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1. 发明授权

US5510157A Method of producing diamond of controlled quality 失效
标题翻译：生产控制质量钻石的方法
公开(公告)号：US5510157A
公开(公告)日：1996-04-23
申请号：US789441
申请日：1991-11-06
申请人： Chia-Fu Chen , Kazuhito Nishimura , Ensei Ko , Hiroshi Ishizuka , Satoru Hosomi
发明人： Chia-Fu Chen , Kazuhito Nishimura , Ensei Ko , Hiroshi Ishizuka , Satoru Hosomi
IPC分类号： C01B31/06 , C23C16/27 , C23C16/52
CPC分类号： C23C16/27 , C01B31/06 , C23C16/278 , C23C16/279 , C23C16/52
摘要： Making a diamond substance exhibiting a cathodoluminescence spectrum with the peak at a photon energy greater than 2.8 eV (electron volt), the half-value and 20%-value width not exceeding 0.5 eV and 0.8 eV, respectively, comprising: providing a substrate in a closed chamber, introducing a matrix gas comprising H.sub.2 and one selected from hydrocarbon and CO to said chamber, exciting the gas to create a plasma while heating said substrate to a temperature of at least 700.degree. C. and, thus, causing deposition and growth of diamond substance which is crystallographically diamond, controlling parameters of the deposition by means of the cathodoluminescence record and recovering the diamond substance from the chamber.
摘要翻译：制备具有阴极发光光谱的金刚石物质，其光子能量大于2.8eV（电子伏特）的峰值，半值和20％值的宽度分别不超过0.5eV和0.8eV，包括：提供基底封闭的室，将包含H 2和选自烃和CO的一种基质气体引入所述室，激发气体以产生等离子体，同时将所述衬底加热到至少700℃的温度，从而引起沉积和生长通过阴极发光记录控制沉积参数，并从室中回收金刚石物质。

2. 发明授权

US5061292A Diamond abrasive and method for producing the same 失效
标题翻译：金刚石磨料及其制造方法
公开(公告)号：US5061292A
公开(公告)日：1991-10-29
申请号：US379219
申请日：1989-07-13
申请人： Chia-Fu Chen , Ensei Ko , Hiroshi Ishizuka , Satoru Hosomi
发明人： Chia-Fu Chen , Ensei Ko , Hiroshi Ishizuka , Satoru Hosomi
IPC分类号： B24D3/00 , C01B31/06 , C09K3/14 , C23C16/26
CPC分类号： C23C16/26 , B24D3/005 , B24D3/007 , C09K3/1436
摘要： Diamond abrasive comprising a mass of idiomorphic crystal grits which each have an irregular shaped core of diamond formed under pressure where diamond is thermodynamically favored phase, and a growth layer of diamond and/or diamond-like carbon formed over said core by chemical vapor deposition.
摘要翻译：金刚石研磨剂包括大量的同晶晶粒，每个具有金刚石在热力学上有利相的金刚石形成的不规则形状的金刚石芯，以及通过化学气相沉积在所述芯上形成的金刚石和/或类金刚石碳的生长层。

3. 发明授权

US5882740A Method of producing diamond of controlled quality and product produced thereby 失效
标题翻译：生产受控质量的金刚石的方法和由此生产的产品
公开(公告)号：US5882740A
公开(公告)日：1999-03-16
申请号：US627320
申请日：1996-04-01
申请人： Chia-Fu Chen , Kazuhito Nishimura , Ensei Ko , Hiroshi Ishizuka , Satoru Hosomi
发明人： Chia-Fu Chen , Kazuhito Nishimura , Ensei Ko , Hiroshi Ishizuka , Satoru Hosomi
IPC分类号： C01B31/06 , C23C16/27 , C23C16/52
CPC分类号： C23C16/27 , C01B31/06 , C23C16/278 , C23C16/279 , C23C16/52
摘要： A method is provided for efficiently producing an entirely quality-controlled CVD diamond. A CVD process is interrupted at an early stage and the deposit is taken out of the reaction chamber, before a significant mass is accumulated, and is inspected by means of cathodoluminescence. The spectrum are compared with a given reference in terms of peak position, half width and 20%-value width in coordination. The observed deviation allows to determine whether to maintain or alter the settings.A diamond substance of acceptable quality which is properly specified in terms of the CL parameters is also provided.
摘要翻译：提供了一种有效地生产完全质量控制的CVD金刚石的方法。 CVD过程在早期中断，并且在积累显着质量之前将沉积物从反应室中取出，并通过阴极发光进行检查。将频谱与峰值位置，半宽度和20％值宽度协调的给定参考值进行比较。观察到的偏差允许确定是否维护或更改设置。还提供了根据CL参数适当指定的可接受质量的钻石物质。

