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1. 发明授权

US06985215B2 Plasma processing method and plasma processing apparatus 有权
标题翻译：等离子体处理方法和等离子体处理装置
公开(公告)号：US06985215B2
公开(公告)日：2006-01-10
申请号：US11055612
申请日：2005-02-11
申请人： Hin Oh , Hideaki Sato , Naoki Takayama , Hisanori Sakai , Yuichi Mimura
发明人： Hin Oh , Hideaki Sato , Naoki Takayama , Hisanori Sakai , Yuichi Mimura
IPC分类号： H01L21/3065 , G01J3/28 , G01J3/30
CPC分类号： H01J37/32935
摘要： In a plasma processing method and apparatus for monitoring information on a plasma processing, a multivariate analysis is performed by using as analysis data detection values detected for each object to be processed from a plurality of detection devices disposed in the processing apparatus upon the plasma processing. At that time, for each of sections defined whenever a maintenance of the processing apparatus is carried out, the detection values detected by the detection devices in the respective sections are compensated through a compensation unit, and the compensated detection values are taken as the analysis data.
摘要翻译：在用于监视等离子体处理信息的等离子体处理方法和装置中，通过在等离子体处理时，从设置在处理装置中的多个检测装置中使用作为对待处理对象检测的分析数据检测值，进行多变量分析。此时，对于执行处理装置的维护而定义的每个部分，通过补偿单元补偿由各个部分中的检测装置检测的检测值，并将补偿的检测值作为分析数据。

2. 发明申请

US20050146709A1 Plasma processing method and plasma processing apparatus 有权
标题翻译：等离子体处理方法和等离子体处理装置
公开(公告)号：US20050146709A1
公开(公告)日：2005-07-07
申请号：US11055612
申请日：2005-02-11
申请人： Hin Oh , Hideaki Sato , Naoki Takayama , Hisanori Sakai , Yuichi Mimura
发明人： Hin Oh , Hideaki Sato , Naoki Takayama , Hisanori Sakai , Yuichi Mimura
IPC分类号： G01J3/28 , G01J3/30 , H01J37/32 , H01L21/3065
CPC分类号： H01J37/32935
摘要： In a plasma processing method and apparatus for monitoring information on a plasma processing, a multivariate analysis is performed by using as analysis data detection values detected for each object to be processed from a plurality of detection devices disposed in the processing apparatus upon the plasma processing. At that time, for each of sections defined whenever a maintenance of the processing apparatus is carried out, the detection values detected by the detection devices in the respective sections are compensated through a compensation unit, and the compensated detection values are taken as the analysis data.
摘要翻译：在用于监视等离子体处理信息的等离子体处理方法和装置中，通过在等离子体处理时，从设置在处理装置中的多个检测装置中使用作为对待处理对象检测的分析数据检测值，进行多变量分析。此时，对于执行处理装置的维护而定义的每个部分，通过补偿单元补偿由各个部分中的检测装置检测的检测值，并将补偿的检测值作为分析数据。

3. 发明授权

US5101110A Ion generator 失效
标题翻译：离子发生器
公开(公告)号：US5101110A
公开(公告)日：1992-03-31
申请号：US611046
申请日：1990-11-09
申请人： Masahiko Matsudo , Akira Koshiishi , Naoki Takayama , Kohei Kawamura
发明人： Masahiko Matsudo , Akira Koshiishi , Naoki Takayama , Kohei Kawamura
IPC分类号： H01J27/20 , H01J37/08
CPC分类号： H01J37/08 , H01J27/20 , H01J2237/30
摘要： An ion generator comprises an electron-generating chamber and an ion-generating chamber. Ions are generated by introducing a raw material gas into the ion-generating chamber and irradiating the raw material gas with electrodes generated in the electron-generating chamber. The ions, thus generated, are drawn by ion-collecting electrodes and guided out of the ion-generating chamber through a slit formed in the ion output section of the ion-generating chamber. That corner of the ion-generating chamber which faces the ion-collecting electrodes is curved, and that outer wall of the ion-generating chamber which faces the ion-collecting electrodes is specular. With this structure, an undesirable spark discharge does not easily take place with reference to the ion-collecting electrodes, so that damage to the structural components of the ion generator is suppressed. Further, the ion output section is removable from the main body of the ion-generating chamber. Therefore, only the ion output section can be replaced with a new one, if it is worn out.
摘要翻译：离子发生器包括电子发生室和离子产生室。通过将原料气体引入离子产生室并用在电子发生室中产生的电极照射原料气体而产生离子。这样产生的离子被离子收集电极拉出，并通过形成在离子产生室的离子输出部分中的狭缝引出离子产生室。面向离子收集电极的离子产生室的角是弯曲的，离子收集电极的面向离子收集电极的外壁是镜面的。利用这种结构，参考离子收集电极不容易发生不期望的火花放电，从而抑制对离子发生器的结构部件的损坏。此外，离子输出部分可从离子产生室的主体移除。因此，只有离子输出部分可以被更换新的离子输出部分。

