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1. 发明申请

US20170144363A1 IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD FOR MANUFACTURING ARTICLE 审中-公开
公开(公告)号：US20170144363A1
公开(公告)日：2017-05-25
申请号：US15357740
申请日：2016-11-21
申请人： CANON KABUSHIKI KAISHA
发明人： Kazuki Nakagawa , Kazuhiro Sato , Tsutomu Terao
IPC分类号： B29C59/16 , B29C59/00 , B29C59/02
CPC分类号： G03F7/0002 , B29C35/02 , B29C35/0288 , B29C35/08 , B29C35/0805 , B29C35/0888 , B29C59/02 , B29C59/022 , B29C59/026 , B29C59/16 , B29C2035/0827 , B29C2059/023 , B29K2105/24 , B29L2031/34 , G03F7/20 , G03F7/2002 , G03F7/2012 , G03F7/70558 , G03F7/70608 , G03F2007/2067
摘要： An imprint apparatus for forming a pattern of an imprint material on a substrate using a mold includes a heating unit, a generation unit, and a measurement unit. The heating unit irradiates a region to be processed on the substrate with light to heat the region to be processed. The generation unit generates irradiation amount distribution data, which indicates an irradiation amount distribution of light with which the heating unit is to irradiate the region to be processed. The measurement unit measures information about absorption of the light by the region to be processed. The generation unit generates the irradiation amount distribution data by correcting, using a result of measurement by the measurement unit, temporary irradiation amount distribution data temporarily generated based on a shape of the region to be processed taken before the region to be processed is heated by the heating unit.

2. 发明授权

US10751930B2 Imprint apparatus, imprint method, and method of manufacturing article 有权
公开(公告)号：US10751930B2
公开(公告)日：2020-08-25
申请号：US15546857
申请日：2016-03-07
申请人： CANON KABUSHIKI KAISHA
发明人： Tsutomu Terao
IPC分类号： B29C59/00 , G03F7/00 , B29C59/02 , B29C37/00
摘要： The present invention an imprint apparatus which performs an imprint process of forming a pattern in an imprint material on a substrate using a mold, the apparatus including an image capturing unit configured to obtain an image by capturing the substrate, and a processing unit configured to perform detection processing of detecting a foreign particle present between the mold and the substrate, wherein the processing unit performs the detection processing by comparing, with a reference image, an image obtained by the image capturing unit in a state in which the mold and the imprint material on the substrate are in contact with each other, and when the image includes a region outside the substrate, the region outside the substrate is excluded from a target of the detection processing.

3. 发明申请

US20190061207A1 IMPRINT APPARATUS, IMPRINT METHOD, ARTICLE MANUFACTURING METHOD, MOLDING APPARATUS, AND MOLDING METHOD 审中-公开
公开(公告)号：US20190061207A1
公开(公告)日：2019-02-28
申请号：US16105137
申请日：2018-08-20
申请人： CANON KABUSHIKI KAISHA
发明人： Tsutomu Terao
IPC分类号： B29C43/58 , B29C33/42
摘要： An apparatus forms a pattern of an imprint material by curing the imprint material in a state in which the imprint material on a pattern formation region of a member, where a pattern is to be formed, is in contact with a pattern region of a mold. The apparatus includes a dispenser for placing the imprint material on the pattern formation region of the member and a non-pattern formation region of the member, outside the pattern formation region, a detector for detecting the non-pattern formation region in a state in which the imprint material has been placed on the pattern formation region and the non-pattern formation region by the dispenser, and a controller for performing processing for determining an abnormality in the dispenser based on a detection result of the non-pattern formation region by the detector.

4. 发明申请

US20230029254A1 PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD 有权
公开(公告)号：US20230029254A1
公开(公告)日：2023-01-26
申请号：US17861510
申请日：2022-07-11
申请人： CANON KABUSHIKI KAISHA
发明人： Tsutomu Terao
IPC分类号： G03F7/20
摘要： A processing apparatus includes a first structure supported by a vibration reduction mechanism, a drive mechanism supported by the first structure and configured to drive an object to be processed, a second structure supported by the first structure and facing the object, an actuator configured to apply a force to the first structure, a sensor configured to detect a vibration of the second structure, and a controller configured to feedforward-control the actuator based on feedforward control information so as to reduce vibrations of the first structure and the second structure. The feedforward control information includes first control information determined in advance based on an output from the sensor.

5. 发明申请

US20180022015A1 IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF MANUFACTURING ARTICLE 审中-公开
公开(公告)号：US20180022015A1
公开(公告)日：2018-01-25
申请号：US15546857
申请日：2016-03-07
申请人： CANON KABUSHIKI KAISHA
发明人： Tsutomu Terao
IPC分类号： B29C59/00 , G03F7/00 , B29C59/02
CPC分类号： B29C59/002 , B29C59/02 , B29C2037/90 , B29C2037/903 , B29C2037/906 , B29C2059/023 , G03F7/0002
摘要： The present invention an imprint apparatus which performs an imprint process of forming a pattern in an imprint material on a substrate using a mold, the apparatus including an image capturing unit configured to obtain an image by capturing the substrate, and a processing unit configured to perform detection processing of detecting a foreign particle present between the mold and the substrate, wherein the processing unit performs the detection processing by comparing, with a reference image, an image obtained by the image capturing unit in a state in which the mold and the imprint material on the substrate are in contact with each other, and when the image includes a region outside the substrate, the region outside the substrate is excluded from a target of the detection processing.