4. 发明申请

US20120003441A1 DECORATION FILM, DECORATION DEVICE, AND METHOD FOR MANUFACTURING DECORATION DEVICE 审中-公开
标题翻译：装饰膜，装饰装置和制造装饰装置的方法
公开(公告)号：US20120003441A1
公开(公告)日：2012-01-05
申请号：US12829353
申请日：2010-07-01
申请人： Chia-Fu Chen
发明人： Chia-Fu Chen
IPC分类号： B32B5/16 , B32B38/14 , B32B3/10
CPC分类号： B32B37/025 , B32B7/06 , B32B7/12 , B32B27/08 , B32B27/285 , B32B27/302 , B32B27/308 , B32B27/32 , B32B27/36 , B32B27/365 , B32B37/12 , B32B38/145 , B32B2250/44 , B32B2255/10 , B32B2264/00 , B32B2305/54 , B32B2307/412 , B32B2307/75 , B32B2451/00 , Y10T428/24802 , Y10T428/24893
摘要： A decoration film, a decoration device and a method for manufacturing a decoration device are provided. The decoration film includes a substrate, a transparent material layer, a pattern layer, a plurality of aroma units and an adhesion layer. The transparent material layer is disposed on the substrate. The pattern layer is disposed on the transparent material layer at a side far from the substrate. The adhesion layer is exposed and disposed on the pattern layer. The aroma units are scattered in the transparent material layer, the pattern layer or the adhesion layer.
摘要翻译：提供装饰膜，装饰装置和装饰装置的制造方法。装饰膜包括基板，透明材料层，图案层，多个香气单元和粘合层。透明材料层设置在基板上。图案层在远离基板的一侧设置在透明材料层上。粘附层被曝光并设置在图案层上。芳香单元散布在透明材料层，图案层或粘合层中。

5. 发明申请

US20080150509A1 VOLTAGE ADJUSTING SYSTEM AND METHOD FOR ADJUSTING DRIVING VOLTAGE OF THERMAL PRINT HEAD 失效
标题翻译：用于调节热打印头驱动电压的电压调节系统和方法
公开(公告)号：US20080150509A1
公开(公告)日：2008-06-26
申请号：US11740263
申请日：2007-04-25
申请人： Kai-Hsiang Liu , Chia-Fu Chen
发明人： Kai-Hsiang Liu , Chia-Fu Chen
IPC分类号： G05F1/10
CPC分类号： H02M3/157 , B41J2/3553 , B41J2/3558
摘要： The present invention discloses a voltage adjusting system and method for adjusting a driving voltage of a thermal print head by utilizing an electronic variable resistor. The voltage adjusting system includes a power converter, a voltage divider, an analog-to-digital converter (ADC), and a controller. The system and method of the present invention obtains a detecting voltage value through a feedback mechanism and the ADC, and then utilizes the detecting voltage value to control the electronic variable resistor implemented in the voltage divider to adjust the driving voltage of the thermal print head.
摘要翻译：本发明公开了一种通过利用电子可变电阻来调节热敏打印头的驱动电压的电压调节系统和方法。电压调节系统包括功率转换器，分压器，模数转换器（ADC）和控制器。本发明的系统和方法通过反馈机构和ADC获得检测电压值，然后利用检测电压值来控制在分压器中实现的电子可变电阻器来调节热敏打印头的驱动电压。

