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1. 发明授权

US06605720B1 Process for making spirolactone compounds 有权
标题翻译：制备螺内酯化合物的方法
公开(公告)号：US06605720B1
公开(公告)日：2003-08-12
申请号：US10349835
申请日：2003-01-23
申请人： Kenji Maeda , Shinji Kato , Takehiko Iida , David M. Tschaen
发明人： Kenji Maeda , Shinji Kato , Takehiko Iida , David M. Tschaen
IPC分类号： C07D491107
CPC分类号： C07D471/10
摘要： This invention relates to processes for making spirolactone compounds analogous to formula I:
摘要翻译：本发明涉及类似于式I的螺内酯化合物的制备方法：

2. 发明授权

US07482449B2 Process for making spirolactone compounds 失效
标题翻译：制备螺内酯化合物的方法
公开(公告)号：US07482449B2
公开(公告)日：2009-01-27
申请号：US12077419
申请日：2008-03-19
申请人： Ralph P. Volante , David M. Tschaen , Steven A. Weissman , Matthew Heileman , Toshiaki Mase , Takehiko Iida , Kenji Maeda , Toshihiro Wada , Hiroki Sato , Kenichi Asakawa
发明人： Ralph P. Volante , David M. Tschaen , Steven A. Weissman , Matthew Heileman , Toshiaki Mase , Takehiko Iida , Kenji Maeda , Toshihiro Wada , Hiroki Sato , Kenichi Asakawa
IPC分类号： C07D405/12 , C07D405/14 , C07D307/94 , C07D491/107
CPC分类号： C07D493/10
摘要： This invention relates to a process for making spirolactone compounds analogous to formula I.
摘要翻译：本发明涉及类似于式I的制备螺内酯化合物的方法。

3. 发明申请

US20080171888A1 Process for making spirolactone compounds 失效
标题翻译：制备螺内酯化合物的方法
公开(公告)号：US20080171888A1
公开(公告)日：2008-07-17
申请号：US12077419
申请日：2008-03-19
申请人： Ralph P. Volante , David M. Tschaen , Steven A. Weissman , Matthew Heileman , Toshiaki Mase , Takehiko Iida , Kenji Maeda , Toshihiro Wada , Hiroki Sato , Kenichi Asakawa
发明人： Ralph P. Volante , David M. Tschaen , Steven A. Weissman , Matthew Heileman , Toshiaki Mase , Takehiko Iida , Kenji Maeda , Toshihiro Wada , Hiroki Sato , Kenichi Asakawa
IPC分类号： C07D325/00
CPC分类号： C07D493/10
摘要： This invention relates to a process for making spirolactone compounds analogous to formula I.
摘要翻译：本发明涉及类似于式I的制备螺内酯化合物的方法。

4. 发明授权

US07368569B2 Process for making spirolactone compounds 有权
标题翻译：制备螺内酯化合物的方法
公开(公告)号：US07368569B2
公开(公告)日：2008-05-06
申请号：US10531361
申请日：2003-10-14
申请人： Ralph P. Volante , David M. Tschaen , Steven A. Weissman , Matthew Heileman , Toshiaki Mase , Takehiko Iida , Kenji Maeda , Toshihiro Wada , Hiroki Sato , Kenichi Asakawa
发明人： Ralph P. Volante , David M. Tschaen , Steven A. Weissman , Matthew Heileman , Toshiaki Mase , Takehiko Iida , Kenji Maeda , Toshihiro Wada , Hiroki Sato , Kenichi Asakawa
IPC分类号： C07D405/12 , C07D405/14 , C07D307/94 , C07D491/107
CPC分类号： C07D493/10
摘要： This invention relates to a process for making spirolactone compounds analogous to formula I
摘要翻译：本发明涉及制备类似于式I的螺内酯化合物的方法

