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1. 发明授权

US07125324B2 Insulated pad conditioner and method of using same 有权
标题翻译：绝缘垫调节剂及其使用方法
公开(公告)号：US07125324B2
公开(公告)日：2006-10-24
申请号：US10797890
申请日：2004-03-09
申请人： Gary M. Palmgren , Brian D. Goers , Douglas J. Pysher
发明人： Gary M. Palmgren , Brian D. Goers , Douglas J. Pysher
IPC分类号： B24B7/00 , B24B9/00
CPC分类号： B24B53/017 , B24B37/042 , B24B37/046
摘要： A wafer planarization process with a conditioning tool having an electrical insulator that electrically insulates the abrasive surface of the conditioning tool. The electrical insulator extends the useful life of the abrasive surface of the conditioning tool by reducing the level of electrochemically driven corrosion.
摘要翻译：具有调节工具的晶片平面化工艺，该调节工具具有使调节工具的研磨表面电绝缘的电绝缘体。电绝缘体通过降低电化学腐蚀的水平来延长调节工具的研磨表面的使用寿命。

2. 发明授权

US07247577B2 Insulated pad conditioner and method of using same 有权
标题翻译：绝缘垫调节剂及其使用方法
公开(公告)号：US07247577B2
公开(公告)日：2007-07-24
申请号：US11405862
申请日：2006-04-18
申请人： Gary M. Palmgren , Brian D. Goers , Douglas J. Pysher
发明人： Gary M. Palmgren , Brian D. Goers , Douglas J. Pysher
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： B24B53/017 , B24B37/042 , B24B37/046
摘要： A wafer planarization process with a conditioning tool having an electrical insulator that electrically insulates the abrasive surface of the conditioning tool. The electrical insulator extends the useful life of the abrasive surface of the conditioning tool by reducing the level of electrochemically driven corrosion.
摘要翻译：具有调节工具的晶片平面化工艺，该调节工具具有使调节工具的研磨表面电绝缘的电绝缘体。电绝缘体通过降低电化学腐蚀的水平来延长调节工具的研磨表面的使用寿命。

3. 发明授权

US5725421A Apparatus for rotative abrading applications 失效
标题翻译：旋转研磨设备
公开(公告)号：US5725421A
公开(公告)日：1998-03-10
申请号：US607757
申请日：1996-02-27
申请人： Brian D. Goers , Troy W. Heuermann , Gary M. Palmgren
发明人： Brian D. Goers , Troy W. Heuermann , Gary M. Palmgren
IPC分类号： B24B5/42 , B24B19/12 , B24B21/00 , B24B21/08 , B24D3/10 , B24D11/00
CPC分类号： B24B5/42 , B24B19/12 , B24B21/004 , B24D11/005 , B24D3/10
摘要： A support shoe for supporting an abrasive tape having an abrasive face and an opposed back face, wherein the support shoe comprises a pressure face including a frictional engagement material for frictionally engaging the back face of the abrasive tape. The frictional engagement material comprises a plurality of cells and a first frictional engagement surface comprising a plurality of particles distributed and arranged within the plurality of cells, wherein at least some of the plurality of particles are fixed within and extend from the plurality of cells, so that when the back face of the abrasive tape contacts the first frictional engagement surface, the plurality of particles attenuate relative movement between the abrasive tape and the pressure face in response to shear forces induced during abrading. The pressure face may be curvilinear, arcuate, convex, or concave. The frictional engagement material may be attached to the pressure face by brazing, sintering, adhering, or soldering. The back face of the abrasive tape may include a second frictional engagement surface, so that when the second frictional engagement surface contacts the first frictional engagement surface, the plurality of particles attenuate relative movement between the abrasive tape and the pressure face in response to shear forces induced during abrading. The frictional engagement material may further comprise a matrix material in the cells for holding the plurality of particles within the cells, wherein this matrix material may comprise a sintered matrix material.
摘要翻译：一种用于支撑具有研磨面和相对背面的研磨带的支撑鞋，其中所述支撑靴包括压力面，所述压力面包括用于摩擦地接合所述砂带背面的摩擦接合材料。所述摩擦接合材料包括多个电池单元和包含多个分散并布置在所述多个电池单元内的多个颗粒的第一摩擦接合表面，其中所述多个颗粒中的至少一些颗粒被固定在所述多个单元内并从所述多个单元中延伸，因此当研磨带的背面接触第一摩擦接合表面时，多个颗粒响应于在研磨期间引起的剪切力而减弱砂带和压力面之间的相对运动。压力面可以是曲线的，弓形的，凸的或凹的。摩擦接合材料可以通过钎焊，烧结，粘合或焊接而附着在压力面上。砂带的背面可以包括第二摩擦接合表面，使得当第二摩擦接合表面接触第一摩擦接合表面时，多个颗粒响应于剪切力而减小砂带和压力面之间的相对运动在研磨期间诱发。摩擦接合材料还可以包括在电池中的用于将多个颗粒保持在电池内的基体材料，其中该基体材料可以包括烧结的基体材料。

