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    • 5. 发明申请
    • Patterning substrate and cell culture substrate
    • 图案化底物和细胞培养基质
    • US20080213857A1
    • 2008-09-04
    • US12002863
    • 2007-12-19
    • Hideyuki MiyakeHideshi HattoriHironori Kobayashi
    • Hideyuki MiyakeHideshi HattoriHironori Kobayashi
    • C12N11/14
    • C12N5/0068C12N2533/12C12N2533/30C12N2535/10
    • The present invention intends primarily to provide such as a cell culture patterning substrate that is used to adhere cells in a highly precise pattern on a base material to culture and a cell culture substrate on which cells is adhered in a highly precise pattern.In order to attain the object, the invention provides a patterning substrate comprising a base material, a photocatalyst-containing layer which is formed on the base material and comprises at least a photocatalyst, and a cell adhesion-inhibiting layer which is formed on the photocatalyst-containing layer and comprises a cell adhesion-inhibiting material that has cell adhesion-inhibiting properties of inhibiting adhesion to cells and is decomposed or denatured by action of the photocatalyst on the basis of irradiation with energy.
    • 本发明主要提供用于将细胞以高精度图案粘附到培养基材上的细胞培养图案形成基材和以高精度图案粘附细胞的细胞培养基质。 为了达到上述目的,本发明提供一种图案形成基材,其包含基材,含有光催化剂的层,其形成在基材上,并且至少包含光催化剂,以及在光催化剂上形成的细胞粘附抑制层 并且包含细胞粘附抑制材料,其具有抑制细胞粘附的细胞粘附抑制性质,并且通过基于光能照射的光催化剂的作用而分解或变性。