专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08942842B2 Varying optical coefficients to generate spectra for polishing control 有权
标题翻译：改变光学系数以产生抛光控制的光谱
公开(公告)号：US08942842B2
公开(公告)日：2015-01-27
申请号：US13096714
申请日：2011-04-28
申请人： Jeffrey Drue David , Dominic J. Benvegnu , Xiaoyuan Hu
发明人： Jeffrey Drue David , Dominic J. Benvegnu , Xiaoyuan Hu
IPC分类号： G06F19/00 , G05B13/02 , B24B49/00 , B24B1/00 , B24B7/00 , G01C25/00 , G01B5/02 , G06F7/60 , C03C15/00 , H01L21/00 , G01R31/26 , H01L21/302 , B24B49/12 , B24B37/04 , B24B37/013 , G01N21/84
CPC分类号： B24B37/013 , B24B37/042 , B24B49/12 , G01N21/84 , G01N2021/8416
摘要： A method of generating a library of reference spectra includes storing an optical model for a layer stack having at a plurality of layers, receiving user input identifying a set of one or more refractive index functions and a set of one or more extinction coefficient functions a first layer from the plurality of layers, wherein the set of one or more refractive index functions includes a plurality of different refractive index functions or the set of one or more extinction coefficient functions includes a plurality of different extinction coefficient functions, and for each combination of a refractive index function from the set of refractive index functions and an extinction coefficient function from the set of extinction coefficient functions, calculating a reference spectrum using the optical model based on the refractive index function, the extinction coefficient function and a first thickness of the first layer.
摘要翻译：生成参考光谱库的方法包括：存储具有多个层的层堆叠的光学模型，接收标识一组一个或多个折射率函数的用户输入和一组一个或多个消光系数函数，第一个层，其中所述一个或多个折射率函数的集合包括多个不同的折射率函数，或者一组或多个消光系数函数包括多个不同的消光系数函数，并且对于每个组合根据折射率函数的折射率函数和来自消光系数函数的消光系数函数，使用基于折射率函数的光学模型计算参考光谱，消光系数函数和第一层的第一厚度。

2. 发明授权

US08755928B2 Automatic selection of reference spectra library 有权
标题翻译：自动选择参考光谱库
公开(公告)号：US08755928B2
公开(公告)日：2014-06-17
申请号：US13095802
申请日：2011-04-27
申请人： Jimin Zhang , Harry Q. Lee , Zhihong Wang , Jeffrey Drue David , Boguslaw A. Swedek , Dominic J. Benvegnu
发明人： Jimin Zhang , Harry Q. Lee , Zhihong Wang , Jeffrey Drue David , Boguslaw A. Swedek , Dominic J. Benvegnu
IPC分类号： G06F19/24
CPC分类号： B24B37/013 , B24B37/042 , B24B49/05 , B24B49/12 , G01J3/28
摘要： A computer-implemented method of generating reference spectra includes polishing a plurality of set-up substrates, the plurality of set-up substrates comprising at least three set-up substrates, measuring a sequence of spectra from each of the plurality of set-up substrates during polishing with an in-situ optical monitoring system to provide a plurality of sequences of spectra, generating a plurality of sequences of potential reference spectra from the plurality of sequences of spectra, determining which sequence of potential reference spectra of the plurality of sequences provides a best match to remaining sequences of the plurality of sequences, and storing the sequence of potential reference spectra determined to provide the best match as reference spectra, and selecting and storing the sequence of potential reference spectra.
摘要翻译：计算机实现的产生参考光谱的方法包括抛光多个设置基板，所述多个设置基板包括至少三个设置基板，测量来自多个设置基板中的每一个的光谱序列在用原位光学监测系统进行抛光时提供多个光谱序列，从多个光谱序列产生多个潜在参考光谱序列，确定多个序列中的哪个潜在参考光谱序列提供一个最佳匹配多个序列的剩余序列，并存储确定为提供最佳匹配的参考光谱序列作为参考光谱，以及选择和存储潜在参考光谱序列。

