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1. 发明授权

US4455561A Electron beam driven ink jet printer 失效
标题翻译：电子束驱动喷墨打印机
公开(公告)号：US4455561A
公开(公告)日：1984-06-19
申请号：US443710
申请日：1982-11-22
申请人： James H. Boyden , Donald R. Bradbury , Garrett A. Garrettson , Timothy R. Groves , Lawrence R. Hanlon , Armand P. Neukermans
发明人： James H. Boyden , Donald R. Bradbury , Garrett A. Garrettson , Timothy R. Groves , Lawrence R. Hanlon , Armand P. Neukermans
IPC分类号： B41J2/05 , B41J2/14 , G01D15/18
CPC分类号： B41J2/14104 , B41J2002/14387
摘要： A new type of thermal ink jet print head is provided which is driven by an electron beam. The print head is constructed of an electron permeable thin film (electron window) which in one embodiment, has on one of its surfaces a plurality of electron absorbing (heater) pads that are in thermal contact with an ink reservoir. As electrons from a CRT traverse the thin film and are absorbed by a pad, they introduce an extremely large and rapid temperature increase in the pad. As a result, a sufficient amount of thermal energy is absorbed by the ink to cause a vapor explosion within the ink, thereby ejecting ink droplets from a nearby orifice in the ink reservoir. In another embodiment, the electrons traverse the window and are absorbed in the ink rather than in pads, and in another embodiment the electrons are absorbed directly in the window itself.
摘要翻译：提供一种由电子束驱动的新型热喷墨打印头。打印头由电子透射薄膜（电子窗）构成，在一个实施例中，其一个表面上具有与墨水储存器热接触的多个电子吸收（加热器）垫。当来自CRT的电子穿过薄膜并被衬垫吸收时，它们在衬垫中引入非常大且快速的温度升高。结果，足够量的热能被墨水吸收，从而在墨水内引起蒸汽爆炸，从而从墨水容器中的附近孔口喷出墨滴。在另一个实施例中，电子穿过窗口并被吸收在墨中而不是在垫中，而在另一个实施例中，电子直接被吸收在窗口本身中。

2. 发明授权

US5585629A Electron beam nano-metrology system 失效
标题翻译：电子束纳米计量系统
公开(公告)号：US5585629A
公开(公告)日：1996-12-17
申请号：US584988
申请日：1996-01-11
申请人： Samuel K. Doran , William A. Enichen , Timothy R. Groves , Rodney A. Kendall , Henri A. Khoury , Richard D. Moore , Paul F. Petric , James D. Rockrohr
发明人： Samuel K. Doran , William A. Enichen , Timothy R. Groves , Rodney A. Kendall , Henri A. Khoury , Richard D. Moore , Paul F. Petric , James D. Rockrohr
IPC分类号： G01B15/00 , H01J37/073 , H01J37/08 , H01J37/12 , H01J37/147 , H01J37/20 , H01J37/244 , H01J37/28
CPC分类号： G01B15/00 , H01J37/28 , H01J2237/2814
摘要： An electron beam nanometer-level metrology tool includes an ambient temperature electron source and a movable stage for mounting a workpiece. The stage is adapted to position the workpiece's surface in a beam interrogation region. Electrostatic focus lenses convert electrons emitted by the electron source into a beam with a focal point that is positioned in the beam interrogation region. The lenses cause the electron beam to traverse a path that is generally orthogonal to the workpiece surface. Along the beam path are positioned upper and lower electrostatic deflection plates which are connected to an adjustable voltage source that applies ganged, opposite-sense d/c potentials thereto. Those potentials enable a scanning of the beam across the beam interrogation region while the beam remains substantially orthogonal to the workpiece surface, thereby enabling more accurate measurements of surface features. Within the metrology tool, all beam control surfaces are electrostatic so as to minimize power dissipation and temperature differentials.
摘要翻译：电子束纳米级计量工具包括环境温度电子源和用于安装工件的活动台。该台适于将工件的表面定位在光束询问区域中。静电聚焦透镜将由电子源发射的电子转换成具有位于光束询问区域中的焦点的光束。透镜使电子束穿过大体正交于工件表面的路径。沿着光束路径定位上和下静电偏转板，其连接到可调节的电压源，该可调电压源向其施加组合的，相反的d / c电位。这些电位使得能够在光束询问区域上扫描光束，同时光束保持基本上垂直于工件表面，从而使得能够更精确地测量表面特征。在计量工具中，所有光束控制表面都是静电的，以便最小化功耗和温差。

