专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20090093070A1 CAPACITOR, METHOD OF MANUFACTURING THE SAME, METHOD OF MANUFACTURING FERROELECTRIC MEMORY DEVICE, METHOD OF MANUFACTURING ACTUATOR, AND METHOD OF MANUFACTURING LIQUID JET HEAD 审中-公开
公开(公告)号：US20090093070A1
公开(公告)日：2009-04-09
申请号：US12265939
申请日：2008-11-06
申请人： Daisuke KOBAYASHI , Masao NAKAYAMA , Takeshi KIJIMA
发明人： Daisuke KOBAYASHI , Masao NAKAYAMA , Takeshi KIJIMA
IPC分类号： H01L21/02 , H01L41/22
CPC分类号： H01L41/0533 , B41J2/161 , B41J2/1625 , B41J2/1642 , B41J2/1645 , B41J2/1646 , H01L27/101 , H01L27/11502 , H01L27/11507 , H01L28/57 , H01L41/23 , Y10T29/42
摘要： A method of manufacturing a capacitor, including: forming a lower electrode on a substrate; forming a dielectric film of a ferroelectric or a piezoelectric on the lower electrode; forming an upper electrode on the dielectric film; and forming a silicon oxide film so that at least the dielectric film is covered with the silicon oxide film, the silicon oxide film being formed by using trimethoxysilane.

2. 发明申请

US20090153625A1 CAPACITOR, METHOD OF MANUFACTURING THE SAME, METHOD OF MANUFACTURING FERROELECTRIC MEMORY DEVICE, METHOD OF MANUFACTURING ACTUATOR, AND METHOD OF MANUFACTURING LIQUID JET HEAD 审中-公开
标题翻译：电容器及其制造方法，制造电磁存储器件的方法，制造执行器的制造方法和制造液体喷射头的方法
公开(公告)号：US20090153625A1
公开(公告)日：2009-06-18
申请号：US12335637
申请日：2008-12-16
申请人： Daisuke KOBAYASHI , Masao NAKAYAMA , Takeshi KIJIMA
发明人： Daisuke KOBAYASHI , Masao NAKAYAMA , Takeshi KIJIMA
IPC分类号： B41J2/045 , H01L41/00
CPC分类号： H01L41/0533 , B41J2/161 , B41J2/1625 , B41J2/1642 , B41J2/1645 , B41J2/1646 , H01L27/101 , H01L27/11502 , H01L27/11507 , H01L28/57 , H01L41/23 , Y10T29/42
摘要： A method of manufacturing a capacitor, including: forming a lower electrode on a substrate; forming a dielectric film of a ferroelectric or a piezoelectric on the lower electrode; forming an upper electrode on the dielectric film; and forming a silicon oxide film so that at least the dielectric film is covered with the silicon oxide film, the silicon oxide film being formed by using trimethoxysilane.
摘要翻译：一种制造电容器的方法，包括：在基板上形成下电极; 在下电极上形成铁电体或压电体的电介质膜; 在所述电介质膜上形成上电极; 并且形成氧化硅膜，使得至少所述电介质膜被所述氧化硅膜覆盖，所述氧化硅膜通过使用三甲氧基硅烷形成。

3. 发明申请

US20090219343A1 ACTUATOR, METHOD FOR MANUFACTURING ACTUATOR, DROPLET EJECTION DEVICE, DROPLET EJECTION HEAD AND PRINTER 有权
标题翻译：执行器，制造执行器的方法，喷射装置，喷射头和打印机
公开(公告)号：US20090219343A1
公开(公告)日：2009-09-03
申请号：US12393126
申请日：2009-02-26
申请人： Takeshi KIJIMA , Minoru USUI
发明人： Takeshi KIJIMA , Minoru USUI
IPC分类号： B41J2/14
CPC分类号： B41J2/14 , B41J2/04 , B41J2002/041 , B41J2202/11
摘要： An actuator includes a deformable substrate, a magnetic body having an opening, provided above the substrate, and a coil that is disposed above the substrate and surrounds the magnetic body.
摘要翻译：致动器包括可变形基板，设置在基板上方的具有开口的磁体，以及设置在基板上方并围绕磁体的线圈。

