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    • 1. 发明授权
    • Predictive failure monitoring system for a mass flow controller
    • 质量流量控制器的预测故障监控系统
    • US06205409B1
    • 2001-03-20
    • US09105282
    • 1998-06-26
    • John G. Zvonar
    • John G. Zvonar
    • G01F2500
    • G01F25/00G05D7/0635Y10T137/7759
    • By monitoring the output voltage of a mass flow controller (MFC) there is no way to detect when a MFC is starting to degrade (or beginning to fail) as long as the MFC output voltage is driven to match the MFC setpoint voltage. Only when the MFC actually fails, and the MFC output voltage is unable to be driven to match the MFC setpoint voltage, is the failure detectable. A predictive failure monitoring system for a mass flow controller (MFC) is disclosed which monitors the “valve voltage” of the MFC as well as the MFC output voltage. By knowing the normal relationship between the MFC setpoint voltage and the respective valve voltage, then degradation or other changes may be noticed before the MFC actually fails, and importantly, before production material is ruined by the failing MFC. Such a real-time monitoring capability may be transparently implemented as an add-on module between the MFC and the system controller for the MFC. The add-on module may be advantageously connected between the MFC card edge connector and the system card edge socket which is normally connected to the MFC card edge connector. The module monitors, in real time, the performance of the MFC by measuring the valve voltage on the valve test point. If determined to be outside of various user-settable limits, then warnings and relay closures may be done. The module can also automatically characterize the MFC operation when known to be proper, then go into a “run” mode to monitor operation and provide indications when operation falls outside of user-settable limits.
    • 只要MFC输出电压被驱动以匹配MFC设定点电压,通过监视质量流量控制器(MFC)的输出电压,无法检测MFC何时开始降级(或开始失效)。 只有当MFC实际故障并且MFC输出电压不能被驱动以匹配MFC设定点电压时,才能检测到故障。 公开了用于质量流量控制器(MFC)的预测故障监测系统,其监测MFC的“阀电压”以及MFC输出电压。 通过了解MFC设定点电压和各个阀门电压之间的正常关系,在MFC实际发生故障之前,可能会注意到退化或其他变化,重要的是在生产材料被故障MFC破坏之前。 这种实时监控功能可以透明地实现为MFC与MFC的系统控制器之间的附加模块。 附加模块可以有利地连接在MFC卡边缘连接器和通常连接到MFC卡边缘连接器的系统卡边缘插座之间。 该模块通过测量阀门测试点上的阀门电压来实时监测MFC的性能。 如果确定在不同的用户可设置的限制之外,则可以进行警告和继电器关闭。 当已知适当时,模块还可以自动表征MFC操作,然后进入“运行”模式以监视操作,并在操作超出用户可设置限制时提供指示。
    • 2. 发明授权
    • Monitor utility for use in manufacturing environment
    • 监控实用程序用于制造环境
    • US5548535A
    • 1996-08-20
    • US335994
    • 1994-11-08
    • John G. Zvonar
    • John G. Zvonar
    • G05B19/418G07C3/00G08B21/00G08B23/00
    • G05B19/4184G05B2219/31323G05B2219/31372G05B2219/31435G05B2219/31452G05B2219/31453G05B2219/32286G05B2219/33209Y02P90/12Y02P90/14Y02P90/20Y02P90/24
    • Method and apparatus for a utility for monitoring, tracking and scheduling the performance of periodic activities in a manufacturing environment is disclosed. In a preferred embodiment, the monitor utility of present invention is a VAX-based menu-driven program that is used to schedule and track periodic activities. erformed on tools and machines, or "entities." In one aspect of the invention, a user may create a family of entities to be monitored and may schedule various monitor items to be performed in connection with each entity, which items may be "triggered" by the occurrence of a designated event a designated number of times or by the elapse of a designated period of time. In another aspect of the invention, the utility may be used easily to generate and display and/or print reports in various formats showing the status of monitor items for a particular family and/or entity. In another aspect of the invention, the utility is capable of sending one or more VAX mail messages to designated users when certain monitor items are due. In addition, the utility may be configured to send a VAX mail warning message to designated users a predetermined amount of time before a monitor item becomes due so that the recipient(s) can take steps to perform the monitor item by the due date. In yet another aspect of the invention, if a monitor item is not performed by the due date, the utility is capable of logging down the entity with which the overdue monitor item is associated.
