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    • 2. 发明申请
    • DISPLAY DEVICE AND ORGANIC LIGHT EMITTING DIODE DISPLAY
    • 显示器件和有机发光二极管显示器
    • US20120104420A1
    • 2012-05-03
    • US13069254
    • 2011-03-22
    • Jung-Min LEEChoong-Ho LEEKie Hyun NAM
    • Jung-Min LEEChoong-Ho LEEKie Hyun NAM
    • H01L51/52
    • H01L51/524B82Y10/00H01L27/3258H01L27/3276H01L51/0048H01L51/5243H01L51/5246H01L51/525
    • A display device includes a substrate, a display unit formed on the substrate, a sealing substrate bonded to the substrate by a bonding layer surrounding the display unit, the sealing substrate comprising a complex member and an insulating member, wherein the complex member has a resin matrix and a plurality of carbon fibers and the insulator is connected to an edge of the complex member and comprises a penetration hole, a metal layer disposed at one side of the sealing substrate wherein the one side faces the substrate, and a conductive connection unit filling in the penetration hole and contacting the metal layer. The complex member and the insulator may be coupled by tongue and groovecoupling along a thickness direction of the sealing substrate where the protrusion-groove coupling structure is top-to-bottom symmetric and the insulator may have a thickness identical to that of the complex member.
    • 显示装置包括基板,形成在基板上的显示单元,通过围绕显示单元的接合层粘合到基板的密封基板,密封基板包括复合部件和绝缘部件,其中复合部件具有树脂 基体和多个碳纤维,绝缘体连接到复合构件的边缘,并且包括穿透孔,设置在密封基板的一侧的金属层,其中一侧面向基板,以及导电连接单元填充 在穿透孔中并与金属层接触。 复合构件和绝缘体可以沿着密封衬底的厚度方向通过舌和槽耦合来耦合,其中突出沟槽联接结构是从上到下对称的,并且绝缘体可以具有与复合构件的厚度相同的厚度。
    • 6. 发明申请
    • THIN FILM DEPOSITION APPARATUS
    • 薄膜沉积装置
    • US20100297348A1
    • 2010-11-25
    • US12784774
    • 2010-05-21
    • Choong-Ho LEEJung-Min LEE
    • Choong-Ho LEEJung-Min LEE
    • C23C16/52C23C16/00C23C16/04C23C16/44
    • C23C14/24
    • A thin film deposition apparatus that can be simply applied to manufacture large-sized display devices on a mass scale and that improves manufacturing yield includes: a deposition source; a first nozzle disposed at a side of the deposition source and including a plurality of first slits arranged in a first direction; a second nozzle disposed opposite to the first nozzle and including a plurality of second slits arranged in the first direction; a barrier wall assembly including a plurality of barrier walls that are arranged in the first direction in order to partition a space between the first nozzle and the second nozzle; and an alignment member including an interval control member that adjusts an interval between the second nozzle and the substrate, and/or an alignment control member that adjusts alignment between the second nozzle and the substrate.
    • 可以简单地应用于大规模制造大尺寸显示装置并且提高制造成品率的薄膜沉积装置包括:沉积源; 第一喷嘴,其设置在所述沉积源的一侧,并且包括沿第一方向布置的多个第一狭缝; 第二喷嘴,与所述第一喷嘴相对设置并且包括沿所述第一方向布置的多个第二狭缝; 阻挡壁组件,其包括沿第一方向布置的多个阻挡壁,以便分隔第一喷嘴和第二喷嘴之间的空间; 以及对准构件,其包括调节第二喷嘴和基板之间的间隔的间隔控制构件和/或调整第二喷嘴和基板之间的对准的对准控制构件。
    • 9. 发明申请
    • THIN FILM DEPOSITION APPARATUS INCLUDING DEPOSITION BLADE
    • 薄膜沉积装置,包括沉积刀片
    • US20110033619A1
    • 2011-02-10
    • US12815673
    • 2010-06-15
    • Jung-Min LEEChoong-Ho Lee
    • Jung-Min LEEChoong-Ho Lee
    • C23C16/44C23C16/00
    • C23C14/243C23C14/042C23C14/12
    • A thin film deposition apparatus includes a deposition source that is disposed opposite to a substrate and holds a deposition material that is vaporized; a first nozzle unit disposed between the substrate and the deposition source and having first slit units arranged in a first direction of the substrate; a second nozzle unit disposed between the first nozzle unit and the substrate and having second slit units arranged in the first direction of the substrate; and at least one barrier member assembly disposed between the first nozzle unit and the second nozzle unit and partitioning the space between the first nozzle unit and the second nozzle unit. A deposition blade is optionally disposed in any space formed between the first nozzle unit and the second nozzle unit during a stand-by mode to prevent the deposition of the deposition material from being deposited onto undesirable regions of the chamber.
    • 薄膜沉积设备包括沉积源,该沉积源与衬底相对设置并保持蒸发的沉积材料; 第一喷嘴单元,设置在所述基板和所述沉积源之间并且具有沿所述基板的第一方向布置的第一狭缝单元; 第二喷嘴单元,设置在所述第一喷嘴单元和所述基板之间,并且具有沿所述基板的第一方向布置的第二狭缝单元; 以及设置在第一喷嘴单元和第二喷嘴单元之间并且分隔第一喷嘴单元和第二喷嘴单元之间的空间的至少一个阻挡构件组件。 在待机模式期间,沉积刀片可选地设置在形成在第一喷嘴单元和第二喷嘴单元之间的任何空间中,以防止沉积材料的沉积沉积在腔室的不期望的区域上。
    • 10. 发明申请
    • THIN FILM DEPOSITION APPARATUS
    • 薄膜沉积装置
    • US20100330265A1
    • 2010-12-30
    • US12820270
    • 2010-06-22
    • Jung-Min LEEChoong-Ho Lee
    • Jung-Min LEEChoong-Ho Lee
    • C23C16/44C23C16/00B05D5/06
    • C23C14/042C23C14/044C23C14/12C23C14/243
    • A thin film deposition apparatus that can be simply applied to manufacture a thin film on a large substrate on a mass scale and that improves manufacturing yield includes a deposition source; a first nozzle disposed at a side of the deposition source and including first slits arranged in a first direction; a second nozzle assembly disposed opposite to the deposition source and including strings arranged in the first direction; and a barrier wall assembly including barrier walls disposed between the first nozzle and the second nozzle assembly to partition a space between the first nozzle and the second nozzle assembly into a plurality of sub-deposition spaces. The second nozzle assembly is movable relative to the target along a plane parallel to a surface of the target, or the target is movable relative to the second nozzle along the plane.
    • 可以简单地应用于在大型基板上以大规模制造薄膜并且提高制造成品率的薄膜沉积装置包括沉积源; 第一喷嘴,其设置在所述沉积源的一侧,并且包括沿第一方向布置的第一狭缝; 第二喷嘴组件,其布置成与所述沉积源相对并且包括沿所述第一方向布置的弦; 以及阻挡壁组件,其包括设置在第一喷嘴和第二喷嘴组件之间的阻挡壁,以将第一喷嘴和第二喷嘴组件之间的空间分隔成多个次沉积空间。 第二喷嘴组件可以沿着平行于靶的表面的平面相对于靶移动,或者靶可沿着平面相对于第二喷嘴移动。