4. 发明申请

US20090174754A1 INSULATING TARGET MATERIAL, METHOD OF MANUFACTURING INSULATING TARGET MATERIAL, CONDUCTIVE COMPLEX OXIDE FILM, AND DEVICE 有权
标题翻译：绝缘目标材料，制造绝缘靶材的方法，导电复合氧化物膜和器件
公开(公告)号：US20090174754A1
公开(公告)日：2009-07-09
申请号：US12400859
申请日：2009-03-10
申请人： Koji OHASHI , Setsuya IWASHITA , Takeshi KIJIMA , Yasuaki HAMADA
发明人： Koji OHASHI , Setsuya IWASHITA , Takeshi KIJIMA , Yasuaki HAMADA
IPC分类号： B41J2/045
CPC分类号： C23C14/3414 , B41J2/161 , B41J2/1646 , C23C14/088 , H01L21/31691 , H01L27/105 , H01L27/11502 , H01L27/11507 , H01L28/55 , H01L41/0478 , H01L41/0973 , H01L41/29 , H01L2224/45144 , H01L2224/48091 , H01L2924/13091 , H01L2924/16195 , H01L2924/19107 , H01L2924/00014 , H01L2924/00
摘要： An insulating target material for obtaining a conductive complex oxide film represented by a general formula ABO3, the insulating target material including an oxide of an element A, an oxide of an element B, and at least one of an Si compound and a Ge compound.
摘要翻译：一种用于获得由通式ABO3表示的导电复合氧化物膜的绝缘靶材料，包括元素A的氧化物，元素B的氧化物以及Si化合物和Ge化合物中的至少一种的绝缘靶材料。

5. 发明申请

US20080308762A1 PIEZOELECTRIC LAMINATE, SURFACE ACOUSTIC WAVE DEVICE, THIN-FILM PIEZOELECTRIC RESONATOR, AND PIEZOELECTRIC ACTUATOR 审中-公开
标题翻译：压电层压板，表面声波装置，薄膜压电谐振器和压电致动器
公开(公告)号：US20080308762A1
公开(公告)日：2008-12-18
申请号：US12175794
申请日：2008-07-18
申请人： Mayumi UENO , Takamitsu HIGUCHI , Takeshi KIJIMA
发明人： Mayumi UENO , Takamitsu HIGUCHI , Takeshi KIJIMA
IPC分类号： H01L41/18
CPC分类号： H01L41/18 , B41J2/14201 , H01L41/0815 , H01L41/1873 , H01L41/318 , H03H9/02031 , H03H9/02574
摘要： A piezoelectric laminate including a base and a first piezoelectric layer formed above the base and including potassium sodium niobate. The first piezoelectric layer is shown by a compositional formula (KaNa1-a)xNbO3, “a” and “x” in the compositional formula being respectively 0.1
摘要翻译：一种压电层压板，包括在基底上形成的底部和第一压电层，并包括铌酸钾钠。第一压电层由组成式（KaNa1-a）xNbO3表示，组成式中的“a”和“x”分别为0.1

