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1. 发明授权

US06364745B1 Mapping system for semiconductor wafer cassettes 有权
标题翻译：半导体晶片盒的映射系统
公开(公告)号：US06364745B1
公开(公告)日：2002-04-02
申请号：US09525315
申请日：2000-03-13
申请人： Jose R. Gonzalez-Martin , Chris Karlsrud , Robert Allen , Toby Jordan , Craig Howard , Arthur Hamer , Jeff Cunnane , Periya Gopalan , Bill Thornton , Jon MacErnie , Fernando Calderon
发明人： Jose R. Gonzalez-Martin , Chris Karlsrud , Robert Allen , Toby Jordan , Craig Howard , Arthur Hamer , Jeff Cunnane , Periya Gopalan , Bill Thornton , Jon MacErnie , Fernando Calderon
IPC分类号： B24B4900
CPC分类号： H01L21/02052 , B24B37/04 , B24B41/005
摘要： An integral machine for polishing, cleaning, rinsing and drying workpieces such as semiconductor wafers. A load/unload station has a plurality of platforms for receiving cassettes of wafers to be processed. A dry end-effector of a robot retrieves wafers from the cassettes and transfers them to an index table. A transfer apparatus having wafer carrier elements picks up wafers from the index table, moves the wafers to a polishing table for polishing, and returns the wafers to the index table for further processing. A flipper moves the polished wafers to a cleaning station. The cleaning station includes scrub stations, a rinsing station and a spin dryer station, and a connective system of water tracks. A wet end-effector of the robot transfers rinsed wafers to the spin dryer station. The dry end-effector of the robot moves dried wafers from the spin dryer station back to the cassette of origination.
摘要翻译：用于抛光，清洁，漂洗和干燥工件如半导体晶片的整体机器。装载/卸载站具有用于接收要处理的晶片盒的多个平台。机器的干燥末端执行器从盒中取出晶片并将它们转移到索引表。具有晶片载体元件的转印装置从分度台拾取晶片，将晶片移动到用于抛光的抛光台，并将晶片返回到索引表以进行进一步处理。抛光器将抛光的晶片移动到清洁站。清洁站包括洗刷站，漂洗站和旋转干燥站，以及水道连接系统。机器的湿端部执行器将冲洗的晶片传送到旋转干燥站。机器人的干燥末端执行器将干燥的晶片从旋转干燥器站移回到起始盒。

2. 发明授权

US06350177B1 Combined CMP and wafer cleaning apparatus and associated methods 有权
标题翻译：组合CMP和晶圆清洗装置及相关方法
公开(公告)号：US06350177B1
公开(公告)日：2002-02-26
申请号：US09573621
申请日：2000-05-17
申请人： Jose R. Gonzalez-Martin , Chris Karlsrud , Robert Allen , Toby Jordan , Craig Howard , Arthur Hamer , Jeff Cunnane , Periya Gopalan , Bill Thornton , Jon MacErnie , Fernando Calderon
发明人： Jose R. Gonzalez-Martin , Chris Karlsrud , Robert Allen , Toby Jordan , Craig Howard , Arthur Hamer , Jeff Cunnane , Periya Gopalan , Bill Thornton , Jon MacErnie , Fernando Calderon
IPC分类号： B24B100
CPC分类号： H01L21/02052 , B24B37/04 , B24B41/005
摘要： An integral machine for polishing, cleaning, rinsing and drying workpieces such as semiconductor wafers. A load/unload station has a plurality of platforms for receiving cassettes of wafers to be processed. A dry end-effector of a robot retrieves wafers from the cassettes and transfers them to an index table. A transfer apparatus having wafer carrier elements picks up wafers from the index table, moves the wafers to a polishing table for polishing, and returns the wafers to the index table for further processing. A flipper moves the polished wafers to a cleaning station. The cleaning station includes scrub stations, a rinsing station and a spin dryer station, and a connective system of water tracks. A wet end-effector of the robot transfers rinsed wafers to the spin dryer station. The dry end-effector of the robot moves dried wafers from the spin dryer station back to the cassette of origination.
摘要翻译：用于抛光，清洁，漂洗和干燥工件如半导体晶片的整体机器。装载/卸载站具有用于接收要处理的晶片盒的多个平台。机器的干燥末端执行器从盒中取出晶片并将它们转移到索引表。具有晶片载体元件的转印装置从分度台拾取晶片，将晶片移动到用于抛光的抛光台，并将晶片返回到索引表以进行进一步处理。抛光器将抛光的晶片移动到清洁站。清洁站包括洗刷站，漂洗站和旋转干燥站，以及水道连接系统。机器的湿端部执行器将冲洗的晶片传送到旋转干燥站。机器人的干燥末端执行器将干燥的晶片从旋转干燥器站移回到起始盒。

