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1. 发明授权

US06921567B2 Disk recording medium 失效
标题翻译：磁盘记录介质
公开(公告)号：US06921567B2
公开(公告)日：2005-07-26
申请号：US10166746
申请日：2002-06-12
申请人： Kengo Oishi , Shinichi Kato , Yasushi Endo
发明人： Kengo Oishi , Shinichi Kato , Yasushi Endo
IPC分类号： G11B7/24097 , G11B7/258 , G11B7/2585 , B32B3/02
CPC分类号： G11B7/252 , G11B7/24097 , G11B7/256 , G11B7/2585 , Y10T428/21
摘要： A disk recording medium of the present invention comprises an antimicrobial agent and an antifungal agent.
摘要翻译：本发明的盘记录介质包含抗微生物剂和抗真菌剂。

2. 发明申请

US20050210497A1 Disk cartridge 审中-公开
标题翻译：磁盘盒
公开(公告)号：US20050210497A1
公开(公告)日：2005-09-22
申请号：US11078679
申请日：2005-03-14
申请人： Kengo Oishi , Shinichi Kato
发明人： Kengo Oishi , Shinichi Kato
IPC分类号： G11B23/03
CPC分类号： G11B23/0308 , G11B23/0317
摘要： A disk cartridge includes: a disk medium on one face of which a recording surface is formed and on the other face of which a non-recording surface is formed; a casing having a disk opening which allows removal of the disk medium, exposing the non-recording surface, and an opening which allows access to the recording surface, being opened and closed by a shutter member; and a disk holder which is rotatably provided in the casing, and which presses and holds the non-recording surface when the disk medium is in storage, and is separated from the non-recording surface when the disk medium is in operation and when taken out, the disk holder being configured such that it will not protrude over the top surface of the casing, when viewed from the side, except when the disk medium is to be taken out.
摘要翻译：磁盘盒包括：一个表面上形成记录表面的磁盘介质，在其另一个面上形成非记录表面; 壳体，其具有允许去除盘介质，暴露非记录表面的盘开口和允许通过挡板构件打开和关闭的允许进入记录表面的开口; 以及盘保持器，其可旋转地设置在壳体中，并且当盘介质被存储时按压并保持非记录表面，并且当盘介质在操作中并且被取出时与非记录表面分离所述盘保持器被配置为使得当从所述侧面观察时，所述盘保持器不会突出到所述壳体的顶表面上，除了当所述盘介质被取出时。

3. 发明授权

US6018446A Magnetic disc cartridge with shutter spring 失效
标题翻译：带快门弹簧的磁盘盒
公开(公告)号：US6018446A
公开(公告)日：2000-01-25
申请号：US072727
申请日：1998-05-06
申请人： Shinichi Kato , Akira Inaba , Kengo Oishi
发明人： Shinichi Kato , Akira Inaba , Kengo Oishi
IPC分类号： G11B23/033 , G11B23/03
CPC分类号： G11B23/0308
摘要： In a magnetic disc cartridge, a magnetic disc is contained for rotation in a casing which is provided with a magnetic head insertion opening and a shutter member for opening and closing the magnetic head insertion opening. The shutter member is urged by a shutter spring to a closing position in which it closes the magnetic head insertion opening. The shutter spring is formed of a coiled metal spring which is engaged with the casing at one end and with the shutter member at the other end and urges the shutter member to the closing position under its resiliency generated by deflection thereof.
摘要翻译：在磁盘盒中，磁盘被容纳在设置有磁头插入口的壳体中，以及用于打开和关闭磁头插入口的活门构件。活门构件被快门弹簧推压到关闭位置，在关闭位置关闭磁头插入口。闸板弹簧由螺旋金属弹簧形成，该螺旋金属弹簧在一端处与壳体接合并且在另一端处与闸板构件接合并且在其由其偏转产生的弹性下将闸板构件推动到关闭位置。

