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1. 发明授权

US07771574B2 Sputtering cathode for coating processes 失效
标题翻译：用于涂层工艺的溅射阴极
公开(公告)号：US07771574B2
公开(公告)日：2010-08-10
申请号：US10889996
申请日：2004-07-13
申请人： Jürgen Ulrich , Peter Sauer
发明人： Jürgen Ulrich , Peter Sauer
IPC分类号： C25B9/00 , C25B11/00 , C25B13/00 , C23C14/00
CPC分类号： C23C14/3407 , C23C14/35 , H01J37/3435 , H01J37/3497
摘要： A sputtering cathode (1) for coating processes in a vacuum chamber (18) comprises one at least single-piece target plate (2) mounted on a metallic diaphragm (3). On the side of the diaphragm (3) facing away from the target plate (2) is disposed a cooling agent channel with an inflow line (9) and an outflow line (10) for a cooling agent and a hollow space (7) for at least one magnet system (5). The magnet system (5) is disposed in a supporting tub (6) sealed against the diaphragm (3) and not exposed to the cooling agent. The entire configuration is disposed on a supporting structure (12). In order to improve the heat transfer from the target plate (2) to the cooling agent in simple, efficient and cost-effective manner and to avoid the hazard of the cooling agent penetrating into the vacuum chamber, the invention provides that a) the supporting structure (12) for the sputtering cathode (1) comprises a hollow body (13), which is closed gas-tight against the interior space of the vacuum chamber (18) and which connects the hollow space (7) encompassing the magnet system (5) with the atmosphere outside of the vacuum chamber (18), b) the cooling agent channel is implemented as a conduit (4) closed on its cross sectional periphery with at least one flat side (4a) in thermally conducting connection with the diaphragm (3), and that c) the diaphragm (3) and the surfaces of the conduit (4) facing away from the diaphragm (3) are exposed via said supporting structure (12) to the atmospheric pressure outside of the vacuum chamber (18).
摘要翻译：用于在真空室（18）中涂覆工艺的溅射阴极（1）包括安装在金属隔膜（3）上的至少一个单件靶板（2）。在离开目标板（2）的隔膜（3）的一侧设置有具有用于冷却剂的流入管线（9）和流出管线（10）的冷却剂通道和用于至少一个磁体系统（5）。磁体系统（5）设置在与隔膜（3）密封并且不暴露于冷却剂的支撑桶（6）中。整个配置设置在支撑结构（12）上。为了以简单，高效和成本有效的方式改善从目标板（2）到冷却剂的热传递，并且避免冷却剂渗透到真空室中的危险，本发明提供：a）支撑用于溅射阴极（1）的结构（12）包括中空体（13），该中空体（13）被气密地封闭在真空室（18）的内部空间上，并连接包围磁体系统的中空空间（7） 5）具有真空室（18）外部的气氛，b）冷却剂通道被实施为在其横截面周边上封闭的导管（4），其中至少一个平坦侧面（4a）与隔膜（3），并且c）隔膜（3）和导管（4）的远离隔膜（3）的表面经由所述支撑结构（12）暴露于真空室（18）外部的大气压力）。

2. 发明授权

US06881270B1 Electrode arrangement 失效
标题翻译：电极排列
公开(公告)号：US06881270B1
公开(公告)日：2005-04-19
申请号：US09710769
申请日：2000-11-09
申请人： Thomas Gebele , Jurgen Henrich , Stefan Bangert , Jürgen Honekamp , Elisabeth Budke , Jürgen Ulrich , Helmut Grimm
发明人： Thomas Gebele , Jurgen Henrich , Stefan Bangert , Jürgen Honekamp , Elisabeth Budke , Jürgen Ulrich , Helmut Grimm
IPC分类号： C23C14/24 , C23C14/32 , H01J37/32 , C23C16/00 , H05H1/02
CPC分类号： H01J37/32055 , C23C14/325 , H01J37/32422 , H01J37/32532
摘要： An electrode arrangement for the plasma-aided coating of a substrate (3) with a layer of material comprising at least one first and a second material component and for the production of a plasma discharge, more especially an arc discharge (35), having an anode arrangement (5), which provides the first material component at an anode material surface (13) for evaporation, and a cathode arrangement (7), which provides the second material component at a cathode material surface (25). The electrode arrangement is characterized in that the cathode material surface (25) is constituted by an evaporation-active part (27) supporting the plasma discharge (35) and an evaporation-inactive part (41) not supporting the plasma discharge. Preferably, a motion-producing means (49) is provided for moving the evaporation-inactive part (41) over the cathode material surface (25) in order to reduce deposit of material due to he first material component on the cathode material surface (25).
摘要翻译：一种用于衬底（3）的等离子体辅助涂层的电极装置，其具有包括至少一种第一和第二材料组分的材料层，并且用于产生等离子体放电，更特别是电弧放电（35），具有阳极装置（5），其在用于蒸发的阳极材料表面（13）处提供第一材料部件，以及在阴极材料表面（25）处提供第二材料部件的阴极装置（7）。电极装置的特征在于，阴极材料表面（25）由支撑等离子体放电（35）的蒸发活性部分（27）和不支持等离子体放电的蒸发非活性部分（41）构成。优选地，提供运动产生装置（49），用于将蒸发非活性部分（41）移动到阴极材料表面（25）上，以便减少由于第一材料成分在阴极材料表面（25）上沉积的材料）。