3. 发明授权

US6029369A Methods for spin drying a workpiece 有权
标题翻译：旋转干燥工件的方法
公开(公告)号：US6029369A
公开(公告)日：2000-02-29
申请号：US361672
申请日：1999-07-26
申请人： Jose R. Gonzalez-Martin , Arthur Hamer , Anand Gupta
发明人： Jose R. Gonzalez-Martin , Arthur Hamer , Anand Gupta
IPC分类号： H01L21/00 , H01L21/687 , F26B5/08
CPC分类号： H01L21/68728 , H01L21/67034 , H01L21/68785 , H01L21/68792
摘要： A spin dryer assembly for drying workpieces such as semiconductor wafers includes a workpiece platform for receiving a workpiece to be dried. A motor is coupled to and spins the platform to effect removal of water and particulates from the workpiece. Gripping fingers are pivotally mounted around the platform and securely grip the workpiece during drying. Spring loaded plungers maintain the gripping fingers in a secured position during drying. A cam ring is vertically movable into and out of contact with the gripping fingers to bias the gripping portions of the fingers outwardly to a release position after drying.
摘要翻译：用于干燥诸如半导体晶片的工件的旋转干燥器组件包括用于接收待干燥的工件的工件平台。马达与平台联接并旋转以实现工件的水和微粒的去除。夹紧指状物可枢转地安装在平台周围并在干燥期间牢固地夹紧工件。弹簧加载的柱塞在干燥过程中将夹紧的手指保持在一个固定的位置。凸轮环可以垂直移动进入和脱离与夹紧指状物的接触，以将干燥后的指状物的把持部分向外偏压到释放位置。

4. 发明授权

US06213853B1 Integral machine for polishing, cleaning, rinsing and drying workpieces 失效
标题翻译：抛光，清洗，漂洗和干燥工件的整体机
公开(公告)号：US06213853B1
公开(公告)日：2001-04-10
申请号：US08926700
申请日：1997-09-10
申请人： Jose R. Gonzalez-Martin , Chris Karlsrud , Robert Allen , Toby Jordan , Craig Howard , Arthur Hamer , Jeff Cunnane , Periya Gopalan , Bill Thornton , Jon MacErnie , Fernando Calderon
发明人： Jose R. Gonzalez-Martin , Chris Karlsrud , Robert Allen , Toby Jordan , Craig Howard , Arthur Hamer , Jeff Cunnane , Periya Gopalan , Bill Thornton , Jon MacErnie , Fernando Calderon
IPC分类号： B24B500
CPC分类号： H01L21/02052 , B24B37/04 , B24B41/005
摘要： An integral machine for polishing, cleaning, rinsing and drying workpieces such as semiconductor wafers. A load/unload station has a plurality of platforms for receiving cassettes of wafers to be processed. A dry end-effector of a robot retrieves wafers from the cassettes and transfers them to an index table. A transfer apparatus having wafer carrier elements picks up wafers from the index table, moves the wafers to a polishing table for polishing, and returns the wafers to the index table for further processing. A flipper moves the polished wafers to a cleaning station. The cleaning station includes scrub stations, a rinsing station and a spin dryer station, and a connective system of water tracks. A wet end-effector of the robot transfers rinsed wafers to the spin dryer station. The dry end-effector of the robot moves dried wafers from the spin dryer station back to the cassette of origination.
摘要翻译：用于抛光，清洁，漂洗和干燥工件如半导体晶片的整体机器。装载/卸载站具有用于接收要处理的晶片盒的多个平台。机器的干燥末端执行器从盒中取出晶片并将它们转移到索引表。具有晶片载体元件的转印装置从分度台拾取晶片，将晶片移动到用于抛光的抛光台，并将晶片返回到索引表以进行进一步处理。抛光器将抛光的晶片移动到清洁站。清洁站包括洗刷站，漂洗站和旋转干燥站，以及水道连接系统。机器的湿端部执行器将冲洗的晶片传送到旋转干燥站。机器人的干燥末端执行器将干燥的晶片从旋转干燥器站移回到起始盒。

