会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明授权
    • High performance field emitter and method of producing the same
    • 高性能场致发射体及其制造方法
    • US6144145A
    • 2000-11-07
    • US73340
    • 1998-05-06
    • Gary W. JonesSteven M. Zimmerman
    • Gary W. JonesSteven M. Zimmerman
    • H01J1/304H01J1/30
    • H01J1/3042H01J2201/30446H01J2201/319
    • A high performance novel electron emitter material for use in field emission devices is disclosed. The high performance electron emitter material of the invention may comprise a high Cr and SiO mixture. This material may be formed into high aspect ratio, low work function tips which maintain their shape, thus minimizing flash over risks and electron scattering problems, while at the same time permitting a high level of fabrication process flexibility, and minimizing film stresses. One or more impurities which are conductive oxides or will form conductive oxides may be added to the Cr--SiO composition so that a net low work function emitter may be maintained under oxidation. A class of semi-conductive and conductive metal oxides comprises another embodiment of the invention. These materials include oxides of Cr, Mo, Ni, Fe, and Sc, which have current emitting properties desirable for applications where improved electron emission infirmity is desired among emitters within a pixel. Emission from these more resistive emitter tip materials may be optionally enhanced with the addition of low work function impurities such as alkali metals enabling more stable devices while still permitting low turn-on voltages. Methods of making the emitter are also disclosed.
    • 公开了一种用于场致发射器件的高性能新型电子发射体材料。 本发明的高性能电子发射体材料可以包括高Cr和SiO混合物。 该材料可以形成为高纵横比,低功函数尖端,保持其形状,从而使风险和电子散射问题的闪现最小化,同时允许高水平的制造工艺灵活性,并最小化薄膜应力。 可以将一种或多种作为导电氧化物或将形成导电氧化物的杂质添加到Cr-SiO组合物中,使得可以在净氧化下保持净低功函数发射极。 一类半导体和导电金属氧化物包括本发明的另一个实施方案。 这些材料包括Cr,Mo,Ni,Fe和Sc的氧化物,其对于在像素内的发射体中期望改善的电子发射弱化的应用具有期望的电流发射特性。 可以通过添加低功函杂质例如碱金属来增加这些更电阻的发射极尖端材料的发射,从而使得能够实现更稳定的器件同时仍然允许低导通电压。 还公开了制造发射极的方法。
    • 6. 发明授权
    • Method of making microstructural surgical instruments
    • 制作微结构外科手术器械的方法
    • US5619889A
    • 1997-04-15
    • US321089
    • 1994-10-11
    • Gary W. JonesSteven M. Zimmerman
    • Gary W. JonesSteven M. Zimmerman
    • A61F9/013B23P15/40B24B1/04B24B3/36B24B3/58
    • B24B1/04A61F9/0133B23P15/40B24B3/36B24B3/58
    • A method of making a microstructural shaped article from a high hardness substrate workpiece, in which an energy-transmissive shaping member is secured in energy-transmissive relationship to an energy source, and the substrate workpiece is positioned in alignment therewith. A fine grain slurry of solid particles is provided between the energy-transmissive shaping member and the substrate, and the substrate workpiece is milled by the energy-transmissive shaping member in compressive bearing relationship to the substrate through the fine grain slurry of solid particles, for sufficient time to form the desired shape in the substrate workpiece. A reusable, tribologically enhanced die is also described, for use in the method of the invention. The energy source may be an electroacoustic energy source or an electric power energy source. The non-etched microstructural articles of the invention include knives, saws, and other instruments useful for ocular and other surgical applications.
