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1. 发明授权

US07705983B2 Wavelength displacement correcting system 有权
标题翻译：波长位移校正系统
公开(公告)号：US07705983B2
公开(公告)日：2010-04-27
申请号：US12020797
申请日：2008-01-28
申请人： Kenji Imura , Takeshi Matsumoto
发明人： Kenji Imura , Takeshi Matsumoto
IPC分类号： G01J3/28
CPC分类号： G01J3/18 , G01J3/02 , G01J3/027 , G01J3/28 , G01J3/2803 , G01J2003/2866
摘要： A wavelength displacement correcting system and method where a monochromatic beam from an LED is incident through an incident slit of a spectral device and is diffracted on a diffraction grating to form a dispersed light image. Information relating to the dispersed light image is outputted and a wavelength displacement is calculated, using a forward voltage value corresponding to the constant current, and a forward voltage initial value. Wavelength displacement amounts of at least two diffracted beams are calculated, using output values of the at least two diffracted beams, and diffracted beam output initial values with respect to the dispersed light image. A dispersion width is calculated, using the calculated wavelength displacement amount of the beam, and the calculated wavelength displacement amounts of at least two diffracted beams.
摘要翻译：一种波长位移校正系统和方法，其中来自LED的单色光束通过光谱器件的入射狭缝入射并衍射在衍射光栅上以形成分散的光图像。输出与分散的光图像相关的信息，并且使用与恒定电流对应的正向电压值和正向电压初始值来计算波长位移。使用至少两个衍射光束的输出值和相对于分散光图像的衍射光束输出初始值来计算至少两个衍射光束的波长位移量。使用计算出的波束位移量和至少两个衍射光束的计算波长位移量来计算色散宽度。

2. 发明申请

US20080212092A1 WAVELENGTH DISPLACEMENT CORRECTING SYSTEM 有权
标题翻译：波长偏移校正系统
公开(公告)号：US20080212092A1
公开(公告)日：2008-09-04
申请号：US12020797
申请日：2008-01-28
申请人： Kenji IMURA , Takeshi Matsumoto
发明人： Kenji IMURA , Takeshi Matsumoto
IPC分类号： G01J3/28
CPC分类号： G01J3/18 , G01J3/02 , G01J3/027 , G01J3/28 , G01J3/2803 , G01J2003/2866
摘要： In a wavelength displacement correcting system and method of the invention, a monochromatic beam from a light emitting diode driven by a constant current is incident through an incident slit of a spectral device. The incident beam is diffracted on a diffraction grating to form a dispersed light image, and information relating to the dispersed light image of the incident slit is outputted from the spectral device. A wavelength displacement amount of the monochromatic beam is calculated, using a forward voltage value corresponding to the constant current, and a forward voltage initial value. Wavelength displacement amounts of at least two diffracted beams are calculated, using output values of the at least two diffracted beams, and diffracted beam output initial values with respect to the dispersed light image. A dispersion width displacement amount of the spectral device is calculated, using the calculated wavelength displacement amount of the monochromatic beam, and the calculated wavelength displacement amounts of at least two diffracted beams, whereby a wavelength displacement of the spectral device is corrected.
摘要翻译：在本发明的波长位移校正系统和方法中，来自由恒定电流驱动的发光二极管的单色光束通过光谱器件的入射狭缝入射。入射光束在衍射光栅上衍射以形成分散的光图像，并且从光谱装置输出与入射狭缝的分散光图像有关的信息。使用与恒定电流对应的正向电压值和正向电压初始值来计算单色光束的波长位移量。使用至少两个衍射光束的输出值和相对于分散光图像的衍射光束输出初始值来计算至少两个衍射光束的波长位移量。使用所计算的单色光束的波长位移量和所计算的至少两个衍射光束的波长位移量来计算光谱器件的色散宽度位移量，从而校正光谱器件的波长位移。