4. 发明授权

US09434005B2 Pb-free copper-alloy sliding material, and plain bearing 有权
标题翻译：无铅铜合金滑动材料和滑动轴承
公开(公告)号：US09434005B2
公开(公告)日：2016-09-06
申请号：US13493617
申请日：2012-06-11
申请人： Hiromi Yokota , Ryo Mukai , Shinichi Kato , Nahomi Hamaguchi
发明人： Hiromi Yokota , Ryo Mukai , Shinichi Kato , Nahomi Hamaguchi
IPC分类号： B22F7/08 , C22C1/04 , C22C9/00 , C22C9/02 , F16C33/12 , C22C9/04 , C22C9/08
CPC分类号： B22F7/08 , B22F2998/00 , C22C1/0425 , C22C9/00 , C22C9/02 , C22C9/04 , C22C9/08 , F16C33/121 , F16C2204/12 , Y02T10/865 , B22F3/10
摘要： A method of producing a Pb-free copper-alloy sliding material containing 1.0 to 15.0% of Sn, 0.5 to 15.0% of Bi and 0.05 to 5.0% of Ag, and Ag and Bi from an Ag—Bi eutectic. If necessary, at least one of 0.1 to 5.0% of Ni, 0.02 to 0.2% P, 0.5 to 30.0% of Zn, and 1.0 to 10.0 mass % of at least one of a group consisting of Fe3P, Fe2P, FeB, NiB and AlN may be added.
摘要翻译：制备含有Sn：1.0〜15.0％，Bi：0.5〜15.0％，Ag：0.05〜5.0％，Ag-Bi共晶的Ag，Bi的无铅铜合金滑动材料的制造方法。如果需要，可以使用0.1〜5.0％的Ni，0.02〜0.2％的P，0.5〜30.0％的Zn和1.0〜10.0质量％的Fe 3 P，Fe 2 P，FeB，NiB和可以添加AlN。

5. 发明授权

US08963050B2 Apparatus for and method of heat-treating thin film on surface of substrate 有权
标题翻译：薄膜表面热处理设备及方法
公开(公告)号：US08963050B2
公开(公告)日：2015-02-24
申请号：US13272657
申请日：2011-10-13
申请人： Shinichi Kato , Hiroki Kiyama
发明人： Shinichi Kato , Hiroki Kiyama
IPC分类号： F27D11/00 , H05B7/18 , H05B3/68 , F26B3/30 , F27B17/00 , F27D7/02 , H01L21/67
CPC分类号： F27B17/0025 , F27D7/02 , H01L21/67109 , H01L21/67115
摘要： A semiconductor wafer having a surface with a thin film formed thereon is transported into a chamber and held by a holder. After an atmosphere provided in the chamber is replaced, flashes of light are directed from flash lamps in a light irradiation part toward the semiconductor wafer to perform a baking process on the thin film. The irradiation of the semiconductor wafer with light from halogen lamps in the light irradiation part also starts at the same time as the irradiation thereof with the flashes of light. The flashes of light emitted for an extremely short period of time and having a high intensity allow the surface temperature of the thin film to rise momentarily. This prevents the occurrence of abnormal grain growth resulting from prolonged baking in the film.
摘要翻译：将其上形成有薄膜的表面的半导体晶片输送到室中并由保持器保持。在更换室内提供的气氛之后，将闪光灯从光照射部分中的闪光灯朝向半导体晶片引导，以对薄膜进行烘烤处理。用光照射部分的卤素灯的光照射半导体晶片也是在与闪光的照射的同时开始的。在非常短的时间内发射的光并且具有高强度的闪光使得薄膜的表面温度瞬间上升。这防止了由于膜中长时间烘烤而导致的异常晶粒生长的发生。

6. 发明授权

US08852966B2 Heat treatment method and heat treatment apparatus of thin film 有权
标题翻译：薄膜的热处理方法和热处理装置
公开(公告)号：US08852966B2
公开(公告)日：2014-10-07
申请号：US13609947
申请日：2012-09-11
申请人： Hiroki Kiyama , Kazuhiko Fuse , Shinichi Kato
发明人： Hiroki Kiyama , Kazuhiko Fuse , Shinichi Kato
IPC分类号： H01L21/26 , H01L21/02 , H01L21/268 , H01L21/67
CPC分类号： H01L21/2686 , H01L21/02181 , H01L21/0228 , H01L21/02337 , H01L21/02356 , H01L21/67109 , H01L21/67115
摘要： A semiconductor wafer, on the surface of which a silicon dioxide base material and an amorphous silicon thin film are formed in this order, is carried into a chamber. An insulated gate bipolar transistor (IGBT) is connected with a power supply circuit to a flash lamp, and the IGBT makes an energization period to the flash lamp to be 0.01 millisecond or more and 1 millisecond or less, consequently making a flash light irradiation time to be 0.01 millisecond or more and 1 millisecond or less. Since a flash heat treatment is performed with a remarkably short flash light irradiation time, the excessive heating of the thin film of amorphous silicon is suppressed and harmful influence such as the exfoliation of the film is prevented.
摘要翻译：在其表面上依次形成二氧化硅基底材料和非晶硅薄膜的半导体晶片被携带到腔室中。绝缘栅双极晶体管（IGBT）与电源电路连接到闪光灯，并且IGBT使闪光灯的通电周期为0.01毫秒以上且1毫秒以下，从而使闪光灯照射时间为0.01毫秒以上且1毫秒以下。由于以明显短的闪光照射时间进行闪光热处理，因此能够抑制非晶硅薄膜的过度加热，并且防止了膜的剥离等有害影响。

