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1. 发明授权

US5957764A Modular wafer polishing apparatus and method 失效
标题翻译：模块化晶圆抛光装置及方法
公开(公告)号：US5957764A
公开(公告)日：1999-09-28
申请号：US964930
申请日：1997-11-05
申请人： H. Alexander Anderson , Linh X. Can , Tsungnan Cheng , Garry K. Kwong , Albert Hu , David Chen , Shu-Wong S. Lee
发明人： H. Alexander Anderson , Linh X. Can , Tsungnan Cheng , Garry K. Kwong , Albert Hu , David Chen , Shu-Wong S. Lee
IPC分类号： B24B21/04 , B24B37/04 , B24B5/00 , B24B29/00
CPC分类号： B24B21/04 , B24B37/04
摘要： A wafer polishing apparatus includes a module frame; a continuous belt rotatable with respect to the frame, the belt having at least one vertically-oriented belt transverse portion including a polishing pad assembly; and at least one pivotable wafer-holding head drive within the frame and having a distal end portion movable to a vertical first position parallel and juxtaposed to the belt transverse portion. The head drive includes a wafer carrier for holding a wafer on the distal end portion of the head drive, while a drive moves the distal end portion and a held wafer into a vertical polishing position abutting the belt transverse portion and pressure is applied to the held-wafer against the polishing pad assembly while the wafer-holding distal end portion is rotated and swept side-by-side. After polishing the drive is reversed and the head drive is pivoted away from the belt transverse portion to a horizontal or other orientation and the then polished wafer removed. Multiple modules may be placed end-to-end or side-by-side with a robot pathway therebetween to load unpolished wafers and to unload polished wafers to a buffing station, to a cassette or other processing station.
摘要翻译：晶片抛光装置包括模块框架; 相对于框架可旋转的连续带，所述带具有包括抛光垫组件的至少一个垂直定向的带横向部分; 以及在所述框架内的至少一个可枢转的晶片保持头驱动器，并且具有可移动到平行并并列到所述带横向部分的垂直第一位置的远端部分。头驱动器包括用于将晶片保持在头驱动器的远端部分的晶片载体，同时驱动器将远端部分和保持的晶片移动到邻近带横向部分的垂直抛光位置，并且压力施加到保持的 - 在晶片保持前端部分旋转并且并排扫掠的同时，抵靠抛光垫组件。在抛光之后，驱动器被反转并且头驱动器从带横向部分转动到水平或其它方向，并且然后抛光晶片。多个模块可以端对端或并排地放置在其间的机器人通路以加载未抛光的晶片并将抛光的晶片卸载到抛光台，到盒或其它处理站。

2. 发明授权

US06315857B1 Polishing pad shaping and patterning 失效
标题翻译：抛光垫成型和图案化
公开(公告)号：US06315857B1
公开(公告)日：2001-11-13
申请号：US09113714
申请日：1998-07-10
申请人： Tsungnan Cheng , Ethan C. Wilson , Shou-sung Chang , Gregory C. Lee , Huey M. Tzeng , David E. Weldon , Linh X. Can , Luis Lau , Siyuan Yang
发明人： Tsungnan Cheng , Ethan C. Wilson , Shou-sung Chang , Gregory C. Lee , Huey M. Tzeng , David E. Weldon , Linh X. Can , Luis Lau , Siyuan Yang
IPC分类号： B24B2100
CPC分类号： B24B37/26 , B24D11/00
摘要： Polishing pads are provided for a linear chemical mechanical polishing apparatus used in manufacturing integrated circuits. The polishing pads, which are attached to a polishing belt, are grooved in patterns to advantageously transport slurry from the point of introduction to the point at which semiconductor wafers are polished. The patterns include at least one set of multiple parallel grooves extending across the polishing pads. The grooves form an angle with the direction of travel of the belt that is unequal to zero.
摘要翻译：为制造集成电路中使用的线性化学机械抛光装置提供抛光垫。附着在抛光带上的抛光垫以图案开槽，以有利地将浆料从导入点输送到半导体晶片被抛光的点。这些图案包括延伸穿过抛光垫的至少一组多个平行凹槽。槽与带的行进方向形成不等于零的角度。

