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1. 发明申请

US20120170102A1 Spatial Light Modulators and Fabrication Techniques 审中-公开
标题翻译：空间光调制器和制作技术
公开(公告)号：US20120170102A1
公开(公告)日：2012-07-05
申请号：US12983195
申请日：2010-12-31
申请人： Justin Payne , Howard Woo , Vlad Novotny , Adrian James Cable
发明人： Justin Payne , Howard Woo , Vlad Novotny , Adrian James Cable
IPC分类号： G02B26/06 , H01L31/18
CPC分类号： H01L27/14603 , G02B26/06 , H01L27/14625
摘要： We describe a phase modulating spatial light modulator (SLM). The SLM comprises a substrate bearing multiple SLM pixels, each of the SLM pixels comprising a MEMS (micro electromechanical system) optical phase modulating structure. The MEMS optical phase modulating structure comprises: a pixel electrode; a spring support structure around a perimeter of the pixel electrode; and a mirror spring supported by the spring support structure. The mirror spring comprises a mirror support and a plurality of mirror spring arms each extending between the mirror support and the spring support structure, and a mirror mounted on the mirror support. Each mirror spring arm has a spiral or serpentine shape. A voltage applied to the pixel electrode flexes the mirror spring and causes the mirror to translate perpendicularly to the substrate substantially without tilting.
摘要翻译：我们描述一个相位调制空间光调制器（SLM）。 SLM包括具有多个SLM像素的基板，每个SLM像素包括MEMS（微机电系统）光相位调制结构。 MEMS光相位调制结构包括：像素电极; 围绕像素电极的周边的弹簧支撑结构; 以及由弹簧支撑结构支撑的镜子弹簧。镜子弹簧包括反射镜支撑件和多个镜子弹簧臂，每个镜子弹簧臂在反射镜支撑件和弹簧支撑结构之间延伸，以及安装在镜子支撑件上的镜子。每个镜子弹簧臂都具有螺旋或蛇形形状。施加到像素电极的电压使反射镜弹性弯曲，并且使得反射镜基本上不倾斜地垂直于基板平移。

2. 发明申请

US20170054922A1 INFRARED IMAGER READOUT ELECTRONICS 审中-公开
标题翻译：红外成像读取电子
公开(公告)号：US20170054922A1
公开(公告)日：2017-02-23
申请号：US15226920
申请日：2016-08-03
申请人： Vlad Novotny , Howard Woo
发明人： Vlad Novotny , Howard Woo
IPC分类号： H04N5/33 , H04N5/369 , H04N5/357 , H04N5/374 , H04N5/355 , H04N5/365 , H01L27/146 , H04N5/378
CPC分类号： H04N5/33 , G06K9/00335 , G06T7/20 , H01L21/0209 , H01L21/3081 , H01L21/31111 , H01L21/32134 , H01L21/76224 , H01L27/14649 , H04N5/35572 , H04N5/3575 , H04N5/365 , H04N5/3698 , H04N5/374 , H04N5/378
摘要： Readout integrated circuits placed underneath the suspended sensing elements detect changes of electrical resistance of sensing elements and digitize the signals with digital to analog convertor for each element. Readout electronics provides low parasitics, high signal to noise ratio, high data rate, high dynamic range and instantaneous global readout.
摘要翻译：放置在悬挂感应元件下方的读出集成电路检测感测元件的电阻变化，并对每个元件的数模转换器数字化信号。读出电子提供低寄生效应，高信噪比，高数据速率，高动态范围和瞬时全局读出。

