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1. 发明申请

US20030218805A1 One-dimensional optical condensing system, optical lighting system for correcting light intensity distribution, and exposure head 失效
标题翻译：一维光学冷凝系统，用于校正光强分布的光学照明系统和曝光头
公开(公告)号：US20030218805A1
公开(公告)日：2003-11-27
申请号：US10396789
申请日：2003-03-25
申请人： Fuji Photo Optical Co., Ltd. , Fuji Photo Film Co., Ltd.
发明人： Hiromitsu Yamakawa , Yoji Okazaki , Kazuhiko Nagano , Hiromi Ishikawa
IPC分类号： G02B013/08
CPC分类号： G02B13/08 , G02B3/06 , G02B27/0911
摘要： Provided are an optical correcting system which can form a linear image or illuminating light having a substantially uniform light intensity distribution without reducing the efficiency of use of light, and an exposure head which can perform excellent exposure by using the linear image or the illuminating light. Light flux from a light source is collimated by the function of a collimator lens, and the collimated light flux enters into an optical correcting system for correcting light intensity distribution. The optical correcting system for correcting light intensity distribution changes the width of the light flux at the exit position at which each collimated light flux exits so that the light intensity distribution of a linear image is uniform when the collimated light flux is formed into the linear image. A change of the widths of the light flux allows utilizing the light flux at the midsection generally having a high light intensity distribution for the peripheral having an insufficient light intensity, thereby uniformalizing the light intensity distribution of the linear image without reducing the efficiency of use of light as a whole.
摘要翻译：提供了一种光学校正系统，其可以形成具有基本上均匀的光强度分布的线性图像或照明光，而不降低光的使用效率;以及可以通过使用线性图像或照明光来实现优异曝光的曝光头。来自光源的光束通过准直透镜的功能被准直，并且准直光束进入用于校正光强度分布的光学校正系统。用于校正光强度分布的光学校正系统改变在每个准直光束出射的出射位置处的光束的宽度，使得当准直光束形成线性图像时线性图像的光强度分布是均匀的。光通量宽度的变化允许利用通常具有高光强度分布的中部的光通量，对于具有不足的光强度的外围设备，从而使线性图像的光强度分布均匀化，而不降低使用效率整体光。

2. 发明申请

US20030226834A1 Laser annealer and laser thin-film forming apparatus 有权
标题翻译：激光退火炉和激光薄膜成型设备
公开(公告)号：US20030226834A1
公开(公告)日：2003-12-11
申请号：US10456741
申请日：2003-06-09
申请人： FUJI PHOTO FILM CO., LTD. & FUJI PHOTO OPTICAL CO., LTD.
发明人： Hiromi Ishikawa , Akinori Harada , Kazuhiko Nagano , Yoji Okazaki , Takeshi Fujii , Hideo Yamanaka , Hiromitsu Yamakawa
IPC分类号： B23K026/00 , H01L021/00 , H01L021/84
CPC分类号： B23K26/0608 , B23K26/0604 , C23C14/28 , C23C16/483
摘要： A laser annealer has a laser light source with at least one GaN-type semiconductor laser and is configured so as to form emission points that emit laser beams having a wavelength of 350 to 450 nm, and a scanning device for scanning an annealing surface with the laser beams. The laser annealer may have a spatial light modulator for modulating the laser beams, and in which pixel portions whose light modulating states change in accordance with control signals are arranged on a substrate. The invention is applied to a laser thin-film forming apparatus. The apparatus has a laser source that has at least one semiconductor laser and is configured so as to form emission points, and an optical system for focusing laser beams into a single beam in the width direction of a substrate.
摘要翻译：激光退火炉具有具有至少一个GaN型半导体激光器的激光光源，并且被配置为形成发射波长为350至450nm的激光束的发射点，以及用于扫描退火表面的扫描装置激光束。激光退火炉可以具有用于调制激光束的空间光调制器，并且其中光调制状态根据控制信号改变的像素部分被布置在基板上。本发明应用于激光薄膜形成装置。该装置具有至少一个半导体激光器并且被配置为形成发射点的激光源，以及用于将激光束在基板的宽度方向上聚焦成单个光束的光学系统。