3. 发明授权

US06019670A Method and apparatus for conditioning a polishing pad in a chemical mechanical polishing system 失效
标题翻译：用于在化学机械抛光系统中调理抛光垫的方法和装置
公开(公告)号：US06019670A
公开(公告)日：2000-02-01
申请号：US814436
申请日：1997-03-10
申请人： Tsungnan Cheng , Shou-Chen Kao , Michael T. Sherwood
发明人： Tsungnan Cheng , Shou-Chen Kao , Michael T. Sherwood
IPC分类号： B24B37/32 , B24B53/007 , B24B53/017 , B24B7/00
CPC分类号： B24B37/32 , B24B53/017
摘要： A chemical mechanical polishing apparatus including a carrier head having an integral conditioning member is described. The conditioning member includes a conditioning surface that may selectively be moved into contact with a polishing surface of a polishing pad. The conditioning member may be connected to a surface of the carrier's retaining ring assembly. As a result, the polishing surface may be conditioned either continuously or intermittently when a substrate is loaded in the carrier for polishing.
摘要翻译：描述了包括具有整体调节部件的载体头的化学机械抛光装置。调理部件包括可选择性地移动成与抛光垫的抛光表面接触的调节表面。调理构件可以连接到承载件的保持环组件的表面。结果，当将基板装载在用于抛光的载体中时，抛光表面可以连续地或间歇地调节。

4. 发明授权

US06051499A Apparatus and method for distribution of slurry in a chemical mechanical polishing system 失效
标题翻译：用于在化学机械抛光系统中分配浆料的装置和方法
公开(公告)号：US06051499A
公开(公告)日：2000-04-18
申请号：US982823
申请日：1997-12-02
申请人： Robert D. Tolles , William L. Guthrie , Jeffrey Marks , Tsungnan Cheng , Semyon Spektor , Ivan A. Ocanada , Norm Shendon
发明人： Robert D. Tolles , William L. Guthrie , Jeffrey Marks , Tsungnan Cheng , Semyon Spektor , Ivan A. Ocanada , Norm Shendon
IPC分类号： H01L21/304 , B24B37/04 , B24B57/02 , B24B1/00
CPC分类号： B24B37/04 , B24B57/02
摘要： Slurry is provided to the surface of the polishing pad by pumping the slurry up through a central port, or by dripping the slurry down onto the surface of the polishing pad from a slurry feed tube. A slurry wiper, which may have one or more flexible members, sweeps the slurry evenly and thinly across the polishing pad. A control system coordinates the distribution of slurry to the polishing pad with the motion of the carrier head.
摘要翻译：通过将浆料向上泵送通过中心口，或通过从浆料进料管将浆料向下滴落到抛光垫的表面上而将浆料提供到抛光垫的表面。可以具有一个或多个柔性构件的浆料刮水器将抛光浆料均匀且薄薄地扫过抛光垫。控制系统通过载体头的运动来协调浆料与抛光垫的分布。

5. 发明授权

US06280297B1 Apparatus and method for distribution of slurry in a chemical mechanical polishing system 有权
标题翻译：用于在化学机械抛光系统中分配浆料的装置和方法
公开(公告)号：US06280297B1
公开(公告)日：2001-08-28
申请号：US09481735
申请日：2000-01-11
申请人： Robert D. Tolles , William L. Guthrie , Jeffrey Marks , Tsungnan Cheng
发明人： Robert D. Tolles , William L. Guthrie , Jeffrey Marks , Tsungnan Cheng
IPC分类号： B24B100
CPC分类号： B24B37/04 , B24B57/02
摘要： Slurry is provided to the surface of the polishing pad by pumping the slurry up through a central port, or by dripping the slurry down onto the surface of the polishing pad from a slurry feed tube. A slurry wiper, which may have one or more flexible members, sweeps the slurry evenly and thinly across the polishing pad. A control system coordinates the distribution of slurry to the polishing pad with the motion of the carrier head.
摘要翻译：通过将浆料向上泵送通过中心口，或通过从浆料进料管将浆料向下滴落到抛光垫的表面上而将浆料提供到抛光垫的表面。可以具有一个或多个柔性构件的浆料刮水器将抛光浆料均匀且薄薄地扫过抛光垫。控制系统通过载体头的运动来协调浆料与抛光垫的分布。

