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    • 7. 发明申请
    • ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREFOR, AND DISPLAY DEVICE
    • 阵列基板及其制造方法及显示装置
    • US20160365531A1
    • 2016-12-15
    • US15122153
    • 2015-06-30
    • BOE TECHNOLOGY GROUP CO., LTD.
    • Chunjing HuHuifeng Wang
    • H01L51/52H01L51/00H01L27/32
    • H01L51/5209H01L27/3246H01L27/3258H01L51/0021H01L2227/323
    • Disclosed is an array substrate and a method for manufacturing the same and a display device. The array substrate comprises: a substrate; a first electrode layer formed on the substrate; a pixel defining layer formed on the first electrode layer and having an opening for exposing the first electrode layer; and an organic material functional layer formed on a region of the first electrode layer corresponding to the opening. The first electrode layer comprises: a first region located at a central portion of the first electrode layer; a second region located between a periphery of the first region and an inner side of the pixel defining layer, the second region being formed as a first arc structure protruding toward the substrate; and a third region located outside the second region and covered by the pixel defining layer. The thicknesses, at positions of respective films of the organic material functional layer in the display device, are uniform. Non-uniform brightness of the display device is avoided, improving display quality of images of the display device.
    • 公开了一种阵列基板及其制造方法以及显示装置。 阵列基板包括:基板; 形成在所述基板上的第一电极层; 形成在第一电极层上并具有用于暴露第一电极层的开口的像素限定层; 以及形成在与开口对应的第一电极层的区域上的有机材料功能层。 第一电极层包括:位于第一电极层的中心部分的第一区域; 位于所述第一区域的周边和所述像素限定层的内侧之间的第二区域,所述第二区域形成为朝向所述基板突出的第一弧形结构; 以及位于第二区域外部并被像素限定层覆盖的第三区域。 在显示装置中的有机材料功能层的各个膜的位置处的厚度是均匀的。 避免显示装置的不均匀亮度,提高显示装置的图像的显示质量。