3. 发明授权

US08243261B2 Optical property measurement apparatus 有权
标题翻译：光学性能测量仪器
公开(公告)号：US08243261B2
公开(公告)日：2012-08-14
申请号：US12587518
申请日：2009-10-07
申请人： Takeshi Matsumoto , Shinji Yamamoto , Kenji Imura , Kazuya Kiyoi , Yoshiyuki Nagashima , Yasushi Goto
发明人： Takeshi Matsumoto , Shinji Yamamoto , Kenji Imura , Kazuya Kiyoi , Yoshiyuki Nagashima , Yasushi Goto
IPC分类号： G01J1/42 , G01J3/46
CPC分类号： G01J3/02 , G01J3/0291 , G01J3/506
摘要： An optical property measurement apparatus includes: a main body which includes a plane-shape surface that is so disposed as to face the display portion; an optical sensor which receives light directed from an opening that is formed through the plane-shape surface; and a support portion which is disposed on a side of the plane-shape surface and keeps a constant distance between the display portion and the plane-shape surface; wherein a light shield portion that is so disposed as to enclose a circumferential area of the opening of the plane-shape surface and shields entrance of light from a region other than a measurement target region of the display portion when the optical property is measured.
摘要翻译：光学特性测量装置包括：主体，其包括面对显示部分的平面形状表面; 接收从通过所述平面形状表面形成的开口指向的光的光学传感器; 以及支撑部，其设置在所述平面形状表面的一侧，并且在所述显示部和所述平面形状表面之间保持恒定的距离; 其特征在于，在测量所述光学特性时，所述遮光部被设置成包围所述平面形状面的开口的周向区域，并遮蔽来自所述显示部的测量对象区域以外的区域的光的入射。

4. 发明申请

US20100091270A1 Optical property measurement apparatus 有权
标题翻译：光学性能测量仪器
公开(公告)号：US20100091270A1
公开(公告)日：2010-04-15
申请号：US12587518
申请日：2009-10-07
申请人： Takeshi Matsumoto , Shiniji Yamamoto , Kenji Imura , Kazuya Kiyoi , Yoshiyuki Nagashima , Yasushi Goto
发明人： Takeshi Matsumoto , Shiniji Yamamoto , Kenji Imura , Kazuya Kiyoi , Yoshiyuki Nagashima , Yasushi Goto
IPC分类号： G01J1/42
CPC分类号： G01J3/02 , G01J3/0291 , G01J3/506
摘要： An optical property measurement apparatus includes: a main body which includes a plane-shape surface that is so disposed as to face the display portion; an optical sensor which receives light directed from an opening that is formed through the plane-shape surface; and a support portion which is disposed on a side of the plane-shape surface and keeps a constant distance between the display portion and the plane-shape surface; wherein a light shield portion that is so disposed as to enclose a circumferential area of the opening of the plane-shape surface and shields entrance of light from a region other than a measurement target region of the display portion when the optical property is measured.
摘要翻译：光学特性测量装置包括：主体，其包括面对显示部分的平面形状表面; 接收从通过所述平面形状表面形成的开口指向的光的光学传感器; 以及支撑部，其设置在所述平面形状表面的一侧，并且在所述显示部和所述平面形状表面之间保持恒定的距离; 其特征在于，在测量所述光学特性时，所述遮光部被设置成包围所述平面形状面的开口的周向区域，并遮蔽来自所述显示部的测量对象区域以外的区域的光的入射。

5. 发明授权

US08830004B2 Crystal resonator and crystal oscillator 有权
标题翻译：水晶谐振器和晶振
公开(公告)号：US08830004B2
公开(公告)日：2014-09-09
申请号：US13559601
申请日：2012-07-27
申请人： Mitsuaki Koyama , Toshihiko Kagami , Takeshi Matsumoto , Takeru Mutoh , Manabu Ishikawa , Shinichi Sato
发明人： Mitsuaki Koyama , Toshihiko Kagami , Takeshi Matsumoto , Takeru Mutoh , Manabu Ishikawa , Shinichi Sato
IPC分类号： H03H9/19 , G01N5/02 , H03H3/02 , H03H9/02
CPC分类号： H03H3/02 , H03H9/02 , H03H9/02086 , H03H9/542 , H03H9/566 , H03L1/023 , H03L1/028
摘要： A crystal resonator comprises a first vibrating region provided on a crystal wafer, a second vibrating region provided on the crystal wafer, the second vibrating region having a different thickness and positive/negative orientation of the X-axis from those of the first vibrating region, and excitation electrodes which are provided respectively on the first vibrating region and the second vibrating region for causing the vibrating regions to vibrate independently. Frequencies that change by different amounts from each other relative to a temperature change can be retrieved from one vibrating region and the other vibrating region. Thus, based on an oscillating frequency of the vibrating region in which a clear frequency change occurs relative to the temperature, the oscillating frequency of the other vibrating region can be controlled. Thereby, increases in the complexity of the crystal oscillator can be suppressed.
摘要翻译：晶体谐振器包括设置在晶体晶片上的第一振动区域，设置在晶体晶片上的第二振动区域，第二振动区域具有与第一振动区域不同的X轴的厚度和正/负取向，以及分别设置在第一振动区域和第二振动区域上用于使振动区域独立振动的激励电极。可以从一个振动区域和另一个振动区域检索相对于温度变化彼此变化的频率。因此，基于相对于温度发生明显的频率变化的振动区域的振荡频率，可以控制另一个振动区域的振荡频率。由此，可以抑制晶体振荡器的复杂性的增加。