6. 发明授权

US5163977A Semi-permeable gas separation membranes containing non-ionic surfactants possessing improved resistance to thermal compaction and processes for making and using the same 失效
标题翻译：含有非离子表面活性剂的半渗透气体分离膜具有改进的耐热压实性，以及制备和使用它的方法
公开(公告)号：US5163977A
公开(公告)日：1992-11-17
申请号：US748493
申请日：1991-08-22
申请人： John A. Jensvold , Tsungnan Cheng , Donald L. Schmidt
发明人： John A. Jensvold , Tsungnan Cheng , Donald L. Schmidt
IPC分类号： B01D53/22 , B01D53/26 , B01D67/00 , B01D71/48 , B01D71/50
CPC分类号： B01D71/50 , B01D53/228 , B01D53/268 , B01D67/0011 , B01D67/0016 , B01D67/0027 , B01D67/003 , B01D69/08 , B01D71/48 , B01D2325/20 , B01D2325/38
摘要： The invention is a semi-permeable gas separation membrane containing a non-ionic surfactant and which possesses improved resistance to thermal compaction or aging. The invention includes a process for making such membranes as well as a method of using such membranes.
摘要翻译：本发明是一种含有非离子表面活性剂的半透气分离膜，具有改进的抗热压缩或老化性能。本发明包括制备这种膜的方法以及使用这种膜的方法。

7. 发明授权

US5795215A Method and apparatus for using a retaining ring to control the edge effect 失效
标题翻译：使用固定环来控制边缘效应的方法和装置
公开(公告)号：US5795215A
公开(公告)日：1998-08-18
申请号：US667221
申请日：1996-06-19
申请人： William L. Guthrie , Tsungnan Cheng , Sen-Hou Ko , Harry Q. Lee , Michael T. Sherwood , Norm Shendon
发明人： William L. Guthrie , Tsungnan Cheng , Sen-Hou Ko , Harry Q. Lee , Michael T. Sherwood , Norm Shendon
IPC分类号： B24B5/00
CPC分类号： B24B5/00
摘要： A process using a retaining ring assembly of a carrier head to precompress a polishing pad to reduce or minimize the edge effect in a chemical mechanical polishing process.
摘要翻译：使用载体头的保持环组件来预压缩抛光垫以减少或最小化化学机械抛光工艺中的边缘效应的方法。

8. 发明授权

US5141530A Polycarbonate, polyester, and polyestercarbonate semi-permeable gas separation membranes possessing improved gas selectivity and recovery, and processes for making and using the same 失效
标题翻译：具有改善的气体选择性和回收率的聚碳酸酯，聚酯和聚酯碳酸酯半透气分离膜及其制备和使用方法
公开(公告)号：US5141530A
公开(公告)日：1992-08-25
申请号：US749002
申请日：1991-08-22
申请人： John A. Jensvold , Tsungnan Cheng , Donald L. Schmidt
发明人： John A. Jensvold , Tsungnan Cheng , Donald L. Schmidt
IPC分类号： B01D67/00 , B01D71/48 , B01D71/50
CPC分类号： B01D67/0088 , B01D71/48 , B01D71/50
摘要： The invention is a semi-permeable gas separation membrane having disposed thereon a non-ionic surfactant. The membrane possesses improved selectivity and recovery. The invention includes a process for making such membranes as well as a method of using such membranes.
摘要翻译：本发明是在其上设置非离子表面活性剂的半透气分离膜。膜具有改善的选择性和回收率。本发明包括制备这种膜的方法以及使用这种膜的方法。

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