6. 发明申请

US20070212876A1 METHOD FOR MANUFACTURING WIRING SUBSTRATE 有权
标题翻译：制造接线基板的方法
公开(公告)号：US20070212876A1
公开(公告)日：2007-09-13
申请号：US11680801
申请日：2007-03-01
申请人： Satoshi KIMURA , Hidemichi FURIHATA , Takeshi KIJIMA
发明人： Satoshi KIMURA , Hidemichi FURIHATA , Takeshi KIJIMA
IPC分类号： H01L21/4763
CPC分类号： H05K3/184 , C23C18/1608 , C23C18/1651 , C23C18/1692 , C23C18/1879 , C23C18/30 , C23C18/31 , C23C18/36 , H05K2203/0565 , H05K2203/1476 , Y10S438/903 , Y10S438/906
摘要： A method for manufacturing a wiring substrate by an electroless plating method that precipitates metal without using a plating resist is provided. The method includes the steps of (a) providing a catalyst layer having a predetermined pattern on a substrate; (b) dipping the substrate in an electroless plating solution to thereby precipitate metal on the catalyst layer to provide a first metal layer; (c) washing a top surface of the substrate with water; and (d) dipping the substrate in an electroless plating solution to thereby precipitate metal on the first metal layer to provide a second metal layer.
摘要翻译：提供一种通过化学镀方法制造布线基板的方法，该方法使不使用电镀抗蚀剂的金属沉淀。该方法包括以下步骤：（a）在衬底上提供具有预定图案的催化剂层; （b）将基板浸渍在化学镀溶液中，从而使金属沉淀在催化剂层上以提供第一金属层; （c）用水洗涤基材的顶表面; 和（d）将基板浸入化学镀溶液中，从而在第一金属层上沉淀金属，以提供第二金属层。

7. 发明申请

US20120103675A1 LAMINATED ELECTRONIC DEVICES AND METHOD OF MANUFACTURING SAME 有权
标题翻译：层压电子器件及其制造方法
公开(公告)号：US20120103675A1
公开(公告)日：2012-05-03
申请号：US13280734
申请日：2011-10-25
申请人： Kazunari KIMURA , Junichi NAKAMURA , Takeshi KIJIMA , Isao ABE , Takahiro SUZUKI , Toshiaki ARAKI
发明人： Kazunari KIMURA , Junichi NAKAMURA , Takeshi KIJIMA , Isao ABE , Takahiro SUZUKI , Toshiaki ARAKI
IPC分类号： H05K1/11 , H05K3/42 , H05K1/16
CPC分类号： H05K3/4061 , H01P1/20345 , H05K3/4629 , Y10T29/49165
摘要： A laminated electronic device comprises two or more wiring layers including a first wiring layer and a second wiring layer, an insulating layer interposed between the first wiring layer and second wiring layer, and a through conductor extending through the insulating layer for electrically connecting a first conductor disposed on the first wiring layer to a second conductor disposed on the second wiring layer. The through conductor includes divergent sections at both ends, which have a diameter gradually increased toward the first conductor or second conductor.
摘要翻译：层叠电子器件包括两个或更多个布线层，包括第一布线层和第二布线层，插入在第一布线层和第二布线层之间的绝缘层，以及穿过绝缘层的贯通导体，用于将第一布线布置在第一布线层上的布置在第二布线层上的第二导体。贯通导体包括两端的发散部分，其具有朝向第一导体或第二导体逐渐增加的直径。

8. 发明申请

US20090230346A1 PIEZOELECTRICS, PIEZOELECTRIC ELEMENT, AND PIEZOELECTRIC ACTUATOR 有权
标题翻译：压电元件，压电元件和压电致动器
公开(公告)号：US20090230346A1
公开(公告)日：2009-09-17
申请号：US12402828
申请日：2009-03-12
申请人： Yasuaki HAMADA , Akio KONISHI , Takeshi KIJIMA
发明人： Yasuaki HAMADA , Akio KONISHI , Takeshi KIJIMA
IPC分类号： C04B35/472
CPC分类号： C04B35/493 , C04B35/624 , C04B2235/3251 , C04B2235/3287 , C04B2235/3418 , C04B2235/441 , C04B2235/449 , C04B2235/768 , H01L41/0805 , H01L41/1876 , H01L41/318
摘要： A piezoelectric body includes a perovskite type compound that is expressed by a compositional formula being Pb (Zrx Ti1-x)1-y My O3, where M is at least one of Ta and Nb, x is in a range of 0.51≦x≦0.57, and y is in a range of 0.05≦y
摘要翻译：压电体包括由组成式表示为Pb（Zr x Ti 1-x）1-y My O 3的钙钛矿型化合物，其中M是Ta和Nb中的至少一种，x在0.51≤x <= 0.57，y在0.05 <= y <0.2的范围内，其中钙钛矿型化合物含有SiO 2和GeO 2中的至少一种作为添加剂，添加剂的添加量为0.5摩尔％以上，但是相对于钙钛矿型化合物的量为5摩尔％以下。

