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1. 发明申请

US20080206690A1 Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof 有权
标题翻译：用于三层图案化应用的组合物，涂料和膜及其制备方法
公开(公告)号：US20080206690A1
公开(公告)日：2008-08-28
申请号：US11838854
申请日：2007-08-14
申请人： Joseph Kennedy , Songyuan Xie , Kim Do , Sudip Mukhopadhyay
发明人： Joseph Kennedy , Songyuan Xie , Kim Do , Sudip Mukhopadhyay
IPC分类号： G03C1/04 , C08G77/04
CPC分类号： G03F7/0752 , C08G77/20 , C08G77/70 , C08L83/04 , C08L83/06 , C09D183/04 , G03F7/091 , G03F7/11 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/3122 , C08L2666/44
摘要： Compositions for use in tri-layer applications are described herein, wherein the composition has a matrix and includes: a formulated polymer comprising at least one type of silicon-based moiety forming the matrix of the polymer, a plurality of vinyl groups coupled to the matrix of the polymer, and a plurality of phenyl groups coupled to the matrix of the polymer, at least one condensation catalyst, and at least one solvent. Tri-layer structures are also contemplated herein that comprise an organic underlayer (first layer), antireflective compositions and/or films contemplated herein (second layer) and a photoresist material (third layer) that are coupled to one another. Methods of producing a composition for tri-layer patterning applications includes: providing a formulated polymer comprising at least one type of silicon-based moiety forming the matrix of the polymer, a plurality of vinyl groups coupled to the matrix of the polymer, and a plurality of phenyl groups coupled to the matrix of the polymer, providing at least one condensation catalyst, providing at least one solvent, providing at least one pH modifier, blending the formulated polymer and part of the at least one solvent in a reaction vessel to form a reactive mixture; and incorporating the at least one pH modifier, the at least one condensation catalyst and the remaining at least one solvent into the reactive mixture to form the composition.
摘要翻译：本文描述了用于三层应用的组合物，其中所述组合物具有基质，并且包括：配制的聚合物，其包含形成聚合物基质的至少一种类型的硅基部分，多个与基质偶联的乙烯基的聚合物，以及与聚合物的基质偶联的多个苯基，至少一种缩合催化剂和至少一种溶剂。本文还涵盖三层结构，其包括彼此耦合的有机底层（第一层），抗反射组合物和/或本文考虑的抗反射组合物（第二层）和光致抗蚀剂材料（第三层）。制备用于三层图案化应用的组合物的方法包括：提供配制的聚合物，其包含形成聚合物基质的至少一种类型的硅基部分，与聚合物基质偶联的多个乙烯基，以及多个提供至少一种缩合催化剂，提供至少一种溶剂，提供至少一种pH调节剂，将配制的聚合物和部分至少一种溶剂混合在反应容器中以形成反应性混合物并将至少一种pH调节剂，至少一种缩合催化剂和剩余的至少一种溶剂掺入到反应混合物中以形成组合物。

2. 发明授权

US08642246B2 Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof 有权
标题翻译：用于三层图案化应用的组合物，涂料和膜及其制备方法
公开(公告)号：US08642246B2
公开(公告)日：2014-02-04
申请号：US11838854
申请日：2007-08-14
申请人： Joseph Kennedy , Songyuan Xie , Kim Do , Sudip Mukhopadhyay
发明人： Joseph Kennedy , Songyuan Xie , Kim Do , Sudip Mukhopadhyay
IPC分类号： G03F7/075 , G03F7/11 , C08L83/06
CPC分类号： G03F7/0752 , C08G77/20 , C08G77/70 , C08L83/04 , C08L83/06 , C09D183/04 , G03F7/091 , G03F7/11 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/3122 , C08L2666/44
摘要： Compositions for use in tri-layer applications are described herein, wherein the composition has a matrix and includes: a formulated polymer comprising at least one type of silicon-based moiety forming the matrix of the polymer, a plurality of vinyl groups coupled to the matrix of the polymer, and a plurality of phenyl groups coupled to the matrix of the polymer, at least one condensation catalyst, and at least one solvent. Tri-layer structures are also contemplated herein that comprise an organic underlayer (first layer), antireflective compositions and/or films contemplated herein (second layer) and a photoresist material (third layer) that are coupled to one another. Methods of producing a composition for tri-layer patterning applications includes: providing a formulated polymer comprising at least one type of silicon-based moiety forming the matrix of the polymer, a plurality of vinyl groups coupled to the matrix of the polymer, and a plurality of phenyl groups coupled to the matrix of the polymer, providing at least one condensation catalyst, providing at least one solvent, providing at least one pH modifier, blending the formulated polymer and part of the at least one solvent in a reaction vessel to form a reactive mixture; and incorporating the at least one pH modifier, the at least one condensation catalyst and the remaining at least one solvent into the reactive mixture to form the composition.
摘要翻译：本文描述了用于三层应用的组合物，其中所述组合物具有基质，并且包括：配制的聚合物，其包含形成聚合物基质的至少一种类型的硅基部分，多个与基质偶联的乙烯基的聚合物，以及与聚合物的基质偶联的多个苯基，至少一种缩合催化剂和至少一种溶剂。本文还涵盖三层结构，其包括彼此耦合的有机底层（第一层），抗反射组合物和/或本文考虑的抗反射组合物（第二层）和光致抗蚀剂材料（第三层）。制备用于三层图案化应用的组合物的方法包括：提供配制的聚合物，其包含形成聚合物基质的至少一种类型的硅基部分，与聚合物基质偶联的多个乙烯基，以及多个提供至少一种缩合催化剂，提供至少一种溶剂，提供至少一种pH调节剂，将配制的聚合物和部分至少一种溶剂混合在反应容器中以形成反应性混合物并将至少一种pH调节剂，至少一种缩合催化剂和剩余的至少一种溶剂掺入到反应混合物中以形成组合物。