5. 发明申请

US20060014950A1 Process for Making Spirolactone Compounds 有权
标题翻译：制备螺内酯化合物的方法
公开(公告)号：US20060014950A1
公开(公告)日：2006-01-19
申请号：US10531361
申请日：2003-10-14
申请人： Ralph Volante , David Tschaen , Steven Weissman , Mathew Heileman , Toshiaki Mase , Takehiko Iida , Kenji Maeda , Toshihiro Wada , Hiroki Sato , Kenichi Asakawa
发明人： Ralph Volante , David Tschaen , Steven Weissman , Mathew Heileman , Toshiaki Mase , Takehiko Iida , Kenji Maeda , Toshihiro Wada , Hiroki Sato , Kenichi Asakawa
IPC分类号： C07D487/10 , C07D491/10
CPC分类号： C07D493/10
摘要： This invention relates to a process for making spirolactone compounds analogous to formula I.
摘要翻译：本发明涉及类似于式I的制备螺内酯化合物的方法。

6. 发明申请

US20060241299A1 Process for making spirolactone compounds 审中-公开
标题翻译：制备螺内酯化合物的方法
公开(公告)号：US20060241299A1
公开(公告)日：2006-10-26
申请号：US10550136
申请日：2004-05-14
申请人： Ralph Volante , Steven Weissman , Takehiko Iida , Yuhei Yamamoto , Hiroki Sato , Kenji Maeda , Naotaka Sawada , Toshiaki Mase
发明人： Ralph Volante , Steven Weissman , Takehiko Iida , Yuhei Yamamoto , Hiroki Sato , Kenji Maeda , Naotaka Sawada , Toshiaki Mase
IPC分类号： C07D491/10
CPC分类号： C07D491/10
摘要： This invention relates to a process for making spirolactone compounds of general formula I, having an improved IA/IB ratio, according to the following shceme.
摘要翻译：本发明涉及按照下列方法制备具有改进的IA / IB比的通式Ⅰ的己内酯化合物的方法。

7. 发明申请

US20140139915A1 IMAGE DISPLAY APPARATUS 审中-公开
标题翻译：图像显示设备
公开(公告)号：US20140139915A1
公开(公告)日：2014-05-22
申请号：US14131169
申请日：2012-07-06
申请人： Yuichi Sato , Kenji Maeda , Masayuki Natsumi , Tatsuo Watanabe , Kazuya Takayama , Takashi Yasumoto , Yoshimitsu Inamori
发明人： Yuichi Sato , Kenji Maeda , Masayuki Natsumi , Tatsuo Watanabe , Kazuya Takayama , Takashi Yasumoto , Yoshimitsu Inamori
IPC分类号： G02B27/22
CPC分类号： G02B27/2214 , G03B35/24 , G09G3/003 , G09G3/20 , G09G3/3607 , H04N13/305 , H04N13/324
摘要： An image display apparatus having sub-pixels of four colors is provided in which the resolution when an image is two-dimensionally displayed is not affected, and deterioration in the color balance of a three-dimensionally displayed image is suppressed. In the image display apparatus, the arrangement of a sub-pixel for displaying red for a left eye and a sub-pixel for displaying green for a right eye has been replaced with the arrangement of a sub-pixel (Lg1) for displaying green for the left eye and a sub-pixel (Rr1) for displaying red for the right eye. The arrangement of a sub-pixel for displaying blue for the left eye and a sub-pixel for displaying yellow for the right eye has been replaced with the arrangement of a sub-pixel (Lx1) for displaying yellow for the left eye and a sub-pixel (Rb1) for displaying blue for the right eye. Replacement with the sub-pixel and the sub-pixel and replacement with the sub-pixel and the sub-pixel are made for every other pixel.
摘要翻译：提供一种具有四色子像素的图像显示装置，其中不影响图像二维显示时的分辨率，并且抑制三维显示图像的色平衡劣化。在图像显示装置中，用于显示用于左眼的红色的子像素和用于显示用于右眼的绿色的子像素的布置已被替换为用于显示绿色的子像素（Lg1）左眼和用于右眼显示红色的子像素（Rr1）。用于显示用于左眼的蓝色的子像素和用于显示用于右眼的黄色的子像素的布置已被替换为用于显示用于左眼的黄色的子像素（Lx1）和用于显示黄色的子像素用于显示右眼的蓝色的像素（Rb1）。使用子像素和子像素进行替换，并且对于每个其他像素进行子像素和子像素的替换。