4. 发明授权

US07840305B2 Abrasive articles, CMP monitoring system and method 有权
标题翻译：磨料制品，CMP监测系统及方法
公开(公告)号：US07840305B2
公开(公告)日：2010-11-23
申请号：US11427154
申请日：2006-06-28
申请人： Andrew H. Behr , Brian D. Goers , Vincent J. Laraia , Gary M. Palmgren , Daniel B. Pendergrass, Jr.
发明人： Andrew H. Behr , Brian D. Goers , Vincent J. Laraia , Gary M. Palmgren , Daniel B. Pendergrass, Jr.
IPC分类号： G06F19/00 , H01L21/00 , B24B49/00 , B24B21/18
CPC分类号： B24B53/017 , B24B37/04 , B24B49/02 , B24B49/04 , B24B49/14 , B24B49/16 , H01L2924/0002 , H01L2924/00
摘要： The disclosure relates to abrasive articles useful in chemical-mechanical polishing (CMP), the articles including a substrate with opposite major surfaces, an abrasive material overlaying at least a portion of at least one of the major surfaces, and at least one of a radio frequency identification (RFID) tag, a RFID tag reader, or a sensor for providing CMP information to a transmitter positioned near the substrate, the transmitter positioned near the substrate and adapted to wirelessly receive CMP information and wirelessly transmit the CMP information to a remote receiver. The disclosure also relates to a CMP pad conditioner for wirelessly communicating CMP information to a remote receiver, a CMP process monitoring system for wirelessly communicating CMP information to a remote receiver, and a method for conditioning a CMP pad using a CMP process monitoring system for wireless communicating CMP information to a remote receiver.
摘要翻译：本公开涉及可用于化学机械抛光（CMP）的磨料制品，所述制品包括具有相反主表面的基底，覆盖至少一个主表面的至少一部分的研磨材料，以及至少一个无线电频率识别（RFID）标签，RFID标签读取器或用于向位于衬底附近的发射器提供CMP信息的传感器，发射器位于衬底附近并适于无线地接收CMP信息并将CMP信息无线传输到远程接收器。本公开还涉及用于将CMP信息无线地传送到远程接收器的CMP垫调节器，用于将CMP信息无线传送到远程接收器的CMP处理监视系统，以及使用CMP无线通信的CMP处理监视系统来调节CMP垫的方法将CMP信息传送到远程接收器。

5. 发明申请

US20080053000A1 EXTENDED LIFE ABRASIVE ARTICLE AND METHOD 有权
标题翻译：延长寿命磨砂文章和方法
公开(公告)号：US20080053000A1
公开(公告)日：2008-03-06
申请号：US11837774
申请日：2007-08-13
申请人： Gary M. Palmgren , Jay B. Preston , Brian D. Goers
发明人： Gary M. Palmgren , Jay B. Preston , Brian D. Goers
IPC分类号： B24D11/00
CPC分类号： B24D3/08 , B23D61/18 , B24B53/017 , B24D11/00
摘要： Provided is an abrasive article comprising (a) a metallic foil having a first and second surfaces and voids therebetween, (b) a plurality of abrasive particles substantially in the voids, and (c) an alloy at least partially between the abrasive particles and the foil in the voids, wherein the alloy comprises a second component and a portion of the metallic foil near the voids. Also provided are methods of making and using such abrasive articles.
摘要翻译：提供了一种磨料制品，其包括（a）金属箔，其间具有第一和第二表面和空隙，（b）基本上在空隙中的多个磨料颗粒，和（c）至少部分地在磨料颗粒和在所述空隙中形成箔，其中所述合金包括靠近所述空隙的第二部件和所述金属箔的一部分。还提供了制造和使用这种磨料制品的方法。