    • 从高硬度基板工件制造微结构成形制品的方法,其中能量传递成形构件以与能量源的能量传递关系固定,并且衬底工件被定位成与其对准。 在能量传递成形构件和基板之间设置有细颗粒的固体颗粒,并且通过固体颗粒的细颗粒浆料与基板压缩承载关系的能量传递成形构件将基板工件研磨, 足够的时间在基板工件中形成所需的形状。 还描述了可重复使用的摩擦增强的模具,用于本发明的方法。 能量源可以是电声能量源或电力能量源。 本发明的未蚀刻的微结构制品包括可用于眼部和其它手术应用的刀,锯和其它器械。
    • 8. 发明授权
    • Flashover control structure for field emitter displays and method of making thereof
    • 场发射体显示器的闪络控制结构及其制作方法
    • US06255771B1
    • 2001-07-03
    • US08985222
    • 1997-12-04
    • Gary W. JonesSteven M. ZimmermanWebster E. HowardStewart Lloyd
    • Gary W. JonesSteven M. ZimmermanWebster E. HowardStewart Lloyd
    • H01J162
    • H01J3/022
    • A field emitter device including an insulator structure provided on an upper gate line layer of the device. The insulator structure may surround groups of emitters arranged on adjacent gate lines, groups of emitters arranged on the same gate lines, and/or entire regions of a larger array of field emitters. The insulator structure may reduce the occurrence of flashovers to and from the gate lines and emitters when the field emitter device is used in a display. The insulator structure may also enhance the focus of electrons emitted by the field emitter device on the display screen. Focus may be further enhanced by the addition of a resistive coating on the insulator structure. Methods of making the insulator structure and resistive coating are also disclosed.
    • 一种场致发射器件,包括设置在器件的上栅极线层上的绝缘体结构。 绝缘体结构可以围绕布置在相邻栅极线上的发射极组,布置在相同栅极线上的发射极组和/或更大阵列的场致发射体的整个区域。 当场致发射器件用于显示器时,绝缘体结构可以减少与栅极线和发射极之间的闪络的发生。 绝缘体结构还可以增强由场致发射器件在显示屏上发射的电子的焦点。 通过在绝缘体结构上添加电阻涂层可以进一步增强聚焦。 还公开了制造绝缘体结构和电阻涂层的方法。
    • 10. 发明授权
    • Planarizing process for field emitter displays and other electron source
applications
    • 场发射显示器和其他电子源应用的平面化处理
    • US5688158A
    • 1997-11-18
    • US519121
    • 1995-08-24
    • Gary W. JonesSteven M. ZimmermanSusan K. Schwartz JonesMichael J. CostaJeffrey A. Silvernail
    • Gary W. JonesSteven M. ZimmermanSusan K. Schwartz JonesMichael J. CostaJeffrey A. Silvernail
    • B81C1/00H01J9/02
    • B81C1/00611H01J9/025B81C2201/0126
    • A planarization method for use during manufacture of a microelectronic field emitter device, comprising applying a glass frit slurry including glass particles in a removable base, and subsequently baking to liquify the frit. The invention relates in another aspect to a method of making a microelectronic field emitter device, comprising the steps of: applying a patterned layer of liftoff profile resist over a substrate to define emitter conductor locations; employing the patterned resist layer to form trenches in the substrate at the emitter conductor locations; depositing emitter conductor metal in the trenches and over the patterned resist layer; removing the patterned resist layer; depositing a current limiter layer over the conductors and substrate areas between trenches; depositing a layer of emitter material; pattern masking and etching the layer of emitter material to form emitter structures; depositing gate dielectric; applying a patterned layer of liftoff profile resist over the gate dielectric; evaporating gate metal; and removing the patterned resist layer to define gate electrodes.
    • 一种在制造微电子场发射器件期间使用的平面化方法,包括将包括玻璃颗粒的玻璃料浆料涂覆在可移除的基底中,随后烘焙以熔化玻璃料。 本发明在另一方面涉及一种制造微电子场发射器件的方法,包括以下步骤:在衬底上施加图案化的剥离轮廓抗蚀剂层以限定发射体导体位置; 使用图案化的抗蚀剂层在发射极导体位置处在衬底中形成沟槽; 将发射极导体金属沉积在沟槽中和图案化抗蚀剂层上方; 去除图案化的抗蚀剂层; 在沟槽之间的导体和衬底区域上沉积限流器层; 沉积一层发射体材料; 图案掩蔽和蚀刻发射体材料层以形成发射体结构; 沉积栅电介质; 在栅极电介质上施加图案化的剥离轮廓抗蚀剂层; 蒸发栅极金属; 并去除图案化的抗蚀剂层以限定栅电极。