会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • Method and apparatus for rapid grain size analysis of polycrystalline materials
    • 多晶材料快速晶粒尺寸分析的方法和装置
    • US06882739B2
    • 2005-04-19
    • US09884791
    • 2001-06-19
    • David S. KurtzKryzsztof J. KozaczekPaul R. Moran
    • David S. KurtzKryzsztof J. KozaczekPaul R. Moran
    • G01N23/20G06K9/00
    • G01N23/20
    • An apparatus and method for performing rapid grain size analysis on a textured polycrystalline material, by generating average grain size and grain size distribution data from x-ray diffraction data of such material. Raw diffraction data is obtained by capturing a plurality of diffraction arcs within a single data capture frame. The raw diffraction data is digitally registered; (3) and the registered diffraction data is filtered to remove background noise, exclude diffraction overlaps or truncations, and compensate for biased data obtained from regions of highly preferred orientations. Average grain size and grain size distribution data are then correlated with the filtered diffraction data. The apparatus for acquiring raw diffraction data includes a collimated x-ray source having means for adjusting beam size and divergence of the x-ray generated, a 2-dimensional area detector for registering diffracted x-ray, and a sample motion assembly for moving the sample in the sample plane. The resulting system is fast, accurate, amenable to automation, and does not require highly skilled personnel to operate.
    • 通过从这种材料的x射线衍射数据产生平均晶粒尺寸和晶粒尺寸分布数据,对纹理多晶材料进行快速晶粒尺寸分析的装置和方法。 通过在单个数据捕获帧内捕获多个衍射弧来获得原始衍射数据。 原始衍射数据进行数字注册; (3)并且对已登记的衍射数据进行滤波以去除背景噪声,排除衍射重叠或截断,并且补偿从高度优选的取向区域获得的有偏差的数据。 然后将平均晶粒尺寸和晶粒尺寸分布数据与滤波的衍射数据相关。 用于获取原始衍射数据的装置包括准直X射线源,其具有用于调节所产生的x射线的光束尺寸和发散度的装置,用于记录衍射X射线的2维区域检测器和用于移动 样品平面中的样品。 所产生的系统快速,准确,适合于自动化,并且不需要高技能人员操作。
    • 4. 发明授权
    • Apparatus and method for texture analysis on semiconductor wafers
    • 用于半导体晶圆上纹理分析的装置和方法
    • US06301330B1
    • 2001-10-09
    • US09365063
    • 1999-07-30
    • David S. KurtzKrzysztof J. KozaczekPaul R. Moran
    • David S. KurtzKrzysztof J. KozaczekPaul R. Moran
    • G01N23223
    • G01N23/20H01L22/12H01L2924/0002H01L2924/00
    • An apparatus and method for performing rapid, high-resolution polycrystalline crystallographic texture analysis, by calculating an Orientation Distribution Function (ODF) from partial pole figures obtained from x-ray diffraction measurements on large samples, e.g., 200 millimeter diameter wafers. The measurement apparatus includes a 2-D area x-ray detector and a collimated x-ray source arranged in a specific, fixed spatial relationship dependant on the properties of the sample to be measured, and also includes a particular wafer motion assembly. The wafer motion assembly includes three mutually orthogonal rectilinear translation stages, and a &phgr; rotation stage mounted thereon, as an uppermost motion stage, with its range restricted to 180° of rotation. &thgr;-2&thgr; and &khgr; motions are eliminated, and the close deployment of the x-ray source and area detector to the measuring spot on the wafer is such that the detector covers a sufficient range of 2&thgr; and &khgr; to capture multiple diffraction arcs in each frame. The invention employs a new and advantageous texture analysis protocol to determine ODF from the severely truncated pole figures thus obtained, through comparison of experimental ODF figures with calculated ones. The resulting system is fast, accurate, amenable to automation, and does not require highly skilled personnel to operate.
    • 通过从大样品(例如200毫米直径的晶片)上的x射线衍射测量获得的部分极数计算定向分布函数(ODF)来执行快速,高分辨率多晶结构织构分析的装置和方法。 该测量装置包括二维区域X射线检测器和准直的X射线源,其以取决于要测量的样品的性质的特定固定的空间关系排列,并且还包括特定的晶片运动组件。 晶片运动组件包括三个相互正交的直线平移平台和安装在其上的旋转平台作为最上面的运动台,其范围限制在180°的旋转角度。 theta-2theta和&khgr; 消除了运动,并且将x射线源和面积检测器紧密地部署到晶片上的测量点,使得检测器覆盖了足够的2θ和khgr范围; 以捕获每个帧中的多个衍射弧。 本发明采用新的和有利的纹理分析协议,通过将实验ODF数据与计算出的ODF值进行比较来确定由此获得的严重截断极数的ODF。 所产生的系统快速,准确,适合于自动化,并且不需要高技能人员操作。