6. 发明授权

US08824842B2 Optical semiconductor device and method for fabricating the optical semiconductor device 有权
标题翻译：光半导体装置及其制造方法
公开(公告)号：US08824842B2
公开(公告)日：2014-09-02
申请号：US13043277
申请日：2011-03-08
申请人： Takeshi Matsumoto
发明人： Takeshi Matsumoto
IPC分类号： G02B6/34 , H01L33/00 , G02B6/12 , H01S5/22 , G02B6/124 , H01L21/02 , B82Y20/00 , H01S5/12 , H01S5/32 , H01S5/34
CPC分类号： H01S5/0268 , B82Y20/00 , G02B6/12007 , G02B6/124 , H01L21/02395 , H01L21/02463 , H01L21/02507 , H01L21/02513 , H01L21/02546 , H01L21/02576 , H01L21/02579 , H01L21/02639 , H01S5/1218 , H01S5/1231 , H01S5/2201 , H01S5/3202 , H01S5/3412 , H01S2304/04
摘要： An optical semiconductor device, includes: a plurality of first diffraction grating layers disposed at a spacing from each other along first direction above first semiconductor layer, length of a lower surface of each of a plurality of first diffraction gratings along first direction being longer than a length of an upper surface of first diffraction grating; second diffraction grating layer disposed along first direction above first semiconductor layer, first and second diffraction grating layers being alternately disposed at a spacing from each other, a length of an upper surface of second diffraction grating layer along first direction being longer than the length of a lower surface of second diffraction layer; a diffraction grating including first and second diffraction grating layers; a second semiconductor layer disposed between first and second diffraction grating layers and under second diffraction grating layer; and third semiconductor layer disposed on first and second diffraction grating layers.
摘要翻译：一种光学半导体器件，包括：多个第一衍射光栅层，沿着第一半导体层上的第一方向彼此间隔设置，多个第一衍射光栅中的每一个的第一方向的下表面的长度比第一方向长第一衍射光栅的上表面的长度; 第二衍射光栅层，沿着第一方向上的第一方向设置，第一和第二衍射光栅层以彼此间隔交替地设置，第二衍射光栅层的沿第一方向的上表面的长度比第一方向的长度长第二衍射层的下表面; 包括第一和第二衍射光栅层的衍射光栅; 第二半导体层，设置在第一和第二衍射光栅层之间并位于第二衍射光栅层之下; 以及设置在第一和第二衍射光栅层上的第三半导体层。

7. 发明申请

US20110206486A1 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD 有权
标题翻译：基板处理装置和基板处理方法
公开(公告)号：US20110206486A1
公开(公告)日：2011-08-25
申请号：US12971171
申请日：2010-12-17
申请人： Kenichirou MATSUYAMA , Takeshi Matsumoto
发明人： Kenichirou MATSUYAMA , Takeshi Matsumoto
IPC分类号： H01L21/67
CPC分类号： H01L21/67225 , H01L21/67196
摘要： Even when a module constituting a multi-module becomes an unavailable module, transfer of substrates can be promptly performed, while restricting generation of inferior products. When a destination module of a multi-module becomes unavailable before a substrate is transferred to the destination module, a destination of the substrate is changed to a module to which a substrate subsequent to the substrate is to be loaded. Upon generation of an unavailable module, before the transfer unit accesses the module on an upstream end of the transfer cycle, the transfer cycle proceeds until a precedent substrate becomes ready to be unloaded from the changed destination module. Alternatively, upon generation of an unavailable module, when the transfer unit is located on an upstream side of the unavailable module in the transfer cycle, the transfer operation of the transfer unit is made standby until a precedent substrate becomes ready to be unloaded in the changed destination module.
摘要翻译：即使构成多模块的模块成为不可用模块，也可以迅速地进行基板的转印，同时限制劣质产品的产生。当在将基板传送到目的地模块之前，多模块的目的地模块变得不可用时，将基板的目的地改变为要在基板之后的基板被加载到的模块。在生成不可用模块之前，在传送单元在传送周期的上游端访问模块之前，传送周期继续进行，直到先前的基板准备好从改变的目的地模块卸载。或者，当生成不可用模块时，当传送单元位于传送周期中的不可用模块的上游侧时，传送单元的传送操作被备用直到先前的基板准备好在改变后的装载中被卸载目的地模块。