3. 发明授权

US06822248B2 Spatial phase locking with shaped electron beam lithography 有权
标题翻译：具有形状电子束光刻的空间相位锁定
公开(公告)号：US06822248B2
公开(公告)日：2004-11-23
申请号：US09809766
申请日：2001-03-15
申请人： Juan Ferrera , James G. Goodberlet , Timothy R. Groves , John G. Hartley , Mark K. Mondol , Mark L. Schattenburg , Henry I. Smith
发明人： Juan Ferrera , James G. Goodberlet , Timothy R. Groves , John G. Hartley , Mark K. Mondol , Mark L. Schattenburg , Henry I. Smith
IPC分类号： H01J3708
CPC分类号： H01J37/3174 , G03F1/78 , H01J37/3045
摘要： Fine positioning of a shaped or patterned charged particle beam without use of intrusive fiducial marks is achieved by providing a dithered shadow pattern, preferably in the form of a grid, within the shaped or patterned charged particle beam. Light output from fiducial marks preferably formed of a scintillating material is reduced when the dithered shadow pattern is incident on some or all of the fiducial marks. The timing of the incidence of the shadow pattern on fiducial marks indicates the position of the shaped or patterned charged particle beam such that correction of the beam position on the target can be corrected to a small fraction of system resolution. The dither pattern and repetition period is chosen to avoid interference with uniformity of beam illumination of the target. Feedback of position error thus provides phase locked position correction in real time and is suitable for mask making since the fiducial marks are not intrusive.
摘要翻译：通过在成形或图案化的带电粒子束内提供优选为栅格形式的抖动阴影图案，实现成形或图案化带电粒子束的精细定位而不使用侵入性基准标记。当抖动的阴影图案入射到一些或所有基准标记上时，优选由闪烁材料形成的基准标记的光输出减小。阴影图案在基准标记上的发生时间表示成形或图案化的带电粒子束的位置，使得可以将目标上的光束位置的校正校正到系统分辨率的一小部分。选择抖动图案和重复周期以避免对目标的光束照明的均匀性的干扰。位置误差的反馈因此提供实时的锁相位置校正，并且适合于掩模制作，因为基准标记不是侵入的。

4. 发明授权

US06175122B1 Method for writing a pattern using multiple variable shaped electron beams 失效
标题翻译：使用多个可变形电子束写入图案的方法
公开(公告)号：US06175122B1
公开(公告)日：2001-01-16
申请号：US09004815
申请日：1998-01-09
申请人： Timothy R. Groves , Rodney A. Kendall
发明人： Timothy R. Groves , Rodney A. Kendall
IPC分类号： H01J37302
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3177 , H01J2237/31776
摘要： A method of operating multiple beam direct write e-beam system employs a set of miniature beam writing modules acting in parallel, each of which employs the combination of a uniform magnetic field and a uniform parallel electric field to form an image of a low-brightness electron emitting surface and also to modify the shape of an initially square beam, thereby producing a set of separately and independently modified beams; the modified beams are deflected in parallel by the same magnetic field and a uniform transverse electric field to cover a desired area; emitters, beamshaping deflection electrodes and fine-deflection electrodes are formed by microlithographic techniques.
摘要翻译：一种操作多光束直接写入电子束系统的方法采用一组并行的微型光束写入模块，每个微型光束写入模块采用均匀磁场和均匀平行电场的组合，以形成低亮度的图像电子发射表面，并且还修改初始方波束的形状，从而产生一组单独和独立地修改的光束; 修改的光束通过相同的磁场和均匀的横向电场平行偏转以覆盖期望的区域; 发射体，光束成形偏转电极和细偏转电极通过微光刻技术形成。

