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1. 发明申请

US20200341375A1 PHOTOSENSITIVE COMPOSITION 审中-公开
公开(公告)号：US20200341375A1
公开(公告)日：2020-10-29
申请号：US16924293
申请日：2020-07-09
申请人： FUJIFILM Corporation
发明人： Takahiro OKAWARA , Yuki NARA , Shoichi NAKAMURA , Mitsuji YOSHIBAYASHI
IPC分类号： G03F7/031 , G03F7/075 , G02B1/04 , G02B5/20 , H01L27/146
摘要： Provided is a photosensitive composition for exposure to light having a wavelength of 300 nm or shorter, the photosensitive composition including: a coloring material; and a polymerizable monomer, in which a total content of the polymerizable monomer and a photopolymerization initiator is 15 mass % or lower with respect to a total solid content of the photosensitive composition.

2. 发明申请

US20180275514A1 RADIATION-SENSITIVE RESIN COMPOSITION, CURED FILM, PATTERN FORMING METHOD, SOLID-STATE IMAGING DEVICE, AND IMAGE DISPLAY DEVICE 审中-公开
公开(公告)号：US20180275514A1
公开(公告)日：2018-09-27
申请号：US15989408
申请日：2018-05-25
申请人： FUJIFILM Corporation
发明人： Yuki NARA , Kaoru AOYAGI
IPC分类号： G03F7/031 , G03F7/033 , G03F7/004 , G03F7/16 , G03F7/20 , G03F7/30
CPC分类号： G03F7/031 , G03F7/0045 , G03F7/029 , G03F7/033 , G03F7/16 , G03F7/168 , G03F7/2039 , G03F7/3064 , G03F7/40
摘要： Provided are a radiation-sensitive resin composition having good sensitivity and excellent temporal stability of the sensitivity, a cured film, a pattern forming method, a solid-state imaging device, and an image display device. The radiation-sensitive resin composition includes a resin, a polymerizable compound having an ethylenically unsaturated bond, a photopolymerization initiator, an organic solvent, and water, in which the photopolymerization initiator includes an oxime ester compound having at least one group selected from a branched alkyl group and a cyclic alkyl group, and the content of water is 0.1% to 2% by mass with respect to the mass of the radiation-sensitive resin composition.

3. 发明申请

US20160033680A1 COMPOSITION FOR FORMING FAR-INFRARED RADIATION SHIELDING LAYER 审中-公开
标题翻译：用于形成红外辐射屏蔽层的组合物
公开(公告)号：US20160033680A1
公开(公告)日：2016-02-04
申请号：US14879245
申请日：2015-10-09
申请人： FUJIFILM Corporation
发明人： Daisuke HAMADA , Yuki NARA , Makoto KUBOTA , Kazuto SHIMADA , Kyohei ARAYAMA
IPC分类号： G02B1/04 , G02B5/20
CPC分类号： G02B1/04 , C08K3/22 , C09D5/32 , C09D7/61 , C09D201/00 , G02B5/206 , G02B5/208 , G03F7/0047 , G03F7/0048 , G03F7/027 , G03F7/0388
摘要： An object of the present invention is to provide a composition for forming a far-infrared radiation shielding layer which is able to form a layer having excellent far-infrared radiation shielding properties. A composition for forming a far-infrared radiation shielding layer of the present invention contains at least inorganic fine particles and a dispersant.
摘要翻译：本发明的目的是提供一种用于形成能够形成具有优异的远红外线辐射屏蔽性的层的远红外线辐射屏蔽层的组合物。本发明的用于形成远红外线辐射屏蔽层的组合物至少含有无机细颗粒和分散剂。

4. 发明申请

US20150259547A1 CURABLE RESIN COMPOSITION, PRODUCTION METHOD OF IMAGE SENSOR CHIP USING THE SAME, AND IMAGE SENSOR CHIP 有权
标题翻译：可固化树脂组合物，使用其的图像传感器芯片的生产方法和图像传感器芯片
公开(公告)号：US20150259547A1
公开(公告)日：2015-09-17
申请号：US14725823
申请日：2015-05-29
申请人： FUJIFILM Corporation
发明人： Toshihide EZOE , Yuki NARA , Kazuto SHIMADA
IPC分类号： C09D7/00 , C09D5/00 , H01L27/146 , G02B5/22 , G02B1/11
CPC分类号： C09D7/007 , C08J3/22 , C08K5/55 , C09D5/00 , C09D7/41 , C09D201/00 , G02B1/11 , G02B5/223 , H01L27/14618 , H01L27/14621 , H01L27/14625 , H01L27/14685 , H01L2224/13 , H04N5/2254
摘要： There is provided a curable resin composition which is capable of being coated so as to have a film thickness of 20 μm or more and contains a dye having a maximum absorption wavelength in a wavelength range from 600 to 850 nm, and the infrared ray cut filter having a dye-containing layer having a film thickness of 20 μm or more formed from the curable resin composition, and a production method of image sensor chip comprising a step of coating the curable resin composition on a glass substrate to form a dye-containing layer, and a step of adhering the glass plate having the dye-containing layer formed on a solid-state imaging device substrate.
摘要翻译：提供一种固化性树脂组合物，其能够被涂覆以具有20μm以上的膜厚，并且含有在600〜850nm的波长范围内具有最大吸收波长的染料，并且红外线截止滤光片具有由固化性树脂组合物形成的膜厚度为20μm以上的含有染料的层，以及图像传感器芯片的制造方法，其包括将固化性树脂组合物涂布在玻璃基板上以形成含染料层以及粘附具有形成在固态成像器件基板上的含有染料的层的玻璃板的步骤。

