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    • 2. 发明授权
    • X-ray analyzer and mapping method for an X-ray analysis
    • X射线分析仪和X线分析的绘图方法
    • US08705698B2
    • 2014-04-22
    • US13027881
    • 2011-02-15
    • Hiroshi MatsumuraKiyoshi Hasegawa
    • Hiroshi MatsumuraKiyoshi Hasegawa
    • H05G1/62G01N23/201G06K9/78G06K9/82
    • G01N23/223G01N2223/076G06T7/001G06T2207/10061G06T2207/10121G06T2207/30148
    • Provided are an X-ray analyzer and a mapping method for an X-ray analysis which, in a inspection for a harmful substance contained in, for example, a material or a composite electronic component, enable determination as to whether a sample is normal or abnormal to be performed visually based on an image obtained by the X-ray mapping analysis. In the X-ray analyzer, an X-ray mapping image of a sample which is confirmed to be normal in advance is obtained as a reference mapping image. A mapping analysis is performed on a inspection sample. A difference from the reference mapping image is obtained for each pixel, to thereby display a difference mapping image. A region in which the amount of specific element is larger than a reference amount is displayed with high brightness, and hence an abnormal portion may be easily found.
    • 提供了一种X射线分析仪和用于X射线分析的映射方法,其在包含在例如材料或复合电子部件中的有害物质的检查中能够确定样品是正常还是 基于通过X射线映射分析获得的图像,可视化地进行异常。 在X射线分析装置中,作为基准对照图像,获得确认为正常的样本的X射线映射图像。 对检查样品进行映射分析。 对于每个像素获得与参考映射图像的差异,从而显示差异映射图像。 特定元素的量大于基准量的区域以高亮度显示,因此可能容易发现异常部分。