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    • 1. 发明申请
    • METHOD FOR MEASURING THE THICKNESS OF A LAYER OF MATERIAL, GALVANIZING METHOD AND RELATED MEASURING DEVICE
    • 用于测量材料层厚度,加压方法和相关测量装置的方法
    • US20160161247A1
    • 2016-06-09
    • US14902217
    • 2014-06-03
    • ENOVASENSE
    • Jean INARD-CHARVINGeoffrey BRUNO
    • G01B11/06C23C2/06C23C2/14G01B21/08
    • G01B11/0658C23C2/06C23C2/14G01B11/06G01B21/085
    • Method of measuring the thickness of a layer by a light source irradiating the layer with a light beam, which light source is controlled by a sinusoidal control signal having a modulation frequency fm so that the light beam presents optical power that is sinusoidally modulated at the modulation frequency, the measurement method consisting in: using detector elements to determine a calibration phase shift (Δφcal) between the optical power and the control signal; heating the layer with the light beam; using the detector elements to detect a sinusoidal component of a heat flux radiated by the layer; calculating a phase shift (Δφth/opt) between the sinusoidal component of the radiated heat flux and the optical power of the light beam while taking account of the calibration phase shift; and determining the thickness of the layer of material as a function of the phase shift (Δφth/opt).
    • 通过用光束照射该层的光源测量层的厚度的方法,该光源由具有调制频率fm的正弦控制信号控制,使得光束呈现在调制时正弦调制的光功率 频率,测量方法包括:使用检测器元件确定光功率和控制信号之间的校准相移(&Dgr& Cal); 用光束加热层; 使用检测器元件来检测由该层辐射的热通量的正弦分量; 计算辐射热通量的正弦分量与光束的光功率之间的相移(&Dgr;&phgr; th / opt),同时考虑校准相移; 并且确定材料层的厚度作为相移的函数(&Dgr& th / opt)。