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    • 1. 发明授权
    • Process for purifying phosphorous acid
    • 纯化亚磷酸的方法
    • US4834960A
    • 1989-05-30
    • US182871
    • 1988-04-18
    • Jurgen GrosseGunther SchimmelBernhard Hofmann
    • Jurgen GrosseGunther SchimmelBernhard Hofmann
    • C01B25/163
    • C01B25/163
    • The purification of phosphorous acid which is formed in halogenations of hydrocarbon derivatives using phosphorus trihalides is carried out in the context of preparing phosphorous acid in a reaction zone by reacting a mixture of phosphorus trichloride and water which has been finely divided by means of steam at temperatures between 150.degree. and 200.degree. C. in the gas phase. In this process, the liquid reaction product drains into a concentrating evaporation zone which has a downstream first separation zone. Inert gas is introduced to the lower part of the first separation zone. A melt is withdrawn from the first separation zone into a crystallizing zone. The waste gases from the reaction zone are treated with a washing liquid in a second separation zone before being passed into the atmosphere. The washing liquid used is an aqueous solution of never-purified phosphorous acid, which can have been prepurified by hydrolysis and stripping.
    • 通过使用三卤化磷在烃衍生物的卤化中形成的亚磷酸的纯化是在反应区中通过使三氯化磷和水分混合物在蒸气中分解的温度反应在反应区中进行的 在气相中为150〜200℃。 在该方法中,液体反应产物排入具有下游第一分离区的浓缩蒸发区。 惰性气体被引入第一分离区的下部。 将熔体从第一分离区取出成结晶区。 来自反应区的废气在通入大气中之前用洗涤液在第二分离区中处理。 所使用的洗涤液是未经纯化的亚磷酸的水溶液,其可以通过水解和汽提进行预净化。
    • 3. 发明授权
    • Process for producing amorphous sodium silicate
    • 无定形硅酸钠的制备方法
    • US5229095A
    • 1993-07-20
    • US839008
    • 1992-02-14
    • Gunther SchimmelMichael KotzianHerbert PanterAlexander Tapper
    • Gunther SchimmelMichael KotzianHerbert PanterAlexander Tapper
    • C01B33/32
    • C01B33/325C01B33/32
    • A process for producing amorphous sodium silicates having a water content of 0.3 to 6% by weight and an SiO.sub.2 /Na.sub.2 O molar ratio of (1.9 to 2.8) : 1 from a waterglass solution containing at least 20% by weight of solids, the water-glass solution is obtained by reacting quartz sand with sodium hydroxide solution at an SiO.sub.2 /Na.sub.2 O molar ratio of (2.0 to 2.8) : 1 at temperatures of 180 to 240.degree. C. and pressures of 10 to 30 bar. This waterglass solution is treated in a spray-drying zone with hot air at 200 to 300.degree. C. for a residence time of 10 to 20 seconds and at a temperature of the exit gas leaving the spray-drying zone of 90.degree. to 130.degree. C., to form a pulverulent amorphous sodium silicate having a water content (determined as the loss on ignition at 700.degree. C.) of 15 to 23% by weight and a bulk density of more than 300 g/l. The pulverulent sodium silicate is introduced into an obliquely arranged rotary kiln fitted with devices for moving solids and treated therein with flue gas in countercurrent at temperatures from 250.degree. up to 500.degree. C. for 1 to 60 minutes. The rotary kiln is here insulated in such a way that its outside wall temperature is less than 60.degree. C. Finally, the amorphous sodium silicate emerging from the rotary kiln is comminuted by means of a mechanical crusher to grain sizes of 0.1 to 12 mm.
    • 从含有至少20重量%固体的水玻璃溶液制备水含量为0.3-6重量%和SiO 2 / Na 2 O摩尔比为(1.9至2.8):1的无定形硅酸钠的方法, 通过在180-240℃的温度和10至30巴的压力下使石英砂与氢氧化钠溶液以(2.0至2.8):1的SiO 2 / Na 2 O摩尔比反应获得玻璃溶液。 该水玻璃溶液在200〜300℃的热风喷雾干燥区中处理10〜20秒的停留时间,离开喷雾干燥区的出口气体的温度为90〜130℃ 以形成15〜23重量%的含水量(在700℃下测定为灼烧损失)的粉末状无定形硅酸钠,堆积密度大于300g / l。 将粉状硅酸钠引入倾斜布置的旋转窑中,该回转窑装有用于移动固体的装置,并在250℃至500℃的温度下逆流处理烟道气1至60分钟。 回转窑的外壁温度低于60℃,最后将回转窑出现的无定形硅酸钠粉碎成0.1〜12mm的粒径。
    • 10. 发明授权
    • Process for the production of crystalline sodium disilicate in an
externally heated rotary kiln having temperature zones
    • 在具有温度区域的外部加热回转窑中生产结晶二硅酸钠的方法
    • US5308596A
    • 1994-05-03
    • US986983
    • 1992-12-08
    • Michael KotzianGunther SchimmelAlexander TapperKnut Bauer
    • Michael KotzianGunther SchimmelAlexander TapperKnut Bauer
    • C01B33/32C01B33/38
    • C01B33/38
    • To prepare crystalline sodium disilicates having a laminar structure, a molar ratio of SiO.sub.2 to Na.sub.2 O of (1.9 to 2.1) 1 and a water content of less than 0.3% by weight, a water glass solution is first obtained by reacting sand with sodium hydroxide solution in a molar ratio of SiO.sub.2 to Na.sub.2 O of (2.0 to 2.3) : 1 at temperatures of 180.degree. to 240.degree. C. and pressures of 10 to 30 bar. This water glass solution having at least 20% by weight of solids is treated in a spray drier with hot air at 200.degree. to 300.degree. C. with the formation of a pulverulent amorphous sodium disilicate having a water content (determined as loss on heating at 700.degree. C.) of 15 to 23% by weight and a bulk density of at least 300 g/l. The spray-dried pulverulent, amorphous sodium disilicate is ground. The ground sodium disilicate is introduced into a rotary kiln equipped with devices for moving solids, externally heated via the wall and having in its interior a plurality of different temperature zones, and is treated therein at temperatures of 400.degree. to 800.degree. C. for 1 to 60 minutes with formation of crystalline sodium disilicate.
    • 为了制备具有层状结构,SiO 2与Na 2 O的摩尔比(1.9-2.1)1和含水量小于0.3重量%的结晶二硅酸钠,首先通过使沙子与氢氧化钠溶液 在180至240℃的温度和10至30巴的压力下,SiO 2与Na 2 O的摩尔比为(2.0至2.3):1。 具有至少20重量%固体的水玻璃溶液在喷雾干燥器中用200-300℃的热空气处理,形成具有水分含量的粉状无定形二硅酸钠(确定为在 700℃)为15〜23重量%,堆积密度为300g / l以上。 将喷雾干燥的粉状无定形二硅酸钠研磨。 将磨碎的二硅酸钠引入装备有用于移动固体的装置的回转窑,其外部经由壁加热并在其内部具有多个不同的温度区域,并在400℃至800℃的温度下处理1 至60分钟,形成结晶二硅酸钠。