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1. 发明申请

US20220028650A1 CHARGED PARTICLE BEAM APPARATUS 有权
公开(公告)号：US20220028650A1
公开(公告)日：2022-01-27
申请号：US17295978
申请日：2018-11-30
申请人： Hitachi High-Tech Corporation
发明人： Takafumi Miwa , Seiichiro Kanno , Go Miya
IPC分类号： H01J37/244 , H01J37/26 , H01J37/22 , H01J37/20
摘要： Provided is a charged particle beam apparatus capable of analyzing foreign matters generated when a sample is transported or observed. The charged particle beam apparatus includes a sample stage on which a measurement sample is provided, a charged particle beam source that irradiates the measurement sample with a charged particle beam, and a detector that detects charged particles emitted by irradiation with the charged particle beam, and includes a foreign matter observation sample held on the sample stage together with the measurement sample and a foreign matter observation unit that causes a foreign matter to be observed on the foreign matter observation sample.

2. 发明授权

US10790111B2 Charged-particle beam device 有权
公开(公告)号：US10790111B2
公开(公告)日：2020-09-29
申请号：US16479356
申请日：2017-02-24
申请人： Hitachi High-Tech Corporation
发明人： Seiichiro Kanno , Hiroyuki Andou
IPC分类号： H01J37/02 , H01J37/20
摘要： The objective of the present invention is to provide a charged-particle beam device wherein suppressing the effects of static build-up is compatible with executing high-throughput measurements and examination. In order to achieve this objective, proposed is the charged-particle beam device equipped with an electrostatic chuck (803), comprising an electrometer (11) for measuring the electric potential of the electrostatic chuck, a charge removing device (805) for removing charge from the electrostatic chuck, and a control device (806) for controlling the charge removing device in such a manner that the charge removal by the charge removing device is executed after reaching a certain number of processed samples irradiated by the charged particle beam, or after a predetermined processing time. When the result of the electric potential measurement by the electrometer does not meet a predetermined condition, the control device executes at least one among increasing and decreasing the number processed or the processing time.

3. 发明授权

US12106930B2 Charged particle beam device 有权
公开(公告)号：US12106930B2
公开(公告)日：2024-10-01
申请号：US17778599
申请日：2019-12-23
申请人： Hitachi High-Tech Corporation
发明人： Takafumi Miwa , Go Miya , Kazuma Tanii , Seiichiro Kanno
IPC分类号： H01J37/12 , H01J37/28
CPC分类号： H01J37/12 , H01J37/28 , H01J2237/022
摘要： Provided is a charged particle beam device capable of reducing scattering of a foreign substance collected by a foreign substance collecting unit. The charged particle beam device includes: a sample chamber in which a sample is to be disposed; and a charged particle beam source configured to irradiate the sample with a charged particle beam. The charged particle beam device further includes: a foreign substance attachment/detachment unit from or to which a foreign substance is to detach or attach; and a foreign substance collecting unit provided in the sample chamber and configured to collect a foreign substance dropped from the foreign substance attachment/detachment unit. An opening through which the foreign substance passes is provided in an upper end portion of the foreign substance collecting unit. An area of the opening is smaller than a horizontal cross-sectional area of an internal space of the foreign substance collecting unit.

4. 发明授权

US11735394B2 Charged particle beam apparatus 有权
公开(公告)号：US11735394B2
公开(公告)日：2023-08-22
申请号：US17295978
申请日：2018-11-30
申请人： Hitachi High-Tech Corporation
发明人： Takafumi Miwa , Seiichiro Kanno , Go Miya
IPC分类号： H01J37/244 , H01J37/20 , H01J37/22 , H01J37/26
CPC分类号： H01J37/244 , H01J37/20 , H01J37/22 , H01J37/26
摘要： Provided is a charged particle beam apparatus capable of analyzing foreign matters generated when a sample is transported or observed. The charged particle beam apparatus includes a sample stage on which a measurement sample is provided, a charged particle beam source that irradiates the measurement sample with a charged particle beam, and a detector that detects charged particles emitted by irradiation with the charged particle beam, and includes a foreign matter observation sample held on the sample stage together with the measurement sample and a foreign matter observation unit that causes a foreign matter to be observed on the foreign matter observation sample.

5. 发明授权

US10903036B2 Charged-particle beam device 有权
公开(公告)号：US10903036B2
公开(公告)日：2021-01-26
申请号：US17005630
申请日：2020-08-28
申请人： Hitachi High-Tech Corporation
发明人： Seiichiro Kanno , Hiroyuki Andou
IPC分类号： H01J37/20 , H02N13/00 , H01J37/02
摘要： A charged-particle beam device wherein suppressing the effects of static build-up is compatible with executing high-throughput measurements and examination. The charged-particle beam device equipped with an electrostatic chuck (803), includes an electrometer (11) for measuring the electric potential of the electrostatic chuck, a charge removing device (805) for removing charge from the electrostatic chuck, and a control device (806) for controlling the charge removing device in such a manner that the charge removal by the charge removing device is executed after reaching a certain number of processed samples irradiated by the charged particle beam, or after a predetermined processing time. When the result of the electric potential measurement by the electrometer does not meet a predetermined condition, the control device executes at least one among increasing and decreasing the number processed or the processing time.

6. 发明授权

US11929231B2 Charged particle beam device 有权
公开(公告)号：US11929231B2
公开(公告)日：2024-03-12
申请号：US17725151
申请日：2022-04-20
申请人： HITACHI HIGH-TECH CORPORATION
发明人： Akito Tanokuchi , Seiichiro Kanno , Kei Shibayama
IPC分类号： H01J37/20 , H01J37/28
CPC分类号： H01J37/20 , H01J37/28 , H01J2237/2007 , H01J2237/202
摘要： A charged particle beam device suppresses sample deformation caused by placing a sample on a suctioning surface of an electrostatic chuck mechanism, the sample having a temperature different from the suctioning surface. The charged particle beam device includes the electrostatic chuck mechanism; a stage (200) which moves a sample, which is to be irradiated with a charged particle beam, relative to an irradiation position of the charged particle beam; an insulating body (203) which is disposed on the stage and constitutes a dielectric layer of the electrostatic chuck; a first support member (402) which supports the insulating body on the stage; a ring-shaped electrode (400) which encloses the surroundings of the sample and is installed on the insulating body in a contactless manner, and to which a predetermined voltage is applied; and a second support member (405) which supports the ring-shaped electrode.

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