4. 发明授权

US5089747A Electron beam excitation ion source 失效
标题翻译：电子束激发离子源
公开(公告)号：US5089747A
公开(公告)日：1992-02-18
申请号：US480765
申请日：1990-02-16
申请人： Akira Koshiishi , Kohei Kawamura , Naoki Takayama
发明人： Akira Koshiishi , Kohei Kawamura , Naoki Takayama
IPC分类号： H01J27/20 , H01J37/08
CPC分类号： H01J37/08 , H01J27/20
摘要： An electron beam excitation ion source includes a housing having an ion generation chamber therein, a port for supplying a discharge gas to the ion generation chamber, a porous electrode for supplying accelerated electrons to the ion generation chamber from an electron generation chamber, causing the accelerated electrons to collide against the discharge gas to generate a plasma containing ions in the ion generation chamber. The housing have an ion extraction slit port through which the ions are extracted from the ion generation chamber outside the housing. An electrode is formed around the ion extraction port, for causing a local discharge around the ion extraction port so as to guide the ions in the plasma to the ion extraction port.
摘要翻译：电子束激发离子源包括其中具有离子产生室的壳体，用于向离子产生室供给放电气体的端口，用于从电子发生室向离子产生室提供加速电子的多孔电极，电子与放电气体碰撞以在离子产生室中产生含有离子的等离子体。壳体具有离子提取狭缝端口，离子从外壳外部的离子产生室中提取离子。在离子提取口周围形成电极，用于在离子提取口周围局部放电，以将等离子体中的离子引导到离子提取口。

5. 发明申请

US20050126709A1 Plasma processing method, detecting method of completion of seasoning, plasma processing apparatus and storage medium 有权
标题翻译：等离子体处理方法，完成调味料的检测方法，等离子体处理装置和储存介质
公开(公告)号：US20050126709A1
公开(公告)日：2005-06-16
申请号：US10937905
申请日：2004-09-10
申请人： Naoki Takayama , Bin Wang , Satoshi Harada
发明人： Naoki Takayama , Bin Wang , Satoshi Harada
IPC分类号： H01L21/00 , C23F1/00
CPC分类号： H01L21/67253
摘要： With analysis data in the prior art, it is difficult to find out if a change regarded as a judgmental standard of the completion of seasoning has come from a change due to the seasoning, namely, change in condition of the interior of a processing container or come from another change based on a temperature change among respective dummy wafers and furthermore, it is difficult to judge whether the seasoning has been completed or not. Therefore, a plasma processing method of the present invention, which is a method for detecting the completion of seasoning in performing the seasoning by loading dummy wafers W into a processing container 2 of a plasma processing apparatus 1, includes a process of creating a predictive formula for predicting the completion of seasoning and another process of detecting the completion of seasoning in performing the seasoning, based on the predictive formula. The creation of the predictive formula is accomplished by performing a multivariate analysis against a plurality of measured data that can be obtained by first supplying dummy wafers W into the processing container 2, cooling down the interior of the processing container 2 and supplying a plurality of dummy wafers W into the processing container 2 again.
摘要翻译：通过现有技术的分析数据，难以确定作为调味品完成的判断标准的变化是否来自调味品的变化，即处理容器的内部状况的变化或来自基于各个虚拟晶片之间的温度变化的另一变化，此外，难以判断调味是否已经完成。因此，本发明的等离子体处理方法是通过将虚拟晶片W装载到等离子体处理装置1的处理容器2中来进行调味的完成调查的方法，包括：生成预测式根据预测公式预测调味料的完成情况和进行调味料调查完成情况的另一个过程。通过对多个测量数据执行多变量分析来实现预测公式的创建，该多个测量数据可以通过首先将虚拟晶片W提供到处理容器2中，冷却处理容器2的内部并提供多个虚拟晶片W再次进入处理容器2。