3. 发明申请

US20030214571A1 Exposure head, exposure apparatus, and application thereof 有权
标题翻译：曝光头，曝光装置及其应用
公开(公告)号：US20030214571A1
公开(公告)日：2003-11-20
申请号：US10409686
申请日：2003-04-09
申请人： FUJI PHOTO FILM CO., LTD.
发明人： Hiromi Ishikawa , Kazuhiko Nagano , Yoji Okazaki , Takeshi Fujii , Hiromitsu Yamakawa
IPC分类号： B41J002/47
CPC分类号： B41J2/451 , B23K26/0604 , B23K26/066 , B29C64/135 , B29C64/153 , B33Y30/00 , B41J2/45 , B41J2/465 , B41J2/47 , D06L4/50 , D06M10/005 , G02B26/0841 , G03F7/7005 , G03F7/70291 , H04N1/12 , H04N1/191 , H04N1/1916
摘要： In an exposure apparatus of the invention, for a spatial light modulator, each of a plurality of pixel portions fewer than the total number of the pixel portions is controlled with a control signal generated according to exposure information. Namely, a part of the pixel portions is controlled without controlling a whole of the pixel portions on the substrate. Thus, the number of pixels in the pixel portions is decreased, and transfer time of the control signal becomes short. This enables modulation speed of the laser beam to be increased and the high-speed exposure to be performed. An incorporated laser light source, in which the laser beams are incorporated and struck on the optical fiber, is preferable to the laser device. By adopting the incorporated laser light source, high brightness and high output can be obtained, and it is preferable to the exposure of the spatial light modulator. Since the fiber array is obtained with few optical fibers, it is low cost. Since the number of optical fibers is few, the light-emitting region is further decreased when the optical fibers are arrayed.
摘要翻译：在本发明的曝光装置中，对于空间光调制器，利用根据曝光信息生成的控制信号来控制少于像素部分总数的多个像素部分中的每一个。即，在不控制基板上的整个像素部分的情况下，控制像素部分的一部分。因此，像素部分中的像素数量减少，并且控制信号的传送时间变短。这使得能够增加激光束的调制速度并执行高速曝光。其中激光束并入并撞击在光纤上的并入的激光光源优于激光装置。通过采用所结合的激光光源，可以获得高亮度和高输出，并且优选空间光调制器的曝光。由于光纤阵列获得的光纤很少，所以成本低。由于光纤的数量少，所以在配置光纤时，发光区域进一步降低。

4. 发明申请

US20040246454A1 Projecting exposure apparatus 审中-公开
标题翻译：投影曝光装置
公开(公告)号：US20040246454A1
公开(公告)日：2004-12-09
申请号：US10835421
申请日：2004-04-30
申请人： FUJI PHOTO FILM CO., LTD.
发明人： Hiromi Ishikawa , Sumihiro Nishihata
IPC分类号： G03B027/42
CPC分类号： G03F7/7005 , G03F7/70283 , G03F7/70291
摘要： A spatial light modulator performs spatial light modulation of light produced by a light source. An image-side telecentric image forming optical system forms an image of a two-dimensional pattern of the light, which has been obtained from the spatial light modulation performed by the spatial light modulator, on a photosensitive material. At least either one of two pupil-adjacent lenses, which are adjacent to each other with an entrance pupil position in the image forming optical system intervening between the two pupil-adjacent lenses, is constituted such that at least either one of lens surfaces of the pupil-adjacent lens is an aspherical surface.
摘要翻译：空间光调制器执行由光源产生的光的空间光调制。图像侧远心成像光学系统形成由空间光调制器执行的空间光调制获得的光的二维图案的图像在感光材料上。两个瞳孔相邻透镜中的至少两个相邻的透镜在入射光瞳位置之间插入在两个瞳孔相邻的透镜之间的图像形成光学系统中，被构造成使得至少一个透镜表面瞳孔相邻透镜是非球面。

5. 发明申请

US20040223227A1 Illumination optical system, exposure device using the illumination optical system, and exposure method 失效
标题翻译：照明光学系统，使用照明光学系统的曝光装置和曝光方法
公开(公告)号：US20040223227A1
公开(公告)日：2004-11-11
申请号：US10674055
申请日：2003-09-30
申请人： FUJI PHOTO FILM CO., LTD.
发明人： Toshihiko Ohmori , Hiromi Ishikawa
IPC分类号： G02B027/10
CPC分类号： G02B27/09
摘要： In an illumination optical system constituted to uniformize the intensity distribution of illumination light by use of an optical integrator, the overall length thereof is shortened. The illumination optical system includes: a light source including a laser irradiating illumination light on an illuminated body such as a two-dimensional SLM and an optical integrator; the optical integrator being placed between this light source and the illuminated body and uniformizes the intensity distribution of the illumination light by passing the light through minute cells. In this system, the size of the minute cell of the optical integrator (S1nullS2) is 1.5 mm or less.
摘要翻译：在通过使用光学积分器使照明光的强度分布均匀化的照明光学系统中，其总长度被缩短。照明光学系统包括：光源，其包括在诸如二维SLM的照明体上的激光照射照明光和光学积分器; 光学积分器被放置在该光源和被照射体之间，并且通过使光通过微细胞而使照明光的强度分布均匀化。在该系统中，光积分器的微小电池的尺寸（S1 = S2）为1.5mm以下。

