚀剂图案。

5. 发明申请

US20080131819A1 Process For Producing Resist Pattern and Conductor Pattern 失效
标题翻译：生产抗蚀剂图案和导体图案的工艺
公开(公告)号：US20080131819A1
公开(公告)日：2008-06-05
申请号：US11720176
申请日：2005-11-29
申请人： Koichi Misumi , Koji Saito , Kaoru Ishikawa
发明人： Koichi Misumi , Koji Saito , Kaoru Ishikawa
IPC分类号： G03F7/26
CPC分类号： G03F7/0382 , G03F7/11 , H05K3/108 , H05K3/384 , H05K2201/0317
摘要： This process for producing a resist pattern is a process for producing a resist pattern including: the step of laminating (a) a support having an upper surface on which copper exists, (b) an inorganic substance layer consisting of an inorganic substance supplied from an inorganic substance source, and (c) a photoresist layer consisting of a chemically amplified type negative photoresist composition, to obtain a photoresist laminate, the step of selectively irradiating active light or radioactive rays to the photoresist laminate, and the step of developing the (c) photoresist layer together with the (b) inorganic substance layer to form a resist pattern.
摘要翻译：制造抗蚀剂图案的方法是一种抗蚀剂图案的制造方法，包括以下步骤：层叠（a）具有铜的上表面的载体，（b）由无机物质层构成的无机物质层，无机物质源，和（c）由化学放大型负性光致抗蚀剂组合物构成的光致抗蚀剂层，以获得光致抗蚀剂层压体，选择性地将光或放射线照射到光致抗蚀剂层压体上的步骤，以及（c ）光致抗蚀剂层与（b）无机物质层一起形成抗蚀剂图案。

6. 发明授权

US07354170B2 Vehicular mirror having tilt angle detection rod with swing axis 有权
标题翻译：车载镜具有摆动轴的倾斜角检测杆
公开(公告)号：US07354170B2
公开(公告)日：2008-04-08
申请号：US11338886
申请日：2006-01-25
申请人： Kaoru Ishikawa
发明人： Kaoru Ishikawa
IPC分类号： G02B7/198 , B60R1/072
CPC分类号： B60R1/072
摘要： In a vehicular mirror device, one end part of an operating shaft disposed on a side opposite to a drive shaft relative to a fulcrum of a mirror holder is swivelably coupled to the mirror holder, and a detection rod of a sensor is coupled to the operating shaft, which is slidably inserted into a guide hole provided in a fixed support member, so that it detects a swing angle of the mirror holder according to an axial position of the operating shaft. The operating shaft is inserted into the guide hole while being supported on the support member so that it can swing around an axis perpendicular to a plane containing a straight line linking a part of the drive shaft that couples the drive shaft to the mirror holder, the fulcrum of the mirror holder, and a part of the operating shaft that couples the operating shaft to the mirror holder. The detection rod, which has an axis coaxial with the swing axis of the operating shaft, is coupled to the operating shaft so that the operating shaft can swing around the swing axis. Thus, the swing angle of the mirror holder can be detected with a high accuracy.
摘要翻译：在车辆用反射镜装置中，与反射镜保持器的支点相对设置在与驱动轴相反的一侧的操作轴的一端部可旋转地联接到反射镜保持器，并且传感器的检测杆与操作轴，其可滑动地插入设置在固定支撑构件中的引导孔中，使得其根据操作轴的轴向位置检测反射镜保持器的摆动角度。操作轴在被支撑在支撑构件上的同时被插入导向孔中，使得其可以围绕垂直于包含将驱动轴的一部分连接到镜支架的直线的平面的轴线摆动，反射镜支架的支点以及将操作轴连接到镜支架的操作轴的一部分。具有与操作轴的摆动轴线同轴的轴线的检测杆联接到操作轴，使得操作轴可绕摆动轴线摆动。因此，可以高精度地检测镜保持器的摆动角度。

7. 发明申请

US20060181793A1 Vehicular mirror device 有权
标题翻译：车载镜装置
公开(公告)号：US20060181793A1
公开(公告)日：2006-08-17
申请号：US11338886
申请日：2006-01-25
申请人： Kaoru Ishikawa
发明人： Kaoru Ishikawa
IPC分类号： G02B7/182
CPC分类号： B60R1/072
摘要： In a vehicular mirror device, one end part of an operating shaft disposed on a side opposite to a drive shaft relative to a fulcrum of a mirror holder is swivelably coupled to the mirror holder, and a detection rod of a sensor is coupled to the operating shaft, which is slidably inserted into a guide hole provided in a fixed support member, so that it detects a swing angle of the mirror holder according to an axial position of the operating shaft. The operating shaft is inserted into the guide hole while being supported on the support member so that it can swing around an axis perpendicular to a plane containing a straight line linking a part of the drive shaft that couples the drive shaft to the mirror holder, the fulcrum of the mirror holder, and a part of the operating shaft that couples the operating shaft to the mirror holder. The detection rod, which has an axis coaxial with the swing axis of the operating shaft, is coupled to the operating shaft so that the operating shaft can swing around the swing axis. Thus, the swing angle of the mirror holder can be detected with a high accuracy.
摘要翻译：在车辆用反射镜装置中，与反射镜保持器的支点相对设置在与驱动轴相反的一侧的操作轴的一端部可旋转地联接到反射镜保持器，并且传感器的检测杆与操作轴，其可滑动地插入设置在固定支撑构件中的引导孔中，使得其根据操作轴的轴向位置检测反射镜保持器的摆动角度。操作轴在被支撑在支撑构件上的同时被插入导向孔中，使得其可以围绕垂直于包含将驱动轴的一部分连接到镜支架的直线的平面的轴线摆动，反射镜支架的支点以及将操作轴连接到镜支架的操作轴的一部分。具有与操作轴的摆动轴线同轴的轴线的检测杆联接到操作轴，使得操作轴可绕摆动轴线摆动。因此，可以高精度地检测镜保持器的摆动角度。

8. 外观设计

USD705144S1 Instrument panel for an automobile 有权
公开(公告)号：USD705144S1
公开(公告)日：2014-05-20
申请号：US29429224
申请日：2012-08-08
申请人： Kaoru Ishikawa , Takashi Ueshin , Ben Uk Chang
设计人： Kaoru Ishikawa , Takashi Ueshin , Ben Uk Chang

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