8. 发明申请

US20140120185A1 COMBINATIONS COMPRISING BREXPIPRAZOLE OR A SALT THEREOF AND A SECOND DRUG FOR USE IN THE TREATMENT OF A CNS DISORDER 审中-公开
标题翻译：包含吡喹酮或其盐的组合和用于治疗CNS疾病的第二种药物
公开(公告)号：US20140120185A1
公开(公告)日：2014-05-01
申请号：US14009436
申请日：2012-04-04
申请人： Tsuyoshi Hirose , Kenji Maeda , Tetsuro Kikuchi , Masafumi Toda
发明人： Tsuyoshi Hirose , Kenji Maeda , Tetsuro Kikuchi , Masafumi Toda
IPC分类号： A61K31/496 , A61K45/06
CPC分类号： A61K31/496 , A61K9/20 , A61K31/135 , A61K31/137 , A61K31/138 , A61K31/15 , A61K31/165 , A61K31/343 , A61K31/381 , A61K31/4525 , A61K31/5513 , A61K45/06 , A61K2300/00
摘要： The present invention provides a medicament having a wider treatment spectrum, causing a fewer side effects and superior in tolerability and safety, as compared to known typical antipsychotic agents and atypical antipsychotic agents. The present invention related to a medicament containing (I) a compound which is 7-[4-(4-benzo[b]thiophen-4-yl-piperazin-1-yl)butoxy]-1H-quinolin-2-one or a salt thereof, and (II) at least one drug selected from the group consisting of a mood stabilizer, a serotonin reuptake inhibitor, a norepinephrine reuptake inhibitor, a serotonin and norepinephrine reuptake inhibitor, a noradrenergic and specific serotonergic antidepressant, an antianxiety drug, a tricyclic antidepressant, a tetracyclic antidepressant, an antipsychotic drug and an anti-ADHD drug, in combination.
摘要翻译：与已知的典型抗精神病药和非典型抗精神病药相比，本发明提供了具有更宽治疗谱的药物，其副作用较小，耐受性和安全性优异。本发明涉及含有（I）7- [4-（4-苯并[b]噻吩-4-基 - 哌嗪-1-基）丁氧基] -1H-喹啉-2-酮的化合物或其盐，和（II）选自情绪稳定剂，5-羟色胺再摄取抑制剂，去甲肾上腺素再摄取抑制剂，5-羟色胺和去甲肾上腺素再摄取抑制剂，去甲肾上腺素能和特异性5-羟色胺能抗抑郁药，抗焦虑药物，三环抗抑郁药，四环抗抑郁药，抗精神病药和抗ADHD药。