5. 发明授权

US5974681A Apparatus for spin drying a workpiece 失效
标题翻译：旋转干燥工件的设备
公开(公告)号：US5974681A
公开(公告)日：1999-11-02
申请号：US927661
申请日：1997-09-10
申请人： Jose R. Gonzalez-Martin , Arthur Hamer
发明人： Jose R. Gonzalez-Martin , Arthur Hamer
IPC分类号： H01L21/00 , H01L21/687 , F26B17/24
CPC分类号： H01L21/68728 , H01L21/67034 , H01L21/68785 , H01L21/68792
摘要： A spin dryer assembly for drying workpieces such as semiconductor wafers includes a workpiece platform for receiving a workpiece to be dried. A motor is coupled to and spins the platform to effect removal of water and particulates from the workpiece. Gripping fingers are pivotally mounted around the platform and securely grip the workpiece during drying. Spring loaded plungers maintain the gripping fingers in a secured position during drying. A cam ring is vertically movable into and out of contact with the gripping fingers to bias the gripping portions of the fingers outwardly to a release position after drying.
摘要翻译：用于干燥诸如半导体晶片的工件的旋转干燥器组件包括用于接收待干燥的工件的工件平台。马达与平台联接并旋转以实现工件的水和微粒的去除。夹紧指状物可枢转地安装在平台周围并在干燥期间牢固地夹紧工件。弹簧加载的柱塞在干燥过程中将夹紧的手指保持在一个固定的位置。凸轮环可以垂直移动进入和脱离与夹紧指状物的接触，以将干燥后的指状物的把持部分向外偏压到释放位置。

6. 发明授权

US4594636A Reactive load drive and surge protection 失效
标题翻译：无功负载驱动和浪涌保护
公开(公告)号：US4594636A
公开(公告)日：1986-06-10
申请号：US534242
申请日：1983-09-21
申请人： Arthur Hamer , Beverley H. Pardoe
发明人： Arthur Hamer , Beverley H. Pardoe
IPC分类号： H02H7/08 , H02H7/122 , H01H47/32
CPC分类号： H02H7/1227 , H02H7/0844
摘要： An electrical drive circuit arrangement to control the energization of a reactive load with a high voltage including a control stage, an electrically isolating control signal transformer and an output stage including power control semiconductor devices and having an energization input for a high voltage electrical supply and an output for the connection of a reactive load, the high voltage being prevented from reaching the control stage via the input of the output stage by the isolating transformer, the control stage including a noise-resistant guard responsive to circuit condition signals to permit or prevent generation of the control signal, the transformer restricting the signal to the output stage to a permitted control signal and the output stage generating a protection signal on a current surge in a connected reactive load, the protection signal being a potential low enough for direct application to the control stage without the need for isolating transfer to protect against the high voltage reaching the control stage and the control stage responsive to the protection signal to act on the control signal and remove any energization of the load by the output stage and protect the stage.
摘要翻译：一种电驱动电路装置，用于控制包括控制级，电绝缘控制信号变压器和包括功率控制半导体器件的输出级的高电压的无功负载的通电，并且具有用于高电压电源的通电输入和用于连接无功负载的输出，通过隔离变压器经由输出级的输入阻止高电压到达控制级，控制级包括响应于电路状态信号的抗噪声保护器，以允许或防止发电的控制信号，变压器将信号限制到输出级到允许的控制信号，并且输出级在连接的无功负载中的电流浪涌上产生保护信号，保护信号是足够低的直接应用于控制阶段无需隔离转移来保护响应于保护信号的高电压到达控制级，控制级作用于控制信号，并且通过输出级去除负载的任何通电并保护级。