3. 发明授权

US08563335B1 Method of controlling polishing using in-situ optical monitoring and fourier transform 有权
标题翻译：使用原位光学监测和傅里叶变换控制抛光的方法
公开(公告)号：US08563335B1
公开(公告)日：2013-10-22
申请号：US13454002
申请日：2012-04-23
申请人： Dominic J. Benvegnu , Boguslaw A. Swedek
发明人： Dominic J. Benvegnu , Boguslaw A. Swedek
IPC分类号： H01L21/66
CPC分类号： H01L22/12 , B24B37/013 , B24B49/12 , G01N21/359 , H01L22/26
摘要： A method of controlling a polishing operation includes polishing a substrate, during polishing obtaining a sequence over time of measured spectra from the substrate with an in-situ optical monitoring system, for each measured spectrum from the sequence of measured spectra applying a Fourier transform to the measured spectrum to generate a transformed spectrum thus generating a sequence of transformed spectra, for each transformed spectrum identifying a peak of interest from a plurality of peaks in the transformed spectrum, for each transformed spectrum determining a position value for the peak of interest in the transformed spectrum thus generating a sequence of position values, and determining at least one of a polishing endpoint or an adjustment of a pressure to the substrate from the sequence of position values.
摘要翻译：一种控制抛光操作的方法包括：在抛光期间，利用原位光学监测系统从基底测量的光谱获得随时间变化的序列，对基底进行抛光，从测量光谱序列中应用傅里叶变换到测量的频谱，以产生变换的频谱，从而为每个变换的频谱，对于每个变换的频谱，从变换的频谱中的多个峰中识别感兴趣的峰，对于每个转化的谱，确定转化的峰中的感兴趣的峰的位置值从而产生位置值序列，并根据位置值序列确定抛光终点或对衬底的压力的调整中的至少一个。

4. 发明授权

US08535115B2 Gathering spectra from multiple optical heads 有权
公开(公告)号：US08535115B2
公开(公告)日：2013-09-17
申请号：US13016504
申请日：2011-01-28
申请人： Jeffrey Drue David , Boguslaw A. Swedek , Dominic J. Benvegnu , Sivakumar Dhandapani
发明人： Jeffrey Drue David , Boguslaw A. Swedek , Dominic J. Benvegnu , Sivakumar Dhandapani
IPC分类号： B24B1/00
CPC分类号： B24B49/12 , B24B37/013 , B24B37/105
摘要： A polishing apparatus includes a platen to hold a polishing pad having a plurality of optical apertures, a carrier head to hold a substrate against the polishing pad, a motor to generate relative motion between the carrier head and the platen, and an optical monitoring system. The optical monitoring system includes at least one light source, a common detector, and an optical assembly configured to direct light from the at least one light source to each of a plurality of separated positions in the platen, to direct light from each position of the plurality of separated positions to the substrate as the substrate passes over said each position, to receive reflected light from the substrate as the substrate passes over said each position, and to direct the reflected light from each of the plurality of separated positions to the common detector.

5. 发明授权

US08393933B2 Polishing pad and system with window support 有权
标题翻译：抛光垫和带窗户支撑的系统
公开(公告)号：US08393933B2
公开(公告)日：2013-03-12
申请号：US12644972
申请日：2009-12-22
申请人： Jun Qian , Dominic J. Benvegnu , Ningzhuo Cui , Boguslaw A. Swedek , Thomas H. Osterheld
发明人： Jun Qian , Dominic J. Benvegnu , Ningzhuo Cui , Boguslaw A. Swedek , Thomas H. Osterheld
IPC分类号： B24B49/00
CPC分类号： B24B37/013 , B24B37/205 , B24B49/12
摘要： A polishing system includes a polishing pad having a solid light-transmissive window, an optical fiber having an end, and a spacer having a vertical aperture therethrough. A bottom surface of the spacer contacts the end of the optical fiber, a top surface of the spacer contacts the underside of the window, and the vertical aperture is aligned with the optical fiber.
摘要翻译：抛光系统包括具有固体透光窗的抛光垫，具有一端的光纤和具有穿过其的垂直孔的间隔件。间隔件的底表面接触光纤的端部，间隔件的顶表面接触窗的下侧，并且垂直孔与光纤对准。