6. 发明申请

US20080004743A1 Abrasive Articles, CMP Monitoring System and Method 有权
标题翻译：磨料制品，CMP监测系统和方法
公开(公告)号：US20080004743A1
公开(公告)日：2008-01-03
申请号：US11427154
申请日：2006-06-28
申请人： Brian D. Goers , Vincent J. Laraia , Gary M. Palmgren , Daniel B. Pendergrass
发明人： Brian D. Goers , Vincent J. Laraia , Gary M. Palmgren , Daniel B. Pendergrass
IPC分类号： G06F19/00
CPC分类号： B24B53/017 , B24B37/04 , B24B49/02 , B24B49/04 , B24B49/14 , B24B49/16 , H01L2924/0002 , H01L2924/00
摘要： The disclosure relates to abrasive articles useful in chemical-mechanical polishing (CMP), the articles including a substrate with opposite major surfaces, an abrasive material overlaying at least a portion of at least one of the major surfaces, a means for providing CMP information positioned near the substrate, and a transmitter positioned near the substrate and adapted to transmit the CMP information to a remote receiver. The disclosure also relates to a CMP pad conditioner having a means for communicating CMP information, a CMP process monitoring system, and a method for conditioning a CMP pad.
摘要翻译：本公开涉及可用于化学机械抛光（CMP）的磨料制品，所述制品包括具有相反主表面的基材，覆盖至少一个主表面的至少一部分的研磨材料，用于提供定位的CMP信息的装置靠近基板，以及位于基板附近并适于将CMP信息发送到远程接收器的发射器。本公开还涉及具有用于传送CMP信息的装置，CMP处理监视系统和用于调节CMP垫的方法的CMP垫调节器。

7. 发明授权

US06354929B1 Abrasive article and method of grinding glass 有权
标题翻译：研磨制品和玻璃研磨方法
公开(公告)号：US06354929B1
公开(公告)日：2002-03-12
申请号：US09250821
申请日：1999-02-17
申请人： Negus B. Adefris , Louis R. Carpentier , Todd J. Christianson , Brian D. Goers , Ashu N. Mujumdar , Gary M. Palmgren , Soon C. Park
发明人： Negus B. Adefris , Louis R. Carpentier , Todd J. Christianson , Brian D. Goers , Ashu N. Mujumdar , Gary M. Palmgren , Soon C. Park
IPC分类号： B24B722
CPC分类号： B24D99/005 , B24B7/24 , B24D3/14 , B24D3/20 , B24D3/28 , B24D3/346 , B24D7/063 , C03C19/00
摘要： The present invention is a fixed abrasive article for grinding or polishing the surface of a glass workpiece. The abrasive article for grinding glass has abrasive composites containing a binder, an alkaline metal salt, and diamond abrasive particles or agglomerate particles comprising diamond particles, the composites integrally molded to a backing. The abrasive article for grinding glass is capable of removing between about 200 and 400 micrometers of glass using an RPP procedure having a polish time interval of between 10 and 15 seconds, generally about 12 seconds. The abrasive article for polishing glass comprises a backing containing fibers, and a plurality of abrasive composites integrally molded to the backing comprising an organic resin, ceria abrasive particles, and alkaline metal salt. The abrasive articles for polishing glass also provide an optimum rate of breakdown of the abrasive composites and improved adhesion between the abrasive composites and the backing.
摘要翻译：本发明是用于研磨或抛光玻璃工件表面的固定磨料制品。用于研磨玻璃的磨料制品具有含有粘合剂，碱金属盐和金刚石磨料颗粒或包含金刚石颗粒的附聚颗粒的研磨复合材料，所述复合材料整体模制到背衬上。用于研磨玻璃的研磨制品能够使用具有10至15秒（通常约12秒）的抛光时间间隔的RPP程序在约200至400微米的玻璃之间除去。用于抛光玻璃的磨料制品包括含有纤维的背衬和与背衬一体成型的多个磨料复合材料，其包含有机树脂，二氧化铈磨料颗粒和碱金属盐。用于抛光玻璃的磨料制品还提供磨料复合材料的最佳分解速率和改善磨料复合材料与背衬之间的粘附性。