    • 公开了用于在制造环境中监视,跟踪和调度周期性活动的性能的实用程序的方法和装置。 在优选实施例中,本发明的监视实用程序是用于调度和跟踪周期性活动的基于VAX的菜单驱动程序。 在工具和机器上,或“实体”上发生变化。 在本发明的一个方面,用户可以创建要监视的一系列实体,并且可以安排与每个实体相关联地执行的各种监视项目,哪些项可以通过指定事件的发生指定数字“触发” 的时间或经过指定的时间段。 在本发明的另一方面,该实用程序可以容易地用于生成和/或打印各种格式的报告,显示特定家庭和/或实体的监视项目的状态。 在本发明的另一方面,当某些监视项目到期时,该实用程序能够向指定用户发送一个或多个VAX邮件消息。 此外,该实用程序可以被配置为在监视项目到期之前向指定用户发送预定时间量的VAX邮件警告消息,使得接收者可以在到期日期之前执行监视项目的步骤。 在本发明的另一方面,如果监视项目在到期日期之前未执行,则该实用程序能够记录与逾期监视项目相关联的实体。
    • 3. 发明授权
    • Polysilicon diffusion doping method employing a deposited doped oxide
layer with a highly uniform thickness
    • 采用具有高度均匀厚度的沉积掺杂氧化物层的多晶硅扩散掺杂方法
    • US5895259A
    • 1999-04-20
    • US647637
    • 1996-05-15
    • W. Mark CarterAllen L. EvansJohn G. Zvonar
    • W. Mark CarterAllen L. EvansJohn G. Zvonar
    • H01L21/28H01L21/3215H01L21/44
    • H01L21/28035H01L21/32155Y10S148/051Y10S438/914Y10S438/915
    • A polysilicon diffusion doping method which employs a deposited dopant-rich oxide layer with a highly uniform distribution of dopant atoms and thickness. Polysilicon layers 1,500 angstroms thick have been doped, achieving average resistance values of 60 ohms and non-uniformity values of 5 percent. Resistance values were measured using the four-point probe method with probe spacings of 0.10 cm. After a polysilicon layer has been formed upon a surface of a silicon wafer, a dopant-rich oxide layer is deposited upon the polysilicon layer at reduced pressure. The dopant-rich oxide layer is deposited, and serves as a source of dopant atoms during the subsequent diffusion process. The dopant-rich oxide layer is a phosphosilicate glass (PSG) including phosphorus pentoxide (P.sub.2 O.sub.5) and phosphorus trioxide (P.sub.2 O.sub.3) and deposited using a PECVD technique. Following deposition of the dopant-rich oxide layer, the silicon wafer is heated to drive dopant atoms from the dopant-rich oxide layer into the underlying polysilicon layer, and to electrically activate the dopant atoms within the polysilicon layer. The presence of electrically active dopant atoms within the polysilicon layer lowers the electrical resistivity of the polysilicon layer. After the heating step, the dopant-rich oxide layer is removed.
    • 一种多晶硅扩散掺杂方法,其使用具有掺杂剂原子和厚度的高度均匀分布的沉积的掺杂剂浓的氧化物层。 已经掺杂了1500埃厚的多晶硅层,实现了60欧姆的平均电阻值和5%的非均匀性值。 使用探针间距为0.10cm的四点探针法测量电阻值。 在硅晶片的表面上形成多晶硅层之后,在减压下在多晶硅层上沉积富含掺杂剂的氧化物层。 沉积富掺杂剂的氧化物层,并且在随后的扩散过程中用作掺杂剂原子的源。 富含掺杂剂的氧化物层是包含五氧化二磷(P 2 O 5)和三氧化磷(P 2 O 3)的磷硅酸盐玻璃(PSG)并使用PECVD技术沉积。 在沉积掺杂剂富氧化物层之后,加热硅晶片以将掺杂剂原子从富含掺杂剂的氧化物层驱动到下面的多晶硅层中,并激活多晶硅层内的掺杂剂原子。 多晶硅层内电活性掺杂剂原子的存在降低了多晶硅层的电阻率。 在加热步骤之后,去除富含掺杂剂的氧化物层。
    • 6. 发明授权
    • Redundant thermocouple
    • 冗余热电偶
    • US5663899A
    • 1997-09-02
    • US462958
    • 1995-06-05
    • John G. ZvonarJames Taylor
    • John G. ZvonarJames Taylor
    • G01K15/00G01K7/14
    • G01K15/00
    • A temperature sensing system contains a plurality of thermocouple pairs which are connected to an interface. The interface contains a microprocessor and a memory and provides for fault tolerance within the system by comparing measurements from each thermocouple within a thermocouple pair to a predetermined threshold value. If the difference between the thermocouple readings is greater than the threshold value, a malfunction is identified and corrective action is taken. The system determines which thermocouple has malfunctioned by comparing the readings of each of the thermocouples to a projected value based on historical data contained in the memory. The thermocouple whose reading varies to the greatest degree from its associated projected value is identified as the malfunctioning thermocouple. The reading from the properly functioning thermocouple is then used to produce an output signal. A likely cause of the malfunction can also be identified by specifying a short when the malfunctioning thermocouple provides a temperature reading substantially below its projected value, and specifying an open when the malfunctioning thermocouple provides a temperature reading substantially greater than its projected value.