3. 发明授权

US08101015B2 Coatings and hard mask compositions for integrated circuit applications methods of production and uses thereof 有权
标题翻译：用于集成电路应用的涂料和硬掩模组合物的生产方法及其用途
公开(公告)号：US08101015B2
公开(公告)日：2012-01-24
申请号：US10570750
申请日：2004-10-05
申请人： Joseph Kennedy , Wei T. Huang , Kim Do , Jason Stuck , Bo Li
发明人： Joseph Kennedy , Wei T. Huang , Kim Do , Jason Stuck , Bo Li
IPC分类号： C09D183/08
CPC分类号： C09D183/04
摘要： A coating material is described herein that includes at least one inorganic compound, and at least one densifying agent, wherein the densifying agent increases the density of the coating material as compared to the density of the at least one inorganic compound. A method of producing a coating material is described herein that includes: providing at least one inorganic compound, providing at least one densifying agent, combining the at least one inorganic compound with the at least one densifying agent to form the coating material, wherein the densifying agent increases the density of the coating material as compared to the density of the at least one inorganic compound.
摘要翻译：本文描述了包括至少一种无机化合物和至少一种致密化剂的涂层材料，其中与至少一种无机化合物的密度相比，致密化剂增加涂层材料的密度。本文描述了制备涂料的方法，其包括：提供至少一种无机化合物，提供至少一种致密化剂，将至少一种无机化合物与至少一种致密化剂结合以形成涂层材料，其中致密化与至少一种无机化合物的密度相比，增加了涂层材料的密度。

4. 发明申请

US20070022909A1 Coatings and hard mask compositions for integrated circuit applications methods of production and uses thereof 有权
标题翻译：用于集成电路应用的涂料和硬掩模组合物的生产方法及其用途
公开(公告)号：US20070022909A1
公开(公告)日：2007-02-01
申请号：US10570750
申请日：2004-10-05
申请人： Joseph Kennedy , Wei Huang , Kim Do , Jason Stuck , Bo Li
发明人： Joseph Kennedy , Wei Huang , Kim Do , Jason Stuck , Bo Li
IPC分类号： C08L83/05
CPC分类号： C09D183/04
摘要： A coating material is described herein that includes at least one inorganic compound, and at least one densifying agent, wherein the densifying agent increases the density of the coating material as compared to the density of the at least one inorganic compound. A method of producing a coating material is described herein that includes: providing at least one inorganic compound, providing at least one densifying agent, combining the at least one inorganic compound with the at least one densifying agent to form the coating material, wherein the densifying agent increases the density of the coating material as compared to the density of the at least one inorganic compound.
摘要翻译：本文描述了包括至少一种无机化合物和至少一种致密化剂的涂层材料，其中与至少一种无机化合物的密度相比，致密化剂增加涂层材料的密度。本文描述了制备涂料的方法，其包括：提供至少一种无机化合物，提供至少一种致密化剂，将至少一种无机化合物与至少一种致密化剂结合以形成涂层材料，其中致密化与至少一种无机化合物的密度相比，增加了涂层材料的密度。

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