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1. 发明申请

US20210364927A1 TARGET SUPPLY DEVICE, TARGET SUPPLY METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD 有权
公开(公告)号：US20210364927A1
公开(公告)日：2021-11-25
申请号：US17228000
申请日：2021-04-12
申请人： Gigaphoton Inc.
发明人： Tsukasa HORI , Yutaka SHIRAISHI , Toshihiro NISHISAKA , Hiroshi SOMEYA , Yukio WATANABE
IPC分类号： G03F7/20 , H05G2/00
摘要： A target supply device may include a first container configured to contain a target substance, a second container configured to contain the target substance supplied from the first container, a first valve disposed between the first container and the second container, a first pipe connected to the second container and configured to supply pressurized gas to the second container, a third container configured to contain the target substance supplied from the second container, a second valve disposed between the second container and the third container, a second pipe connected to the third container and configured to supply pressurized gas to the third container, and a nozzle configured to output the target substance supplied from the third container.

2. 发明申请

US20190116655A1 EXTREME UV LIGHT GENERATION DEVICE 审中-公开
公开(公告)号：US20190116655A1
公开(公告)日：2019-04-18
申请号：US16214435
申请日：2018-12-10
申请人： Gigaphoton Inc.
发明人： Tsukasa HORI , Shinji OKAZAKI
IPC分类号： H05G2/00 , G21K1/14 , G21K1/06
摘要： An extreme UV light generation device may include: a chamber having a plasma generation region at an inside of the chamber, the chamber receiving a target substance externally supplied to the plasma generation region; an outlet port provided on the chamber; a magnetic field generating unit configured to generate a magnetic field to converge cations on the outlet port, the cations being generated from the target substance that has been turned into plasma in the plasma generation region; an electron emission unit configured to emit electrons neutralizing the cations; and an exhaust tube joined to the outlet port and through which a neutralized substance obtained by neutralizing the cations flows.

3. 发明申请

US20170280543A1 TARGET SUPPLY DEVICE, PROCESSING DEVICE AND PROCESSING METHOD THEFEFOR 审中-公开
公开(公告)号：US20170280543A1
公开(公告)日：2017-09-28
申请号：US15616167
申请日：2017-06-07
申请人： Gigaphoton Inc.
发明人： Tsukasa HORI , Yutaka SHIRAISHI , Shinya IKESAKA , Takanobu ISHIHARA , Toshiro UMEKI
IPC分类号： H05G2/00
CPC分类号： H05G2/006 , H05G2/005 , H05G2/008
摘要： A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.

4. 发明申请

US20160270199A1 TARGET PRODUCING APPARATUS 有权
标题翻译：目标生产装置
公开(公告)号：US20160270199A1
公开(公告)日：2016-09-15
申请号：US15161628
申请日：2016-05-23
申请人： GIGAPHOTON INC.
发明人： Fumio IWAMOTO , Takashi SAITO , Tsukasa HORI , Osamu WAKABAYASHI
IPC分类号： H05G2/00 , G03F7/20
CPC分类号： H05G2/006 , G03F7/70033 , H05G2/005
摘要： An aspect of the present disclosure may include a gas lock cover secured to a nozzle holder and provided downstream of a nozzle. The gas lock cover may cover a periphery of an exit of the nozzle and be structured to guide gas supplied from a gas supply unit. The gas lock cover may include a hollow cylindrical part provided downstream of the nozzle and having an exit opening for outputting droplets that are outputted from the nozzle and pass through an internal cavity of the cylindrical part. The gas lock cover may include a channel for transmitting the gas supplied from the gas supply unit, the channel being structured to orient a flow of the transmitted gas so as to flow to the exit opening of the cylindrical part through the internal cavity of the cylindrical part.
摘要翻译：本公开的一个方面可以包括固定到喷嘴保持器并设置在喷嘴下游的气体锁盖。气体锁定盖可以覆盖喷嘴的出口的周边，并被构造成引导从气体供应单元供应的气体。气体锁定盖可以包括设置在喷嘴下游的中空圆柱形部分，并且具有用于输出从喷嘴输出并穿过圆柱形部分的内部空腔的液滴的出口。气体锁定盖可以包括用于传送从气体供应单元供应的气体的通道，该通道被构造成使透过气体的流动定向，以便通过圆筒形的内部空腔流到圆柱形部分的出口部分。

5. 发明申请

US20160227638A1 EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND CONTROL METHOD FOR EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS 有权
标题翻译：极光超紫外光发生装置及极光紫外线发光装置的控制方法
公开(公告)号：US20160227638A1
公开(公告)日：2016-08-04
申请号：US15096769
申请日：2016-04-12
申请人： GIGAPHOTON INC.
发明人： Tsukasa HORI , Fumio IWAMOTO , Hiroshi UMEDA
IPC分类号： H05G2/00
CPC分类号： H05G2/006 , H05G2/005 , H05G2/008
摘要： In an example of the present invention is an extreme ultraviolet light generation apparatus including: a droplet supply device configured to successively supply droplets; a charging electrode being configured to control charging of droplets supplied from the droplet supply unit; and a target controller configured to control electric polarities of the droplets supplied from the droplet supply unit by controlling potential of the charging electrode in such a way that successive droplets join together to become a target droplet, wherein the droplets controlled in charging by the charging electrode include a plurality of groups each composed of successive droplets, and, in each of the groups, a droplet at one end is charged positively or negatively, a droplet at the other end is uncharged or charged in a polarity being the same as a polarity of an adjacent droplet in a group adjacent to the droplet at the other end.
摘要翻译：本发明的一个实例是一种极紫外光发生装置，包括：液滴供给装置，被配置为连续供应液滴; 充电电极被配置为控制从液滴供应单元供应的液滴的充电; 以及目标控制器，其被配置为通过控制充电电极的电位来控制从液滴供给单元提供的液滴的电极性，使得连续的液滴接合在一起成为目标液滴，其中通过充电电极控制的液滴包括多个由连续的液滴组成的组，并且在每个组中，一端的液滴是正或负的，另一端的液滴不带电或充电，极性与极性相同在另一端与液滴相邻的组中的相邻液滴。