3. 发明授权

US06335054B1 Air lock for introducing substrates to and/or removing them from a treatment chamber 有权
标题翻译：用于将基材引入和/或将其从处理室中移出的气锁
公开(公告)号：US06335054B1
公开(公告)日：2002-01-01
申请号：US09631940
申请日：2000-08-03
申请人： Tomas Baumecker , Helmut Grimm , Jürgen Henrich , Klaus Michael , Gert Rödling , Jürgen Ulrich
发明人： Tomas Baumecker , Helmut Grimm , Jürgen Henrich , Klaus Michael , Gert Rödling , Jürgen Ulrich
IPC分类号： C23C1400
CPC分类号： C23C16/54 , B65G21/00 , C23C14/56
摘要： In an air lock for continuous introduction into and/or removal of workpieces from spaces (1, 4) separated atmospherically, the individual substrates (3, 13) are transported through a transfer channel (24). At least one lock chamber (7a-7m) serving to accommodate the substrates (3, 13) is arranged movably in the transfer channel (24). During the substrate transport in the transfer channel (24), the lock chamber (7a-7m) is atmospherically separated both from the exterior (1) having normal pressure and from the coating chamber (4). The air lock (2) includes a carrousel lock which has a carrousel housing (24) and a lock chamber wheel (10). On the periphery in the lock chamber wheel (10) individual lock chambers (7a-7m) are provided, in which the workpieces (3, 13) to be brought into the chamber to be loaded (4) are inserted freely accessible on the normal pressure side. By turning the lock chamber wheel (10), the substrates (3, 13) in the lock chambers (7a-7m) are transported from the coating station [sic; loading station] (A) to the transfer station (B) into the treatment chamber (4) diametrically opposite the normal pressure side. In the transfer station (B) the substrates (3, 13) are removed from the transfer channels (7a-7m) by means of a transfer device (17′) and are available for further treatment in the treatment chamber (4).
摘要翻译：在用于从空气分离的空间（1,4）中连续引入和/或移除工件的气锁中，各个基板（3,13）通过传送通道（24）传送。用于容纳基板（3,13）的至少一个锁定室（7a-7m）可移动地布置在输送通道（24）中。在传送通道（24）中的基板传送期间，锁定室（7a-7m）与具有常压的外部（1）和涂覆室（4）大气分离。气锁（2）包括具有转盘壳体（24）和锁室轮（10）的转盘锁。在锁定室轮（10）的周边上，设置有单独的锁定室（7a-7m），其中待进入待装载室（4）的工件（3,13）在正常情况下自由地接近压力侧。通过转动锁定室轮（10），锁定室（7a-7m）中的基板（3,13）从涂布站传送; 装载站]（A）到转运站（B）进入与正常压力侧直径相对的处理室（4）。在转运站（B）中，借助于转移装置（17'）将基板（3,13）从转移通道（7a-7m）中移出，并且可用于在处理室（4）中进一步处理。

4. 发明授权

US06196154B1 Air lock for introducing substrates to and/or removing them from a treatment chamber 有权
标题翻译：用于将基材引入和/或将其从处理室中移出的气锁
公开(公告)号：US06196154B1
公开(公告)日：2001-03-06
申请号：US09249445
申请日：1999-02-12
申请人： Tomas Baumecker , Helmut Grimm , Jürgen Henrich , Klaus Michael , Gert Rödling , Jürgen Ulrich
发明人： Tomas Baumecker , Helmut Grimm , Jürgen Henrich , Klaus Michael , Gert Rödling , Jürgen Ulrich
IPC分类号： C23C1600
CPC分类号： C23C16/54 , B65G21/00 , C23C14/56
摘要： In an air lock for continuous introduction into and/or removal of workpieces from spaces (1,4) separated atmospherically, the individual substrates (3,13) are transported through a transfer channel (24). At least one lock chamber (7a-7m) serving to accommodate the substrates (3,13) is arranged movably in the transfer channel (24). During the substrate transport in the transfer channel (24), the lock chamber (7a-7m) is atmospherically separated both from the exterior (1) having normal pressure and from the coating chamber (4). The air lock (2) includes a carrousel lock which has a carrousel housing (24) and a lock chamber wheel (10). On the periphery in the lock chamber wheel (10) individual lock chambers (7a-7m) are provided, in which the workpieces (3,13) to be brought into the chamber to be loaded (4) are inserted freely accessible on the normal pressure side. By turning the lock chamber wheel (10), the substrates (3,13) in the lock chambers (7a-7m) are transported from the coating station (A) to the transfer station (B) into the treatment chamber (4) diametrically opposite the normal pressure side. In the transfer station (B) the substrates (3,13) are removed from the transfer channels (7a-7m) by means of a transfer device (17′) and are available for further treatment in the treatment chamber (4). The treatment chamber (4) includes, for instance, of a vacuum-coating chamber in which the workpieces (3,13) as the substrates to be coated are coated by a vacuum-supported coating method.
摘要翻译：在用于从气氛分离的空间（1,4）连续引入和/或移除工件的气锁中，各个基板（3,13）通过传送通道（24）传送。用于容纳基板（3,13）的至少一个锁定室（7a-7m）可移动地布置在输送通道（24）中。在传送通道（24）中的基板传送期间，锁定室（7a-7m）与具有常压的外部（1）和涂覆室（4）大气分离。气锁（2）包括具有转盘壳体（24）和锁室轮（10）的转盘锁。在锁室轮（10）的周边设有单独的锁定室（7a-7m），其中待进入待加载室的工件（3,13）可以在正常情况下自由地接近压力侧。通过转动锁定室轮（10），锁定室（7a-7m）中的基板（3,13）从涂覆站（A）到转印站（B）沿直径传送到处理室（4）与正常压力侧相反。在传送站（B）中，通过传送装置（17'）从传送通道（7a-7m）移除基板（3,13），并且可用于在处理室（4）中进一步处理。处理室（4）例如包括真空涂布室，其中作为待涂布的基板的工件（3,13）通过真空支撑的涂覆方法被涂覆。

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