    • 温度感测系统包含多个连接到接口的热电偶对。 该接口包含微处理器和存储器,并通过将热电偶对内的每个热电偶的测量值与预定阈值进行比较来提供系统内的容错。 如果热电偶读数之间的差值大于阈值,则会发现故障并采取纠正措施。 通过将每个热电偶的读数与存储器中包含的历史数据进行比较,可以确定哪个热电偶发生故障。 其读数与其相关联的预测值最大程度变化的热电偶被识别为故障热电偶。 然后使用来自正常工作的热电偶的读数来产生输出信号。 当故障热电偶提供的温度读数显着低于其预计值时,也可以通过指定短路来指定故障的可能原因,并且当故障热电偶提供显着大于其预计值的温度读数时指定打开。
    • 7. 发明授权
    • Wafer fabrication robotic interface unit
    • 晶圆制造机器人接口单元
    • US5455894A
    • 1995-10-03
    • US50575
    • 1993-04-19
    • Michael R. ConboyGreg A. SmesnyKurt W. NichterJohn G. Zvonar
    • Michael R. ConboyGreg A. SmesnyKurt W. NichterJohn G. Zvonar
    • B25J9/16H01L21/00H01L21/677G06F15/00B23P19/00H05K3/30
    • H01L21/67276B25J9/1679H01L21/67769G05B2219/34291G05B2219/37558G05B2219/45026G05B2219/45063Y10S414/137Y10S706/912
    • An improved wafer transfer and monitoring system is described which utilizes a robotic interface unit. The robotic interface unit includes at least one wafer storage location placed proximate to a wafer stepper unit. A robotic arm attached to the interface unit is moveable in three dimensions to move wafers between the wafer storage location and the wafer stepper unit. The robotic interface unit can be placed between a wafer stepper unit and a coater/developer unit to transfer wafers between each unit and to store and monitor wafers placed upon the units and/or upon the wafer storage location. Accordingly, the robotic interface unit can operate in a stand-alone configuration with the wafer stepper or can be integrated between a wafer stepper and a wafer coater/developer. By using a robotic arm, less contaminates are associated with the exposed and readily cleaned arm. As such, the robotic interface unit and integrated system can be used in class I wafer fabrication areas where cleanliness is important, and the ability to track and monitor wafers is also important.
    • 描述了利用机器人接口单元的改进的晶片转移和监测系统。 机器人接口单元包括靠近晶片步进单元放置的至少一个晶片存储位置。 附接到接口单元的机械臂可以在三维上移动以在晶片存储位置和晶片步进单元之间移动晶片。 机器人接口单元可以放置在晶片步进单元和涂布机/显影单元之间,以在每个单元之间传送晶片,并且存储和监视放置在单元上和/或晶片存储位置的晶片。 因此,机器人接口单元可以与晶片步进器一起工作在独立结构中,或者可以集成在晶片步进器和晶片涂布机/显影剂之间。 通过使用机器人手臂,较少的污染物与暴露且容易清洁的手臂相关联。 因此,机器人接口单元和集成系统可用于清洁度重要的I类晶圆制造领域,并且跟踪和监视晶片的能力也很重要。