6. 发明授权

US5961718A Process for selectively depositing diamond films 失效
标题翻译：用于选择性沉积金刚石膜的方法
公开(公告)号：US5961718A
公开(公告)日：1999-10-05
申请号：US543811
申请日：1995-10-16
申请人： Chia-Fu Chen , Sheng-Hsiung Chen , Tsao-Ming Hong
发明人： Chia-Fu Chen , Sheng-Hsiung Chen , Tsao-Ming Hong
IPC分类号： C23C16/04 , C23C16/27 , C30B25/02 , C30B29/04
CPC分类号： C23C16/27 , C23C16/04 , C30B25/02 , C30B29/04
摘要： The present invention provides a process for selectively depositing diamond films, which includes two stages of diamond deposition and the gas source used is a mixture of C.sub.x H.sub.y plus CO.sub.2 or C.sub.x H.sub.y O.sub.z plus CO.sub.2. In the period between the first and second stage, the substrate is immersed in an aqueous solution of HF plus HNO.sub.3. The obtained diamond films exhibit good crystallinity and selectivity and the growth rate is fast.
摘要翻译：本发明提供了选择性沉积金刚石膜的方法，其包括金刚石沉积的两个阶段，所用的气体源是C x H y + CO 2或C x H y O z + CO 2的混合物。在第一和第二阶段之间的期间，将基板浸入HF + HNO 3的水溶液中。所得到的金刚石膜具有良好的结晶度和选择性，生长速度快。

7. 发明授权

US07492382B2 Voltage adjusting system and method for adjusting driving voltage of thermal print head 失效
标题翻译：电压调节系统及调节热敏打印头驱动电压的方法
公开(公告)号：US07492382B2
公开(公告)日：2009-02-17
申请号：US11740263
申请日：2007-04-25
申请人： Kai-Hsiang Liu , Chia-Fu Chen
发明人： Kai-Hsiang Liu , Chia-Fu Chen
IPC分类号： B41J2/35
CPC分类号： H02M3/157 , B41J2/3553 , B41J2/3558
摘要： The present invention discloses a voltage adjusting system and method for adjusting a driving voltage of a thermal print head by utilizing an electronic variable resistor. The voltage adjusting system includes a power converter, a voltage divider, an analog-to-digital converter (ADC), and a controller. The system and method of the present invention obtains a detecting voltage value through a feedback mechanism and the ADC, and then utilizes the detecting voltage value to control the electronic variable resistor implemented in the voltage divider to adjust the driving voltage of the thermal print head.
摘要翻译：本发明公开了一种通过利用电子可变电阻来调节热敏打印头的驱动电压的电压调节系统和方法。电压调节系统包括功率转换器，分压器，模数转换器（ADC）和控制器。本发明的系统和方法通过反馈机构和ADC获得检测电压值，然后利用检测电压值来控制在分压器中实现的电子可变电阻器来调节热敏打印头的驱动电压。

8. 发明授权

US5660894A Process for depositing diamond by chemical vapor deposition 失效
标题翻译：通过化学气相沉积法沉积金刚石的方法
公开(公告)号：US5660894A
公开(公告)日：1997-08-26
申请号：US543373
申请日：1995-10-16
申请人： Chia-Fu Chen , Sheng-Hsiung Chen , Tsao-Ming Hong
发明人： Chia-Fu Chen , Sheng-Hsiung Chen , Tsao-Ming Hong
IPC分类号： C23C16/27 , B05D3/06 , C23C16/26
CPC分类号： C23C16/274 , C23C16/277
摘要： The present invention provides a process for depositing diamond by chemical vapor deposition without using conventionally-used hydrogen, which is an explosive gas, as a reaction gases. The process includes contacting a substrate with a two-component gas mixture, under the conditions of a substrate temperature of 150.degree. C.-900.degree. C., a pressure of 1-50 torr, an input microwave power of 250-450 W. The two-component gas mixture is a hydrocarbon (C.sub.x H.sub.y) plus CO.sub.2 with a flow rate ratio of the C.sub.x H.sub.y to CO.sub.2 of 0.2-0.8, or a gasified liquid state oxygen-containing hydrocarbon (C.sub.x H.sub.y O.sub.z) plus CO.sub.2 with a flow rate ratio of the C.sub.x H.sub.y O.sub.z to CO.sub.2 of 12-17. High quality diamond can be obtained even at low temperature of 180.degree. C.
摘要翻译：本发明提供了一种通过化学气相沉积法沉积金刚石的方法，而不使用作为爆炸性气体的常规使用的氢作为反应气体。该方法包括在基板温度为150℃-900℃，压力为1-50托，250-450瓦的输入微波功率的条件下使基板与双组分气体混合物接触。双组分气体混合物是碳氢化合物（CxHy）加CO 2，流速比C x H y与CO 2的比例为0.2-0.8，或气化液态含氧烃（C x H y O z）加CO 2，流速比为 CxHyOz至12-17的CO2。即使在180℃的低温下也可获得高品质的金刚石。

