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1. 发明申请

US20180103534A1 EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE 审中-公开
公开(公告)号：US20180103534A1
公开(公告)日：2018-04-12
申请号：US15836877
申请日：2017-12-10
申请人： Gigaphoton Inc.
发明人： Takashi SAITO , Yoshifumi UENO , Georg SOUMAGNE
IPC分类号： H05G2/00
CPC分类号： H05G2/006 , H05G2/008
摘要： The extreme ultraviolet light generation device includes a chamber having a first through-hole that allows a pulse laser beam to enter the chamber, a target supply unit held by the chamber and configured to output a target toward a predetermined region in the chamber, a shield member surrounding the predetermined region in the chamber and having a target path that allows the target outputted from the target supply unit to pass toward the predetermined region, and a tubular member surrounding at least a part of an upstream portion of the trajectory of the target outputted from the target supply unit toward the predetermined region, the upstream portion being upstream from the target path of the shield member.

2. 发明申请

US20160037616A1 EXTREME UV LIGHT GENERATION APPARATUS 有权
标题翻译：极光紫外线发生装置
公开(公告)号：US20160037616A1
公开(公告)日：2016-02-04
申请号：US14879754
申请日：2015-10-09
申请人： Gigaphoton Inc.
发明人： Takashi SAITO , Fumio IWAMOTO , Osamu WAKABAYASHI , Takayuki YABU
IPC分类号： H05G2/00
CPC分类号： H05G2/008 , H05G2/003 , H05G2/005 , H05G2/006
摘要： An extreme ultraviolet light generation apparatus includes a target supplier configured to output a target into a chamber as a droplet, the target generating extreme ultraviolet light when being irradiated with a laser beam in the chamber; a droplet measurement unit configured to measure a parameter for a state of the droplet outputted into the chamber; a pressure regulator configured to regulate a pressure in the target supplier in which the target is accommodated; and a target generation controller configured to control the pressure regulator, based on the parameter measured by the droplet measurement unit.
摘要翻译：一种极紫外光发生装置，具备将目标物作为液滴输出到室内的目标供给装置，在所述室内照射激光时产生极紫外光; 液滴测量单元，被配置为测量输出到所述室中的液滴的状态的参数; 压力调节器，被配置为调节所述目标供应器中容纳所述目标的压力; 以及目标产生控制器，其被配置为基于由所述液滴测量单元测量的参数来控制所述压力调节器。

3. 发明申请

US20160270199A1 TARGET PRODUCING APPARATUS 有权
标题翻译：目标生产装置
公开(公告)号：US20160270199A1
公开(公告)日：2016-09-15
申请号：US15161628
申请日：2016-05-23
申请人： GIGAPHOTON INC.
发明人： Fumio IWAMOTO , Takashi SAITO , Tsukasa HORI , Osamu WAKABAYASHI
IPC分类号： H05G2/00 , G03F7/20
CPC分类号： H05G2/006 , G03F7/70033 , H05G2/005
摘要： An aspect of the present disclosure may include a gas lock cover secured to a nozzle holder and provided downstream of a nozzle. The gas lock cover may cover a periphery of an exit of the nozzle and be structured to guide gas supplied from a gas supply unit. The gas lock cover may include a hollow cylindrical part provided downstream of the nozzle and having an exit opening for outputting droplets that are outputted from the nozzle and pass through an internal cavity of the cylindrical part. The gas lock cover may include a channel for transmitting the gas supplied from the gas supply unit, the channel being structured to orient a flow of the transmitted gas so as to flow to the exit opening of the cylindrical part through the internal cavity of the cylindrical part.
摘要翻译：本公开的一个方面可以包括固定到喷嘴保持器并设置在喷嘴下游的气体锁盖。气体锁定盖可以覆盖喷嘴的出口的周边，并被构造成引导从气体供应单元供应的气体。气体锁定盖可以包括设置在喷嘴下游的中空圆柱形部分，并且具有用于输出从喷嘴输出并穿过圆柱形部分的内部空腔的液滴的出口。气体锁定盖可以包括用于传送从气体供应单元供应的气体的通道，该通道被构造成使透过气体的流动定向，以便通过圆筒形的内部空腔流到圆柱形部分的出口部分。