6. 发明授权

US08342906B2 Friction sensor for polishing system 有权
标题翻译：抛光系统摩擦传感器
公开(公告)号：US08342906B2
公开(公告)日：2013-01-01
申请号：US12433433
申请日：2009-04-30
申请人： Gabriel Lorimer Miller , Manoocher Birang , Nils Johansson , Boguslaw A. Swedek , Dominic J. Benvegnu
发明人： Gabriel Lorimer Miller , Manoocher Birang , Nils Johansson , Boguslaw A. Swedek , Dominic J. Benvegnu
IPC分类号： B24B49/00
CPC分类号： G01N19/02 , B24B37/013 , B24B49/16
摘要： A system method and apparatus to monitor a frictional coefficient of a substrate undergoing polishing is described. A polishing pad assembly includes a polishing layer including a polishing surface, and a substrate contacting member flexibly coupled to the polishing layer having a top surface to contact an exposed surface of a substrate. At least a portion of the top surface is substantially coplanar with the polishing surface. A sensor is provided to measure a lateral displacement of the substrate contacting member. Some embodiments may provide accurate endpoint detection during chemical mechanical polishing to indicate the exposure of an underlying layer.
摘要翻译：描述了用于监测经历抛光的基底的摩擦系数的系统，方法和装置。抛光垫组件包括包括抛光表面的抛光层，以及柔性地联接到抛光层上的衬底接触构件，其具有与衬底的暴露表面接触的顶表面。顶表面的至少一部分与抛光表面基本共面。提供传感器以测量基板接触构件的横向位移。一些实施例可以在化学机械抛光期间提供准确的端点检测以指示下层的曝光。

7. 发明授权

US08292693B2 Using optical metrology for wafer to wafer feed back process control 有权
标题翻译：使用光学测量技术进行晶圆反馈过程控制
公开(公告)号：US08292693B2
公开(公告)日：2012-10-23
申请号：US12625480
申请日：2009-11-24
申请人： Jeffrey Drue David , Harry Q. Lee , Boguslaw A. Swedek , Dominic J. Benvegnu , Zhize Zhu , Wen-Chiang Tu
发明人： Jeffrey Drue David , Harry Q. Lee , Boguslaw A. Swedek , Dominic J. Benvegnu , Zhize Zhu , Wen-Chiang Tu
IPC分类号： B24B49/00 , B24B51/00 , B24B1/00 , C23F1/00 , H01L21/306 , H01L21/302 , H01L21/461 , G01N21/55 , G01B11/06 , G06F19/00
CPC分类号： B24B37/013 , B24B49/12 , H01L22/12 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： A method of controlling the polishing of a substrate includes polishing a substrate on a first platen using a first set of parameters, obtaining first and second sequences of measured spectra from first and second regions of the substrate with an in-situ optical monitoring system, generating first and second sequences of values from the first and second sequences of measured spectra, fitting first and second linear functions to the first and second sequences of values, determining a difference between the first linear function and the second linear function, adjusting at least one parameter of the first set of parameters based on the difference, and polishing the second substrate on the first platen using the adjusted parameter.
摘要翻译：控制衬底抛光的方法包括使用第一组参数在第一压板上抛光衬底，用原位光学监测系统从衬底的第一和第二区域获得测量光谱的第一和第二序列，产生来自第一和第二测量光谱序列的第一和第二序列值，将第一和第二线性函数拟合到第一和第二序列序列，确定第一线性函数和第二线性函数之间的差异，调整至少一个参数基于所述差异的所述第一组参数，并且使用所述调整参数来研磨所述第一台板上的所述第二基板。

8. 发明申请

US20120196511A1 Gathering Spectra From Multiple Optical Heads 有权
标题翻译：从多个光头收集光谱
公开(公告)号：US20120196511A1
公开(公告)日：2012-08-02
申请号：US13016504
申请日：2011-01-28
申请人： Jeffrey Drue David , Boguslaw A. Swedek , Dominic J. Benvegnu , Sivakumar Dhandapani
发明人： Jeffrey Drue David , Boguslaw A. Swedek , Dominic J. Benvegnu , Sivakumar Dhandapani
IPC分类号： B24B49/00
CPC分类号： B24B49/12 , B24B37/013 , B24B37/105
摘要： A polishing apparatus includes a platen to hold a polishing pad having a plurality of optical apertures, a carrier head to hold a substrate against the polishing pad, a motor to generate relative motion between the carrier head and the platen, and an optical monitoring system. The optical monitoring system includes at least one light source, a common detector, and an optical assembly configured to direct light from the at least one light source to each of a plurality of separated positions in the platen, to direct light from each position of the plurality of separated positions to the substrate as the substrate passes over said each position, to receive reflected light from the substrate as the substrate passes over said each position, and to direct the reflected light from each of the plurality of separated positions to the common detector.
摘要翻译：抛光装置包括用于保持具有多个光学孔的抛光垫的压板，用于将衬底保持在抛光垫上的载体头，用于在承载头和压板之间产生相对运动的电动机以及光学监控系统。所述光学监视系统包括至少一个光源，公共检测器和配置成将来自所述至少一个光源的光引导到所述压板中的多个分离位置中的每一个的光学组件，以引导来自所述至少一个光源的每个位置的光当衬底越过所述每个位置时，多个分离的位置到衬底，以在衬底经过所述每个位置时接收来自衬底的反射光，并将来自多个分离位置中的每一个的反射光引导到公共检测器。