7. 发明授权

US4441060A Vibratory conveyor control arrangement 失效
标题翻译：振动输送机控制装置
公开(公告)号：US4441060A
公开(公告)日：1984-04-03
申请号：US244795
申请日：1981-03-17
申请人： Arthur Hamer , Beverley H. Pardoe
发明人： Arthur Hamer , Beverley H. Pardoe
IPC分类号： H02K33/14 , H02K33/02
CPC分类号： H02K33/14
摘要： A control arrangement for vibratory conveyors, including bowl and linear types, in which the vibration frequency is set by the behavior of the conveyor and not by an applied frequency. A sensor, SC, senses the behavior of the conveyor and a frequency, of controlled amplitude and phase, is derived from the sensor output to energize conveyor drive means, AV and AH1 to AH3. User controls (HA, VA, PA) for amplitude and phase can be mark/space adjusters (HMS, VMS, DMS) effective on the base circuits of transistors connected to electromagnetic actuators. Low voltage operation (less than 50v) is provided without proportionally increased current, partly by energy recovery from the inductors in the actuators. Two levels of protection against supply ripple are included (RT, RLA) and the actuator drive can be stabilized against supply variation (MSC). The low-voltage operation provided is both safer and more efficient than mains voltage operation.
摘要翻译：振动输送机的控制装置，包括碗和线性类型，其中振动频率由输送机的行为而不是施加的频率设定。传感器SC感测输送机的行为，并且从传感器输出导出受控幅度和相位的频率，以激励输送机驱动装置AV和AH1至AH3。用于幅度和相位的用户控制（HA，VA，PA）可以是连接到电磁执行器的晶体管的基极上有效的标记/空间调节器（HMS，VMS，DMS）。提供低电压操作（小于50v），没有按比例增加的电流，部分通过来自致动器中的电感器的能量回收。包括两个级别的电源纹波保护（RT，RLA），并且执行器驱动可以针对电源变化（MSC）进行稳定。所提供的低电压操作比电源电压操作更安全和更有效。

8. 发明授权

US4496884A Vibratory conveyor control arrangement 失效
标题翻译：振动输送机控制装置
公开(公告)号：US4496884A
公开(公告)日：1985-01-29
申请号：US595735
申请日：1984-04-02
申请人： Arthur Hamer , Beverley H. Pardoe
发明人： Arthur Hamer , Beverley H. Pardoe
IPC分类号： H02K33/14 , H02K33/02
CPC分类号： H02K33/14
摘要： A control arrangement for vibratory conveyors, including bowl and linear types, in which the vibration frequency is set by the behavior of the conveyor and not by an applied frequency. A sensor, SC, senses the behavior of the conveyor and a frequency, of controlled amplitude and phase, is derived from the sensor output to energize conveyor drive means, AV and AH1 to AH3. User controls (HA, VA, PA) for amplitude and phase can be mark/space adjusters (HMS, VMS, DMS) effective on the base circuits of transistors connected to electromagnetic actuators. Low voltage operation (less than 50v) is provided without proportionally increased current, partly by energy recovery from the inductors in the actuators. Two levels of protection against supply ripple are included (RT, RLA) and the actuator drive can be stabilized against supply variation (MSC). The low-voltage operation provided is both safer and more efficient than mains voltage operation.
摘要翻译：振动输送机的控制装置，包括碗和线性类型，其中振动频率由输送机的行为而不是施加的频率设定。传感器SC感测输送机的行为，并且从传感器输出导出受控幅度和相位的频率，以激励输送机驱动装置AV和AH1至AH3。用于幅度和相位的用户控制（HA，VA，PA）可以是连接到电磁执行器的晶体管的基极上有效的标记/空间调节器（HMS，VMS，DMS）。提供低电压操作（小于50v），没有按比例增加的电流，部分通过来自致动器中的电感器的能量回收。包括两个级别的电源纹波保护（RT，RLA），并且执行器驱动可以针对电源变化（MSC）进行稳定。所提供的低电压操作比电源电压操作更安全和更有效。

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