9. 发明申请

US20090225139A1 DROPLET EJECTION DEVICE AND PRINTER 有权
公开(公告)号：US20090225139A1
公开(公告)日：2009-09-10
申请号：US12398351
申请日：2009-03-05
申请人： Takeshi KIJIMA , Shoichi IINO
发明人： Takeshi KIJIMA , Shoichi IINO
IPC分类号： B41J2/045
CPC分类号： B41J2/14274 , B41J2202/11
摘要： A droplet ejection device includes: a substrate having a first pressure chamber, a second pressure chamber, a third pressure chamber and a fourth pressure chamber extending in a first direction; a nozzle plate provided below the substrate, and having a first nozzle aperture continuous with the first pressure chamber, a second nozzle aperture continuous with the second pressure chamber, a third nozzle aperture continuous with the third pressure chamber, and a fourth nozzle aperture continuous with the fourth pressure chamber; a vibration plate provided above the substrate; a first piezoelectric element provided above the vibration plate and above the first pressure chamber; a second piezoelectric element provided above the vibration plate and above the second pressure chamber; a third piezoelectric element provided above the vibration plate and above the third pressure chamber; and a fourth piezoelectric element provided above the vibration plate and above the fourth pressure chamber, wherein, as viewed in a second direction orthogonal to the first direction, the first nozzle aperture is provided at a position that overlaps the third nozzle aperture, and provided at a position that does not overlap the second nozzle aperture and the forth nozzle aperture; the second nozzle aperture is provided at a position that overlaps the fourth nozzle aperture, and provided at a position that does not overlap the first nozzle aperture and the third nozzle aperture, as viewed in the second direction; the first piezoelectric element is provided at a position that overlaps the third piezoelectric element, and provided at a position that does not overlap the second piezoelectric element and the fourth piezoelectric element, as viewed in the second direction; and the second piezoelectric element is provided at a position that overlaps the fourth piezoelectric element, and provided at a position that does not overlap the first piezoelectric element and the third piezoelectric element.

10. 发明申请

US20090246360A1 OXIDE SOURCE MATERIAL SOLUTION, OXIDE FILM, PIEZOELECTRIC ELEMENT, METHOD FOR FORMING OXIDE FILM AND METHOD FOR MANUFACTURING PIEZOELECYTRIC ELEMENT 审中-公开
标题翻译：氧化硅材料解决方案，氧化膜，压电元件，形成氧化膜的方法和制造PIEZOELECYTRICELEMENT的方法
公开(公告)号：US20090246360A1
公开(公告)日：2009-10-01
申请号：US12413880
申请日：2009-03-30
申请人： Yasuaki HAMADA , Takeshi KIJIMA
发明人： Yasuaki HAMADA , Takeshi KIJIMA
IPC分类号： B05D3/02 , C04B35/499
CPC分类号： C04B35/493 , C04B35/6325 , C04B2235/3287 , C04B2235/3418 , C04B2235/441 , C04B2235/768 , C04B2235/79 , C23C18/1216 , C23C18/1225 , H01L41/1876 , H01L41/318
摘要： An oxide source material solution for forming an oxide film having a composition expressed by PbuZrxTi1-x-yMyO3 is presented. A composition of metal element constituents in the oxide source material solution is expressed by [Pb]:([Zr]+[Ti]+[M])=v:1, and a difference (v−u) in composition ratio of Pb between the oxide source material solution and the oxide film is 0.01 or less.
摘要翻译：提出了一种用于形成具有由PbuZrxTi1-x-yMyO3表示的组成的氧化物膜的氧化物源材料溶液。氧化物源材料溶液中的金属元素成分的组成由[Pb]：（[Zr] + [Ti] + [M]）= v：1表示，Pb的组成比的差（vu）氧化物源材料溶液和氧化膜为0.01以下。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式