3. 发明申请

US20150085134A1 Infrared Imager Readout Electronics 审中-公开
标题翻译：红外成像读取电子
公开(公告)号：US20150085134A1
公开(公告)日：2015-03-26
申请号：US14032205
申请日：2013-09-20
申请人： Vlad Novotny , Howard Woo
发明人： Vlad Novotny , Howard Woo
IPC分类号： H04N5/33 , H04N5/378 , H04N5/357 , H04N5/3745 , H04N5/353
CPC分类号： G01J5/24 , H04N5/33 , H04N5/3535 , H04N5/35554 , H04N5/3575 , H04N5/37455 , H04N5/378
摘要： Readout integrated circuits placed below the suspended sensor elements detect changes of electrical resistance of sensor elements and digitize the signals with digital to analog convertor for each element. Readout electronics provides low parasitics, high signal to noise ratio, high data rate, high dynamic range and instantaneous global readout.
摘要翻译：放置在悬挂传感器元件下面的读出集成电路检测传感器元件的电阻变化，并对每个元件的数模转换器进行数字化。读出电子提供低寄生效应，高信噪比，高数据速率，高动态范围和瞬时全局读出。

4. 发明申请

US20070097486A1 Projection display system including a high fill ratio silicon spatial light modulator 有权
标题翻译：投影显示系统包括高填充率硅空间光调制器
公开(公告)号：US20070097486A1
公开(公告)日：2007-05-03
申请号：US11448537
申请日：2006-06-05
申请人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Payne , Ye Wang , William Worley , Dongmin Chen , Howard Woo
发明人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Payne , Ye Wang , William Worley , Dongmin Chen , Howard Woo
IPC分类号： G02B26/00
CPC分类号： G02B26/0841
摘要： A display system includes a light source and a first optical system coupled to the light source and adapted to provide an illumination beam along an illumination path. The display system also includes a spatial light modulator positioned in the illumination path. The spatial light modulator includes a semiconductor substrate including a plurality of electrode devices and a hinge structure coupled to the semiconductor substrate. The hinge structure includes silicon material. The spatial light modulator also includes a mirror post coupled to the hinge structure and extending to a predetermined distance from the semiconductor substrate and a mirror plate coupled to the mirror post and overlying the plurality of electrode devices. The display system further includes a second optical system coupled to the spatial light modulator and adapted to project an image onto a projection surface.
摘要翻译：显示系统包括光源和耦合到光源并适于沿照明路径提供照明光束的第一光学系统。显示系统还包括位于照明路径中的空间光调制器。空间光调制器包括包括多个电极器件和耦合到半导体衬底的铰链结构的半导体衬底。铰链结构包括硅材料。空间光调制器还包括耦合到铰链结构并且延伸到半导体衬底预定距离的镜柱和耦合到镜柱并且覆盖多个电极器件的镜板。显示系统还包括耦合到空间光调制器并适于将图像投影到投影表面上的第二光学系统。

5. 发明申请

US20070097485A1 Fabrication of a high fill ratio silicon spatial light modulator 有权
标题翻译：高填充率硅空间光调制器的制造
公开(公告)号：US20070097485A1
公开(公告)日：2007-05-03
申请号：US11448148
申请日：2006-06-05
申请人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Payne , Ye Wang , Howard Woo
发明人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Payne , Ye Wang , Howard Woo
IPC分类号： G02B26/00
CPC分类号： G02B26/0841
摘要： A method for forming an optical deflection device includes providing a semiconductor substrate comprising an upper surface region and a plurality of drive devices within one or more portions of the semiconductor substrate. The upper surface region includes one or more patterned structure regions and at least one open region to expose a portion of the upper surface region to form a resulting surface region. The method also includes forming a planarizing material overlying the resulting surface region to fill the at least one open region and cause formation of an upper planarized layer using the fill material. The method further includes forming a thickness of silicon material at a temperature of less than 300 ° C. to maintain a state of the planarizing material.
摘要翻译：一种形成光偏转装置的方法包括提供半导体衬底的一个或多个部分内包括上表面区域和多个驱动装置的半导体衬底。上表面区域包括一个或多个图案化结构区域和至少一个开放区域，以暴露上表面区域的一部分以形成所得表面区域。该方法还包括形成覆盖所得表面区域的平坦化材料以填充至少一个开放区域，并且使用填充材料形成上部平坦化层。该方法还包括在小于300℃的温度下形成硅材料的厚度以保持平坦化材料的状态。

