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    • 2. 发明申请
    • Method and Control Apparatus for Controlling a High-Pressure Fuel Supply Pump
    • 控制高压燃油泵的方法与控制装置
    • US20120000445A1
    • 2012-01-05
    • US13171595
    • 2011-06-29
    • Jonathan BORGMasanori WatanabeKenichiro Tokuo
    • Jonathan BORGMasanori WatanabeKenichiro Tokuo
    • F02M37/06F02D41/26
    • F02D41/3845F02D41/20F02D41/3854F02D2041/2027
    • The present invention relates to a control apparatus 700 for controlling a high-pressure fuel supply pump 100, a computer program product comprising computer program code means configured to adapt a control apparatus 700 for controlling a high-pressure fuel supply pump 100, and a method for controlling a high-pressure fuel supply pump 100 configured to supply pressurized fuel to an internal combustion engine. The high-pressure fuel supply pump 100 comprises a normally-closed type solenoid actuated intake valve 110 configured to be opened or kept open by magnetic force. A control current IC of the solenoid actuated intake valve 110 is controlled for opening the solenoid actuated intake valve 110 by applying a control voltage VC to the solenoid actuated intake valve 110. Controlling a control current IC of the solenoid actuated intake valve 110 comprises increasing the control current IC to a first control current value IC1 for energizing the solenoid actuated intake valve 110. Controlling a control current IC of the solenoid actuated intake valve 110 for opening the solenoid actuated intake valve 110 according to the present invention further comprises reducing the control current IC from the first control current value IC1 to a second control current value IC2 being smaller than the first control current value IC1.
    • 本发明涉及一种用于控制高压燃料供给泵100的控制装置700,包括计算机程序代码装置的计算机程序产品,该计算机程序代码装置被配置为使用于控制高压燃料供应泵100的控制装置700,以及一种方法 用于控制构造成向内燃机供给加压燃料的高压燃料供给泵100。 高压燃料供给泵100包括构造成通过磁力打开或保持打开的常闭型电磁致动进气阀110。 控制电磁致动进气门110的控制电流IC通过向电磁致动的进气门110施加控制电压VC来打开电磁致动的进气门110.控制电磁致动进气门110的控制电流IC包括增加 将电流IC控制到第一控制电流值IC1,以激励电磁致动的进气门110.根据本发明的控制用于打开电磁致动的进气门110的电磁致动进气门110的控制电流IC还包括减小控制电流 IC从第一控制电流值IC1到第二控制电流值IC2小于第一控制电流值IC1。
    • 6. 发明授权
    • Silencing equipment for electric devices
    • 电气设备消音设备
    • US08485310B2
    • 2013-07-16
    • US13044133
    • 2011-03-09
    • Yosuke TanabeMasanori WatanabeAkira GotoShigeyasu TsubakiMasahiko UsuiAkio Idei
    • Yosuke TanabeMasanori WatanabeAkira GotoShigeyasu TsubakiMasahiko UsuiAkio Idei
    • F01N1/04F24F13/24F01N1/00F24F13/00
    • G10K11/172H05K7/20718
    • Silencing equipment provided with one or more flow channels through which cooling air flows has a flow channel forming member that forms the flow channel, and an acoustic absorbent member that is fixed to the flow channel forming member. A resonance type silencer is formed on a wall surface of the flow channel by providing a cavity for the resonance type silencer in the acoustic absorbent member and an aperture for the resonance type silencer in a portion of the flow channel forming member. The resonance type silencer sets a frequency of noise necessary to be reduced based on a peak frequency of noise generated by a fan. The silencing equipment further has a slide member which slides by a slide mechanism to adjust the area of the top of the aperture. The silencing equipment for electronic devices capable of cooling heat generating sections thereof with air has a small and simple structure and can improve a silencing effect by blowing air.
    • 设置有冷却空气流过的一个或多个流动通道的沉降设备具有形成流路的流路形成部件,以及固定在流路形成部件上的吸声部件。 通过在吸声部件中设置共振型消音器的空腔,在流路形成部件的一部分设置共振型消音器的开口,在流路的壁面上形成共振型消音器。 谐振型消声器基于由风扇产生的噪声的峰值频率来设定需要减小的噪声频率。 消音装置还具有滑动构件,滑动构件通过滑动机构滑动以调节孔的顶部的面积。 能够用空气冷却发热部的电子设备的消音装置结构简单,结构简单,能够通过吹送空气来提高消音效果。
    • 7. 发明申请
    • SPUTTERING SYSTEM
    • 喷射系统
    • US20130043128A1
    • 2013-02-21
    • US13583417
    • 2011-03-08
    • Akinori EbeMasanori Watanabe
    • Akinori EbeMasanori Watanabe
    • C23C14/34
    • C23C14/3407C23C14/3464H01J37/34H01J37/3488
    • The present invention aims at providing a sputtering system capable of efficiently generating high-density plasma near the surface of a sputter target and forming a film at a high rate. It also aims at providing a large-area sputtering system and a plasma processing system having a simple structure and allowing the sputter target to be easily attached/detached, maintained, or operated otherwise. The present invention provides a sputtering system in which an inductively-coupled antenna conductor plate is attached to a portion of a vacuum chamber, wherein: a sputter target plate is attached to the inductively-coupled antenna conductor on its plasma formation space side; one end of the antenna conductor is connected to a radio-frequency power source; and the other end is grounded through a capacitor. A plurality of antenna conductors may be provided to form a large-area sputtering system.
    • 本发明的目的在于提供一种溅射系统,其能够在溅射靶的表面附近有效地生成高密度等离子体并以高速率形成膜。 它还旨在提供具有简单结构的大面积溅射系统和等离子体处理系统,并且允许溅射靶容易地附接/分离,维持或操作。 本发明提供一种溅射系统,其中感应耦合的天线导体板附着在真空室的一部分上,其中:溅射靶板安装在其等离子体形成空间侧的电感耦合天线导体上; 天线导体的一端连接到射频电源; 另一端通过电容器接地。 可以提供多个天线导体以形成大面积溅射系统。