6. 发明申请

US20230057796A1 CONTROL APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD 有权
公开(公告)号：US20230057796A1
公开(公告)日：2023-02-23
申请号：US17880767
申请日：2022-08-04
申请人： CANON KABUSHIKI KAISHA
发明人： Mitsuhide Nishimura , Junichi Motojima , Tsutomu Terao
IPC分类号： G03F9/00 , G03F7/20
摘要： A control apparatus for performing position control of a moving object is provided. The apparatus includes a feedforward controller configured to perform feedforward control by giving a feedforward manipulated variable to the moving object. In a case that a duration of the feedforward control exceeds a predetermined time, the feedforward controller continues the feedforward control using a feedforward manipulated variable obtained based on a feedforward manipulated variable used in a predetermined section including an end of the predetermined time.

7. 发明申请

US20220107572A1 POSITIONING APPARATUS, LITHOGRAPHY APPARATUS AND ARTICLE MANUFACTURING METHOD 有权
公开(公告)号：US20220107572A1
公开(公告)日：2022-04-07
申请号：US17492987
申请日：2021-10-04
申请人： CANON KABUSHIKI KAISHA
发明人： Tsutomu Terao
IPC分类号： G03F7/20 , H01L21/027
摘要： The present invention provides a positioning apparatus for positioning of an object, the positioning apparatus including a first actuator and a second actuator configured to be arranged along a first direction so as to be parallel to each other, and to cause a beam to move in the first direction, a third actuator configured to be built in the beam, and to cause the object to move in a second direction relative to the beam, the second direction intersecting with the first direction, and a control unit configured to control the first actuator, the second actuator, and the third actuator.

8. 发明授权

US10372034B2 Imprint apparatus, imprint method, and method for manufacturing article 有权
公开(公告)号：US10372034B2
公开(公告)日：2019-08-06
申请号：US15357740
申请日：2016-11-21
申请人： CANON KABUSHIKI KAISHA
发明人： Kazuki Nakagawa , Kazuhiro Sato , Tsutomu Terao
IPC分类号： B29C59/16 , G03F7/00 , B29K105/24 , B29L31/34 , B29C59/02 , B29C35/08 , B29C35/02 , G03F7/20
摘要： An imprint apparatus for forming a pattern of an imprint material on a substrate using a mold includes a heating unit, a generation unit, and a measurement unit. The heating unit irradiates a region to be processed on the substrate with light to heat the region to be processed. The generation unit generates irradiation amount distribution data, which indicates an irradiation amount distribution of light with which the heating unit is to irradiate the region to be processed. The measurement unit measures information about absorption of the light by the region to be processed. The generation unit generates the irradiation amount distribution data by correcting, using a result of measurement by the measurement unit, temporary irradiation amount distribution data temporarily generated based on a shape of the region to be processed taken before the region to be processed is heated by the heating unit.

9. 发明申请

US20150062552A1 STAGE APPARATUS AND ITS DRIVING METHOD 审中-公开
标题翻译：阶段装置及其驱动方法
公开(公告)号：US20150062552A1
公开(公告)日：2015-03-05
申请号：US14474411
申请日：2014-09-02
申请人： CANON KABUSHIKI KAISHA
发明人： Tsutomu Terao
IPC分类号： G03F7/20
CPC分类号： G03F7/70758 , G03F7/70725
摘要： Provided is a stage apparatus that includes a first stage configured to be movable by a predetermined stroke; a second stage configured to be movable on the first stage by a stroke shorter than the stroke of the first stage; and a controller configured to control a first driving unit, which changes the relative position of the second stage with respect to the first stage, or a second driving unit, which changes the position of the first stage, such that the relative position of the second stage with respect to the first stage is offset in the direction of movement of the first stage upon acceleration of the first stage whereas the relative position of the second stage with respect to the first stage is offset in a direction opposite to the direction of movement of the first stage upon deceleration of the first stage.
摘要翻译：提供了一种舞台装置，其包括被配置为可移动预定行程的第一级; 第二级，被配置为可以在所述第一级上移动比所述第一级的行程短的行程; 以及控制器，被配置为控制改变第二级相对于第一级的相对位置的第一驱动单元或改变第一级的位置的第二驱动单元，使得第二级相对于第一阶段的阶段在第一阶段的加速度时在第一阶段的移动方向上偏移，而第二阶段相对于第一阶段的相对位置在与第一阶段的移动方向相反的方向上偏移第一阶段减速的第一阶段。

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