5. 发明授权

US4737644A Conductive coated semiconductor electrostatic deflection plates 失效
标题翻译：导电涂层半导体静电偏转板
公开(公告)号：US4737644A
公开(公告)日：1988-04-12
申请号：US793046
申请日：1985-10-30
申请人： Douglas G. Cullum , George J. Giuffre , Timothy R. Groves , Werner Stickel , Maris A. Sturans
发明人： Douglas G. Cullum , George J. Giuffre , Timothy R. Groves , Werner Stickel , Maris A. Sturans
IPC分类号： B41J2/085 , H01J3/30 , H01J29/74 , H01J37/147 , H01J3/14
CPC分类号： H01J37/1477 , B41J2/085 , H01J3/30
摘要： An electrostatic deflection plate for charged particle beam systems is formed of a planar semiconductive substrate having a conductive region at the substrate surface. The conductive region is diffused or implanted into the body of the substrate, or one or more conductive layers are deposited upon the substrate surface. The substrate material is preferably silicon and the diffused or implanted region is formed of a nonmagnetic, nonoxidizable metal such as gold or platinum. The deposited conductive region may be formed of a single layer of these or similar metals, one or more conductive underlayers with a nonmagnetic, nonoxidizable overlayer, a single or multilayer structure with a conductive oxide on the outermost layer, or a metallo-organic compound which forms a conductive layer during following heat treatment. The deflection plates are fabricated using conventional semiconductor processes and form durable structures which minimize eddy current effects.
摘要翻译：用于带电粒子束系统的静电偏转板由在基板表面具有导电区域的平面半导体基板形成。导电区域被扩散或注入到衬底的主体中，或者一个或多个导电层沉积在衬底表面上。基底材料优选为硅，并且扩散或注入的区域由非磁性，不可氧化的金属如金或铂形成。沉积的导电区域可以由这些或类似金属的单层形成，一个或多个具有非磁性，不可氧化覆盖层的导电底层，在最外层具有导电氧化物的单层或多层结构或金属有机化合物，在随后的热处理期间形成导电层。偏转板使用传统的半导体工艺制造，并形成耐久结构，使涡流效应最小化。

6. 发明授权

US06369396B1 Calibration target for electron beams 失效
标题翻译：电子束校准目标
公开(公告)号：US06369396B1
公开(公告)日：2002-04-09
申请号：US09408350
申请日：1999-09-29
申请人： John G. Hartley , Timothy R. Groves , Rodney A. Kendall , Maris A. Sturans
发明人： John G. Hartley , Timothy R. Groves , Rodney A. Kendall , Maris A. Sturans
IPC分类号： G03F900
CPC分类号： H05H6/00 , H01J37/02 , H01J2237/30433
摘要： A scattering target for use in a particle beam system is formed from a grid of gold on a substrate of carbon, with an intermediate smoothing layer (e.g. copper) on the carbon to provide a surface sufficiently smooth to provide an adequate target. An optional bonding layer may be used to improve adhesion between the gold and the smoothing layer.
摘要翻译：用于粒子束系统的散射靶由碳基底上的金格栅形成，在碳上具有中间平滑层（例如铜），以提供足够光滑的表面以提供足够的靶。可以使用任选的粘合层来改善金和平滑层之间的粘附。

7. 发明授权

US5981962A Distributed direct write lithography system using multiple variable shaped electron beams 失效
标题翻译：使用多个可变形电子束的分布式直写光刻系统
公开(公告)号：US5981962A
公开(公告)日：1999-11-09
申请号：US4814
申请日：1998-01-09
申请人： Timothy R. Groves , Rodney A. Kendall
发明人： Timothy R. Groves , Rodney A. Kendall
IPC分类号： H01J37/30 , H01J37/317 , H01J37/302
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J37/3174 , H01J2237/31774
摘要： A multiple beam direct write e-beam system employs a set of miniature beam writing modules acting in parallel, each of which employs the combination of a uniform magnetic field and a uniform parallel electric field to form an image of a low-brightness electron emitting surface and also to modify the shape of an initially square beam, thereby producing a set of separately and independently modified beams; the modified beams are deflected in parallel by the same magnetic field and a uniform transverse electric field to cover a desired area; emitters, beamshaping deflection electrodes and fine-deflection electrodes are formed by microlithographic techniques.
摘要翻译：多光束直接写入电子束系统采用一组并行的微型光束写入模块，每组都采用均匀磁场和均匀平行电场的组合，以形成低亮度电子发射表面的图像并且还修改初始方波束的形状，从而产生一组单独且独立的修改的波束; 修改的光束通过相同的磁场和均匀的横向电场平行偏转以覆盖期望的区域; 发射体，光束成形偏转电极和微偏转电极通过微光刻技术形成。