8. 发明授权

US07886314B2 Disk device, shutter control device, and computer program for shutter opening/closing control 失效
标题翻译：磁盘设备，快门控制装置和用于快门打开/关闭控制的计算机程序
公开(公告)号：US07886314B2
公开(公告)日：2011-02-08
申请号：US11886881
申请日：2006-03-27
申请人： Hiroyuki Matsumoto , Takeshi Matsumoto , Katsunori Tamamura , Takao Yoshida , Fumito Inaba , Makoto Ikehata
发明人： Hiroyuki Matsumoto , Takeshi Matsumoto , Katsunori Tamamura , Takao Yoshida , Fumito Inaba , Makoto Ikehata
IPC分类号： G11B33/02
CPC分类号： G11B17/0405 , G11B17/0407
摘要： To assuredly determine whether a shutter pinches a disk in a disk device including a shutter at a disk insertion slot. A shutter control device 10 includes a pinch determining unit 14 that determines whether the disk is pinched by the shutter based on a position of the shutter during a process of closing the shutter, and a sensitivity changing unit that sets sensitivity of determination to be high as ambient temperature of a shutter driving mechanism increases.
摘要翻译：为了确定地确定快门是否在包括盘插入槽的快门的盘装置中夹住盘。快门控制装置10包括捏合确定单元14，其确定在关闭快门的过程期间基于快门的快门的盘被盘夹住;以及灵敏度改变单元，其将确定的灵敏度设置为高，如快门驱动机构的环境温度升高。

9. 发明申请

US20100003202A1 Ultraviolet screening agent for cosmetics and cosmetics using the same 审中-公开
标题翻译：用于化妆品和化妆品的紫外线屏蔽剂使用它们
公开(公告)号：US20100003202A1
公开(公告)日：2010-01-07
申请号：US12310995
申请日：2007-09-12
申请人： Takeshi Matsumoto , Hideo Oka , Jun Yamashita
发明人： Takeshi Matsumoto , Hideo Oka , Jun Yamashita
IPC分类号： A61K8/19 , A61K8/27 , A61K8/29 , A61K8/28
CPC分类号： A61Q17/04 , A61K8/027 , A61K8/04 , A61K8/11 , A61K8/19 , A61K8/27 , A61K8/28 , A61K8/29 , A61K8/8147 , A61K8/8152 , A61K2800/413 , C01G9/02 , C01G23/047 , C01G25/02 , C01G49/02 , C01P2006/22 , C09C1/3676 , C09C1/3684 , C09C1/3692 , C09C3/006 , C09C3/10 , C09C3/12
摘要： An ultraviolet screening agent for cosmetics, including polymer-coated metal oxide fine particles produced by coating, with silica as a first layer, the surface of each of at least one kind of metal oxide fine particles selected from the group consisting of zinc oxide fine particles, titanium oxide fine particles, cerium oxide fine particles, zirconium oxide fine particles, and iron oxide fine particles, a primary particle diameter of which fine particles is not smaller than 1 nm and not greater than 100 nm, and coating the outside of the first layer with a polymer as a second layer; and cosmetics using the ultraviolet screening agent.
摘要翻译：一种用于化妆品的紫外线屏蔽剂，包括通过涂覆制备的聚合物涂覆的金属氧化物细颗粒，以二氧化硅为第一层，选自氧化锌细颗粒中的至少一种金属氧化物细颗粒中的每一种的表面，氧化钛微粒，氧化铈微粒，氧化锆微粒，氧化铁微粒等，一次粒径为1nm以上且100nm以下的一次粒径，涂布在第一层，聚合物作为第二层; 和使用紫外线屏蔽剂的化妆品。

10. 发明申请

US20090221142A1 Method of forming a metal bump on a semiconductor device 有权
标题翻译：在半导体器件上形成金属凸块的方法
公开(公告)号：US20090221142A1
公开(公告)日：2009-09-03
申请号：US12453299
申请日：2009-05-06
申请人： Takeshi Matsumoto
发明人： Takeshi Matsumoto
IPC分类号： H01L21/768
CPC分类号： H01L24/13 , H01L22/34 , H01L24/11 , H01L2223/5446 , H01L2224/05567 , H01L2224/05573 , H01L2224/05624 , H01L2224/11464 , H01L2224/13099 , H01L2224/13155 , H01L2224/85447 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01029 , H01L2924/0103 , H01L2924/01033 , H01L2924/01078 , H01L2924/01079 , H01L2924/14 , H01L2924/00014
摘要： An uppermost one of multilayered electrode pads, on which a bump and a plating coat will be formed, is made of metal having high ionization tendency, particularly, Al. On the other hand, an uppermost one of multilayered electrode pads, on which none of the bump and the plating coat will be formed, is made of metal having low ionization tendency, particularly, Cu.
摘要翻译：其上形成有凸起和镀覆层的多层电极焊盘中最上方的电极由具有高电离倾向的金属，特别是Al制成。另一方面，不会形成凸起和镀覆层的多层电极焊盘的最上面的一个由离子化倾向低的金属，特别是Cu构成。

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