9. 发明授权

US5635258A Method of forming a boron-doped diamond film by chemical vapor deposition 失效
标题翻译：通过化学气相沉积法形成硼掺杂金刚石膜的方法
公开(公告)号：US5635258A
公开(公告)日：1997-06-03
申请号：US415646
申请日：1995-04-03
申请人： Chia-Fu Chen , Sheng-Hsiung Chen , Tsao-Ming Hong
发明人： Chia-Fu Chen , Sheng-Hsiung Chen , Tsao-Ming Hong
IPC分类号： C23C16/27 , B05D3/06 , C23C16/30
CPC分类号： C23C16/274 , C23C16/278
摘要： A method of forming boron-doped diamond film by, chemical vapor deposition (CVD) utilizing two-component system reactant gas doped with trimethyl borate.
摘要翻译：通过使用掺杂有硼酸三甲酯的双组分体系反应气体的化学气相沉积（CVD）形成硼掺杂金刚石膜的方法。

10. 发明授权

US09336123B1 Method and system for automatically establishing a component description format (CDF) debugging environment 有权
标题翻译：自动建立组件描述格式（CDF）调试环境的方法和系统
公开(公告)号：US09336123B1
公开(公告)日：2016-05-10
申请号：US14230022
申请日：2014-03-31
申请人： Gilles S. C. Lamant , Li-Chien Ting , Serena Chiang Caluya , Chia-Fu Chen
发明人： Gilles S. C. Lamant , Li-Chien Ting , Serena Chiang Caluya , Chia-Fu Chen
IPC分类号： G06F9/44 , G06F11/36
CPC分类号： G06F11/3636 , G06F11/3664 , G06F17/5068 , G06F2217/14
摘要： A system and method are provided for establishing an automated debugging environment in an Electronic Design Automation (EDA) work flow. A user interface is provided for interfacing with a user by displaying a list of debuggable parameters, accepting a selection thereof from a user, and automatically locating both the callback function which sets the selected parameter, and the source code file which contains the callback function. Additionally, it is determined whether the callback function sets solely the selected parameter, or several different parameters, and an automatic breakpoint is set accordingly to break only responsive to the selected parameter. On execution of the modified callback function, execution will be arrested by the automatically-set intelligent breakpoint and a debugging user interface will be generated and provided to the user with a display of the relevant source code, callback function, parameter names and values, system state, and the like. Upon completion of the debugging process, the automatically-set breakpoint will be removed or modified to remove the automatically-set portion of the breakpoint.
摘要翻译：提供了一种用于在电子设计自动化（EDA）工作流程中建立自动调试环境的系统和方法。提供用户接口，用于通过显示可调试参数的列表，接受来自用户的选择以及自动定位设置所选择的参数的回调函数以及包含回调函数的源代码文件来与用户进行接口。此外，确定回调函数是否仅设置所选择的参数或几个不同的参数，并且相应地设置自动断点以仅响应于所选择的参数而中断。在执行修改的回调函数时，执行将被自动设置的智能断点阻止，并且将生成调试用户界面并向用户提供相关源代码的显示，回调函数，参数名称和值，系统状态等。完成调试过程后，自动设置的断点将被删除或修改，以删除断点的自动设置部分。

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