6. 发明申请

US20040022503A1 Laser apparatus, exposure head, exposure apparatus, and optical fiber connection method 失效
标题翻译：激光装置，曝光头，曝光装置和光纤连接方法
公开(公告)号：US20040022503A1
公开(公告)日：2004-02-05
申请号：US10409675
申请日：2003-04-09
申请人： FUJI PHOTO FILM CO., LTD.
发明人： Yoji Okazaki , Hiromi Ishikawa , Kazuhiko Nagano , Takeshi Fujii , Hiromitsu Yamakawa
IPC分类号： G02B006/255
CPC分类号： G02B6/4249 , G02B6/04 , G02B6/08 , G02B6/2551 , G02B6/4206 , G02B6/425 , H01S3/06708 , H01S3/06745
摘要： An optical fiber of a bundled fiber light source is an optical fiber whose core diameter is uniform but whose emission end cladding diameter is smaller than an incidence end cladding diameter thereof, and a light emission region thereof is made smaller. An angle of luminous flux from this higher luminance bundled fiber light source, which passes through a lens system and is incident on a DMD, is smaller, i.e., an illumination NA is made smaller. Thus, an angle of flux which is incident on a surface that is to be exposed is smaller. That is, a minute image formation beam can be obtained without increasing the image formation NA, focal depth is lengthen.
摘要翻译：束状纤维光源的光纤是芯直径均匀但发射端包层直径比其入射端包层直径小的光纤，其发光区域变小。来自通过透镜系统并入射到DMD上的该较高亮度束状光纤光源的光通量的角度较小，即使照明NA更小。因此，入射在要曝光的表面上的通量角较小。也就是说，可以在不增加图像形成NA的情况下获得微小的图像形成光束，焦点深度被延长。

7. 发明申请

US20040061673A1 Imaging forming apparatus 失效
标题翻译：成像装置
公开(公告)号：US20040061673A1
公开(公告)日：2004-04-01
申请号：US10671833
申请日：2003-09-29
申请人： FUJI PHOTO FILM CO., LTD.
发明人： Hiromi Ishikawa , Kazuhiko Nagano
IPC分类号： G09G003/34
CPC分类号： G03F7/70291 , G02B26/0841 , G03F7/7005 , G03F7/70275
摘要： In an image forming apparatus: pixel portions of a spatial light-modulation element are two-dimensionally arranged, and individually modulate portions of light applied to the spatial light-modulation element, according to control signals; a first image-forming optical system is arranged in optical paths of the portions of the light modulated by the pixel portions; a microlens array is arranged in a vicinity of an image-forming plane of the first image-forming optical system, and has microlenses arranged in correspondence with the pixel portions, respectively; and a second image-forming optical system is arranged in optical paths of the portions of the light which have passed through the microlenses, and forms on a predetermined surface an image represented by the portions of the light modulated by the spatial light-modulation element. Each of the first and second image-forming optical systems forms an image with a magnification power greater than one.
摘要翻译：在图像形成装置中，空间光调制元件的像素部分被二维排列，并且根据控制信号单独地调制施加到空间光调制元件的光的部分; 第一图像形成光学系统被布置在由像素部分调制的光的部分的光路中; 微透镜阵列布置在第一成像光学系统的图像形成平面附近，并且分别与像素部分对应地布置有微透镜; 并且第二图像形成光学系统被布置在已经通过微透镜的光的部分的光路中，并且在预定表面上形成由由空间光调制元件调制的光的部分表示的图像。第一和第二成像光学系统中的每一个形成具有大于1的放大倍率的图像。