6. 发明申请

US20210333718A1 EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD 有权
公开(公告)号：US20210333718A1
公开(公告)日：2021-10-28
申请号：US17366219
申请日：2021-07-02
申请人： Gigaphoton Inc.
发明人： Yuichi NISHIMURA , Takayuki YABU , Tsukasa HORI
IPC分类号： G03F7/20 , H05G2/00
摘要： An extreme ultraviolet light generation system according to an aspect of the present disclosure includes a first actuator that changes a travel direction of prepulse laser light to be output from a first optical element arranged on an optical path of the prepulse laser light between a prepulse laser device and a beam combiner, and a second actuator that changes irradiation positions of the prepulse laser light and main pulse laser light to be output from a light concentrating optical system, a plurality of sensors that detect light radiated from a predetermined region by a target being irradiated with the main pulse laser light, and a controller. Here, the controller controls the first actuator so that an evaluation value calculated from output of the plurality of sensors approaches a target value, and thereafter, controls the second actuator so that the evaluation value approaches the target value.

7. 发明申请

US20200341383A1 TARGET SUPPLY DEVICE, EXTREME ULTRAVIOLET LIGHT GENERATING APPARATUS, AND ELECTRONIC DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：US20200341383A1
公开(公告)日：2020-10-29
申请号：US16925567
申请日：2020-07-10
申请人： Gigaphoton Inc.
发明人： Fumio IWAMOTO , Yutaka SHIRAISHI , Tsukasa HORI
IPC分类号： G03F7/20 , H05G2/00
摘要： A target supply device includes a tank body portion holding a target substance; a communication portion connected to the tank body portion and including a filter that filters the melted target substance and a nozzle that discharges the target substance having passed through the filter; a main heater that heats the tank body portion; a sub-heater that heats the communication portion; and a control unit, the control unit being configured to set the main heater to a temperature higher than a melting point of the target substance before the target substance is melted, to set the sub-heater to a temperature lower than the melting point of the target substance until the target substance in the tank body portion is melted, and to set the sub-heater to a temperature higher than the melting point of the target substance after the target substance in the tank body portion is melted.

8. 发明申请

US20170215266A1 VIBRATOR UNIT AND TARGET SUPPLY DEVICE 审中-公开
公开(公告)号：US20170215266A1
公开(公告)日：2017-07-27
申请号：US15480454
申请日：2017-04-06
申请人： Gigaphoton Inc.
发明人： Toshiyuki HIRASHITA , Fumio IWAMOTO , Tsukasa HORI , Masaki NAKANO
IPC分类号： H05G2/00
CPC分类号： H05G2/006 , H05G2/008
摘要： A vibrator unit may be configured to apply vibration to a target material supplied to an inside of a target flow path. The vibrator unit may include a vibration transmission member to be brought into contact with a first member including the target flow path therein, and a piezoelectric member to be brought into contact with the vibration transmission member. The piezoelectric member may be configured to vibrate in response to an electric signal from the outside. The vibration dumping rate of the vibration transmission member may be smaller than the vibration dumping rate of the first member.

9. 发明申请

US20160255709A1 EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS 有权
标题翻译：极光紫外线发光装置
公开(公告)号：US20160255709A1
公开(公告)日：2016-09-01
申请号：US15152124
申请日：2016-05-11
申请人： Gigaphoton Inc.
发明人： Fumio IWAMOTO , Masaki NAKANO , Tsukasa HORI
IPC分类号： H05G2/00
CPC分类号： H05G2/008 , H05G2/003 , H05G2/005 , H05G2/006
摘要： An extreme ultraviolet light generation apparatus may include: a chamber in which extreme ultraviolet light is generated when a target is irradiated with a laser beam inside the chamber; a target supply part configured to supply the target into the chamber; and a target collector configured to collect the target which is supplied by the target supply part but is not irradiated with the laser beam in a collection container, by receiving the target on a receiving surface having a contact angle of equal to or smaller than 90 degrees with the target.
摘要翻译：极紫外光发生装置可以包括：当在室内的激光束照射靶时在其中产生极紫外光的室; 目标供给部构造成将所述目标物供给到所述室内; 以及目标收集器，其被配置为通过在具有等于或小于90度的接触角的接收表面上接收目标而将由目标供给部提供但不被激光束照射的目标收集在收集容器中与目标。

10. 发明申请

US20160128172A1 SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT 有权
公开(公告)号：US20160128172A1
公开(公告)日：2016-05-05
申请号：US14992506
申请日：2016-01-11
申请人： GIGAPHOTON INC
发明人： Tsukasa HORI , Kouji KAKIZAKI , Tatsuya YANAGIDA , Osamu WAKABAYASHI , Hakaru MIZOGUCHI
IPC分类号： H05G2/00 , H01S3/11 , H01S3/23 , H01S3/223 , H01S3/16
CPC分类号： H05G2/008 , H01S3/005 , H01S3/0071 , H01S3/09 , H01S3/102 , H01S3/104 , H01S3/1106 , H01S3/1611 , H01S3/1643 , H01S3/1673 , H01S3/2232 , H01S3/2308 , H01S3/2366 , H01S3/2391 , H05G2/003 , H05G2/005
摘要： A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

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