7. 发明授权

US08623750B2 Heat treatment method for promoting crystallization of high dielectric constant film 有权
标题翻译：促进高介电常数膜结晶的热处理方法
公开(公告)号：US08623750B2
公开(公告)日：2014-01-07
申请号：US13607892
申请日：2012-09-10
申请人： Kazuhiko Fuse , Shinichi Kato
发明人： Kazuhiko Fuse , Shinichi Kato
IPC分类号： H01L21/3205 , H01L21/31 , H01L21/469
CPC分类号： H01L21/02356 , H01L21/2686 , H01L21/28176 , H01L21/67115 , H01L21/68707 , H01L21/68735 , H01L29/513 , H01L29/517 , H01L29/7848
摘要： A film of silicon dioxide is formed on the silicon-germanium layer, and a high dielectric constant film is further formed on the film of silicon dioxide. First irradiation from a flash lamp is performed on the semiconductor wafer to increase the temperature of a front surface of the semiconductor wafer from a preheating temperature to a target temperature for a time period in the range of 3 milliseconds to 1 second. Subsequently, second irradiation from the flash lamp is performed to maintain the temperature of the front surface of the semiconductor wafer within a ±25° C. range around the target temperature for a time period in the range of 3 milliseconds to 1 second. This promotes the crystallization of the high dielectric constant film while suppressing the alleviation of distortion in the silicon-germanium layer.
摘要翻译：在硅 - 锗层上形成二氧化硅膜，并且在二氧化硅膜上进一步形成高介电常数膜。在半导体晶片上进行来自闪光灯的第一次照射，将半导体晶片的正面的温度从预热温度升温至目标温度，时间范围为3毫秒〜1秒。随后，执行从闪光灯的第二次照射，以将半导体晶片的前表面的温度保持在目标温度的±25℃范围内，持续3毫秒至1秒的时间段。这促进了高介电常数膜的结晶，同时抑制了硅 - 锗层中的变形的减轻。

8. 发明申请

US20120225968A1 INK COMPOSITION FOR INK JET 审中-公开
标题翻译：墨水喷墨墨水组合物
公开(公告)号：US20120225968A1
公开(公告)日：2012-09-06
申请号：US13337581
申请日：2011-12-27
申请人： Tomohito Nakano , Toshiyuki Miyabayashi , Shinichi Kato , Hiroki Nakane , Hirotoshi Koyano , Yoshinobu Sato , Hiroshi Sawada , Kenji Kitada
发明人： Tomohito Nakano , Toshiyuki Miyabayashi , Shinichi Kato , Hiroki Nakane , Hirotoshi Koyano , Yoshinobu Sato , Hiroshi Sawada , Kenji Kitada
IPC分类号： C09D11/10
CPC分类号： C08F299/06 , C08F290/067 , C09D11/101
摘要： An ink composition for ink jet providing excellent in the curability based on ultraviolet irradiation in the presence of water or a solvent, the ejection stability with respect to the factors such as dot loss or flight deflection, and the storage stability of ink. Also provided herein is an ink composition for ink jet including: a pigment; a water-soluble organic solvent; a surfactant; at least either of a urethane (meth)acrylate being represented by the following general formula (1) and having a weight average molecular weight of 1,000 to 10,000 and a cross-linked urethane (meth)acrylate having a constitutional unit including the urethane (meth)acrylate; a compound having a radical polymerizable group(s); a photoradical polymerization initiator; and water: A1-O—(CONH—B1—NHCOO—C1—O)n—CONH—B1—NH—COO-D1 (1) where each of A1, B1, C1, D1, and n in formula (1) are described herein.
摘要翻译：一种用于喷墨的油墨组合物，其在水或溶剂的存在下，基于紫外线照射提供优异的固化性，相对于诸如点损失或飞行偏转等因素的喷射稳定性以及油墨的储存稳定性。本文还提供了一种用于喷墨的油墨组合物，包括：颜料; 水溶性有机溶剂; 表面活性剂; 氨基甲酸酯（甲基）丙烯酸酯中的至少一种由以下通式（1）表示并具有1,000至10,000的重均分子量和具有包含氨基甲酸酯（甲基）丙烯酸酯的结构单元的交联的聚氨酯（甲基）丙烯酸酯）丙烯酸酯; 具有自由基聚合性基团的化合物; 光自由基聚合引发剂; 和水：式（1）中的A1，B1，C1，D1和n各自的A1-O-（CONH-B1-NHCOO-C1-O）n-CONH-B1-NH-COO-D1（1）在此描述。

