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    • 4. 发明申请
    • LASER APPARATUS
    • 激光装置
    • US20160190763A1
    • 2016-06-30
    • US15060148
    • 2016-03-03
    • GIGAPHOTON INC.
    • Kouji KAKIZAKITakeshi ASAYAMAOsamu WAKABAYASHI
    • H01S3/038H01S3/225
    • H01S3/038H01S3/08009H01S3/134H01S3/225
    • There may be provided a laser apparatus including: an optical resonator including an output coupler; a laser chamber containing a laser medium and disposed in an optical path inside the optical resonator; a pair of discharge electrodes disposed inside the laser chamber; an electrode gap varying section configured to vary a gap between the discharge electrodes; a laser beam measurement section disposed in an optical path of a laser beam outputted from the output coupler, the laser beam resulting from electric discharge between the discharge electrodes; and a controller configured to control the gap between the discharge electrodes through activating the electrode gap varying section, based on a beam parameter of the laser beam measured by the laser beam measurement section.
    • 可以提供一种激光装置,包括:包括输出耦合器的光谐振器; 包含激光介质并设置在光学谐振器内的光路中的激光室; 设置在激光室内的一对放电电极; 电极间隙变化部,被配置为改变所述放电电极之间的间隙; 设置在从输出耦合器输出的激光束的光路中的激光束测量部分,由放电电极之间的放电产生的激光束; 以及控制器,被配置为基于由激光束测量部测量的激光束的光束参数来激活电极间隙变化部分来控制放电电极之间的间隙。
    • 7. 发明申请
    • EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS
    • 极光紫外线光源设备
    • US20130126762A1
    • 2013-05-23
    • US13742276
    • 2013-01-15
    • GIGAPHOTON INC.
    • Masato MORIYAHiroshi KOMORITakeshi ASAYAMA
    • H05G2/00
    • H05G2/003G03F7/70033G03F7/70916H05G2/005H05G2/008
    • An extreme ultra violet light source apparatus in which debris moving within a chamber are prevented from reducing reflectance or transmittance of optical elements of an EUV collector mirror, etc, and extreme ultra violet light can stably be generated in a long period. The apparatus includes: a target supply unit for supplying a target to a predetermined position within a chamber; a driver laser for applying a laser beam to the target to generate first plasma; a collector mirror provided within the chamber, for collecting extreme ultra violet light radiated from the first plasma; a gas supply unit for supplying a gas into the chamber; an excitation unit for exciting the gas to generate second plasma around a region where the first plasma is generated; and an exhaust unit for exhausting the chamber and ejecting debris emitted from the first plasma to outside of the chamber.
    • 能够防止在室内移动的碎屑减少EUV收集镜等的光学元件的反射率或透射率的极端紫外线光源装置,能够长时间稳定地产生极紫外光。 该装置包括:目标供给单元,用于将目标供给到室内的预定位置; 用于将激光束施加到所述靶以产生第一等离子体的驱动器激光器; 设置在室内的收集器反射镜,用于收集从第一等离子体辐射的极紫外光; 气体供应单元,用于将气体供应到所述室中; 用于激发气体以在产生第一等离子体的区域周围产生第二等离子体的激励单元; 以及排气单元,用于排出室并将从第一等离子体发射的碎屑喷射到室外。