6. 发明申请

US20070097487A1 High fill ratio silicon spatial light modulator 有权
标题翻译：高填充率硅空间光调制器
公开(公告)号：US20070097487A1
公开(公告)日：2007-05-03
申请号：US11448149
申请日：2006-06-05
申请人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Payne , Ye Wang , William Worley , Dongmin Chen , Howard Woo
发明人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Payne , Ye Wang , William Worley , Dongmin Chen , Howard Woo
IPC分类号： G02B26/00
CPC分类号： G02B26/0841 , G02B26/008
摘要： An optical deflection device for a display application. The optical deflection device includes a semiconductor substrate including an upper surface region and one or more electrode devices provided overlying the upper surface region. The optical deflection device also includes a hinge device including a silicon material and coupled to the upper surface region. The optical deflection device further includes a spacing defined between the upper surface region and the hinge device and a mirror structure including a post portion coupled to the hinge device and a mirror plate portion coupled to the post portion and overlying the hinge device.
摘要翻译：一种用于显示器应用的光学偏转装置。光偏转装置包括：半导体衬底，包括上表面区域和设置在上表面区域上的一个或多个电极器件。光学偏转装置还包括铰链装置，其包括硅材料并且连接到上表面区域。光学偏转装置还包括限定在上表面区域和铰链装置之间的间隔，以及反射镜结构，其包括联接到铰链装置的柱部分和耦合到柱部分并且覆盖铰链装置的镜板部分。

7. 发明申请

US20060121373A1 Method and structure for manufacturing bonded substrates using multiple photolithography tools 有权
标题翻译：使用多个光刻工具制造粘结衬底的方法和结构
公开(公告)号：US20060121373A1
公开(公告)日：2006-06-08
申请号：US11004588
申请日：2004-12-03
申请人： Xiao Yang , Kegang Huang , Yuxiang Wang , Howard Woo
发明人： Xiao Yang , Kegang Huang , Yuxiang Wang , Howard Woo
IPC分类号： G03F9/00 , G03B27/00 , G03C5/00 , G03B27/42
CPC分类号： G03F7/70525 , G03F9/7046 , H01L21/2007
摘要： A method of manufacturing bonded substrate structures. The method includes providing a first substrate comprising a first surface region and processing the first surface region to form a first pattern region using a first photolithographic stepper characterized by a first tolerance criteria for alignment. The method also includes providing a second substrate comprising a second surface region and processing the second surface region through at least one masking process to form a second pattern region using a second photolithographic stepper characterized by a second tolerance criteria for alignment. Further, the method includes determining a masking process having a third tolerance criteria for alignment, the third tolerance criteria allowing for a change from the second to the first photographic stepper, processing the second substrate for at least the determined masking process using the first photolithographic stepper, and joining the first substrate to the second substrate to form a composite substrate structure.
摘要翻译：制造键合衬底结构的方法。该方法包括提供包括第一表面区域的第一基底和使用第一光刻步进器处理第一表面区域以形成第一图案区域，其特征在于用于对准的第一公差标准。该方法还包括提供包括第二表面区域的第二基底并通过至少一个掩模过程处理第二表面区域，以使用第二光刻步进器形成第二图案区域，其特征在于用于对准的第二容限标准。此外，该方法包括确定具有用于对准的第三公差准则的掩蔽处理，第三公差准则允许从第二照相步骤器改变到第一照相步进器，使用第一光刻步进器处理至少所确定的掩蔽处理的第二衬底并且将第一基板接合到第二基板以形成复合基板结构。