8. 发明申请

US20030228543A1 Writing device and writing method 有权
标题翻译：写装置和写作方式
公开(公告)号：US20030228543A1
公开(公告)日：2003-12-11
申请号：US10455403
申请日：2003-06-06
申请人： FUJI PHOTO FILM CO., LTD.
发明人： Mitsuru Sawano , Yoji Okazaki , Kazuhiko Nagano , Hiromi Ishikawa , Takeshi Fujii
IPC分类号： G03B027/48 , G03F007/20
CPC分类号： H05K3/0079 , G03F7/16 , G03F7/2035 , G03F7/70275 , G03F7/70291 , H05K3/0023 , H05K3/0082 , H05K3/0091 , H05K3/064 , H05K3/125 , H05K3/4664 , H05K2203/013
摘要： A writing device is provided which, in simple processes, can write in two dimensions and three dimensions, and which can form highly accurate patterns. An exposure head, a conductive material discharging head, and an insulating material discharging head are disposed at one scanning stage. At the one scanning stage, a pattern can be formed on a printed board which is on the scanning stage. As a result, processes can be simplified, time between patternings can be shortened, and pattern formation can be made to be faster. Moreover, positional offset of the exposure head and the discharging heads with respect to the printed board does not arise. Thus, it is easy to increase a density of a pattern, and a highly accurate pattern is formed.
摘要翻译：提供了一种写入装置，其在简单的过程中可以写入二维和三维，并且可以形成高度精确的图案。曝光头，导电材料放电头和绝缘材料放电头设置在一个扫描阶段。在一个扫描阶段，可以在扫描台上的印刷电路板上形成图案。结果，可以简化处理，可以缩短图案之间的时间，并且可以使图案形成更快。此外，不会出现曝光头和放电头相对于印刷电路板的位置偏移。因此，容易增加图案的密度，并且形成高精度图案。

9. 发明申请

US20030219189A1 Exposure head 失效
标题翻译：曝光头
公开(公告)号：US20030219189A1
公开(公告)日：2003-11-27
申请号：US10443995
申请日：2003-05-23
申请人： FUJI PHOTO FILM CO., LTD.
发明人： Hiromi Ishikawa , Yoji Okazaki , Kazuhiko Nagano
IPC分类号： G02F001/295 , G02B026/08
CPC分类号： G03F7/70291 , G02B26/0841 , G03F7/7005
摘要： In the present invention provides, in order to obtain a desired focal depth t in a range null of an acceptable increased amount of beam diameter, an exposure head is designed so that the ratio D/W of an output beam width D to a beam width W at the position where a DMD is placed satisfies the following relational formula. 1 D W null null null M 2 null t - K null null a null In the above formula, parameters are defined as follows. null: the wavelength of laser light null: the angle of beam outputted from an illumination light source that is derived by a numerical aperture (NA) of optical fiber according to the following formula nullnullsinnull1(NA) D: the width of beam outputted from the illumination light source W: the beam width at the position where the DMD is placed (at the irradiated surface) a: the size of one pixel on the DMD K: a coefficient determined by beam characteristics, Knull1 M: the magnification of imaging optical system t: required focal depth null: acceptable increased amount of beam diameter
摘要翻译：在本发明中，为了获得可接受的增加光束直径的α的范围内的所需焦点深度t，曝光头被设计为使得输出光束宽度D的比D / W与光束宽度放置DMD的位置的W满足以下关系式。 1 $DW\leqMROW> 2xt-在上述公式中，参数定义如下。 λ：激光的波长θ：根据以下公式θ= sin（-1），由光纤的数值孔径（NA）导出的照明光源输出的光束的角度θ：从照明光源W输出的光束的宽度W：放置DMD的位置处的光束宽度（照射面）a：DMD上的一个像素的尺寸K：由光束特性确定的系数，K = 1 M：成像光学系统的放大倍数t：所需的焦深α：可接受的增加光束直径的数量$

10. 发明申请

US20030010945A1 Radiation image read-out apparatus 失效
标题翻译：辐射图像读出装置
公开(公告)号：US20030010945A1
公开(公告)日：2003-01-16
申请号：US10193994
申请日：2002-07-15
申请人： FUJI PHOTO FILM CO., LTD.
发明人： Hiromi Ishikawa
IPC分类号： G03B042/08
CPC分类号： G03B42/08
摘要： A radiation image read-out apparatus for reading out a radiation image recorded on a stimulable phosphor sheet includes a stimulating light projector which projects stimulating light emitted from a stimulating light source onto the stimulable phosphor sheet through a projecting optical system so that the stimulating light is collected in a line-like area of the stimulable phosphor sheet, and a line sensor which detects stimulated emission emitted from the line-like area of the stimulable phosphor sheet upon exposure to the stimulating light. The projecting optical system has an aspheric toric surface.
摘要翻译：用于读出记录在可刺激的磷光体片上的放射线图像的放射线图像读取装置包括：刺激光投影仪，其通过投影光学系统将刺激光源发射的光刺激到可刺激的荧光体片上，使得刺激光为收集在可刺激的荧光体片的线状区域中，以及线传感器，其在暴露于刺激光时检测从可刺激的荧光体片的线状区域发射的受激发射。投影光学系统具有非球面复曲面。

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