6. 发明授权

US06334983B1 Processing system 有权
标题翻译：处理系统
公开(公告)号：US06334983B1
公开(公告)日：2002-01-01
申请号：US09402393
申请日：1999-10-05
申请人： Nobuyuki Okayama , Hidehito Saegusa , Jun Ozawa , Daisuke Hayashi , Naoki Takayama , Koichi Kazama
发明人： Nobuyuki Okayama , Hidehito Saegusa , Jun Ozawa , Daisuke Hayashi , Naoki Takayama , Koichi Kazama
IPC分类号： B01J1908
CPC分类号： C23C16/45565 , C23C16/455 , C23C16/5096 , H01J37/3244 , H01J37/32477 , Y10T29/49002 , Y10T29/49117 , Y10T29/532 , Y10T29/53204
摘要： A processing system has an upper electrode with gas discharge holes of a shape corresponding to the external we of insulating members. The insulating members are formed of a poly(ether etherketone) resin, a polyimide resin, a poly(ether imide) resin or the like. Each insulating member has a step at its outer surface and an internal longitudinal through hole tapered to expand toward the processing chamber. The insulating members are pressed in the gas discharge holes to bring the steps into contact with shoulders formed in the sidewalls of the gas discharge holes. A part of each insulting member, as fitted in the gas discharge hole, projects from a surface of the upper electrode that faces a susceptor.
摘要翻译：处理系统具有具有与绝缘构件的外部对应的形状的气体排出孔的上部电极。绝缘构件由聚（醚醚酮）树脂，聚酰亚胺树脂，聚（醚酰亚胺）树脂等形成。每个绝缘构件在其外表面具有台阶，并且内部纵向通孔锥形以向处理室扩展。绝缘构件被压在气体排放孔中，使台阶与气体排放孔的侧壁中形成的肩部接触。每个绝缘构件的一部分安装在气体排放孔中，从面向基座的上部电极的表面突出。

7. 发明授权

US06195223B1 Cartridge insertion/discharge opening structure of recording/reproduction unit for library apparatus, and library apparatus 失效
标题翻译：图书馆装置的记录/再现单元的盒式插入/排出开口结构和库设备
公开(公告)号：US06195223B1
公开(公告)日：2001-02-27
申请号：US09047657
申请日：1998-03-25
申请人： Toshihito Kanetsuku , Kenichi Utsumi , Takahisa Miyamoto , Naoki Takayama
发明人： Toshihito Kanetsuku , Kenichi Utsumi , Takahisa Miyamoto , Naoki Takayama
IPC分类号： G11B1568
CPC分类号： G11B17/225 , G11B15/6835
摘要： The present invention is for the purpose of allowing a transferring mechanism to certainly carry out the direct insertion/extraction of a cartridge into/from a recording/reproduction unit. For this purpose, in a structure according to this invention, introduction guides (a guide member) for guiding the cartridge to be inserted from the external through an accessor (the transferring mechanism) toward the interior of a deck (the recording/reproduction unit) is provided in a cartridge insertion/discharge opening section of the deck. The introduction guides are formed to have tapered surfaces broadening out from the deck to the external. Further, this invention is applicable to a large-capacity external storage memory storing a large number of cartridges such as magnetic tape cartridges and optical disk cartridges.
摘要翻译：本发明的目的是允许传送机构肯定地执行将盒直接插入/从记录/再现单元中取出。为此，在根据本发明的结构中，用于将从外部插入的盒通过存取器（传送机构）朝向甲板（记录/再现单元）的内部引导的引导引导件（引导构件）设置在甲板的盒插入/排出开口部分中。引入引导件形成为具有从甲板扩展到外部的锥形表面。此外，本发明可应用于存储诸如磁带盒和光盘盒的大量盒的大容量外部存储存储器。

8. 发明授权

US5252892A Plasma processing apparatus 失效
标题翻译：等离子体处理装置
公开(公告)号：US5252892A
公开(公告)日：1993-10-12
申请号：US786009
申请日：1991-10-31
申请人： Akira Koshiishi , Kohei Kawamura , Masahiko Matsudo , Naoki Takayama
发明人： Akira Koshiishi , Kohei Kawamura , Masahiko Matsudo , Naoki Takayama
IPC分类号： H01J27/20 , H01J37/32 , H05H1/24 , H05H1/02
CPC分类号： H01J37/32495 , H01J27/20 , H01J37/3233 , H01J37/32559 , H05H1/24
摘要： A plasma processing apparatus includes a filament mounted in an electron generation chamber for producing plasma of a discharge gas, thereby generating electrons. The electrons are supplied from the electron generation chamber into an ion generation chamber through electron passage hole between both chambers to produce plasma of a processing gas inside the ion generation chamber. The chambers are formed of conductive ceramics to constitute electrodes.
摘要翻译：等离子体处理装置包括安装在用于产生放电气体的等离子体的电子发生室中的灯丝，从而产生电子。电子从电子发生室通过两个室之间的电子通过孔供给到离子发生室，以产生离子产生室内的处理气体的等离子体。这些室由导电陶瓷形成以构成电极。