8. 发明授权

US07675670B2 Fabrication of a high fill ratio silicon spatial light modulator 有权
标题翻译：高填充率硅空间光调制器的制造
公开(公告)号：US07675670B2
公开(公告)日：2010-03-09
申请号：US11448148
申请日：2006-06-05
申请人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Allen Payne , Ye Wang , Howard Woo
发明人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Allen Payne , Ye Wang , Howard Woo
IPC分类号： G02B26/00 , G02F1/00
CPC分类号： G02B26/0841
摘要： A method for forming an optical deflection device includes providing a semiconductor substrate comprising an upper surface region and a plurality of drive devices within one or more portions of the semiconductor substrate. The upper surface region includes one or more patterned structure regions and at least one open region to expose a portion of the upper surface region to form a resulting surface region. The method also includes forming a planarizing material overlying the resulting surface region to fill the at least one open region and cause formation of an upper planarized layer using the fill material. The method further includes forming a thickness of silicon material at a temperature of less than 300 ° C. to maintain a state of the planarizing material.
摘要翻译：一种形成光偏转装置的方法包括提供半导体衬底的一个或多个部分内包括上表面区域和多个驱动装置的半导体衬底。上表面区域包括一个或多个图案化结构区域和至少一个开放区域，以暴露上表面区域的一部分以形成所得表面区域。该方法还包括形成覆盖所得表面区域的平坦化材料以填充至少一个开放区域，并且使用填充材料形成上部平坦化层。该方法还包括在小于300℃的温度下形成硅材料的厚度以保持平坦化材料的状态。

9. 发明授权

US07522330B2 High fill ratio silicon spatial light modulator 有权
标题翻译：高填充率硅空间光调制器
公开(公告)号：US07522330B2
公开(公告)日：2009-04-21
申请号：US11448149
申请日：2006-06-05
申请人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Allen Payne , Ye Wang , William Spencer Worley, III , Dongmin Chen , Howard Woo
发明人： Xiao Yang , Yuxiang Wang , Wook Ji , Justin Allen Payne , Ye Wang , William Spencer Worley, III , Dongmin Chen , Howard Woo
IPC分类号： G02B26/00
CPC分类号： G02B26/0841 , G02B26/008
摘要： An optical deflection device for a display application. The optical deflection device includes a semiconductor substrate including an upper surface region and one or more electrode devices provided overlying the upper surface region. The optical deflection device also includes a hinge device including a silicon material and coupled to the upper surface region. The optical deflection device further includes a spacing defined between the upper surface region and the hinge device and a mirror structure including a post portion coupled to the hinge device and a mirror plate portion coupled to the post portion and overlying the hinge device.
摘要翻译：一种用于显示器应用的光学偏转装置。光偏转装置包括：半导体衬底，包括上表面区域和设置在上表面区域上的一个或多个电极器件。光学偏转装置还包括铰链装置，其包括硅材料并且连接到上表面区域。光学偏转装置还包括限定在上表面区域和铰链装置之间的间隔，以及反射镜结构，其包括联接到铰链装置的柱部分和耦合到柱部分并且覆盖铰链装置的镜板部分。

10. 发明授权

US07369297B2 Mirror structure with single crystal silicon cross-member 有权
标题翻译：具有单晶硅横梁的镜面结构
公开(公告)号：US07369297B2
公开(公告)日：2008-05-06
申请号：US11299140
申请日：2005-12-08
申请人： Brian K. McGinley , Jonathan D. Mohn , Howard Woo
发明人： Brian K. McGinley , Jonathan D. Mohn , Howard Woo
IPC分类号： G02B26/00
CPC分类号： G02B26/0841
摘要： Hydrogen cleave silicon process for light modulating mirror structure using single crystal silicon as the base cross-member. Existing processes use two critical alignment steps that can contribute to higher actuation voltages and result in lower manufacturing yields. The hydrogen cleave process simplifies the manufacturing process to one step: transferring a thin film of single crystal silicon to the CMOS substrate, resulting in minimal alignment error and providing large bonding area.
摘要翻译：氢解裂硅工艺用于光调制镜结构，采用单晶硅作为基底横截面。现有工艺使用两个关键对准步骤，这些步骤可以有助于更高的致动电压并导致较低的制造产量。氢裂解过程将制造过程简化为一步：将单晶硅薄膜转移到CMOS衬底，导致最小的对准误差并提供较大的结合面积。

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