9. 发明申请

US20120096006A1 BUILDING A LIBRARY OF SPECTRA FOR OPTICAL MONITORING 有权
标题翻译：建立光学监测光谱图书馆
公开(公告)号：US20120096006A1
公开(公告)日：2012-04-19
申请号：US13270137
申请日：2011-10-10
申请人： Jeffrey Drue David , Dominic J. Benvegnu , Xiaoyuan Hu
发明人： Jeffrey Drue David , Dominic J. Benvegnu , Xiaoyuan Hu
IPC分类号： G06F17/30 , H01L21/306
CPC分类号： H01L22/26 , B24B37/013 , B24B49/12 , H01L21/3212 , H01L22/12
摘要： A method of controlling polishing includes storing a library having a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum using a matching technique other than sum of squared differences to generate a sequence of best matching reference spectra, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of best matching reference spectra. Finding a best matching reference spectrum may include performing a cross-correlation of the measured spectrum with each of two or more of the plurality of reference spectra from the library and selecting a reference spectrum with the greatest correlation to the measured spectrum as a best matching reference spectrum.
摘要翻译：控制抛光的方法包括：存储具有多个参考光谱的库，抛光衬底，在抛光期间测量来自衬底的光的光谱序列，对于光谱序列的每个测量光谱，使用除了平方差的和以产生最佳匹配参考光谱的序列之外的匹配技术，以及基于最佳匹配参考光谱的序列来确定抛光终点或抛光速率的调整中的至少一个。找到最佳匹配的参考光谱可以包括执行所测量的光谱与来自文库的多个参考光谱中的两个或更多个的互相关，并且选择与所测量的光谱具有最大相关性的参考光谱作为最佳匹配参考光谱。

10. 发明授权

US08039397B2 Using optical metrology for within wafer feed forward process control 有权
标题翻译：使用光学测量在晶片前馈过程控制中
公开(公告)号：US08039397B2
公开(公告)日：2011-10-18
申请号：US12625489
申请日：2009-11-24
申请人： Jeffrey Drue David , Harry Q. Lee , Boguslaw A. Swedek , Dominic J. Benvegnu , Zhize Zhu , Wen-Chiang Tu
发明人： Jeffrey Drue David , Harry Q. Lee , Boguslaw A. Swedek , Dominic J. Benvegnu , Zhize Zhu , Wen-Chiang Tu
IPC分类号： H01L21/302
CPC分类号： B24B37/013 , B24B49/12 , H01L22/12 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： A method of controlling the polishing of a substrate includes polishing a substrate on a first platen using a first set of parameters, obtaining first and second sequences of measured spectra from first and second regions of the substrate with an in-situ optical monitoring system, generating first and second sequences of values from the first and second sequences of measured spectra, fitting first and second linear functions to the first and second sequences of values, determining a difference between the first linear function and the second linear function, adjusting at least one parameter of a second set of parameters based on the difference, and polishing the substrate on a second platen using the adjusted parameter.
摘要翻译：控制衬底抛光的方法包括使用第一组参数在第一压板上抛光衬底，用原位光学监测系统从衬底的第一和第二区域获得测量光谱的第一和第二序列，产生来自第一和第二测量光谱序列的第一和第二序列值，将第一和第二线性函数拟合到第一和第二序列序列，确定第一线性函数和第二线性函数之间的差异，调整至少一个参数基于所述差异的第二组参数，以及使用所述调整参数在所述第二压板上抛光所述衬底。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式