5. 发明申请

US20200218151A1 METHOD OF MANUFACTURING OPTICAL FILTER 审中-公开
公开(公告)号：US20200218151A1
公开(公告)日：2020-07-09
申请号：US16826662
申请日：2020-03-23
申请人： FUJIFILM Corporation
发明人： Yuki NARA , Takahiro OKAWARA
IPC分类号： G03F7/00 , G03F7/004
摘要： Provided is a method of manufacturing an optical filter in which a pixel having excellent rectangularity can be accurately formed in a region that is partitioned by a partition wall or at a position corresponding to the region partitioned by the partition wall. The method of manufacturing an optical filter includes: forming a photosensitive coloring composition layer by applying a photosensitive coloring composition to a support, the support including a partition wall and a plurality of regions that are partitioned by the partition wall, and the photosensitive coloring composition including a coloring material and a curable compound and in which a content of the coloring material is 10 mass % or higher with respect to a total solid content; irradiating the photosensitive coloring composition layer with light having a wavelength of 300 nm or shorter using a scanner exposure device such that the photosensitive coloring composition layer is exposed in a pattern shape; and forming a pixel in the region partitioned by the partition wall or at a position corresponding to the region partitioned by the partition wall by removing a non-exposed portion of the photosensitive coloring composition layer by development.

6. 发明申请

US20160116653A1 INFRARED-LIGHT-BLOCKING COMPOSITION, INFRARED-LIGHT-BLOCKING LAYER, INFRARED CUT-OFF FILTER, AND CAMERA MODULE 审中-公开
标题翻译：红外线遮光组合物，红外线遮光层，红外线切割滤光片和相机模块
公开(公告)号：US20160116653A1
公开(公告)日：2016-04-28
申请号：US14982885
申请日：2015-12-29
申请人： FUJIFILM Corporation
发明人： Satoru MURAYAMA , Kazuto SHIMADA , Yuki NARA
IPC分类号： G02B5/20 , G02B1/04
摘要： Provided are an infrared-light-blocking composition capable of forming an infrared-light-blocking layer having excellent light-transmitting performance in the visible region and having excellent light-blocking performance in the infrared region; an infrared-light-blocking layer; an infrared cut-off filter; and a camera module. An infrared-light-blocking composition of the invention contains inorganic microparticles and a dispersing agent, and the infrared-light-blocking layer formed from the infrared-light-blocking composition has a transmittance at a wavelength of 1,000 nm of 60% or less, a transmittance at a wavelength of 1,100 nm of 50% or less, and a transmittance at a wavelength of 500 nm of 80% or more.
摘要翻译：本发明提供能够形成在可见光区域具有优异的透光性能并且在红外区域具有优异的阻光性能的红外阻光层的红外阻光组合物; 红外阻光层; 红外截止滤光片; 和相机模块。本发明的红外线阻光性组合物含有无机微粒和分散剂，由红外线阻光性组合物形成的红外线阻光层的波长为1000nm以下的透射率为60％以下，在1100nm的波长下的透射率为50％以下，波长500nm的透射率为80％以上。

7. 发明申请

US20220057711A1 RESIN COMPOSITION, FILM, COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE 有权
公开(公告)号：US20220057711A1
公开(公告)日：2022-02-24
申请号：US17516677
申请日：2021-11-01
申请人： FUJIFILM Corporation
发明人： Yuki NARA
IPC分类号： G03F7/00 , C08L79/04 , C08L79/08 , C08J5/18 , G03F7/037 , G02B1/04
摘要： Provided are a resin composition including a coloring material, a resin, and a solvent, in which, in a case where a film having a thickness of 0.60 μm is formed by heating the resin composition at 200° C. for 30 minutes, a thickness of the film after performing a heating treatment of the film at 300° C. for 5 hours in a nitrogen atmosphere is 70% or more of a thickness of the film before the heating treatment; a film formed of the resin composition; a color filter; a solid-state imaging element; and an image display device.