9. 发明授权

US4749912A Ion-producing apparatus 失效
标题翻译：离子产生装置
公开(公告)号：US4749912A
公开(公告)日：1988-06-07
申请号：US54496
申请日：1987-05-27
申请人： Tamio Hara , Manabu Hamagaki , Yoshinobu Aoyagi , Susumu Namba , Nobuo Ishii , Naoki Takayama , Kohei Kawamura
发明人： Tamio Hara , Manabu Hamagaki , Yoshinobu Aoyagi , Susumu Namba , Nobuo Ishii , Naoki Takayama , Kohei Kawamura
IPC分类号： H01J27/08 , G01T1/20 , H01J27/00
CPC分类号： H01J27/08
摘要： An ion-producing apparatus comprises an electron-producing vessel having an electron-producing chamber, an ion-producing vessel having an ion-producing chamber communicating with the electron-producing chamber, a cathode provided at one end of the electron-producing vessel, an accelerating electrode provided within the ion-producing chamber, for allowing passage of electrons, an anode provided between the cathode and the accelerating electrode, and a power supply circuit for providing a potential difference between the cathode and the anode, thereby to produce electrons in the gap between the cathode and the anode. A vacuum pump is provided for evacuating gas from the ion-producing chamber. A partition is provided within the electron-producing vessel, between the cathode and the anode to divide the electron-producing vessel into a cathode-side chamber and an anode-side chamber, and hinders a gas flow from the cathode-side chamber to the anode-side chamber to apply a pressure difference between both chambers.
摘要翻译：离子产生装置包括具有电子产生室的电子产生容器，具有与电子产生室连通的离子产生室的离子产生容器，设置在电子产生容器的一端的阴极，设置在离子产生室内的用于允许电子通过的加速电极，设置在阴极和加速电极之间的阳极，以及用于在阴极和阳极之间提供电位差的电源电路，从而在阴极和阳极之间的间隙。提供真空泵用于从离子产生室排出气体。在电子产生容器内，在阴极和阳极之间设置隔板，以将电子产生容器分成阴极侧室和阳极侧室，并阻止气体从阴极侧室流向阳极侧室，以在两个室之间施加压力差。

10. 再颁专利

USRE40046E1 Processing system 失效
标题翻译：处理系统
公开(公告)号：USRE40046E1
公开(公告)日：2008-02-12
申请号：US10463439
申请日：1998-04-08
申请人： Nobuyuki Okayama , Hidehito Saegusa , Jun Ozawa , Daisuke Hayashi , Naoki Takayama , Koichi Kazama
发明人： Nobuyuki Okayama , Hidehito Saegusa , Jun Ozawa , Daisuke Hayashi , Naoki Takayama , Koichi Kazama
IPC分类号： B23P19/00 , H01L21/306
CPC分类号： C23C16/45565 , C23C16/455 , C23C16/5096 , H01J37/3244 , H01J37/32477 , Y10T29/49002 , Y10T29/49117 , Y10T29/532 , Y10T29/53204
摘要： A processing system has an upper electrode with gas discharge holes of a shape corresponding to the external we of insulating members. The insulating members are formed of a poly(ether etherketone) resin, a polyimide resin, a poly(ether imide) resin or the like. Each insulating member has a step at its outer surface and an internal longitudinal through hole tapered to expand toward the processing chamber. The insulating members are pressed in the gas discharge holes to bring the steps into contact with shoulders formed in the sidewalls of the gas discharge holes. A part of each insulating member, as fitted in the gas discharge hole, projects from a surface of the upper electrode that faces a susceptor.
摘要翻译：处理系统具有具有与绝缘构件的外部对应的形状的气体排出孔的上部电极。绝缘构件由聚（醚醚酮）树脂，聚酰亚胺树脂，聚（醚酰亚胺）树脂等形成。每个绝缘构件在其外表面具有台阶，并且内部纵向通孔锥形以向处理室扩展。绝缘构件被压在气体排放孔中，使台阶与气体排放孔的侧壁中形成的肩部接触。每个绝缘构件的安装在气体排出孔中的部分从面向基座的上电极的表面突出。

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