4. 发明申请

US20150296604A1 EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS 审中-公开
标题翻译：极光紫外线发光系统和极光紫外线发光装置
公开(公告)号：US20150296604A1
公开(公告)日：2015-10-15
申请号：US14729723
申请日：2015-06-03
申请人： GIGAPHOTON INC.
发明人： Shinji NAGAI , Takashi SAITO
IPC分类号： H05G2/00
CPC分类号： H05G2/008 , H05G2/003 , H05G2/006
摘要： An extreme ultraviolet light generation system may include a beam focusing optics configured such that a pre-pulse laser beam and a main pulse laser beam are focused on a plasma generation region, and that a beam path axis of the pre-pulse laser beam and a beam path axis of the main pulse laser beam pass through the plasma generation region at an angle equal to or smaller than a loss-cone angle with respect to a central axis of a magnetic field that is generated by a magnetic field generator. A first laser apparatus and a second laser apparatus may be controlled such that, after a target outputted from a target generation unit has been irradiated with the pre-pulse laser beam in the plasma generation region, the target is irradiated with the main pulse laser beam with a delay time ranging from 0.5 μs or longer to 7 μs or shorter.
摘要翻译：极紫外光发生系统可以包括光束聚焦光学元件，其配置为使得预脉冲激光束和主脉冲激光束聚焦在等离子体产生区域上，并且预脉冲激光束的光束轴线和主脉冲激光束的光束路径轴相对于由磁场发生器产生的磁场的中心轴以等于或小于损耗锥角的角度通过等离子体产生区域。可以控制第一激光装置和第二激光装置，使得在从目标产生单元输出的目标已经在等离子体产生区域中的预脉冲激光束照射之后，用主脉冲激光束延迟时间范围为0.5μs或更长至7μs或更短。

5. 发明申请

US20200301285A1 EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：US20200301285A1
公开(公告)日：2020-09-24
申请号：US16894652
申请日：2020-06-05
申请人： Gigaphoton Inc.
发明人： Shinji NAGAI , Takashi SAITO
IPC分类号： G03F7/20 , B82Y10/00
摘要： An extreme ultraviolet light generation device configured to generate extreme ultraviolet light by irradiating a target containing tin with a pulse laser beam includes a chamber container, a hydrogen gas supply unit configured to supply hydrogen gas into the chamber container, a heat shield disposed between the chamber container and a predetermined region in which the target is irradiated with the pulse laser beam inside the chamber container, a first cooling medium flow path disposed in the chamber container, a second cooling medium flow path disposed in the heat shield, and a cooling device configured to supply a first cooling medium to the first cooling medium flow path and supply a second cooling medium to the second cooling medium flow path so that a temperature of the heat shield becomes lower than a temperature of the chamber container.

6. 发明申请

US20160087389A1 LASER SYSTEM, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, AND METHOD OF CONTROLLING LASER APPARATUS 审中-公开
标题翻译：激光系统，极光紫外线发光系统及控制激光装置的方法
公开(公告)号：US20160087389A1
公开(公告)日：2016-03-24
申请号：US14960579
申请日：2015-12-07
申请人： GIGAPHOTON INC.
发明人： Motoki NIWANO , Takashi SAITO
IPC分类号： H01S3/00 , G02F1/03 , H01S3/13 , H01S3/23 , H05G2/00 , H01S3/10
CPC分类号： H01S3/0085 , G02F1/03 , H01S3/005 , H01S3/0064 , H01S3/10015 , H01S3/1301 , H01S3/2316 , H05G2/003 , H05G2/008
摘要： A laser system capable of appropriately controlling the energy of a laser beam pulse is provided. An exemplary laser system of the present disclosure may control an optical isolator to switch from a closed state to an open state and then to return to the closed state for each of the laser beam pulses repeatedly outputted from a master oscillator. The laser system may control the optical attenuator to set an optical transmittance of the optical attenuator for each of the laser beam pulses repeatedly outputted from the master oscillator.
摘要翻译：提供能够适当地控制激光束脉冲的能量的激光系统。本公开的示例性激光系统可以控制光隔离器从关闭状态切换到打开状态，然后对于从主振荡器重复输出的每个激光束脉冲返回关闭状态。激光系统可以控制光衰减器以对从主振荡器重复输出的每个激光束脉冲设置光衰减器的光透射率。

7. 发明申请

US20160066401A1 EXTREME ULTRAVIOLET LIGHT GENERATING SYSTEM 有权
标题翻译：极致超紫外光发生系统
公开(公告)号：US20160066401A1
公开(公告)日：2016-03-03
申请号：US14937332
申请日：2015-11-10
申请人： GIGAPHOTON INC.
发明人： Takayuki YABU , Takashi SAITO , Osamu WAKABAYASHI
IPC分类号： H05G2/00 , G03F7/20
CPC分类号： H05G2/008 , G03F7/2006 , G03F7/70033 , H05G2/006
摘要： There is provided an extreme ultraviolet light generating system. The extreme ultraviolet light generating system may include: a laser apparatus configured to provide pulsed laser light inside a chamber in which EUV light is generated; an optical shutter disposed on an optical path of the pulsed laser light; and a controller configured to open or close the optical shutter, based on a generation signal supplied from an external unit, the generation signal instructing generation of the EUV light.
摘要翻译：提供了一种极紫外光发生系统。所述极紫外光发生系统可以包括：激光装置，被配置为在其内产生EUV光的室内提供脉冲激光; 设置在所述脉冲激光的光路上的光学快门; 以及控制器，其被配置为基于从外部单元提供的生成信号来打开或关闭所述光学快门，所述生成信号指示所述EUV光的产生。