9. 发明授权

US08129284B2 Heat treatment method and heat treatment apparatus for heating substrate by light irradiation 有权
标题翻译：热处理方法和通过光照射加热基板的热处理装置
公开(公告)号：US08129284B2
公开(公告)日：2012-03-06
申请号：US12732591
申请日：2010-03-26
申请人： Shinichi Kato
发明人： Shinichi Kato
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： F27B17/0025 , H01L21/26513 , H01L21/2686 , H01L21/67103 , H01L21/67115 , H01L21/67248 , H01L21/68742 , H01L21/68785 , H01L21/68792
摘要： A semiconductor wafer in which a carbon thin film is formed on a surface of a silicon substrate implanted with impurities is irradiated with flash light emitted from flash lamps. Absorbing the flash light causes the temperature of the carbon thin film to increase. The surface temperature of the silicon substrate implanted with impurities is therefore increased to be higher than that in a case where no thin film is formed, and the sheet resistance value can be thereby decreased. When the semiconductor wafer with the carbon thin film formed thereon is irradiated with flash light in high concentration oxygen atmosphere, since the carbon of the thin film is oxidized to be vaporized, removal of the thin film is performed concurrently with flash heating.
摘要翻译：在其上注入有杂质的硅衬底的表面上形成碳薄膜的半导体晶片被从闪光灯发射的闪光照射。吸收闪光灯会导致碳薄膜的温度升高。因此，注入杂质的硅衬底的表面温度增加到高于不形成薄膜的情况下的表面温度，并且可以降低薄层电阻值。当在其上形成有碳薄膜的半导体晶片用高浓度氧气氛中的闪光照射时，由于薄膜的碳被氧化以汽化，所以与闪光加热同时进行薄膜的去除。

10. 发明申请

US20110176819A1 ROTATION DETECTING DEVICE, SHEET FEEDING DEVICE, AND IMAGE FORMING APPARATUS 有权
标题翻译：旋转检测装置，进纸装置和图像形成装置
公开(公告)号：US20110176819A1
公开(公告)日：2011-07-21
申请号：US13008490
申请日：2011-01-18
申请人： Yasutomo IDE , Masanobu Yamagata , Shinichi Kato , Yasuhiro Kuba , Tsuyoshi Hashiyada
发明人： Yasutomo IDE , Masanobu Yamagata , Shinichi Kato , Yasuhiro Kuba , Tsuyoshi Hashiyada
IPC分类号： G03G15/22 , B65H7/02 , G01L3/02
CPC分类号： B65H7/02 , B65H3/06 , B65H2403/42 , B65H2511/212 , B65H2553/25 , G03G15/6502 , G03G2215/00383 , G03G2215/00729 , B65H2220/03 , B65H2220/11
摘要： An image forming apparatus includes a sheet feeding device (1). The sheet feeding device (1) includes a sheet feeding cassette (2), a push-up member (4), a drive shaft (5), and a rotation detecting device (6). The rotation detecting device (6) includes an output gear connected to the drive shaft (5). The output gear includes a gear main body provided with a gear tooth on its outer edge; and an electrode holding member that is attached to the gear main body. The electrode holding member is rotatably provided in the case (9) and a rotating electrode is attached to the electrode holding member. The electrode holding member is formed of at least one thermoplastic resin selected from the group consisting of POM, PA, PBT, PP, PE, ABS resin, PS, PPE, PC, and PMMA. The gear main body is formed of a material whose strength is higher than thermoplastic resin of which the electrode holding member is formed.
摘要翻译：图像形成装置包括片材进给装置（1）。送纸装置（1）包括送纸盒（2），上推构件（4），驱动轴（5）和旋转检测装置（6）。旋转检测装置（6）包括连接到驱动轴（5）的输出齿轮。输出齿轮包括在其外缘上设有齿轮齿的齿轮主体; 以及安装在齿轮主体上的电极保持部件。电极保持构件可旋转地设置在壳体（9）中，并且旋转电极附接到电极保持构件。电极保持构件由选自POM，PA，PBT，PP，PE，ABS树脂，PS，PPE，PC和PMMA中的至少一种热塑性树脂形成。齿轮主体由强度比形成有电极保持部件的热塑性树脂高的材料形成。

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