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    • 1. 发明申请
    • TFT ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
    • TFT阵列基板及其制造方法
    • US20100230676A1
    • 2010-09-16
    • US12581438
    • 2009-10-19
    • Hsien Tang HUChien Chih HsiaoChih Hung Tsai
    • Hsien Tang HUChien Chih HsiaoChih Hung Tsai
    • H01L29/786H01L21/336
    • H01L29/4908H01L27/124H01L29/458
    • A TFT array substrate includes a substrate, at least one gate line and gate electrode, a gate insulating layer, and at least one channel component, source electrode, drain electrode and data line. The gate line and gate electrode are disposed on the substrate, wherein both of the gate line and gate electrode have first and second conductive layers, the first conductive layer is formed on the substrate, the first conductive layer contains molybdenum nitride, the second conductive layer is formed on the first conductive layer, and the second conductive layer contains copper. The gate insulating layer is disposed on the gate line, gate electrode and the substrate. The channel component is disposed on the gate insulating layer. The source electrode and drain electrode are disposed on the channel component, and data line is disposed on the gate insulating layer.
    • TFT阵列基板包括基板,至少一个栅极线和栅极电极,栅极绝缘层以及至少一个沟道部件,源电极,漏电极和数据线。 栅极线和栅电极设置在基板上,其中栅极线和栅电极都具有第一和第二导电层,第一导电层形成在基板上,第一导电层含有氮化钼,第二导电层 形成在第一导电层上,第二导电层含有铜。 栅极绝缘层设置在栅极线,栅电极和基板上。 沟道部件设置在栅极绝缘层上。 源电极和漏极设置在沟道部件上,并且数据线设置在栅极绝缘层上。
    • 2. 发明申请
    • TFT ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
    • TFT阵列基板及其制造方法
    • US20120264260A1
    • 2012-10-18
    • US13527983
    • 2012-06-20
    • Hsien Tang HUChien Chih HSIAOChih Hung TSAI
    • Hsien Tang HUChien Chih HSIAOChih Hung TSAI
    • H01L21/336
    • H01L29/4908H01L27/124H01L29/458
    • A TFT array substrate includes a substrate, at least one gate line and gate electrode, a gate insulating layer, and at least one channel component, source electrode, drain electrode and data line. The gate line and gate electrode are disposed on the substrate, wherein both of the gate line and gate electrode have first and second conductive layers, the first conductive layer is formed on the substrate, the first conductive layer contains molybdenum nitride , the second conductive layer is formed on the first conductive layer, and the second conductive layer contains copper. The gate insulating layer is disposed on the gate line, gate electrode and the substrate. The channel component is disposed on the gate insulating layer. The source electrode and drain electrode are disposed on the channel component, and data line is disposed on the gate insulating layer.
    • TFT阵列基板包括基板,至少一个栅极线和栅极电极,栅极绝缘层以及至少一个沟道部件,源电极,漏电极和数据线。 栅极线和栅电极设置在基板上,其中栅极线和栅电极都具有第一和第二导电层,第一导电层形成在基板上,第一导电层含有氮化钼,第二导电层 形成在第一导电层上,第二导电层含有铜。 栅极绝缘层设置在栅极线,栅极电极和基板上。 沟道部件设置在栅极绝缘层上。 源电极和漏极设置在沟道部件上,并且数据线设置在栅极绝缘层上。