8. 发明申请

US20210132496A1 RADIATION-SENSITIVE RESIN COMPOSITION, CURED FILM, PATTERN FORMING METHOD, SOLID-STATE IMAGING DEVICE, AND IMAGE DISPLAY DEVICE 有权
公开(公告)号：US20210132496A1
公开(公告)日：2021-05-06
申请号：US17143685
申请日：2021-01-07
申请人： FUJIFILM Corporation
发明人： Yuki NARA , Kaoru AOYAGI
IPC分类号： G03F7/031 , G03F7/029 , G03F7/40 , C08F2/50 , G03F7/028 , G03F7/30 , G03F7/004 , G03F7/033 , G03F7/16 , G03F7/20
摘要： Provided are a radiation-sensitive resin composition having good sensitivity and excellent temporal stability of the sensitivity, a cured film, a pattern forming method, a solid-state imaging device, and an image display device. The radiation-sensitive resin composition includes a resin, a polymerizable compound having an ethylenically unsaturated bond, a photopolymerization initiator, an organic solvent, and water, in which the photopolymerization initiator includes an oxime ester compound having at least one group selected from a branched alkyl group and a cyclic alkyl group, and the content of water is 0.1% to 2% by mass with respect to the mass of the radiation-sensitive resin composition.

9. 发明申请

US20150293283A1 NEAR-INFRARED ABSORBING COMPOSITION, NEAR-INFRARED BLOCKING FILTER, METHOD FOR PRODUCING NEAR-INFRARED BLOCKING FILTER, CAMERA MODULE AND METHOD FOR MANUFACTURING CAMERA MODULE 审中-公开
标题翻译：近红外吸收组合物，近红外阻挡过滤器，生产近红外阻塞过滤器的方法，摄像机模块和制造摄像机模块的方法
公开(公告)号：US20150293283A1
公开(公告)日：2015-10-15
申请号：US14751245
申请日：2015-06-26
申请人： FUJIFILM Corporation
发明人： Yuki NARA , Seongmu BAK , Toshihide EZOE , Takashi KAWASHIMA , Seiichi HITOMI
IPC分类号： G02B5/20 , H04N5/335 , H04N5/33 , G02B1/04 , H01L27/146
CPC分类号： G02B5/208 , G02B1/04 , G02B13/003 , G03B11/00 , H01L27/14621 , H01L27/14638 , H01L27/14685 , H04N5/2254 , H04N5/33 , H04N5/335 , C08L63/00 , C08L101/14
摘要： A near-infrared blocking filter includes a near-infrared absorbing substance, has a film thickness of 300 μm or less, and has a visible light transmissivity in a wavelength range of 450 nm to 550 nm of 85% or more, a light transmissivity at a wavelength of 800 nm is 20% or less, and a light transmissivity at a wavelength of 850 nm is 20% or less.
摘要翻译：近红外阻挡滤光器包括近红外线吸收物质，膜厚度为300μm以下，在450nm〜550nm的波长范围内的可见光透过率为85％以上，透过率为 800nm的波长为20％以下，波长850nm的透光率为20％以下。

10. 发明申请

US20220064444A1 RESIN COMPOSITION, FILM, COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE 有权
公开(公告)号：US20220064444A1
公开(公告)日：2022-03-03
申请号：US17521859
申请日：2021-11-09
申请人： FUJIFILM Corporation
发明人： Yuki NARA
IPC分类号： C08L79/08 , C08L39/00 , C08J5/18 , C03C17/32 , C08K5/00
摘要： Provided are a resin composition including a coloring material, a resin, and a solvent, in which, in a case where a film having a thickness of 0.60 μm is formed by heating the resin composition at 200° C. for 30 minutes, a rate of change ΔA in an absorbance of the film after performing a heating treatment of the film at 300° C. for 5 hours in a nitrogen atmosphere, which is represented by Expression (1), is 50% or less; a film formed of the resin composition; a color filter; a solid-state imaging element; and an image display device. In the following expression, ΔA is the rate of change in the absorbance of the film after the heating treatment, A1 is a maximum value of an absorbance of the film before the heating treatment in a wavelength range of 400 to 1100 nm, and A2 is an absorbance of the film after the heating treatment, and is an absorbance at a wavelength showing the maximum value of the absorbance of the film before the heating treatment in a wavelength range of 400 to 1100 nm. ΔA=|100−(A2/A1)×100| (1)

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