9. 发明授权

US08704429B2 Bismuth iron oxide powder, manufacturing method for the bismuth iron oxide powder, dielectric ceramics, piezoelectric element, liquid discharge head, and ultrasonic motor 有权
标题翻译：氧化铁铋粉，氧化铁铋粉末，电介质陶瓷，压电元件，液体排出头，超声波电机的制造方法
公开(公告)号：US08704429B2
公开(公告)日：2014-04-22
申请号：US13045118
申请日：2011-03-10
申请人： Hisato Yabuta , Makoto Kubota , Mikio Shimada , Kenji Takashima , Fumio Uchida , Kenji Maeda , Chiemi Shimizu
发明人： Hisato Yabuta , Makoto Kubota , Mikio Shimada , Kenji Takashima , Fumio Uchida , Kenji Maeda , Chiemi Shimizu
IPC分类号： H01L41/187
CPC分类号： C01G49/02 , B82Y30/00 , C01G29/00 , C01G49/0018 , C01P2002/34 , C01P2002/60 , C01P2002/72 , C01P2002/76 , C01P2004/04 , C01P2004/10 , C01P2004/82 , C01P2006/60 , C04B35/26 , C04B2235/3298 , C04B2235/5445 , C04B2235/5454 , C04B2235/76 , C04B2235/768 , C04B2235/80 , C04B2235/85 , H01L41/1878 , H01L41/43
摘要： Provided is a lead-free dielectric ceramics having a low leakage current value, and a bismuth iron oxide powder as a raw material thereof. The bismuth iron oxide powder includes at least: (A) grains including a bismuth iron oxide having a perovskite-type crystal structure; (B) grains including a bismuth iron oxide having a crystal structure classified to a space group Pbam; and (C) grains including a bismuth iron oxide or a bismuth oxide having a crystal structure that is classified to a space group I23. The dielectric ceramics are made of bismuth iron oxide in which the bismuth iron oxide crystals having the crystal structure classified to the space group Pbam are distributed at a grain boundary of crystal grains of the bismuth iron oxide crystals having the perovskite-type crystal structure.
摘要翻译：提供具有低漏电流值的无铅电介质陶瓷和作为其原料的氧化铋铁粉末。氧化铋粉末至少包括：（A）包含具有钙钛矿型晶体结构的氧化铋的晶粒; （B）包含具有分类为空间群Pbam的晶体结构的氧化铋的晶粒; 和（C）包含分类为空间群I23的具有晶体结构的氧化铋铁或氧化铋的晶粒。介电陶瓷由氧化铋铁氧化物制成，其中具有分类为空间群Pbam的晶体结构的氧化铋晶体分布在具有钙钛矿型晶体结构的氧化铋晶体的晶粒的晶界处。

10. 发明授权

US08496781B2 Plasma processing apparatus 有权
标题翻译：等离子体处理装置
公开(公告)号：US08496781B2
公开(公告)日：2013-07-30
申请号：US11182793
申请日：2005-07-18
申请人： Kenetsu Yokogawa , Kenji Maeda , Masaru Izawa
发明人： Kenetsu Yokogawa , Kenji Maeda , Masaru Izawa
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306 , H05B31/26
CPC分类号： H01J37/32174 , H01J37/32082
摘要： The invention provides a plasma processing apparatus which is based upon a dry etching apparatus and which can inhibit the contamination of a work piece caused by sputtering onto a wall of a vacuum chamber, the occurrence of a foreign matter, the increase of a running cost for replacing the walls of the vacuum chamber and the deterioration of a rate of operation. The plasma processing apparatus according to the invention is based upon the dry etching apparatus having parallel plate structure and is characterized in that a low-pass filter having high impedance to a frequency of a high frequency power source for generating discharge, having small resistance to direct current and grounded is connected to an electrode for generating discharge which is arranged in a position opposite to the work piece and to which the high frequency power source for generating discharge is connected or a low-pass filter having small resistance to direct current and grounded and a direct-current power source connected in series with it are connected to the electrode for generating discharge.
摘要翻译：本发明提供了一种基于干蚀刻装置的等离子体处理装置，其可以抑制由溅射引起的工件对真空室的壁的污染，异物的发生，运行成本的增加更换真空室的壁和操作速度的恶化。根据本发明的等离子体处理装置基于具有平行板结构的干式蚀刻装置，其特征在于，具有高阻抗频率的低通滤波器，用于产生放电的高频电源的频率，具有较小的直接阻抗电流和接地连接到用于产生放电的电极，其布置在与工件相对的位置，并且用于产生放电的高频电源被连接到该电极上，或者具有对直流电阻和接地电阻小的低通滤波器，与其串联连接的直流电源连接到用于产生放电的电极。

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