8. 发明授权

US08628597B2 Method of sorting abrasive particles, abrasive particle distributions, and abrasive articles including the same 有权
标题翻译：研磨颗粒，磨料颗粒分布以及包括其的磨料制品的分选方法
公开(公告)号：US08628597B2
公开(公告)日：2014-01-14
申请号：US12491681
申请日：2009-06-25
申请人： Gary M. Palmgren , Brian D. Goers
发明人： Gary M. Palmgren , Brian D. Goers
IPC分类号： B24D3/00 , B24D11/00 , B24D18/00 , C09K3/14 , B24B1/00 , B24D3/02 , C09C1/68
CPC分类号： C09K3/1409 , B07B1/00 , B24D18/00 , C25D7/00
摘要： A method of making an abrasive particle distribution includes: sorting an initial lot of abrasive particles into a plurality of sublots including first and second sublots of the abrasive particles according to their average particle diameter and aspect ratio, and combining the first and second sublots. The initial lot conforms to an abrasives industry specified nominal grade. The first sublot has an average particle diameter and aspect ratio less than the second sublot. A sum of the first sublot and the second sublot contains fewer abrasive particles than the initial lot. The resultant abrasive particle distribution and abrasive articles including the same are also disclosed.
摘要翻译：制造磨料颗粒分布的方法包括：根据它们的平均粒径和纵横比，将初始批次的研磨颗粒分选成包括研磨颗粒的第一和第二子图的多个分区，以及组合第一和第二分区。初始批次符合磨料行业规定的标称等级。第一子区具有小于第二子区的平均粒径和纵横比。第一个子区域和第二个子区域的总和包含比初始批次更少的磨料颗粒。还公开了所得的磨料颗粒分布和包括其的磨料制品。

9. 发明授权

US08377158B2 Extended life abrasive article and method 有权
标题翻译：延长使用寿命的磨料制品和方法
公开(公告)号：US08377158B2
公开(公告)日：2013-02-19
申请号：US11837774
申请日：2007-08-13
申请人： Gary M. Palmgren , Jay B. Preston , Brian D. Goers
发明人： Gary M. Palmgren , Jay B. Preston , Brian D. Goers
IPC分类号： B24D3/00
CPC分类号： B24D3/08 , B23D61/18 , B24B53/017 , B24D11/00
摘要： Provided is an abrasive article comprising (a) a metallic foil having a first and second surfaces and voids therebetween, (b) a plurality of abrasive particles substantially in the voids, and (c) an alloy at least partially between the abrasive particles and the foil in the voids, wherein the alloy comprises a second component and a portion of the metallic foil near the voids. Also provided are methods of making and using such abrasive articles.
摘要翻译：提供了一种磨料制品，其包括（a）金属箔，其间具有第一和第二表面和空隙，（b）基本上在空隙中的多个磨料颗粒，和（c）至少部分地在磨料颗粒和在所述空隙中形成箔，其中所述合金包括靠近所述空隙的第二部件和所述金属箔的一部分。还提供了制造和使用这种磨料制品的方法。

10. 发明申请

US20100326894A1 METHOD OF SORTING ABRASIVE PARTICLES, ABRASIVE PARTICLE DISTRIBUTIONS, AND ABRASIVE ARTICLES INCLUDING THE SAME 有权
标题翻译：研磨磨粒的研磨方法，磨料颗粒分布以及包括它们的磨料制品
公开(公告)号：US20100326894A1
公开(公告)日：2010-12-30
申请号：US12491681
申请日：2009-06-25
申请人： Gary M. Palmgren , Brian D. Goers
发明人： Gary M. Palmgren , Brian D. Goers
IPC分类号： B07C5/04 , C25D7/00
CPC分类号： C09K3/1409 , B07B1/00 , B24D18/00 , C25D7/00
摘要： A method of making an abrasive particle distribution includes: sorting an initial lot of abrasive particles into a plurality of sublots including first and second sublots of the abrasive particles according to their average particle diameter and aspect ratio, and combining the first and second sublots. The initial lot conforms to an abrasives industry specified nominal grade. The first sublot has an average particle diameter and aspect ratio less than the second sublot. A sum of the first sublot and the second sublot contains fewer abrasive particles than the initial lot. The resultant abrasive particle distribution and abrasive articles including the same are also disclosed
摘要翻译：制造磨料颗粒分布的方法包括：根据它们的平均粒径和纵横比，将初始批次的研磨颗粒分选成包括研磨颗粒的第一和第二子图的多个分区，以及组合第一和第二分区。初始批次符合磨料行业规定的标称等级。第一子区具有小于第二子区的平均粒径和纵横比。第一个子区域和第二个子区域的总和包含比初始批次更少的磨料颗粒。还公开了所得的磨料颗粒分布和包括其的磨料制品

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