8. 发明授权

US4859856A Telecentric sub-field deflection with vail 失效
标题翻译：远心子场偏转与vail
公开(公告)号：US4859856A
公开(公告)日：1989-08-22
申请号：US142035
申请日：1988-01-11
申请人： Timothy R. Groves , Hans C. Pfeiffer , Werner Stickel , Maris A. Sturans
发明人： Timothy R. Groves , Hans C. Pfeiffer , Werner Stickel , Maris A. Sturans
IPC分类号： H01J37/04 , H01J37/141 , H01J37/147 , H01J37/305 , H01L21/027
CPC分类号： H01J37/141 , H01J37/1474
摘要： A two staqge, electron beam projection system includes a target, a source of an electron beam and means for projecting an electron beam towards the target with its upper surface defining a target plane. A magnetic projection lens has a principal plane and a back focal plane located between said means for projecting and the target. The means for projecting provides an electron beam directed towards the target. First stage means provides deflection of the beam from area to area within a field. Second stage means provides for deflection of the beam for providing deflection of the beam within an area within a field. The beam crossing the back focal plane produces a telecentric condition of the beam in the image plane with the beam substantially normal to the target plane from the principal plane to the target plane. The magnetic projection lens includes a magnetic structure providing for magnetic compensation positioned within the bore of the projection lens, which produces a compensating magnetic field substantially proportional to the first derivative of the axial magnetic projection field. The axial magnetic projection field provides substantially a zero first derivative of the axial magnetic projection field in the vicinity of the target. The projection system projects on the target plane from the projection system as deflected by the upper and lower stages, at all times maintaining the telecentric condition of the electron beam at the target plane throughout the entire range of deflection of the beam, assuring minimum errors due to target height variations.

9. 发明授权

US06296976B1 Compensation of within-subfield linewidth variation in e-beam projection lithography 失效
标题翻译：电子束投影光刻中子场内线宽变化的补偿
公开(公告)号：US06296976B1
公开(公告)日：2001-10-02
申请号：US09333931
申请日：1999-06-16
申请人： Timothy R. Groves , Steven D. Golladay , Hans C. Pfeiffer
发明人： Timothy R. Groves , Steven D. Golladay , Hans C. Pfeiffer
IPC分类号： G03F900
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/06 , H01J37/3174 , H01J2237/0653 , Y10S430/143
摘要： A method for improving image fidelity on a resist. The method adjusts the intensity distribution of the electron beam such that the feature size at the edges and the center of a subfield have a same width “w”. This is accomplished by intentionally increasing the incident intensity where the images are small (more pronounced blurring), and intentionally decreasing the incident intensity where the images are large (less pronounced blurring). This can be achieved, for example, by maintaining a cathode temperature profile which increases or decreases radially by an appropriate amount.
摘要翻译：一种提高抗蚀剂图像保真度的方法。该方法调整电子束的强度分布，使得子区域的边缘和中心处的特征尺寸具有相同的宽度“w”。这是通过有意识地增加图像较小（更明显的模糊）的入射强度，并有意降低图像大的模糊的较少的入射强度来实现的。这可以通过例如维持一个适当量的径向增加或减小的阴极温度分布来实现。

10. 发明授权

US5962859A Multiple variable shaped electron beam system with lithographic structure 失效
标题翻译：具有光刻结构的多变量电子束系统
公开(公告)号：US5962859A
公开(公告)日：1999-10-05
申请号：US004816
申请日：1998-01-09
申请人： Timothy R. Groves , Rodney A. Kendall
发明人： Timothy R. Groves , Rodney A. Kendall
IPC分类号： H01J37/30 , H01J37/317 , H01J37/304 , H01J37/147
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J37/3174 , H01J2237/31774
摘要： A multiple beam direct write e-beam system employs a set of miniature beam writing modules acting in parallel, each of which employs the combination of a uniform magnetic field and a uniform parallel electric field to form an image of a low-brightness electron emitting surface and also to modify the shape of an initially square beam, thereby producing a set of separately and independently modified beams, in which emitters, beamshaping deflection electrodes and fine-deflection electrodes are formed by microlithographic techniques.
摘要翻译：多光束直接写入电子束系统采用一组并行的微型光束写入模块，每组都采用均匀磁场和均匀平行电场的组合，以形成低亮度电子发射表面的图像并且还可以修改初始方波束的形状，由此产生一组单独和独立的修改的光束，其中通过微光刻技术形成发射器，波束形成的偏转电极和精细偏转电极。

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