8. 发明申请

US20150188277A1 SLAB AMPLIFIER, AND LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS INCLUDING SLAB AMPLIFIER 有权
标题翻译： SLAB放大器，激光装置和超大型紫外线发光装置，包括SLAB放大器
公开(公告)号：US20150188277A1
公开(公告)日：2015-07-02
申请号：US14657640
申请日：2015-03-13
申请人： Gigaphoton Inc.
发明人： Krzysztof NOWAK , Takashi SUGANUMA , Takashi SAITO , Yasufumi KAWASUJI
IPC分类号： H01S3/034 , H01S3/23 , H01S3/223
CPC分类号： H01S3/034 , H01S3/03 , H01S3/076 , H01S3/0971 , H01S3/2232 , H01S3/2316 , H01S3/2325 , H01S3/2366 , H01S3/2375 , H01S2301/02 , H05G2/008
摘要： There is provided a slab amplifier including an optical system (48, 51) provided in a chamber (47) to allow a seed beam having entered from a first window into the space between a pair of electrodes (42, 43) to be repeatedly reflected between the space so that the seed beam is amplified to be an amplified beam; a first aperture plate (61) provided between the first window and the electrodes, and having an opening of a dimension equal to or greater than a cross-section of the seed beam and equal to or smaller than a dimension of the first window; and a second aperture plate (62) provided between the second window and the electrodes, and having an opening of a dimension equal to or greater than a cross-section of the amplified beam and equal to or smaller than a dimension of the second window.
摘要翻译：提供了一种平板放大器，包括设置在室（47）中的光学系统（48,51），以允许从第一窗口进入的种子束进入一对电极（42,43）之间的空间中，以反复反射在空间之间，使得种子束被放大为放大的光束; 设置在所述第一窗口和所述电极之间并且具有等于或大于所述种子束的横截面的尺寸的开口并且等于或小于所述第一窗口的尺寸的第一孔板（61）以及设置在第二窗口和电极之间并具有等于或大于放大光束的横截面的尺寸的开口并且等于或小于第二窗口的尺寸的第二孔板（62）。

9. 发明申请

US20200185212A1 EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS CONTROLLING METHOD 审中-公开
公开(公告)号：US20200185212A1
公开(公告)日：2020-06-11
申请号：US16786542
申请日：2020-02-10
申请人： Gigaphoton Inc.
发明人： Atsushi UEDA , Takashi SAITO
IPC分类号： H01J61/28 , H01J61/12 , H01J61/02
摘要： An EUV light generation apparatus includes: a chamber; an EUV light condensing mirror positioned inside the chamber and having a reflective surface that determines a first focal point and a second focal point, the reflective surface and the second focal point being positioned on respective sides of a first surface; at least one magnet configured to generate a magnetic field at and around the first focal point; a first gas supply unit configured to supply first gas to the reflective surface in the chamber and opened near an outer peripheral part of the reflective surface; a second gas supply unit configured to supply second gas into the chamber and opened at a position between the first surface and the second focal point; and a discharge device configured to discharge gas inside the chamber and opened at a position between the first focal point and the at least one magnet.

10. 发明申请

US20180224748A1 EXTREME ULTRAVIOLET LIGHT GENERATING DEVICE 审中-公开
公开(公告)号：US20180224748A1
公开(公告)日：2018-08-09
申请号：US15945672
申请日：2018-04-04
申请人： GIGAPHOTON INC.
发明人： Shinji NAGAI , Atsushi UEDA , Takashi SAITO
IPC分类号： G03F7/20 , H05G2/00 , H01J37/32 , G21K1/06
CPC分类号： G03F7/70033 , G21K1/06 , G21K5/02 , H01J37/3244 , H05G1/00 , H05G2/008
摘要： An extreme ultraviolet light generating device may include a chamber, an EUV light focusing mirror provided therein, including a reflection surface having a concave curved shape and an outer peripheral portion around an outer edge of the reflection surface, and configured to focus EUV light radiated from plasma generated when a target is irradiated with laser light, a gas supplying device including peripheral heads provided on or along the outer peripheral portion; and a discharge device including a discharge path forming a discharge port near the outer peripheral portion, and configured to discharge an ion or a particle from the discharge port. The peripheral heads each may blow out a gas flow from the outer peripheral portion or a vicinity thereof along the reflection surface, and allow gas flows to join on the reflection surface to thereby form a gas flow along the reflection surface toward the discharge port.

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